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    • 1. 发明申请
    • IMPLANTABLE CO-FIRED ELECTRICAL INTERCONNECT SYSTEMS AND DEVICES AND METHODS OF FABRICATION THEREFOR
    • 可植入的电气互连系统及其装置及其制造方法
    • WO2007035332A1
    • 2007-03-29
    • PCT/US2006/035509
    • 2006-09-12
    • MEDTRONIC, INC.BURDON, Jeremy, W.KNOWLES, Shawn, D.YAMAMOTO, Joyce, K.
    • BURDON, Jeremy, W.KNOWLES, Shawn, D.YAMAMOTO, Joyce, K.
    • A61N1/375H01G4/35
    • H01G4/35A61N1/3754
    • ABSTRACT The invention includes a family of miniaturized, hermetic electrical feedthrough assemblies having at least one passive electrical component electrically coupled to a conductive pathway traversing each said assembly which are adapted for implantation within a biological system. The electrical feedthrough assembly according to the invention can be used as a component of an implantable medical device (IMD) such as an implantable pulse generator, cardioverter-defibrillator, physiologic sensor, drug-delivery system and the like. Such assemblies require biocompatibility and resistance to degradation under applied bias current or voltage. Such an assembly is fabricated by interconnected electrical pathways, or vias, of a conductive metallic paste disposed between ceramic green-state material. The layers are stacked together and sintered to form a substantially monolithic dielectric structure with at least one embedded metallization pathway extending through the structure.
    • 摘要本发明包括一系列小型化,密封的电馈通组件,其具有至少一个无源电部件,其电耦合到横穿每个所述组件的导电通路,其适于植入生物系统内。 根据本发明的电馈通组件可以用作可植入式医疗装置(IMD)的组件,例如可植入式脉冲发生器,心律转复除颤器,生理传感器,药物递送系统等。 这样的组件需要在施加的偏置电流或电压下的生物相容性和耐劣化性。 这种组件由布置在陶瓷绿色材料之间的导电金属膏的互连电路或通孔制成。 层叠在一起并烧结以形成具有延伸穿过该结构的至少一个嵌入金属化路径的基本上单片的电介质结构。
    • 3. 发明申请
    • PLASMA-ASSISTED MICRO-SCALE MATERIAL DEPOSITION
    • 等离子体辅助微尺度材料沉积
    • WO2004033750A1
    • 2004-04-22
    • PCT/US2003/031846
    • 2003-10-07
    • MOTOROLA, INC.BURDON, Jeremy, W.VON ALLMEN, Paul, A.WILCOX, David, L.
    • BURDON, Jeremy, W.VON ALLMEN, Paul, A.WILCOX, David, L.
    • C23C16/04
    • H01J37/32091C23C8/36C23C16/50H01J37/32366H01J37/32596
    • An exemplary system and method for micro-scale, plasma-assisted material deposition is disclosed as comprising inter alia: a plasma source (100); a microfluidic channel (250); a medium disposed within the micro-channel; a substrate within the micro-channel; and means for activating a low voltage plasma discharge to form a material product on a surface of the substrate. Disclosed features and specifications may be variously controlled, adapted or otherwise optionally modified to improve material deposition characteristics. Exemplary embodiments of the present invention representatively provide for in situ, plasma-assisted material deposition and may be readily integrated with existing micro-scale technologies for the improvement of device package form factors, weights and other manufacturing and/or device performance metrics.
    • 公开了用于微尺度等离子体辅助材料沉积的示例性系统和方法,其包括:等离子体源(100); 微流体通道(250); 布置在微通道内的介质; 微通道内的衬底; 以及用于激活低电压等离子体放电以在所述衬底的表面上形成材料产品的装置。 公开的特征和规格可以被不同地控制,适应或以其他方式任意地修改以改善材料沉积特性。 本发明的示例性实施例代表性地提供原位等离子体辅助材料沉积,并且可以容易地与现有的微尺度技术集成,以改进器件封装外形尺寸,重量和其他制造和/或器件性能度量。