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    • 10. 发明授权
    • Flash memory device
    • 闪存设备
    • US08030699B2
    • 2011-10-04
    • US11918967
    • 2006-04-21
    • Jong-ho Lee
    • Jong-ho Lee
    • H11L29/788
    • H01L21/28273B82Y10/00H01L27/115H01L27/11521H01L29/42332H01L29/7881
    • Disclosed herein is a flash memory device in which the distribution of threshold voltage is significantly reduced and the durability is improved even though a floating gate has a micro- or nano-size length. It comprises a tunneling insulation film formed on a semiconductor substrate; a multilayer floating gate structure comprising a first thin storage electrode, a second thick storage electrode, and a third thin storage electrode, defined in that order on the tunneling insulation film; an interelectrode insulation film and a control electrode formed in that order on the floating gate structure; and a source/drain provided in the semiconductor substrate below the opposite sidewalls of the floating gate structure. The novel flash memory device can be readily fabricated at a high yield through a process compatible with a conventional one.
    • 这里公开了一种闪存器件,其中阈值电压的分布被显着地减小,并且即使浮栅具有微尺寸或纳米尺寸长度也提高了耐久性。 它包括形成在半导体衬底上的隧道绝缘膜; 多层浮栅结构,包括在隧道绝缘膜上依次定义的第一薄存储电极,第二厚存储电极和第三薄层存储电极; 电极间绝缘膜和在浮栅结构上依次形成的控制电极; 以及在所述半导体衬底中设置在所述浮动栅极结构的相对侧壁下方的源极/漏极。 新颖的闪速存储器件可以通过与常规闪存器件兼容的工艺以高产率容易地制造。