专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2008137544A1 AUTOMATED MODEL BUILDING AND MODEL UPDATING 审中-公开
标题翻译：自动模型建筑和模型更新
公开(公告)号：WO2008137544A1
公开(公告)日：2008-11-13
申请号：PCT/US2008/062217
申请日：2008-05-01
申请人： MKS INSTRUMENTS, INC. , HENDLER, Lawrence , LAZAROVICH, Stela, Diamant , HADAR, Ron , KETTANEH, Nouna , LEVAMI, Uzi , PERLROIZEN, Dmitry
发明人： HENDLER, Lawrence , LAZAROVICH, Stela, Diamant , HADAR, Ron , KETTANEH, Nouna , LEVAMI, Uzi , PERLROIZEN, Dmitry
IPC分类号： G05B19/418
CPC分类号： G05B19/41875 , G05B2219/32201 , G05B2219/42001 , G05B2219/45031
摘要： A system and computer-implemented method for creating a new model or updating a previously-created model based on a template are described. A template is generated from a previously-created model. The previously-created model specifies a set of parameters associated with a manufacturing process, a process tool or chamber. Variables associated with the manufacturing process are acquired, monitored, and analyzed. A statistical analysis (or multivariate statistical analysis) is employed to analyze the monitored variables and the set of parameters. When any of the monitored variables satisfy a threshold condition, a new model is created or the parameters of the previously-created model are updated, adjusted, or modified based on the template and the monitored variables. A user interface facilitating communication between a user and the systems and display of information is also described.
摘要翻译：描述了用于创建新模型或基于模板更新先前创建的模型的系统和计算机实现的方法。从先前创建的模型生成模板。先前创建的模型指定与制造过程，过程工具或室相关联的一组参数。获取，监测和分析与制造过程相关的变量。采用统计分析（或多变量统计分析）来分析监测变量和参数集。当任何受监视的变量满足阈值条件时，将根据模板和监视变量创建新模型或先前创建的模型的参数进行更新，调整或修改。还描述了便于用户和系统之间的通信以及信息显示的用户界面。

2. 发明申请

WO2007064933A1 METHOD AND APPARATUS FOR CLASSIFYING MANUFACTURING OUTPUTS 审中-公开
标题翻译：用于分类制造输出的方法和装置
公开(公告)号：WO2007064933A1
公开(公告)日：2007-06-07
申请号：PCT/US2006/046084
申请日：2006-12-01
申请人： MKS INSTRUMENTS, INC. , HENDLER, Lawrence , RICHTER, Matthew
发明人： HENDLER, Lawrence , RICHTER, Matthew
IPC分类号： G05B23/02
CPC分类号： G05B23/0281
摘要： A method for process monitoring involves acquiring data samples associated with a plurality of manufacturing related variables for a plurality of outputs of a manufacturing process. The distance of each data sample relative to every other data sample is then calculated. The outputs are then grouped based on the Euclidean distances that satisfy a boundary determining criterion.
摘要翻译：用于过程监控的方法包括获取与制造过程的多个输出相关联的多个制造相关变量的数据样本。然后计算每个数据样本相对于每个其他数据样本的距离。然后基于满足边界确定标准的欧氏距离对输出进行分组。

3. 发明申请

WO2007146558A2 CLASSIFYING FAULTS ASSOCIATED WITH A MANUFACTURING PROCESS 审中-公开
标题翻译：与制造过程相关的分类故障
公开(公告)号：WO2007146558A2
公开(公告)日：2007-12-21
申请号：PCT/US2007/069457
申请日：2007-05-22
申请人： MKS INSTRUMENTS, INC , HENDLER, Lawrence , LEV-AMI, Uzi, Josef
发明人： HENDLER, Lawrence , LEV-AMI, Uzi, Josef
CPC分类号： G05B23/0281
摘要： Faults that are associated with a set of variables that are each associated with a manufacturing parameter are classified. A fault vector is defined according to a multivariate analysis based on a contribution to a metric of a subset of the variables. The fault vector is compared to a plurality of previously-defined fault vectors to determine a comparison value indicative of a correlation between the fault vector and the plurality of previously-defined fault vectors. The fault vector is associated with at least one of a first set of fault vectors indicative of a known fault or a second set of fault vectors indicative of an unknown fault based in part on the comparison value.
摘要翻译：与与制造参数相关联的一组变量相关联的故障被分类。根据对变量子集的度量的贡献，根据多变量分析来定义故障向量。将故障向量与多个先前定义的故障向量进行比较，以确定指示故障向量与多个先前定义的故障向量之间的相关性的比较值。部分地基于比较值，故障向量与指示已知故障的第一组故障向量或指示未知故障的第二组故障向量中的至少一个相关联。

4. 发明申请

WO2009114251A1 PROCESS CONTROL USING PROCESS DATA AND YIELD DATA 审中-公开
标题翻译：使用过程数据和输入数据的过程控制
公开(公告)号：WO2009114251A1
公开(公告)日：2009-09-17
申请号：PCT/US2009/034619
申请日：2009-02-20
申请人： MKS INSTRUMENTS, INC. , HENDLER, Lawrence , LIN, Kuo-chin , WOLD, Svante, Bjarne
发明人： HENDLER, Lawrence , LIN, Kuo-chin , WOLD, Svante, Bjarne
IPC分类号： G05B23/02
CPC分类号： G05B23/0254 , G05B17/02 , G05B2219/11 , G05B2219/1112 , G05B2219/32187 , G05B2219/32201 , G05B2219/45031 , Y02P90/22 , Y02P90/86
摘要： A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process ('Step a'). Data is acquired for a plurality of process variables for a first process step for manufacturing semiconductor wafers ('Step b'). A first mathematical model of the first process step is created based on the metrology data and the acquired data for the plurality of process variables for the first process step ('Step c'). Steps b and c are repeated for at least a second process step for manufacturing the semiconductor wafers ('Step d'). An nth mathematical model is created based on the metrology data and the data for the plurality of process variables for each of the n process steps ('Step e'). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e ('Step f ')• The top level mathematical model of Step f is based on those process variables that have a substantial effect on the metrology data.
摘要翻译：在制造过程的最终处理步骤结束时，用于监测制造过程的方法特征在于采集半导体晶片的度量数据（“步骤a”）。针对用于制造半导体晶片的第一工艺步骤的多个工艺变量获取数据（“步骤b”）。基于测量数据和用于第一处理步骤（“步骤c”）的多个处理变量的获取数据，创建第一处理步骤的第一数学模型。对于制造半导体晶片的至少第二工艺步骤重复步骤b和c（步骤d'）。基于计量学数据和用于n个处理步骤（'步骤e'）中的每一个的多个处理变量的数据创建第n个数学模型。基于测量数据和由步骤c，d和e创建的模型创建顶级数学模型（“步骤f”）步骤f的顶级数学模型基于对计量数据。

5. 发明申请

WO2007008538A3 SELF-CORRECTING MULTIVARIATE ANALYSIS FOR USE IN MONITORING DYNAMIC PARAMETERS IN PROCESS ENVIRONMENTS 审中-公开
公开(公告)号：WO2007008538A3
公开(公告)日：2007-01-18
申请号：PCT/US2006/026236
申请日：2006-07-05
申请人： MKS INSTRUMENTS, INC. , LEV-AMI, Uzi, Josef , HENDLER, Lawrence
发明人： LEV-AMI, Uzi, Josef , HENDLER, Lawrence
IPC分类号： G05B23/02
摘要： A method and apparatus for process monitoring are provided. Process monitoring includes (i) generating a multivariate analysis reference model of a process environment from data corresponding to monitored parameters of the process environment; (ii) designating at least one of the monitored parameters as being correlated to maturation of the process environment; (iii) collecting current process data corresponding to the monitored parameters, including the at least one designated parameter; and (iv) scaling the multivariate reference model based on the current process data of the at least one designated parameter to account for maturation of the process environment. The method further includes generating one or more current multivariate analysis process metrics that represent a current state of the process environment from the current process data; and comparing the current process metrics to the scaled reference model to determine whether the current state of the process environment is acceptable.

6. 发明公开

EP2260358A1 PROCESS CONTROL USING PROCESS DATA AND YIELD DATA 审中-公开
标题翻译：过程数据以及数据的结果过程控制
公开(公告)号：EP2260358A1
公开(公告)日：2010-12-15
申请号：EP09718781.9
申请日：2009-02-20
申请人： MKS Instruments, Inc.
发明人： HENDLER, Lawrence , LIN, Kuo-chin , WOLD, Svante, Bjarne
IPC分类号： G05B23/02
CPC分类号： G05B23/0254 , G05B17/02 , G05B2219/11 , G05B2219/1112 , G05B2219/32187 , G05B2219/32201 , G05B2219/45031 , Y02P90/22 , Y02P90/86
摘要： A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process ('Step a'). Data is acquired for a plurality of process variables for a first process step for manufacturing semiconductor wafers ('Step b'). A first mathematical model of the first process step is created based on the metrology data and the acquired data for the plurality of process variables for the first process step ('Step c'). Steps b and c are repeated for at least a second process step for manufacturing the semiconductor wafers ('Step d'). An nth mathematical model is created based on the metrology data and the data for the plurality of process variables for each of the n process steps ('Step e'). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e ('Step f ')• The top level mathematical model of Step f is based on those process variables that have a substantial effect on the metrology data.

7. 发明公开

EP1907908A2 SELF-CORRECTING MULTIVARIATE ANALYSIS FOR USE IN MONITORING DYNAMIC PARAMETERS IN PROCESS ENVIRONMENTS 审中-公开
标题翻译：更可变纠正分析用于监测中的动态参数的过程环境
公开(公告)号：EP1907908A2
公开(公告)日：2008-04-09
申请号：EP06786397.7
申请日：2006-07-05
申请人： MKS Instruments, Inc.
发明人： LEV-AMI, Uzi, Josef , HENDLER, Lawrence
IPC分类号： G05B23/02
CPC分类号： G05B23/0254
摘要： A method and apparatus for process monitoring are provided. Process monitoring includes (i) generating a multivariate analysis reference model of a process environment from data corresponding to monitored parameters of the process environment; (ii) designating at least one of the monitored parameters as being correlated to maturation of the process environment; (iii) collecting current process data corresponding to the monitored parameters, including the at least one designated parameter; and (iv) scaling the multivariate reference model based on the current process data of the at least one designated parameter to account for maturation of the process environment. The method further includes generating one or more current multivariate analysis process metrics that represent a current state of the process environment from the current process data; and comparing the current process metrics to the scaled reference model to determine whether the current state of the process environment is acceptable.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式