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1. 发明申请

WO2003056066A2 APPARATUS FOR THE GENERATION AND SUPPLY OF FLUORINE GAS 审中-公开
标题翻译：用于生产和供应氟气的装置
公开(公告)号：WO2003056066A2
公开(公告)日：2003-07-10
申请号：PCT/EP2002/014909
申请日：2002-12-20
申请人： L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , COLIN, Kennedy , KIMURA, Takato , INO, Minoru , SONOBE, Jun
发明人： COLIN, Kennedy , KIMURA, Takato , INO, Minoru , SONOBE, Jun
IPC分类号： C25B
CPC分类号： C25B15/00 , C23C16/4405 , C25B1/245
摘要： To provide an apparatus for fluorine gas generation and supply that is disposed in the gas supply system of a semiconductor processing system and that in the event of abnormalities in the apparatus enables back up by a safe and inexpensive structure. An apparatus 30 for the generation and supply of gas is disposed in the gas supply system of a semiconductor processing system. This apparatus 30 contains an electrolytic cell 34 that generates fluorine gas and a cylinder 62 that holds a substitute gas selected from the group consisting of nitrogen fluoride, sulfur fluoride, and chlorine fluoride. The electrolytic cell 34 and cylinder 62 are connected to a gas switching section 56 that selectively supplies a gas utilization section with fluorine gas from the electrolytic cell 34 or with substitute gas from the cylinder 62. A controller 40 controls the gas switching section 56 in such a manner that, upon detection of an abnormal state at the electrolytic cell 34 by an electrolytic cell detector 36, substitute gas is supplied from the cylinder 62 to the gas utilization section.
摘要翻译：为了提供一种设置在半导体处理系统的气体供给系统中的氟气生成和供给装置，并且在设备的异常情况下可以通过安全且廉价的结构进行备份。在半导体处理系统的气体供给系统中设置有用于产生和供应气体的装置30。该装置30包含产生氟气的电解槽34和保持选自氮氟化物，氟化硫和氯氟化物的替代气体的气缸62。电解槽34和气缸62连接到气体切换部分56，气体切换部分56选择性地向气体利用部分供应来自电解槽34的氟气或来自气缸62的替代气体。控制器40控制气体切换部分56 在电解槽检测器36检测到电解槽34的异常状态的情况下，从气缸62向气体利用部供给替代气体。

2. 发明申请

WO2003056066A3 APPARATUS FOR THE GENERATION AND SUPPLY OF FLUORINE GAS 审中-公开
公开(公告)号：WO2003056066A3
公开(公告)日：2003-07-10
申请号：PCT/EP2002/014909
申请日：2002-12-20
申请人： L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , COLIN, Kennedy , KIMURA, Takato , INO, Minoru , SONOBE, Jun
发明人： COLIN, Kennedy , KIMURA, Takato , INO, Minoru , SONOBE, Jun
IPC分类号： C25B15/00
摘要： To provide an apparatus for fluorine gas generation and supply that is disposed in the gas supply system of a semiconductor processing system and that in the event of abnormalities in the apparatus enables back up by a safe and inexpensive structure. An apparatus 30 for the generation and supply of gas is disposed in the gas supply system of a semiconductor processing system. This apparatus 30 contains an electrolytic cell 34 that generates fluorine gas and a cylinder 62 that holds a substitute gas selected from the group consisting of nitrogen fluoride, sulfur fluoride, and chlorine fluoride. The electrolytic cell 34 and cylinder 62 are connected to a gas switching section 56 that selectively supplies a gas utilization section with fluorine gas from the electrolytic cell 34 or with substitute gas from the cylinder 62. A controller 40 controls the gas switching section 56 in such a manner that, upon detection of an abnormal state at the electrolytic cell 34 or in the gas supply path by detectors 36, 72, substitute gas is supplied from the cylinder 62 to the gas utilization section.

3. 发明申请

WO2004007802A2 APPARATUS FOR THE GENERATION OF FLUORINE GAS 审中-公开
标题翻译：氟气产生装置
公开(公告)号：WO2004007802A2
公开(公告)日：2004-01-22
申请号：PCT/IB2003/002998
申请日：2003-06-30
申请人： L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , SONOBE, Jun , INO, Minoru , FUKUOKA, Muneuyki , KIMURA, Takako
发明人： SONOBE, Jun , INO, Minoru , FUKUOKA, Muneuyki , KIMURA, Takako
IPC分类号： C25B1/24
CPC分类号： C25B15/02 , C25B1/245
摘要： To provide an apparatus for the generation of fluorine gas that is capable of very safe and highly reliable operation even during long-term operations. An apparatus (30) for the generation of fluorine gas is provided with an electrolytic cell (32) that generates, in a first gas phase region on the anode side, product gas whose main component is fluorine gas and at the same time generates, in a second gas phase region on the cathode side, by-product gas whose main component is hydrogen gas. A first and second pressure gauges (46 and 48) are provided in order to measure the pressure in the first and second gas phase regions. A first and second conduits (52 and 72) are provided in order to withdraw the product gas and by-product gas. A first and second flow rate control valves are disposed in the first and second conduits (52 and 72). The apertures of the first and second flow rate control valves are adjusted based on the measurement results from the first and second pressure gauges (46 and 48) so as to maintain the pressures in the first and second gas phase regions at first and second set values that are substantially equal.
摘要翻译：提供即使在长期运行中也能够非常安全和高可靠运行的产生氟气的装置。用于产生氟气的设备（30）设置有电解池（32），其在阳极侧的第一气相区域中产生主要成分为氟气并同时产生的产物气体阴极侧的第二气相区域，主要成分为氢气的副产物气体。提供第一和第二压力计（46和48）以便测量第一和第二气相区域中的压力。提供第一和第二管道（52和72）以便抽出产物气体和副产物气体。第一和第二流量控制阀设置在第一和第二管道（52和72）中。基于来自第一和第二压力计（46和48）的测量结果来调节第一和第二流量控制阀的孔径，以将第一和第二气相区域中的压力保持在第一和第二设定值这基本相等。

4. 发明申请

WO2005031039A2 FLUORINE GAS PRODUCTION UNIT 审中-公开
标题翻译：氟气生产单位
公开(公告)号：WO2005031039A2
公开(公告)日：2005-04-07
申请号：PCT/IB2004/003030
申请日：2004-09-16
申请人： L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , INO, Minoru , NISHIKAWA, Yukinobu , HONMA, Fumihiro
发明人： INO, Minoru , NISHIKAWA, Yukinobu , HONMA, Fumihiro
IPC分类号： C25B
CPC分类号： C25B15/08 , C25B1/245
摘要： There is provided a fluorine gas production unit capable of restraining damage in an abnormal situation in minimum. A fluorine gas production unit (30) comprises an electrolytic cell (32), wherein product gas consisting of fluorine gas as a main component is generated in the first gas phase portion on the anode side thereof and by-product gas consisting of hydrogen gas as a main component is generated in the second gas phase portion on the cathode side thereof. First and second pipes (52, 72) are disposed to derive the product gas and by-product gas. In the second pipe (72), there is disposed a deriving flow rate control section (74) for controlling the deriving flow rate of the byproduct gas. A first dilution pipe (82) for introducing inert gas is disposed so that the hydrogen concentration in gas in the second gas phase portion on the cathode side gets 70 ≈10%. A second dilution pipe (83) for introducing inert gas into the second pipe (72) downstream of the deriving flow rate control section (74) is disposed so that the hydrogen concentration in gas coming out of the second pipe (72) gets less than 4%.
摘要翻译：提供了能够在异常情况下至少抑制损伤的氟气制造单元。氟气制造单元（30）包括电解池（32），其中以氟气为主要成分的产物气体在其阳极侧的第一气相部分和由氢气组成的副产物气体作为在其阴极侧的第二气相部分中产生主要成分。第一和第二管（52,72）被设置为导出产物气体和副产物气体。在第二管道（72）中设置有用于控制副产物气体的导出流量的导出流量控制部（74）。设置用于引入惰性气体的第一稀释管（82），使得阴极侧的第二气相部分中的气体中的氢浓度为70≈10％。设置用于将惰性气体引入到导出流量控制部（74）下游的第二配管（72）的第二稀释管（83），使得从第二管（72）排出的气体中的氢浓度小于 4％。

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