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    • 8. 发明授权
    • Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement
    • 电感耦合等离子体喷枪采用浸入式低电感FR线圈和多脉冲磁排列
    • US08471476B2
    • 2013-06-25
    • US12901198
    • 2010-10-08
    • Peter F. KuruncziVictor M. BenvenisteOliver V. Naumovski
    • Peter F. KuruncziVictor M. BenvenisteOliver V. Naumovski
    • H05B31/26H01J37/317
    • H01J37/3211H01J37/026H01J37/3171H01J37/32688H01J2237/03
    • A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.
    • 公开了一种用于提供电感耦合的射频等离子体喷枪的装置。 在一个特定的示例性实施例中,该装置是离子注入系统中的等离子体喷枪。 等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源,用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料,并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体。 可以在等离子体室中设置出口孔,以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。 在一个实施例中,磁体设置在孔的相对侧上,并用于操纵等离子体的电子。
    • 9. 发明申请
    • INDUCTIVELY COUPLED PLASMA FLOOD GUN USING AN IMMERSED LOW INDUCTANCE FR COIL AND MULTICUSP MAGNETIC ARRANGEMENT
    • 电感耦合等离子体喷枪使用低电感FR线圈和MULTICUSP磁性布置
    • US20120085917A1
    • 2012-04-12
    • US12901198
    • 2010-10-08
    • Peter F. KuruncziVictor M. BenvenisteOliver V. Naumovski
    • Peter F. KuruncziVictor M. BenvenisteOliver V. Naumovski
    • H01J1/50H01J3/14
    • H01J37/3211H01J37/026H01J37/3171H01J37/32688H01J2237/03
    • A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.
    • 公开了一种用于提供电感耦合的射频等离子体喷枪的装置。 在一个特定的示例性实施例中,该装置是离子注入系统中的等离子体喷枪。 等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源,用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料,并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体。 可以在等离子体室中设置出口孔,以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。 在一个实施例中,磁体设置在孔的相对侧上,并用于操纵等离子体的电子。