专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120068200A1 Liquid Crystal Display Device and Method for Manufacturing the Same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US20120068200A1
公开(公告)日：2012-03-22
申请号：US13198175
申请日：2011-08-04
申请人： Kum Mi OH , Jae Hoon Park , Han Seok Lee , Hee Sun Shin , Won Keun Park
发明人： Kum Mi OH , Jae Hoon Park , Han Seok Lee , Hee Sun Shin , Won Keun Park
IPC分类号： H01L33/08
CPC分类号： G02F1/136227 , G02F1/13338 , G02F1/136286 , G02F2001/13629 , G02F2001/136295 , G02F2201/40 , G06F3/0412 , G06F3/044
摘要： A liquid crystal display device with a built-in touch screen, which uses a common electrode as a touch-sensing electrode including an intersection of a gate line and a data line to define a pixel region, a gate metal disposed in a central portion of the pixel, an insulating layer formed on the gate metal, a first contact hole disposed through the insulating layer to expose a predetermined portion of an upper surface of the gate metal, a contact metal on the insulating layer and inside the first contact hole, the contact metal electrically connected with the gate metal, a first passivation layer on the contact metal, a second contact hole disposed through the first passivation layer to expose a predetermined portion of an upper surface of the contact metal, a common electrode on the first passivation layer and inside the second contact hole, a conductive line electrically connected with the common electrode, and a second passivation layer on the first passivation layer and the conductive line, wherein the gate metal and the common electrode are electrically connected via the contact metal.
摘要翻译：一种具有内置触摸屏的液晶显示装置，其使用公共电极作为包括栅极线和数据线的交点的触摸感应电极来限定像素区域，栅极金属设置在中心部分像素，形成在栅极金属上的绝缘层，设置在绝缘层上以暴露栅极金属的上表面的预定部分的第一接触孔，绝缘层上的接触金属和第一接触孔内部的接触金属，与栅极金属电连接的接触金属，接触金属上的第一钝化层，通过第一钝化层设置以暴露接触金属的上表面的预定部分的第二接触孔，第一钝化层上的公共电极并且在所述第二接触孔内部，与所述公共电极电连接的导电线以及所述第一钝化层上的第二钝化层和所述导体 e线，其中栅极金属和公共电极经由接触金属电连接。

2. 发明授权

US08792060B2 Liquid crystal display device and method for manufacturing the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US08792060B2
公开(公告)日：2014-07-29
申请号：US13198175
申请日：2011-08-04
申请人： Kum Mi Oh , Jae Hoon Park , Han Seok Lee , Hee Sun Shin , Won Keun Park
发明人： Kum Mi Oh , Jae Hoon Park , Han Seok Lee , Hee Sun Shin , Won Keun Park
IPC分类号： H01L33/08
CPC分类号： G02F1/136227 , G02F1/13338 , G02F1/136286 , G02F2001/13629 , G02F2001/136295 , G02F2201/40 , G06F3/0412 , G06F3/044
摘要： A liquid crystal display device with a built-in touch screen, which uses a common electrode as a touch-sensing electrode including an intersection of a gate line and a data line to define a pixel region, a bridge line disposed in a central portion of the pixel, an insulating layer formed on the bridge line, a first contact hole disposed through the insulating layer to expose a predetermined portion of an upper surface of the bridge line, a contact metal on the insulating layer and inside the first contact hole, the contact metal electrically connected with the bridge line, a first passivation layer on the contact metal, a second contact hole disposed through the first passivation layer to expose a predetermined portion of an upper surface of the contact metal, a common electrode on the first passivation layer and inside the second contact hole, a conductive line electrically connected with the common electrode, and a second passivation layer on the first passivation layer and the conductive line, wherein the bridge line and the common electrode are electrically connected via the contact metal.
摘要翻译：一种具有内置触摸屏的液晶显示装置，其使用公共电极作为包括栅极线和数据线的交点以限定像素区域的触摸感测电极，布置在中心部分中的桥接线所述像素，形成在所述桥接线上的绝缘层，设置在所述绝缘层上以暴露所述桥接线的上表面的预定部分的第一接触孔，所述绝缘层上的接触金属和所述第一接触孔内部，与桥接线电连接的接触金属，接触金属上的第一钝化层，设置成穿过第一钝化层暴露接触金属的上表面的预定部分的第二接触孔，第一钝化层上的公共电极并且在所述第二接触孔内部，与所述公共电极电连接的导线以及所述第一钝化层上的第二钝化层和所述导体其中所述桥接线和所述公共电极经由所述接触金属电连接。

3. 发明授权

US6097469A Method of processing resist onto substrate and resist processing apparatus 有权
标题翻译：将抗蚀剂加工到基材和抗蚀剂处理装置上的方法
公开(公告)号：US6097469A
公开(公告)日：2000-08-01
申请号：US277734
申请日：1999-03-29
申请人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
发明人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
IPC分类号： G03F7/30 , G03F7/16 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , G03B27/52
CPC分类号： H01L21/67173 , G03F7/16 , G03F7/26 , G03F7/7075 , G03F7/70866 , H01L21/67017 , H01L21/67178 , Y10S414/135
摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.
摘要翻译：一种在基板上形成抗蚀剂并在具有空调的处理区域和非处理区域的抗蚀剂处理系统中处理抗蚀剂的方法，该方法包括以下步骤：将基板转移到非处理区域将抗蚀剂涂覆在基材上，使涂覆的抗蚀剂曝光，显影曝光的抗蚀剂，使涂覆的抗蚀剂至少一次，在从转印步骤到显影步骤的时间段内进行热处理，至少检测一次，在从转印步骤到显影步骤的期间，处理气氛中的抗蚀剂分辨率降低的碱性成分，在导致抗蚀剂分辨率不良的处理气氛中设定碱成分浓度的阈值，以及根据检测到的碱性com的浓度控制和改变步骤中的至少一种处理气氛 ponent和阈值。

4. 发明授权

US5932380A Method of processing resist utilizing alkaline component monitoring 失效
公开(公告)号：US5932380A
公开(公告)日：1999-08-03
申请号：US823470
申请日：1997-03-24
申请人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
发明人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
IPC分类号： G03F7/30 , G03F7/16 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , G03C5/00
CPC分类号： H01L21/67173 , G03F7/16 , G03F7/26 , G03F7/7075 , G03F7/70866 , H01L21/67017 , H01L21/67178 , Y10S414/135
摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.

5. 发明申请

US20100249402A1 NOVEL BENZAMIDINE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITION FOR PREVENTING OR TREATING OSTEPOROSIS COMPRISING THE SAME 审中-公开
标题翻译：新型苯扎明衍生物，其制备方法和用于预防或治疗包含其的药物组合物的药物组合物
公开(公告)号：US20100249402A1
公开(公告)日：2010-09-30
申请号：US12670814
申请日：2008-07-28
申请人： Jei Man Ryu , Jin Soo Lee , Young Goo Jin , Jae Hoon Park , Bo Kyung Kim , Dae Yeon Won , Yun-Ha Hwang , Ki Yoon Kim , Sae Kwang Ku
发明人： Jei Man Ryu , Jin Soo Lee , Young Goo Jin , Jae Hoon Park , Bo Kyung Kim , Dae Yeon Won , Yun-Ha Hwang , Ki Yoon Kim , Sae Kwang Ku
IPC分类号： C07D417/02 , C07D413/02
CPC分类号： C07D277/22 , C07D277/28 , C07D277/40 , C07D417/06
摘要： The present invention relates to novel benzamidine derivatives, a process for the preparation thereof and a pharmaceutical composition for preventing or treating osteoporosis comprising the same. The benzamidine derivatives of the present invention effectively inhibit osteoclast differentiation at an extremely low concentration, and thus can be advantageously used for the prevention and treatment of osteoporosis.
摘要翻译：本发明涉及新的苄脒衍生物，其制备方法和用于预防或治疗包含其的骨质疏松症的药物组合物。本发明的苄脒衍生物以极低的浓度有效抑制破骨细胞分化，因此可有利地用于预防和治疗骨质疏松症。

6. 发明授权

US08039635B2 N-hydroxy-4-{5-[4-(5-isopropyl-2-methyl-1,3-thiazol-4-yl) phenoxy]pentoxy} benzamidine 2 ethansulfonic acid salt, process for the preparation thereof and pharmaceutical composition comprising the same 失效
标题翻译： N-羟基-4- {5- [4-（5-异丙基-2-甲基-1,3-噻唑-4-基）苯氧基]戊氧基}苄脒2乙磺酸盐，其制备方法和药物组合物，其包含一样
公开(公告)号：US08039635B2
公开(公告)日：2011-10-18
申请号：US12531807
申请日：2008-04-21
申请人： Jin Soo Lee , Soon Ki Cho , Seoung Kyoo Sung , Young Goo Jin , Jae Hoon Park , Bo Kyung Kim , Ja Hyun Cha , Eun Hee Cho , Jei Man Ryu
发明人： Jin Soo Lee , Soon Ki Cho , Seoung Kyoo Sung , Young Goo Jin , Jae Hoon Park , Bo Kyung Kim , Ja Hyun Cha , Eun Hee Cho , Jei Man Ryu
IPC分类号： A61K31/426 , C07D277/30
CPC分类号： C07D277/24
摘要： N-hydroxy-4-{5-[4-(5-isopropyl-2-methyl-1,3-thiazol-4-yl)phenoxy]pentoxy} benzamidine 2 ethansulfonic acid salt, a process for the preparation thereof, a pharmaceutical composition for preventing and treating osteoporosis, bone fractures or allergic inflammatory diseases, comprising the same, and an oral formulation for preventing and treating osteoporosis, bone fractures or allergic inflammatory diseases, comprising the same are described.
摘要翻译： N-羟基-4- {5- [4-（5-异丙基-2-甲基-1,3-噻唑-4-基）苯氧基]戊氧基}苄脒2乙磺酸盐，其制备方法，药物描述了用于预防和治疗骨质疏松症，骨折或过敏性炎性疾病的组合物，以及用于预防和治疗含有该组合物的骨质疏松症，骨折或过敏性炎性疾病的口服制剂。

7. 发明授权

US07943646B2 Benzamidine derivative, process for the preparation thereof and pharmaceutical composition comprising same 失效
标题翻译：苄脒衍生物，其制备方法和包含其的药物组合物
公开(公告)号：US07943646B2
公开(公告)日：2011-05-17
申请号：US12162701
申请日：2007-01-31
申请人： Jei Man Ryu , Jin Soo Lee , Young Goo Jin , Ki Young Lee , Jae Hoon Park , Yun Ha Hwang , Sae Kwang Ku
发明人： Jei Man Ryu , Jin Soo Lee , Young Goo Jin , Ki Young Lee , Jae Hoon Park , Yun Ha Hwang , Sae Kwang Ku
IPC分类号： C07D277/22 , A61K31/426 , A61K31/155 , A61P19/10
CPC分类号： C07D417/04 , C07D277/28 , C07D417/12
摘要： The present invention relates to a novel benzamidine derivative, a process for the preparation thereof, and a pharmaceutical composition comprising the same. The benzamidine derivative of the present invention effectively inhibits osteoclast differentiation at an extremely low concentration, and greatly increases the trabecular bone volume, and thus it can be advantageously used for the prevention and treatment of osteoporosis.
摘要翻译：本发明涉及一种新的苄脒衍生物，其制备方法和包含其的药物组合物。本发明的苯甲脒衍生物以极低的浓度有效抑制破骨细胞分化，大大增加小梁骨体积，因此可有利地用于预防和治疗骨质疏松症。

8. 发明申请

US20100053524A1 Display device 有权
标题翻译：显示设备
公开(公告)号：US20100053524A1
公开(公告)日：2010-03-04
申请号：US12314913
申请日：2008-12-18
申请人： Su Chang An , So Haeng Cho , Jae Hoon Park
发明人： Su Chang An , So Haeng Cho , Jae Hoon Park
IPC分类号： G02F1/1333 , G02F1/13
CPC分类号： G02F1/133504 , G02F1/133553 , G02F2001/133562
摘要： A display device includes: a back light unit for emitting a light; a lower polarization plate on the back light unit; a liquid crystal display panel on the lower polarization plate for displaying an image; an upper polarization plate on the liquid crystal display panel; an optical film bonded to the upper polarization plate; and a transparent material on the optical film for improving hardness of the optical film.
摘要翻译：显示装置包括：用于发光的背光单元; 背光单元上的下偏振板; 用于显示图像的下偏振板上的液晶显示面板; 液晶显示面板上的上偏振板; 结合到上偏振板的光学膜; 以及用于提高光学膜的硬度的光学膜上的透明材料。

9. 发明授权

US07585979B2 Process for preparing N-hydroxy-4-{5-[4-(5-isopropyl-2-methyl-1,3-thiazol-4-yl)-phenoxy]-pentoxy}-benzamidine 失效
标题翻译：制备N-羟基-4- {5- [4-（5-异丙基-2-甲基-1,3-噻唑-4-基） - 苯氧基] - 苯氧基} - 苄脒的方法
公开(公告)号：US07585979B2
公开(公告)日：2009-09-08
申请号：US11631829
申请日：2005-07-05
申请人： Jin Soo Lee , Seok Hoon Ahn , Young Goo Jin , Jae Hoon Park , Dong Hyuk Shin , Eun Hee Cho , Hwan Bong Chang , Young Ho Jung
发明人： Jin Soo Lee , Seok Hoon Ahn , Young Goo Jin , Jae Hoon Park , Dong Hyuk Shin , Eun Hee Cho , Hwan Bong Chang , Young Ho Jung
IPC分类号： C07D277/20
CPC分类号： C07D277/24
摘要： This invention relates to an improved method of preparing N-hydroxy-4-{5-[4-(5-isopropyl-2-methyl-1,3-thiazol-4-yl)phenoxy]pentoxy}benzamidine.
摘要翻译：本发明涉及一种制备N-羟基-4- {5- [4-（5-异丙基-2-甲基-1,3-噻唑-4-基）苯氧基]戊氧基}苄脒的改进方法。

10. 发明授权

US6017663A Method of processing resist utilizing alkaline component monitoring 失效
标题翻译：利用碱性成分监测处理抗蚀剂的方法
公开(公告)号：US6017663A
公开(公告)日：2000-01-25
申请号：US277735
申请日：1999-03-29
申请人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
发明人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
IPC分类号： G03F7/30 , G03F7/16 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , G03F9/00
CPC分类号： H01L21/67173 , G03F7/16 , G03F7/26 , G03F7/7075 , G03F7/70866 , H01L21/67017 , H01L21/67178 , Y10S414/135
摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.
摘要翻译：一种在基板上形成抗蚀剂并在具有空调的处理区域和非处理区域的抗蚀剂处理系统中处理抗蚀剂的方法，该方法包括以下步骤：将基板转移到非处理区域将抗蚀剂涂覆在基材上，使涂覆的抗蚀剂曝光，显影曝光的抗蚀剂，使涂覆的抗蚀剂至少一次，在从转印步骤到显影步骤的时间段内进行热处理，至少检测一次，在从转印步骤到显影步骤的期间，处理气氛中的抗蚀剂分辨率降低的碱性成分，在导致抗蚀剂分辨率不良的处理气氛中设定碱成分浓度的阈值，以及根据检测到的碱性com的浓度控制和改变步骤中的至少一种处理气氛 ponent和阈值。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式