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    • 1. 发明授权
    • Vapor deposition of parylene-F using 1,4-bis (trifluoromethyl) benzene
    • 使用1,4-双(三氟甲基)苯气相沉积聚对二甲苯
    • US5268202A
    • 1993-12-07
    • US960089
    • 1992-10-09
    • Lu YouGuang-Rong YangToh-Ming LuJames A. MooreJohn F. P. McDonald
    • Lu YouGuang-Rong YangToh-Ming LuJames A. MooreJohn F. P. McDonald
    • B05D7/24C23C16/448C23C16/00
    • B05D1/60C23C16/4488
    • A PA-F polymer film is formed using a mixture of 1,4-bis (trifluoromethyl) benzene (TFB) and a halogen initiator. This mixture is provided to a low pressure reactor containing a metal catalyst. The reactor is operated at a sufficient temperature to form a reactive monomer by a chemical reaction at the surface of the catalyst. The reactive monomer is condensed on the surface of a substrate cooled to a temperature sufficiently low to induce polymerization of the reactive monomer to form a PA-F polymer film. In general, the proportion of halogen initiator is about 0.25 to 50% by volume relative to the total volume of the TFB/halogen initiator mixture. The reactor is operated at a temperature of about 200.degree. to 700.degree. C. and a pressure of less than about one torr. In addition, the surface of the substrate is maintained at a temperature of about -30.degree. C. to room temperature. In the preferred approach, the halogen initiator is dibromotetrafluoro-p-xylene (DBX) and the proportion of DBX is about 1 to 5%.
    • 使用1,4-双(三氟甲基)苯(TFB)和卤素引发剂的混合物形成PA-F聚合物膜。 将该混合物提供至含有金属催化剂的低压反应器。 反应器在足够的温度下操作以通过催化剂表面的化学反应形成反应性单体。 反应性单体在冷却到足够低的温度的基材的表面上冷凝以引发反应性单体的聚合以形成PA-F聚合物膜。 通常,相对于TFB /卤素引发剂混合物的总体积,卤素引发剂的比例为约0.25至50体积%。 反应器在约200℃至700℃的温度和小于约一乇的压力下操作。 此外,将基板的表面保持在约-30℃至室温的温度。 在优选的方法中,卤素引发剂是二溴四氟对二甲苯(DBX),DBX的比例为约1至5%。