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1. 发明授权

US07098456B1 Method and apparatus for accurate e-beam metrology 有权
标题翻译：用于精确电子束计量的方法和装置
公开(公告)号：US07098456B1
公开(公告)日：2006-08-29
申请号：US10918088
申请日：2004-08-13
申请人： Gian Francesco Lorusso , Paola De Cecco , Luca Grella , David L. Adler , David Goodstein , Chris Bevis
发明人： Gian Francesco Lorusso , Paola De Cecco , Luca Grella , David L. Adler , David Goodstein , Chris Bevis
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： G01N23/2251 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01J2237/2826
摘要： One embodiment disclosed relates to a method for accurate electron beam metrology. A substrate with a target feature is loaded into a scanning electron microscope. An electron beam is scanned over the target feature, and scattered electrons are detected therefrom. A characteristic of the target feature is measured by finding optimal values for parameters of a mathematical model which accounts for substrate charging effects. Principal component analysis may be used to advantageously result in reduced requirements for processing time and/or computational speed.
摘要翻译：所公开的一个实施例涉及一种精确电子束计量的方法。将具有目标特征的基板装载到扫描电子显微镜中。在目标特征上扫描电子束，并从中检测散射的电子。通过找到考虑到基板充电效应的数学模型的参数的最佳值来测量目标特征的特征。主成分分析可用于有利地减少对处理时间和/或计算速度的要求。

2. 发明授权

US07009177B1 Apparatus and method for tilted particle-beam illumination 有权
标题翻译：倾斜粒子束照明的装置和方法
公开(公告)号：US07009177B1
公开(公告)日：2006-03-07
申请号：US11040281
申请日：2005-01-20
申请人： Marian Mankos , Luca Grella , David L. Adler
发明人： Marian Mankos , Luca Grella , David L. Adler
IPC分类号： H01J37/26
CPC分类号： H01J37/1478 , H01J37/29 , H01J2237/2538
摘要： One embodiment disclosed relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a beam separator interconnecting those subsystems. Advantageously, the illumination subsystem includes a tilt deflector configured to controllably tilt the incident beam. The tilt of the incident beam caused by the tilt deflector is magnified prior to the incident beam impinging onto the substrate. This technique allows for achieving large beam tilts at the substrate without lens aberrations caused by introducing tilt at the objective lens and without complications due to using a tiltable stage. Other embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及一种使用带电粒子检查基板的装置。该装置包括照明子系统，客观子系统，投影子系统和互连这些子系统的分束分离器。有利地，照明子系统包括被配置为可控地倾斜入射光束的倾斜偏转器。在入射光束撞击到基板上之前，由倾斜偏转器引起的入射光束的倾斜被放大。该技术允许在基板处实现大的光束倾斜，而不会由于在物镜处引入倾斜而导致的透镜像差，并且由于使用可倾斜的台而不会产生并发症。还公开了其他实施例。

3. 发明授权

US07361941B1 Calibration standards and methods 有权
标题翻译：校准标准和方法
公开(公告)号：US07361941B1
公开(公告)日：2008-04-22
申请号：US11022481
申请日：2004-12-21
申请人： Gian F. Lorusso , Christopher F. Bevis , Luca Grella , David L. Adler , Ian Smith
发明人： Gian F. Lorusso , Christopher F. Bevis , Luca Grella , David L. Adler , Ian Smith
IPC分类号： H01J33/00 , G01J1/10
CPC分类号： G03F7/70625 , G01B11/24 , G01B15/00 , G01B21/042 , G03F7/70516 , H01J37/222 , H01J37/263 , H01J37/3045 , H01J2237/223 , H01J2237/226 , H01J2237/24578 , H01J2237/2826
摘要： Parameters of a metrology tool may be determined by measuring a dimension of a feature on a calibration standard with the tool and using the measured dimension and a known traceable value of the dimension to determine a value for the parameter. If the dimension of the feature on the standard has a known traceable value, different standards may be used to calibrate different tools.
摘要翻译：可以通过使用工具测量校准标准上的特征的尺寸并使用测量的尺寸和尺寸的已知可追踪值来确定参数的值来确定计量工具的参数。如果标准中的特征尺寸具有已知的可追溯值，则可能会使用不同的标准来校准不同的工具。

4. 发明授权

US06979824B1 Filtered e-beam inspection and review 有权
标题翻译：过滤电子束检查和审查
公开(公告)号：US06979824B1
公开(公告)日：2005-12-27
申请号：US10886519
申请日：2004-07-07
申请人： David L. Adler , Luca Grella
发明人： David L. Adler , Luca Grella
IPC分类号： G01Q30/02 , G01Q30/04 , H01J37/14 , H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24485 , H01J2237/24592 , H01J2237/281 , H01J2237/2815
摘要： The disclosure relates to filtered e-beam inspection and review. One embodiment pertains to the filtered inspection or review of a specimen with a high aspect ratio feature. Advantageously, the energy and/or angular filtering improves the information retrievable relating to the high aspect ratio feature on the specimen. Another embodiment pertains to a method for energy-filtered electron beam inspection where a band-pass energy filtered image data is generated by determining the difference between a first high-pass energy-filtered image data set and a second high-pass energy-filtered image data set.
摘要翻译：本公开涉及过滤的电子束检查和审查。一个实施例涉及具有高纵横比特征的样本的过滤检查或检查。有利地，能量和/或角度滤波改善了与样本上的高纵横比特征有关的信息。另一个实施例涉及一种用于能量过滤的电子束检查的方法，其中通过确定第一高通能量滤波图像数据集和第二高通能量滤波图像之间的差异来生成带通能量滤波图像数据数据集。

5. 发明授权

US06797955B1 Filtered e-beam inspection and review 有权
标题翻译：过滤电子束检查和审查
公开(公告)号：US06797955B1
公开(公告)日：2004-09-28
申请号：US10607224
申请日：2003-06-26
申请人： David L. Adler , Luca Grella , Gabor D. Toth
发明人： David L. Adler , Luca Grella , Gabor D. Toth
IPC分类号： H01J37147
CPC分类号： H01J37/28 , H01J2237/281 , H01J2237/2815
摘要： The disclosure relates to filtered e-beam inspection and review. One embodiment pertains to the filtered inspection or review of a specimen with a high aspect ratio feature. Advantageously, the energy and/or angular filtering improves the information retrievable relating to the high aspect ratio feature on the specimen. Another embodiment pertains to a method for energy-filtered electron beam inspection where a band-pass energy filtered image data is generated by determining the difference between a first high-pass energy-filtered image data set and a second high-pass energy-filtered image data set.
摘要翻译：本公开涉及过滤的电子束检查和审查。一个实施例涉及具有高纵横比特征的样本的过滤检查或检查。有利地，能量和/或角度滤波改善了与样本上的高纵横比特征有关的信息。另一个实施例涉及一种用于能量过滤的电子束检查的方法，其中通过确定第一高通能量滤波图像数据集和第二高通能量滤波图像之间的差异来生成带通能量滤波图像数据数据集。

6. 发明授权

US07019292B1 E-beam detection of defective contacts/vias with flooding and energy filter 有权
标题翻译：通过淹没和能量过滤器对缺陷接触/过孔进行电子束检测
公开(公告)号：US07019292B1
公开(公告)日：2006-03-28
申请号：US10869588
申请日：2004-06-15
申请人： Frank Y. H. Fan , David L. Adler , Kirk J. Bertsche , Luca Grella
发明人： Frank Y. H. Fan , David L. Adler , Kirk J. Bertsche , Luca Grella
IPC分类号： H01J37/256
CPC分类号： H01J37/05 , H01J37/28 , H01J2237/057 , H01J2237/281 , H01J2237/2817 , H01L22/14
摘要： One embodiment disclosed relates to a method for robustly detecting a defective high aspect ratio (HAR) feature. A surface area of a semiconductor specimen with HAR features thereon is charged up, and a primary beam is impinged onto the surface area. Scattered electrons that are generated due to the impingement of the primary beam are extracted from the surface area. An energy filter is applied to remove the scattered electrons with lower energies, and the filtered electrons are detected. Image data is generated from the detected electrons, and an intensity threshold is applied to the image data.
摘要翻译：公开的一个实施例涉及用于鲁棒地检测有缺陷的高纵横比（HAR）特征的方法。其上具有HAR特征的半导体样品的表面积被充电，并且主光束撞击到表面区域。从表面区域提取由于主光束的撞击而产生的分散电子。应用能量滤波器去除具有较低能量的散射电子，并且检测滤波电子。从检测到的电子生成图像数据，并且将强度阈值应用于图像数据。

7. 发明申请

US20200090826A1 X-RAY PHOTOEMISSION APPARATUS FOR INSPECTION OF INTEGRATED DEVICES 审中-公开
公开(公告)号：US20200090826A1
公开(公告)日：2020-03-19
申请号：US16690103
申请日：2019-11-20
申请人： David L. Adler
发明人： David L. Adler
IPC分类号： G21K1/00 , G01N23/04 , H01L23/498 , H01L27/02 , H01J1/78
摘要： An apparatus is disclosed for the examination and inspection of integrated devices such as integrated circuits. X-rays are transmitted through the integrated device, and are incident on a photoemissive structure that absorbs x-rays and emits electrons. The electrons emitted by the photoemissive structure are shaped by an electron optical system to form a magnified image of the emitted electrons on a detector. This magnified image is then recorded and processed. For some embodiments of the invention, the photoemissive structure is deposited directly onto the integrated device. In some embodiments, the incidence angle of the x-rays is varied to allow internal three-dimensional structures of the integrated device to be determined. In some embodiments, the recorded image is compared with a reference data to enable inspection for manufacturing quality control.

8. 发明授权

US06897444B1 Multi-pixel electron emission die-to-die inspection 有权
标题翻译：多像素电子发射模 - 模检查
公开(公告)号：US06897444B1
公开(公告)日：2005-05-24
申请号：US10702271
申请日：2003-11-06
申请人： David L. Adler
发明人： David L. Adler
IPC分类号： G01N23/225 , G01Q30/02 , G01Q30/04 , H01J37/26 , H01J37/29 , H01J37/153
CPC分类号： H01J37/26 , G01N23/225 , H01J37/29 , H01J2237/24592 , H01J2237/2538 , H01J2237/2817
摘要： One embodiment disclosed is a method of detecting defects in objects. A selected surface area of an object is inspected with a multi-pixel electron microscope, and first set of data is generated having signal values representing image content of each pixel thereof. Further selected surface area of the object is inspected with said multi-pixel electron microscope, and second set of data is generated having signal values representing image content of each pixel thereof. Corresponding portions of first and second sets of data are stored in memory. Misalignment between stored portions of the first and second sets of data is detected with resolution of a fraction of a pixel, and the stored portions of first and second sets of data are aligned using subpixel interpolation to correct the detected misalignment therebetween. Finally, corresponding subportions of the aligned portions of first and second sets of data are compared to detect differences therebetween.
摘要翻译：公开的一个实施例是检测物体中的缺陷的方法。用多像素电子显微镜检查物体的选择的表面积，并且生成具有表示其每个像素的图像内容的信号值的第一组数据。用所述多像素电子显微镜检查物体的另外选择的表面积，并且生成具有表示其每个像素的图像内容的信号值的第二组数据。第一和第二组数据的相应部分被存储在存储器中。以分辨率为单位的像素的分辨率来检测第一和第二组数据的存储部分之间的对准，并且使用子像素插值来对齐第一组数据和第二组数据的存储部分，以校正其间检测到的不对准。最后，比较第一和第二组数据的对准部分的相应子部分，以检测它们之间的差异。

9. 发明授权

US06570154B1 Scanning electron beam microscope 有权
标题翻译：扫描电子束显微镜
公开(公告)号：US06570154B1
公开(公告)日：2003-05-27
申请号：US09786137
申请日：2001-06-11
申请人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
发明人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
IPC分类号： H01J37244
CPC分类号： H01J37/28
摘要： A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM (200) has a source unit (202 through 220) for directing an electron beam (203) substantially towards a portion of the specimen (222), a detector (224) for detecting particles (205) that are emitted from the specimen (222), and an image generator (234 through 242) for generating the image of the specimen (222) from the emitted particles (205). The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions (252) to generate a first image during a first image phase (302, 402). The specimen is then scanned under a second set conditions (254) during a setup phase (304, 404). The second set of conditions is selected to control charge on the specimen. The specimen is then scanned under the first set of conditions (252) to generate a second image during a second image phase (306, 406). The features of the second image are controlled by the first and second sets of conditions.
摘要翻译：公开了一种用扫描电子显微镜（SEM）产生样本图像的方法和装置。扫描电子显微镜（200）具有源单元（202至220），用于基本上朝向样本（222）的一部分引导电子束（203）;检测器（224），用于检测从样本发射的颗粒（205）（222），以及用于从所发射的颗粒（205）产生样本（222）的图像的图像发生器（234至242）。图像特征由生成图像的条件控制。在第一组条件（252）下扫描样本，以在第一图像相位期间产生第一图像（302,402）。然后在设置阶段（304,404）期间，在第二设定条件（254）下扫描样本。选择第二组条件来控制样品上的电荷。然后在第一组条件（252）下扫描样本，以在第二图像相位期间产生第二图像（306,406）。第二图像的特征由第一和第二组条件控制。

10. 发明授权

US6066849A Scanning electron beam microscope 有权
标题翻译：扫描电子束显微镜
公开(公告)号：US6066849A
公开(公告)日：2000-05-23
申请号：US149767
申请日：1998-09-08
申请人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
发明人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
IPC分类号： H01L21/66 , H01J37/20 , H01J37/22 , H01J37/248 , H01J37/28 , H01J37/244
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2817
摘要： A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM has a source unit for directing an electron beam substantially towards a portion of the specimen, a detector for detecting particles that are emitted from the specimen, and an image generator for generating the image of the specimen from the emitted particles. The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions to generate a first image during a first image phase. The specimen is then scanned under a second set of conditions during a setup phase. The second set of conditions are selected to control charge on the specimen. The specimen is then scanned under the first set of conditions to generate a second image during a second image phase. The features of the second image are controlled by the first and second sets of conditions.
摘要翻译：公开了一种用扫描电子显微镜（SEM）产生样本图像的方法和装置。 SEM具有用于将电子束基本上朝向样本的一部分引导的源单元，用于检测从样本发射的颗粒的检测器，以及用于从所发射的颗粒产生样本的图像的图像发生器。图像特征由生成图像的条件控制。在第一组条件下扫描样本以在第一图像阶段期间产生第一图像。然后在设置阶段，在第二组条件下扫描样品。选择第二组条件来控制样品上的电荷。然后在第一组条件下扫描样品，以在第二图像阶段期间产生第二图像。第二图像的特征由第一和第二组条件控制。

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