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    • 10. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20110024802A1
    • 2011-02-03
    • US12901929
    • 2010-10-11
    • NOBUYUKI SHIRAINobuyoshi MatsuuraYoshito Nakazawa
    • NOBUYUKI SHIRAINobuyoshi MatsuuraYoshito Nakazawa
    • H01L29/812H01L29/772
    • H01L29/7806H01L27/0629H01L29/0615H01L29/0619H01L29/0696H01L29/0847H01L29/0878H01L29/1095H01L29/20H01L29/402H01L29/407H01L29/4236H01L29/456H01L29/47H01L29/475H01L29/7802H01L29/7811H01L29/7813H01L29/782H01L29/7823H01L29/872H01L29/8725
    • To attain reduction in size of a semiconductor device having a power transistor and an SBD, a semiconductor device according to the present invention comprises a first region and a second region formed on a main surface of a semiconductor substrate; plural first conductors and plural second conductors formed in the first and second regions respectively; a first semiconductor region and a second semiconductor region formed between adjacent first conductors in the first region, the second semiconductor region lying in the first semiconductor region and having a conductivity type opposite to that of the first semiconductor region; a third semiconductor region formed between adjacent second conductors in the second region, the third semiconductor region having the same conductivity type as that of the second semiconductor region and being lower in density than the second semiconductor region; a metal formed on the semiconductor substrate in the second region, the third semiconductor region having a metal contact region for contact with the metal, the metal being electrically connected to the second semiconductor region, and a center-to-center distance between adjacent first conductors in the first region being smaller than that between adjacent second conductors in the second region.
    • 为了实现具有功率晶体管和SBD的半导体器件的尺寸的减小,根据本发明的半导体器件包括形成在半导体衬底的主表面上的第一区域和第二区域; 分别形成在第一和第二区域中的多个第一导体和多个第二导体; 形成在所述第一区域中的相邻第一导体之间的第一半导体区域和第二半导体区域,所述第二半导体区域位于所述第一半导体区域中并具有与所述第一半导体区域相反的导电类型; 形成在所述第二区域的相邻的第二导体之间的第三半导体区域,所述第三半导体区域具有与所述第二半导体区域相同的导电类型,并且密度低于所述第二半导体区域; 在所述第二区域中形成在所述半导体衬底上的金属,所述第三半导体区域具有用于与所述金属接触的金属接触区域,所述金属电连接到所述第二半导体区域,以及相邻的第一导体之间的中心到中心距离 在所述第一区域中小于所述第二区域中相邻的第二导体之间的距离。