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1. 发明专利

DE69030329T2 未知
公开(公告)号：DE69030329T2
公开(公告)日：1997-09-25
申请号：DE69030329
申请日：1990-08-17
申请人： MITSUBISHI ELECTRIC CORP , NISSHIN DENKI K K
发明人： SHONO KAZUHIRO , SASAKI SHIGEO , KATOH SUSUMU , NAITOU MASAO , NAKANISHI TETSUYA , FUJISHITA NAOMITSU , NOGUCHI KAZUHIKO , TANJO MASAYASU
IPC分类号： H01J37/302 , C23C14/48 , H01J37/317 , H01L21/265
摘要： An ion implantation apparatus includes an ion source (1) comprising an arc chamber (2) generating ions and a drawing electrode (3) drawing ions from the arc chamber (2), a mass separator (25) transporting only ions necessary for implantation in the drawn ions to a material to be implanted by ions, an ion implantation chamber (5) in which the material to be implanted by ions are arranged and controlling means (10) for automatically controlling the distance between the arc chamber (2) and the drawing electrode (3) by quantization in accordance with a theoretical calculation using conception of normalization perveance at a beam drawing part in accordance with setting of the kind of ions to be implanted, an accelerating voltage and an amount of current, and current density distribution.

2. 发明专利

DE69030329D1 未知
公开(公告)号：DE69030329D1
公开(公告)日：1997-04-30
申请号：DE69030329
申请日：1990-08-17
申请人： MITSUBISHI ELECTRIC CORP , NISSHIN DENKI K K
发明人： SHONO KAZUHIRO , SASAKI SHIGEO , KATOH SUSUMU , NAITOU MASAO , NAKANISHI TETSUYA , FUJISHITA NAOMITSU , NOGUCHI KAZUHIKO , TANJO MASAYASU
IPC分类号： H01J37/302 , C23C14/48 , H01J37/317 , H01L21/265
摘要： An ion implantation apparatus includes an ion source (1) comprising an arc chamber (2) generating ions and a drawing electrode (3) drawing ions from the arc chamber (2), a mass separator (25) transporting only ions necessary for implantation in the drawn ions to a material to be implanted by ions, an ion implantation chamber (5) in which the material to be implanted by ions are arranged and controlling means (10) for automatically controlling the distance between the arc chamber (2) and the drawing electrode (3) by quantization in accordance with a theoretical calculation using conception of normalization perveance at a beam drawing part in accordance with setting of the kind of ions to be implanted, an accelerating voltage and an amount of current, and current density distribution.

3. 发明专利

DE69027720T2 未知
公开(公告)号：DE69027720T2
公开(公告)日：1997-02-20
申请号：DE69027720
申请日：1990-08-17
申请人： MITSUBISHI ELECTRIC CORP , NISSHIN DENKI K K
发明人： SHONO KAZUHIRO , SASAKI SHIGEO , KATOH SUSUMU , NAITOU MASAO , NAKANISHI TETSUYA , FUJISHITA NAOMITSU , NOGUCHI KAZUHIKO , TANJO MASAYASU
IPC分类号： H01J37/302 , H01J37/317 , C23C14/48 , H01L21/265
摘要： An ion implantation apparatus includes an ion source (1) comprising an arc chamber (2) generating ions and a drawing electrode (3) drawing ions from the arc chamber (2), a mass separator (25) transporting only ions necessary for implantation in the drawn ions to a material to be implanted by ions, an ion implantation chamber (5) in which the material to be implanted by ions are arranged and controlling means (10) for automatically controlling the distance between the arc chamber (2) and the drawing electrode (3) by quantization in accordance with a theoretical calculation using conception of normalization perveance at a beam drawing part in accordance with setting of the kind of ions to be implanted, an accelerating voltage and an amount of current, and current density distribution.

4. 发明专利

DE69027720D1 未知
公开(公告)号：DE69027720D1
公开(公告)日：1996-08-14
申请号：DE69027720
申请日：1990-08-17
申请人： MITSUBISHI ELECTRIC CORP , NISSHIN DENKI K K
发明人： SHONO KAZUHIRO , SASAKI SHIGEO , KATOH SUSUMU , NAITOU MASAO , NAKANISHI TETSUYA , FUJISHITA NAOMITSU , NOGUCHI KAZUHIKO , TANJO MASAYASU
IPC分类号： H01J37/302 , H01J37/317 , C23C14/48 , H01L21/265
摘要： An ion implantation apparatus includes an ion source (1) comprising an arc chamber (2) generating ions and a drawing electrode (3) drawing ions from the arc chamber (2), a mass separator (25) transporting only ions necessary for implantation in the drawn ions to a material to be implanted by ions, an ion implantation chamber (5) in which the material to be implanted by ions are arranged and controlling means (10) for automatically controlling the distance between the arc chamber (2) and the drawing electrode (3) by quantization in accordance with a theoretical calculation using conception of normalization perveance at a beam drawing part in accordance with setting of the kind of ions to be implanted, an accelerating voltage and an amount of current, and current density distribution.

5. 发明专利

DE102004030830A1 未知
公开(公告)号：DE102004030830A1
公开(公告)日：2005-02-10
申请号：DE102004030830
申请日：2004-06-25
申请人： MITSUBISHI ELECTRIC CORP
发明人： OTA HITOSHI , HASHIMOTO AKIRA , SHONO KAZUHIRO , KAJITA NAOKI , UOZUMI HISANORI , HASHIGUCHI NAOKI
IPC分类号： F16D65/22 , B60L7/00 , B66D5/08 , B66D5/28 , B66D5/30 , F16D51/00 , F16D51/10 , F16D65/14 , F16D65/27
摘要： A brake structure of a traction machine includes a brake drum which is made rotatable about a shaft disposed on a rotary axis of the traction machine, and an electromagnetic brake unit built in an inner space of the brake drum. The electromagnetic brake unit includes a plurality of movable iron cores, a plurality of brake shoes located on the outside of the individual movable iron cores and joined thereto by connecting members, the brake shoes having curved outer surfaces facing a curved inner surface of the brake drum, and a one-piece formed stationary iron core block. The one-piece formed stationary iron core block has a plurality of stationary iron core portions joined to the individual movable iron cores via compression springs for forcing the individual brake shoes against the curved inner surface of the brake drum via the movable iron cores and the connecting members.

6. 发明专利

DE112016003983T5 ROTOR, ROTIERENDE ELEKTRISCHE MASCHINE, ELEKTRISCHER KOMPRESSOR UND KÜHL/KLIMATISIERUNGS-VORRICHTUNG 未知
公开(公告)号：DE112016003983T5
公开(公告)日：2018-07-05
申请号：DE112016003983
申请日：2016-08-19
申请人： MITSUBISHI ELECTRIC CORP
发明人： NAKAMURA HIDEYUKI , SHONO KAZUHIRO , TAMURA YUKI , MASUMOTO KOJI
IPC分类号： H02K1/27 , F04B39/00 , H02K1/22
摘要： Ein Rotorkern wird durch Stapeln einer Mehrzahl von Kernplatten (1) konfiguriert, die jeweils Folgendes aufweisen: einen Kernbereich (2) auf der inneren Umfangsseite; einen Kernbereich (3) auf der äußeren Umfangsseite; ein Magnet-Einsetzloch (5); einen radialen Verbindungsbereich (6b), der so angeordnet ist, dass er mit dem Kernbereich (2) auf der inneren Umfangsseite verbunden ist; einen Umfangs-Verbindungsbereich (6a), der so angeordnet ist, dass er zwischen den Kernbereich (3) auf der äußeren Umfangsseite und den radialen Verbindungsbereich (6b) geschaltet ist, der einen Bereich mit minimaler Breite aufweist, der eine Breite aufweist, die geringer als Breiten an beiden Enden ist, und eine Breite aufweist, die von beiden Enden in Richtung zu dem Bereich mit minimaler Breite gleichmäßig abnimmt; sowie einen dünnen Bereich (12), der einen Bereich mit gleichmäßiger Dicke, der in dem Umfangs-Verbindungbereich (6a) angeordnet ist und der eine gleichmäßige Dicke aufweist, und einen Bereich mit nicht-gleichmäßiger Dicke aufweist, der benachbart zu dem Bereich mit gleichmäßiger Dicke ist und eine zunehmende Dicke aufweist, wobei der dünne Bereich (12) den Bereich mit minimaler Breite innerhalb des Bereichs mit gleichmäßiger Dicke aufweist. Auch wenn die Dicke des Umfangs-Verbindungsbereichs (6a) verringert ist, ist eine ausreichende Festigkeit sichergestellt, und ein magnetischer Streufluss kann verringert werden.

7. 发明专利

DE102004030830B4 未知
公开(公告)号：DE102004030830B4
公开(公告)日：2009-07-23
申请号：DE102004030830
申请日：2004-06-25
申请人： MITSUBISHI ELECTRIC CORP
发明人： OTA HITOSHI , HASHIMOTO AKIRA , SHONO KAZUHIRO , KAJITA NAOKI , UOZUMI HISANORI , HASHIGUCHI NAOKI
IPC分类号： F16D65/22 , B60L7/00 , B66D5/08 , B66D5/28 , B66D5/30 , F16D51/00 , F16D51/10 , F16D65/14
摘要： A brake structure of a traction machine includes a brake drum which is made rotatable about a shaft disposed on a rotary axis of the traction machine, and an electromagnetic brake unit built in an inner space of the brake drum. The electromagnetic brake unit includes a plurality of movable iron cores, a plurality of brake shoes located on the outside of the individual movable iron cores and joined thereto by connecting members, the brake shoes having curved outer surfaces facing a curved inner surface of the brake drum, and a one-piece formed stationary iron core block. The one-piece formed stationary iron core block has a plurality of stationary iron core portions joined to the individual movable iron cores via compression springs for forcing the individual brake shoes against the curved inner surface of the brake drum via the movable iron cores and the connecting members.

8. 发明专利

GB2255225A ELECTRON SHOWER GENERATION. 未知
公开(公告)号：GB2255225A
公开(公告)日：1992-10-28
申请号：GB9205312
申请日：1992-03-11
申请人： MITSUBISHI ELECTRIC CORP
发明人： SHONO KAZUHIRO , FUJISHITA NAOMITSU , NOGUCHI KAZUHIKO , NAGAYAMA TAKAHISA , SASAKI SHIGEO
IPC分类号： H01J37/02 , H01J37/317
摘要： An electron shower apparatus 1, for neutralising the charge formed on a semiconductor target 9 during ion implantation, is operated or constructed in such a way that the magnetic field generated by the heating current flowing in the electron emitting filament 2 is reduced or eliminated whereby it's adverse effect on the emitted electron shower 11 is reduced or avoided. This may be achieved by (i) pulsing the filament current using pulse source 6 and extracting the electron shower only during the periods when the filament current is off; (ii) providing an adjacent element either separate from or integral with the filament, Figs 5-9 (not shown), through which current flows in a direction to provide an opposing or cancelling magnetic field; (iii) using a permanent or electromagnet to provide an opposing magnetic field, Fig. 10 (not shown). Two pulsed sources as in (i) may be operated alternately to give an effectively continuous electron shower at the target. The filament may be divided into three separately energised parts which are controlled individually in response to the monitored target charge distribution, Figs 11-13 (not shown), to vary the charge profile or position of the electron shower. Alternatively, Fig. 14 (not shown), a compensating filament may be translated or rotated with respect to the electron cutting filament in response to the monitored target charge.

9. 发明公开

EP1710038A4 WELDER FOR METAL MEMBER HAVING PERMANENT MAGNET MATERIAL AND ITS WELDING METHOD, AND ROTATING ELECTRIC MACHINE 失效转让
标题翻译：焊接装置与永磁材料的金属元素及其焊接及旋转电机
公开(公告)号：EP1710038A4
公开(公告)日：2009-03-11
申请号：EP05703921
申请日：2005-01-20
申请人： MITSUBISHI ELECTRIC CORP
发明人： FUJITA MASAHIKO , NISHITANI SHOICHIRO , NAKATAKE YASUSHI , DOI MASAHARU , KUDOU SHINYA , SHONO KAZUHIRO , ASAO YOSHIHITO , KURIBAYASHI MASARU
IPC分类号： B23K11/00 , B23K11/11 , H02K1/22 , H02K9/06 , H02K15/02 , H02K19/00
CPC分类号： B23K11/115 , B23K11/002 , B23K2201/36 , H02K15/022 , H02K15/03 , H02K21/044 , Y10T29/49009
摘要： A welder and welding method for preventing the permanent magnet material of a metal member from being unnecessarily magnetized by the welding current when the metal member having the permanent magnet material is resistance-welded to another metal member. The welder comprised a work holding section (3) for holding a work (14), a press unit (4) provided to the work holding section (3) with a work supply space interposed, a first welding electrode (8) provided to a movable part (4a) of the press unit (4), a second welding electrode (10), and a welding transformer (11) for supplying a welding current to the welding electrodes (8, 10). The welding electrodes (8, 10) are arranged on one end side of the work (14) in respect of one and the other metal members. A permanent magnet material (18) is not interposed between the butted ends of the metal members.

10. 发明专利

GB2255225B Electron shower generation 未知
公开(公告)号：GB2255225B
公开(公告)日：1995-10-11
申请号：GB9205312
申请日：1992-03-11
申请人： MITSUBISHI ELECTRIC CORP
发明人： SHONO KAZUHIRO , FUJISHITA NAOMITSU , NOGUCHI KAZUHIKO , NAGAYAMA TAKAHISA , SASAKI SHIGEO
IPC分类号： H01J37/02 , H01J37/317
摘要： There is disclosed an electron shower apparatus which eliminates the adverse effect of a magnetic field on electrons and which provides electrons in sufficient quantity when primary electrons having low energy are employed. In the apparatus, the magnetic field generated by a filament current is decreased or eliminated by pulsing the filament current or by passing a current opposite in direction to the filament current in the vicinity of the filament current.

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