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    • 1. 发明授权
    • Method for fabricating GaN field emitter arrays
    • 制造GaN场发射极阵列的方法
    • US06579735B1
    • 2003-06-17
    • US09998336
    • 2001-12-03
    • Linda T. RomanoDavid K. Biegelsen
    • Linda T. RomanoDavid K. Biegelsen
    • H01L2100
    • H01J1/3042H01J9/025
    • An improved nanotip structure and method for forming the nanotip structure and a display system using the improved nanotip structure is described. The described nanotip is formed from a semiconductor having a crystalline structure such as gallium nitride. The crystalline structure preferably forms dislocations oriented in the direction of the nanotips. One method of forming the nanotip structure uses the relatively slow etching rates that occur around the dislocations compared to the faster etch rates that occur in other parts of the semiconductor structure. The slower etching around dislocations enables the formation of relatively high aspect ratio nanotips in the dislocation area.
    • 描述了用于形成纳米尖端结构的改进的纳米尖端结构和方法以及使用改进的纳米尖端结构的显示系统。 所描述的纳米尖端由具有诸如氮化镓的晶体结构的半导体形成。 晶体结构优选地形成在纳米尖端方向上取向的位错。 与在半导体结构的其它部分中发生的更快的蚀刻速率相比,形成纳米尖端结构的一种方法使用在位错周围发生的相对慢的蚀刻速率。 在位错周围较慢的蚀刻使得能够在位错区域中形成相对高的纵横比的纳米尖端。
    • 2. 发明授权
    • Field emission display device
    • 场致发射显示装置
    • US06781159B2
    • 2004-08-24
    • US09998334
    • 2001-12-03
    • Linda T. RomanoDavid K. Biegelsen
    • Linda T. RomanoDavid K. Biegelsen
    • H01L3300
    • H01J1/3044H01J9/025
    • An improved nanotip structure and method for forming the nanotip structure and a display system using the improved nanotip structure is described. The described nanotip is formed from a semiconductor having a crystalline structure such as gallium nitride. The crystalline structure preferably forms dislocations oriented in the direction of the nanotips. One method of forming the nanotip structure uses the relatively slow etching rates that occur around the dislocations compared to the faster etch rates that occur in other parts of the semiconductor structure. The slower etching around dislocations enables the formation of relatively high aspect ratio nanotips in the dislocation area.
    • 描述了用于形成纳米尖端结构的改进的纳米尖端结构和方法以及使用改进的纳米尖端结构的显示系统。 所描述的纳米尖端由具有诸如氮化镓的晶体结构的半导体形成。 晶体结构优选地形成在纳米尖端方向上取向的位错。 与在半导体结构的其它部分中发生的更快的蚀刻速率相比,形成纳米尖端结构的一种方法使用在位错周围发生的相对慢的蚀刻速率。 在位错周围较慢的蚀刻使得能够在位错区域中形成相对高的纵横比的纳米尖端。
    • 3. 发明授权
    • Imaging system for patterning of an image definition material by electro-wetting and methods therefor
    • 通过电润湿对图像定义材料进行图案化的成像系统及其方法
    • US09529307B2
    • 2016-12-27
    • US13548155
    • 2012-07-12
    • Janos VeresDavid K. Biegelsen
    • Janos VeresDavid K. Biegelsen
    • G03G15/10G03G15/22G03G13/28
    • G03G15/10G03G13/28G03G15/226
    • A system comprises an electro-wetting subsystem, a transfer subsystem, an imaging member, and an inking subsystem. The electro-wetting subsystem comprises a photo-responsive photoreceptor, a charging mechanism, an image definition material reservoir, a charge erase mechanism, and an exposure subsystem, such as a light source and rotating polygon forming a raster output scanner (ROS) disposed for exposure of the photoreceptor through the image definition material reservoir. The imaging member comprises a reimageable surface having certain properties, such as having a low surface energy to promote ink release onto a substrate. In operation, the photoreceptor is charged areawise. An exposure pattern is formed by the exposure subsystem on the surface of the charged photoreceptor, which is developed with image definition material. The image definition material pattern is transferred to the reimageable surface. The pattern is developed with ink. The inked image may be transferred to a substrate.
    • 系统包括电润湿子系统,传输子系统,成像构件和着墨子系统。 电润湿子系统包括光响应感光体,充电机构,图像定义材料储存器,电荷擦除机构和曝光子系统,例如形成光栅输出扫描器(ROS)的光源和旋转多边形,其设置用于 通过图像定义材料储存器曝光感光体。 成像构件包括具有某些特性的可再成像表面,例如具有低表面能以促进油墨释放到基底上。 在操作中,感光体面积充电。 通过曝光子系统在带图像定义材料显影的带电感光体的表面上形成曝光图案。 图像定义材料图案被转移到可再成像的表面。 该图案是用墨水开发的。 着墨的图像可以被转印到基底上。
    • 5. 发明申请
    • Electrophotographic Patterning of an Image Definition Material
    • 图像定义材料的电子照相图案
    • US20140016112A1
    • 2014-01-16
    • US13548134
    • 2012-07-12
    • Janos VeresDavid K. BiegelsenChu-Heng Liu
    • Janos VeresDavid K. BiegelsenChu-Heng Liu
    • G03B27/32
    • G03G17/02B41C1/1058B41M1/06B41N3/08
    • A method is disclosed in the context of a system comprises an electrophotographic subsystem, a transfer subsystem, an imaging member, and an inking subsystem. The electrophotographic subsystem comprises a photoreceptor, a charging subsystem, an exposure subsystem, and a development subsystem. In operation, the photoreceptor is charged areawise. An exposure pattern is formed by the exposure subsystem on the surface of the charged photoreceptor to thereby write a latent charge image onto the photoreceptor surface. The image is developed with an image defining material, such as a dampening fluid. The image defining material forms a negative pattern of the image to be printed. This negative image is then transferred to the reimageable surface. The negative image is then developed with ink. The inked image may be transferred to a substrate.
    • 在包括电子照相子系统,传输子系统,成像构件和着墨子系统的系统的上下文中公开了一种方法。 电子照相子系统包括感光体,充电子系统,曝光子系统和开发子系统。 在操作中,感光体面积充电。 通过曝光子系统在带电感光体的表面上形成曝光图案,从而将潜像写入感光体表面。 图像用图像限定材料(例如润版液)显影。 图像定义材料形成要打印的图像的负图案。 然后将该负图像转移到可再成像的表面。 然后用墨水显影负像。 着墨的图像可以被转印到基底上。
    • 6. 发明申请
    • Imaging System With Electrophotographic Patterning of an Image Definition Material and Methods Therefor
    • 成像系统与电子照相图案的图像定义材料及其方法
    • US20140013978A1
    • 2014-01-16
    • US13548146
    • 2012-07-12
    • Janos VeresDavid K. BiegelsenChu-Heng Liu
    • Janos VeresDavid K. BiegelsenChu-Heng Liu
    • B41N3/00
    • G03F7/20B41F7/24G03G17/02
    • A system comprises an electrophotographic subsystem, a transfer subsystem, an imaging member, and an inking subsystem. The electrophotographic subsystem comprises a photoreceptor, a charging subsystem, an exposure subsystem, and a development subsystem. In operation, the photoreceptor is charged areawise. An exposure pattern is formed by the exposure subsystem on the surface of the charged photoreceptor to thereby write a latent charge image onto the photoreceptor surface. The image is developed with an image definition material, such as a dampening fluid. The image definition material forms a positive pattern of the image to be printed. The image pattern is then transferred to the reimageable surface. The transferred pattern is then developed by selectively applying an ink over regions of image definition material. The inked image may be transferred to a substrate.
    • 系统包括电子照相子系统,传输子系统,成像构件和着墨子系统。 电子照相子系统包括感光体,充电子系统,曝光子系统和开发子系统。 在操作中,感光体面积充电。 通过曝光子系统在带电感光体的表面上形成曝光图案,从而将潜像写入感光体表面。 图像用诸如润版液的图像定义材料显影。 图像定义材料形成要打印的图像的正图案。 然后将图像图案转移到可再成像的表面。 然后通过在图像定义材料的区域上选择性地施加墨水来显影转印图案。 着墨的图像可以被转印到基底上。
    • 8. 发明申请
    • Dampening Fluid Recovery in a Variable Data Lithography System
    • 可变数据光刻系统中的阻尼流体回收
    • US20130199387A1
    • 2013-08-08
    • US13366947
    • 2012-02-06
    • David K. Biegelsen
    • David K. Biegelsen
    • B41L23/02B41F1/18
    • B41C1/10B41F7/00B41F7/24B41F7/32B41N3/08
    • In a variable data lithography system that employs a patterned dampening fluid layer for image formation, dampening fluid may be removed prior to image transfer to a substrate. Removed dampening fluid may be recovered and recycled to reduce operating expenses and environmental waste. A replacement fluid may be applied after inking and after removal of the dampening fluid. The replacement fluid preferentially occupies the regions previously occupied by dampening fluid, and may lubricate the transfer nip. Any replacement fluid and ink not transferred to the substrate upon printing may then be cleaned from the print image carrier prior to forming a new dampening fluid layer and subsequent pattern formation.
    • 在使用用于图像形成的图案化润版液层的可变数据光刻系统中,在图像转印到基底之前可以去除阻尼流体。 可以回收和回收去除的润版液,以减少操作费用和环境浪费。 可以在着墨之后和去除润版液之后施加更换的流体。 替换流体优先占据先前被阻尼流体占据的区域,并且可以润滑转印辊隙。 然后在形成新的阻尼流体层和随后的图案形成之前,可以从印刷图像载体清洁任何在印刷时未转印到基材上的替换流体和油墨。