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    • 9. 发明授权
    • Method for forming a coating film on a plate-like workpiece
    • 在板状工件上形成涂膜的方法
    • US07300889B2
    • 2007-11-27
    • US10914523
    • 2004-08-09
    • Hiroki EndoTaiichiro AokiAkihiko Nakamura
    • Hiroki EndoTaiichiro AokiAkihiko Nakamura
    • H01L
    • H01L21/02337H01L21/02282H01L21/316H01L21/76828
    • A method for forming a coating film, comprises the steps of: applying a raw material of a low dielectric constant onto a surface of a plate-like material; reducing oxygen concentration in the atmosphere surrounding the plate-like material to be less than or equal to 1% before a surface temperature of said plate-like material to be treated rises to 200° C.; thereafter heating said plate-like material to a temperature greater than or equal to 400° C.; and then maintaining the oxygen content in the atmosphere to be less than or equal to 1% until the surface temperature of said plate-like material to be treated lowers to 200° C. The raw material is an organic SOG obtained by hydrolyzing and condensing at least one alkoxysilane compound into an organic solvent under an acid catalyst.
    • 形成涂膜的方法包括以下步骤:将低介电常数的原料施加到板状材料的表面上; 在板状材料的表面温度升高到200℃之前,将板状材料周围的气氛中的氧浓度降低至1%以下。 然后将所述板状材料加热至大于或等于400℃的温度; 然后将大气中的氧含量保持在1%以下,直到所述板状材料的表面温度降低到200℃为止。原料是通过水解和缩合至少一种烷氧基硅烷得到的有机SOG 在酸催化剂下形成有机溶剂。