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    • 3. 发明申请
    • METHOD AND APPARATUS OF PROVIDING OVERLAY
    • 提供覆盖的方法和装置
    • US20110133347A1
    • 2011-06-09
    • US12631591
    • 2009-12-04
    • Guo-Tsai HuangFu-Jye LiangLi-Jui ChenChih-Ming Ke
    • Guo-Tsai HuangFu-Jye LiangLi-Jui ChenChih-Ming Ke
    • H01L23/544H01L21/64
    • G03F7/70283G03F7/70633H01L2924/0002H01L2924/00
    • Provided is an apparatus that includes an overlay mark. The overlay mark includes a first portion that includes a plurality of first features. Each of the first features have a first dimension measured in a first direction and a second dimension measured in a second direction that is approximately perpendicular to the first direction. The second dimension is greater than the first dimension. The overlay mark also includes a second portion that includes a plurality of second features. Each of the second features have a third dimension measured in the first direction and a fourth dimension measured in the second direction. The fourth dimension is less than the third dimension. At least one of the second features is partially surrounded by the plurality of first features in both the first and second directions.
    • 提供了一种包括重叠标记的装置。 覆盖标记包括包括多个第一特征的第一部分。 每个第一特征具有在第一方向上测量的第一尺寸和在大致垂直于第一方向的第二方向上测量的第二尺寸。 第二维度大于第一维度。 覆盖标记还包括包括多个第二特征的第二部分。 每个第二特征具有在第一方向上测量的第三尺寸,并且在第二方向上测量第四尺寸。 第四个维度小于第三个维度。 第二特征中的至少一个在第一和第二方向上被多个第一特征部分地包围。
    • 4. 发明申请
    • METHOD AND APPARATUS FOR MAINTAINING DEPTH OF FOCUS
    • 维持聚焦深度的方法和装置
    • US20110267593A1
    • 2011-11-03
    • US12772647
    • 2010-05-03
    • Chang-Tsun HsiehFu-Jye LiangTzung-Chi FuLi-Jui ChenChih-Ming Ke
    • Chang-Tsun HsiehFu-Jye LiangTzung-Chi FuLi-Jui ChenChih-Ming Ke
    • G03B27/53G01J3/28
    • G03F7/70616G02B7/28G03F7/70575G03F7/70641G03F9/70G03F9/7026
    • A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.
    • 一种方法包括将辐射束沿着光轴引向工件支撑件,在第一时间测量光束的光谱以获得第一分布,在第二时间测量光束的光谱以获得第二分布,确定 两个轮廓之间的光谱差异,并且基于该差异来调整沿着光轴的工件支撑件的位置。 不同的方面涉及一种具有工件支撑件的装置,将导光束沿着光轴朝向工件支撑件的光束引导结构,光谱测量结构,其在第一次和第二次测量光束的光谱以获得相应的第一和第二 轮廓,确定两个轮廓之间的差异的处理结构,以及基于该差异来调整沿着光轴的工件支撑件的位置的支撑调整结构。
    • 5. 发明授权
    • Hood for immersion lithography
    • 用于浸没光刻的罩
    • US07675604B2
    • 2010-03-09
    • US11427434
    • 2006-06-29
    • Li-Jui ChenTzung-Chi FuChing-Yu ChangFu-Jye LiangLin-Hung ShiuChun-Kuang ChenTsai-Sheng Gau
    • Li-Jui ChenTzung-Chi FuChing-Yu ChangFu-Jye LiangLin-Hung ShiuChun-Kuang ChenTsai-Sheng Gau
    • G03B27/52G03B27/42
    • G03F7/70341
    • A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least two of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.
    • 光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 流体保持模块,被配置为将流体保持在所述成像透镜模块和所述基板载台上的基板之间的空间中; 以及配置在所述流体保持模块中且与所述空间相邻的加热元件。 所述加热元件包括以下至少两个:对所述流体不溶的密封剂,用于密封所述流体保持模块中的所述加热元件; 密封开口,其构造在流体保持模块的顶部和侧部之一中,用于密封流体保持模块中的加热元件; 和/或配置有加热元件的不均匀的温度补偿装置。
    • 6. 发明授权
    • Method and apparatus of providing overlay
    • 提供覆盖的方法和装置
    • US08329360B2
    • 2012-12-11
    • US12631591
    • 2009-12-04
    • Guo-Tsai HuangFu-Jye LiangLi-Jui ChenChih-Ming Ke
    • Guo-Tsai HuangFu-Jye LiangLi-Jui ChenChih-Ming Ke
    • G03F1/00H01L21/66
    • G03F7/70283G03F7/70633H01L2924/0002H01L2924/00
    • Provided is an apparatus that includes an overlay mark. The overlay mark includes a first portion that includes a plurality of first features. Each of the first features have a first dimension measured in a first direction and a second dimension measured in a second direction that is approximately perpendicular to the first direction. The second dimension is greater than the first dimension. The overlay mark also includes a second portion that includes a plurality of second features. Each of the second features have a third dimension measured in the first direction and a fourth dimension measured in the second direction. The fourth dimension is less than the third dimension. At least one of the second features is partially surrounded by the plurality of first features in both the first and second directions.
    • 提供了一种包括重叠标记的装置。 覆盖标记包括包括多个第一特征的第一部分。 每个第一特征具有在第一方向上测量的第一尺寸和在大致垂直于第一方向的第二方向上测量的第二尺寸。 第二维度大于第一维度。 覆盖标记还包括包括多个第二特征的第二部分。 每个第二特征具有在第一方向上测量的第三尺寸,并且在第二方向上测量第四尺寸。 第四个维度小于第三个维度。 第二特征中的至少一个在第一和第二方向上被多个第一特征部分地包围。