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1. 发明授权

US6031058A Addition polymers of polycycloolefins containing silyl functional groups 有权
标题翻译：含有甲硅烷基官能团的聚环烯烃的加成聚合物
公开(公告)号：US6031058A
公开(公告)日：2000-02-29
申请号：US263930
申请日：1999-03-08
申请人： Lester H. McIntosh, III , Brian L. Goodall , Robert A. Shick , Saikumar Jayaraman
发明人： Lester H. McIntosh, III , Brian L. Goodall , Robert A. Shick , Saikumar Jayaraman
IPC分类号： C08F4/605 , C08F4/606 , C08F32/08 , C08F4/80
CPC分类号： C08F32/08
摘要： Silyl substituted polymers of polycycloolefins are provided as well as catalyst systems for their preparation. The polymers of the invention include polycyclic repeat units that contain pendant silyl functional groups represented by the following formulae: ##STR1## wherein A is a divalent radical selected from the following structures: ##STR2## R.sup.9 independently represents hydrogen, methyl, or ethyl; R.sup.10, R.sup.11, and R.sup.12 independently represent halogen, linear or branched (C.sub.1 to C.sub.20) alkyl, linear or branched (C.sub.1 to C.sub.20) alkoxy, linear or branched (C.sub.1 to C.sub.20) alkyl carbonyloxy, (C.sub.1 to C.sub.20) alkyl peroxy, and substituted or unsubstituted (C.sub.6 to C.sub.20) aryloxy; R.sup.10, R.sup.11, and R.sup.12 together with the silicon atom to which they are attached form the group: ##STR3## n is a number from 0 to 5; and n' is 0 or 1; and n" is a number from 0 to 10.
摘要翻译：提供聚环烯烃的甲硅烷基取代聚合物以及用于其制备的催化剂体系。本发明的聚合物包括含有由下式表示的侧链甲硅烷基官能团的多环重复单元：其中A是选自以下结构的二价基团：R9独立地表示氢，甲基或乙基; R10，R11和R12独立地表示直链或支链（C1至C20）烷基，直链或支链（C1至C20）烷氧基，直链或支链（C1至C20）烷基羰基氧基，（C1至C20）烷基过氧基），和取代或未取代的（C6〜C20）芳氧基; R 10，R 11和R 12与它们所连接的硅原子一起形成基团：n为0至5的数; 并且n'为0或1; n“是从0到10的数字。

2. 发明授权

US5912313A Addition polymers of polycycloolefins containing silyl functional groups 失效
公开(公告)号：US5912313A
公开(公告)日：1999-06-15
申请号：US562345
申请日：1995-11-22
申请人： Lester H. McIntosh, III , Brian L. Goodall , Robert A. Shick , Saikumar Jayaraman
发明人： Lester H. McIntosh, III , Brian L. Goodall , Robert A. Shick , Saikumar Jayaraman
IPC分类号： C08F4/605 , C08F4/606 , C08F32/08 , C08F232/08 , C08F230/08
CPC分类号： C08F32/08
摘要： Silyl substituted polymers of polycycloolefins are provided as well as catalyst systems for their preparation. The polymers of the invention include polycyclic repeat units that contain pendant silyl functional groups represented by the following formulae: ##STR1## wherein A is a divalent radical selected from the following structures: ##STR2## R.sup.9 independently represents hydrogen, methyl, or ethyl; R.sup.10, R.sup.11, and R.sup.12 independently represent halogen, linear or branched (C.sub.1 to C.sub.20) alkyl, linear or branched (C.sub.1 to C.sub.20) alkoxy, linear or branched (C.sub.1 to C.sub.20) alkyl carbonyloxy, (C.sub.1 to C.sub.20) alkyl peroxy, and substituted or unsubstituted (C.sub.6 to C.sub.20) aryloxy; R.sup.10, R.sup.11, and R.sup.12 together with the silicon atom to which they are attached form the group: ##STR3## n is a number from 0 to 5; and n' is 0 or 1; and n" is a number from 0 to 10.

3. 发明授权

US06649707B1 Blends and alloys of polycyclic polymers 失效
标题翻译：多环聚合物的共混物和合金
公开(公告)号：US06649707B1
公开(公告)日：2003-11-18
申请号：US09679001
申请日：2000-10-04
申请人： Larry F. Rhodes , Brian L. Goodall , Rolf Mülhaupt , Robert A. Shick , George M. Benedikt , Sai Kumar Jayaraman , Lynn M. Soby , Lester H. McIntosh, III
发明人： Larry F. Rhodes , Brian L. Goodall , Rolf Mülhaupt , Robert A. Shick , George M. Benedikt , Sai Kumar Jayaraman , Lynn M. Soby , Lester H. McIntosh, III
IPC分类号： C08G7704
CPC分类号： C08G77/442 , C08F232/08 , C08F277/00 , C08L53/025 , C08L2666/04
摘要： Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.
摘要翻译：衍生自降冰片烯型单体的多环加成聚合物与各种其它聚合物混合以产生新的共混物，合金和嵌段共聚物的族。

4. 发明授权

US06294616B1 Blends and alloys of polycyclic polymers 失效
标题翻译：多环聚合物的共混物和合金
公开(公告)号：US06294616B1
公开(公告)日：2001-09-25
申请号：US08450648
申请日：1995-05-25
申请人： Larry F. Rhodes , Brian L. Goodall , Rolf Mülhaupt , Robert A. Shick , George M. Benedikt , Sai Kumar Jayaraman , Lynn M. Soby , Lester H. McIntosh, III
发明人： Larry F. Rhodes , Brian L. Goodall , Rolf Mülhaupt , Robert A. Shick , George M. Benedikt , Sai Kumar Jayaraman , Lynn M. Soby , Lester H. McIntosh, III
IPC分类号： C08F1014
CPC分类号： C08G77/442 , C08F232/08 , C08F277/00 , C08L53/025 , C08L2666/04
摘要： Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.
摘要翻译：衍生自降冰片烯型单体的多环加成聚合物与各种其它聚合物混合以产生新的共混物，合金和嵌段共聚物的族。

5. 发明授权

US06232417B1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups 失效
标题翻译：包含具有酸不稳定侧基的多环聚合物的光致抗蚀剂组合物
公开(公告)号：US06232417B1
公开(公告)日：2001-05-15
申请号：US08928573
申请日：1997-09-12
申请人： Larry F Rhodes , Andrew Bell , Saikumar Jayaraman , John-Henry Lipian , Brian L. Goodall , Robert A. Shick
发明人： Larry F Rhodes , Andrew Bell , Saikumar Jayaraman , John-Henry Lipian , Brian L. Goodall , Robert A. Shick
IPC分类号： C08F480
CPC分类号： G03F7/0045 , C08G61/08 , G03F7/038 , G03F7/039 , Y10S430/109 , Y10S430/111 , Y10S430/115
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source. The polymer repeating units are polymerized from polycyclic monomers in the presence of single or multicomponent catalyst systems containing a Group VIII metal
摘要翻译：本发明涉及包含光酸引发剂和包含含有酸不稳定基团的重复单元的多环聚合物的辐射敏感性光致抗蚀剂组合物。在暴露于成像辐射源时，光酸引发剂产生酸，该酸切割引起聚合物极性变化的侧链酸不稳定基团。聚合物在暴露于成像源的区域中变得可溶于碱性水溶液。聚合物重复单元在含有VIII族金属的单组分或多组分催化剂体系存在下由多环单体聚合

6. 发明授权

US06790579B1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups 有权
公开(公告)号：US06790579B1
公开(公告)日：2004-09-14
申请号：US09630894
申请日：2000-08-02
申请人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes
发明人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes
IPC分类号： G03F7039
CPC分类号： C08G61/08 , G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/106
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.

7. 发明授权

US06723486B2 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups 有权
标题翻译：包含具有酸不稳定侧基的多环聚合物的光致抗蚀剂组合物
公开(公告)号：US06723486B2
公开(公告)日：2004-04-20
申请号：US09850915
申请日：2001-05-08
申请人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes , Robert David Allen , Richard Anthony DiPietro , Thomas Wallow
发明人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes , Robert David Allen , Richard Anthony DiPietro , Thomas Wallow
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , C08G61/08 , G03F7/038 , G03F7/039 , Y10S430/109 , Y10S430/111 , Y10S430/115
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
摘要翻译：本发明涉及包含光酸引发剂和包含含有酸不稳定基团的重复单元的多环聚合物的辐射敏感性光致抗蚀剂组合物。在暴露于成像辐射源时，光酸引发剂产生酸，该酸切割引起聚合物极性变化的侧链酸不稳定基团。聚合物在暴露于成像源的区域中变得可溶于碱性水溶液。

8. 发明授权

US6136499A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups 失效
公开(公告)号：US6136499A
公开(公告)日：2000-10-24
申请号：US812418
申请日：1997-03-06
申请人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes
发明人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes
IPC分类号： H01L21/027 , C08F4/80 , C08F32/00 , C08F32/08 , C08G61/08 , C08L45/00 , C08L65/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03C1/73
CPC分类号： C08G61/08 , G03F7/0045 , G03F7/039 , G03F7/038 , Y10S430/106
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.

9. 发明授权

US6121340A Photodefinable dielectric compositions comprising polycyclic polymers 失效
标题翻译：包含多环聚合物的光可定义电介质组合物
公开(公告)号：US6121340A
公开(公告)日：2000-09-19
申请号：US964080
申请日：1997-11-04
申请人： Robert A. Shick , Saikumar Jayaraman , Edmund Elce , Brian L. Goodall
发明人： Robert A. Shick , Saikumar Jayaraman , Edmund Elce , Brian L. Goodall
IPC分类号： C08F2/50 , C08G61/08 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , G03C1/73
CPC分类号： G03F7/0388 , C08G61/08 , G03F7/039 , G03F7/0758 , G03F7/0045
摘要： The present invention relates to a photodefinable dielectric composition comprising a photoinitiator and a polycyclic addition polymer comprising polycyclic repeating units that contain pendant silyl functionalities containing hydrolyzable substituents. Upon exposure to a radiation source the photoinitiator catalyzes the hydrolysis of the hydrolyzable groups to effect the cure of the polymer and adhesion of the polymer to desired substrates.
摘要翻译：本发明涉及包含光引发剂和包含多环重复单元的多环加成聚合物的光可定义电介质组合物，所述多环重复单元含有含有可水解取代基的侧链甲硅烷基官能团。在暴露于辐射源时，光引发剂催化可水解基团的水解以实现聚合物的固化和聚合物粘合到所需的基材上。

10. 发明授权

US5571881A Addition polymers derived from norbornene-functional monomers and process therefor 失效
公开(公告)号：US5571881A
公开(公告)日：1996-11-05
申请号：US476810
申请日：1995-06-07
申请人： Brian L. Goodall , George M. Benedikt , Lester H. McIntosh, III , Dennis A. Barnes , Larry F. Rhodes
发明人： Brian L. Goodall , George M. Benedikt , Lester H. McIntosh, III , Dennis A. Barnes , Larry F. Rhodes
IPC分类号： C08F4/70 , C08F4/30 , C08F4/42 , C08F4/80 , C08F32/00 , C08F32/08 , C08F36/04 , C08F36/20 , C08F210/14 , C08F232/08 , C08F236/20 , C08F4/76 , C08F4/78
CPC分类号： C08F232/08 , C08F32/08
摘要： Addition polymers derived from norbornene-functional monomers are terminated with an olefinic moiety derived from a chain transfer agent selected from a compound having a terminal olefinic double bond between adjacent carbon atoms, excluding styrenes, vinyl ethers, and conjugated dienes and at least one of said carbon atoms has two hydrogen atoms attached thereto. The addition polymers of this invention are prepared from a single or multicomponent catalyst system including a Group VIII metal ion source. The catalyst systems are unique in that they catalyze the insertion of the chain transfer agent exclusively at a terminal end of the polymer chain.

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