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    • 8. 发明申请
    • TRENCH JUNCTION BARRIER CONTROLLED SCHOTTKY
    • TRENCH JUNCTION BARRIER控制的肖特
    • WO2008039548A2
    • 2008-04-03
    • PCT/US2007/021107
    • 2007-09-30
    • ALPHA & OMEGA SEMICONDUCTOR, LTD.LUI, Sik, K.
    • LUI, Sik, K.BHALLA, Anup
    • H01L29/739H01L31/00
    • H01L29/66727H01L29/0623H01L29/1095H01L29/407H01L29/66143H01L29/66734H01L29/7811H01L29/782H01L29/8725
    • A Schottky diode includes at least a trenched opened in a semiconductor substrate doped with a dopant of a first conductivity type wherein the trench is filled with a Schottky junction barrier metal. The Schottky diode further includes one or more dopant region of a second conductivity type surrounding sidewalk of the trench distributed along the depth of the trench for shielding a reverse leakage current through the sidewalk of the trench. The Schottky diode further includes a bottom-doped region of the second conductivity type surrounding a bottom surface of the trench and a top-doped region of the second conductivity type surrounding a top portion of the sidewalk of the trench. In a preferred embodiment, the first conductivity type k a N-type conductivity type and the middle-depth dopant region comprising a P-dopant region.
    • 肖特基二极管包括在掺杂有第一导电类型的掺杂剂的半导体衬底中开放的至少沟槽,其中沟槽填充有肖特基结阻挡金属。 所述肖特基二极管进一步包括沿沟槽深度分布的围绕沟槽的第二导电类型的一个或多个掺杂区域,用于屏蔽通过沟槽的人行道的反向泄漏电流。 肖特基二极管还包括围绕沟槽的底表面的第二导电类型的底部掺杂区域和围绕沟槽的人行道顶部的第二导电类型的顶部掺杂区域。 在优选实施例中,第一导电类型k是N型导电类型,以及包含P掺杂区域的中间深度掺杂剂区域。