专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090048409A1 ACRYLIC COPOLYMER 审中-公开
标题翻译：丙烯酸共聚物
公开(公告)号：US20090048409A1
公开(公告)日：2009-02-19
申请号：US11913844
申请日：2005-12-22
申请人： Kotaro Endo , Keita Ishiduka , Tomoyuki Hirano , Ichiro Taninaka , Takahiko Tsukuda
发明人： Kotaro Endo , Keita Ishiduka , Tomoyuki Hirano , Ichiro Taninaka , Takahiko Tsukuda
IPC分类号： C08F20/10 , C08F20/22
CPC分类号： G03F7/11 , C08F220/06 , C08F220/18 , G03F7/2041
摘要： It is intended to in a liquid-immersion exposure process, simultaneously prevent any degeneration, represented by bridge, etc., of resist film during the liquid-immersion exposure using water and other various liquid-immersion exposure liquids and any degeneration of liquid-immersion exposure liquids per se, and to without increasing of the number of treatment steps, realize enhancing of the post-exposure storage stability of resist film, and to enable forming of a resist pattern of high resolution through liquid-immersion exposure. Use is made of an acrylic copolymer of the general formula: wherein R is a hydrogen atom or methyl; R′ is a hydrogen atom, methyl or C1-C4 hydroxyalkyl; R1 is a C1-C15 linear, branched or cyclic alkyl with the proviso that the hydrogen atoms of the alkyl may be partially or wholly substituted with fluorine atom or atoms; R2 is an alicyclic hydrocarbon group; R3 is a linear hydrocarbon group; and each of l, m, n and o is the mol % of structural unit contained, being in the range of 2 to 60 mol %.
摘要翻译：旨在在浸液曝光工艺中，同时防止在使用水和其他各种液浸曝光液体的浸液曝光期间抗蚀剂膜的桥等引起的任何退化，以及液浸的任何退化曝光液体本身，并且在不增加处理步骤的数量的情况下，实现抗蚀剂膜的曝光后储存稳定性的提高，并且能够通过液浸曝光形成高分辨率的抗蚀剂图案。使用由以下通式的丙烯酸共聚物制备：其中R是氢原子或甲基; R'是氢原子，甲基或C 1 -C 4羟基烷基; R1是C1-C15直链，支链或环状烷基，条件是烷基的氢原子可以部分或全部被氟原子或原子取代; R2是脂环族烃基; R3是直链烃基; l，m，n和o各自为所含结构单元的摩尔％，为2〜60摩尔％。

2. 发明申请

US20090280431A1 MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME 审中-公开
标题翻译：用于保护膜形成的材料，以及使用其形成光电子图案的方法
公开(公告)号：US20090280431A1
公开(公告)日：2009-11-12
申请号：US12066127
申请日：2006-09-08
申请人： Tomoyuki Hirano , Kotaro Endo , Keita Ishiduka
发明人： Tomoyuki Hirano , Kotaro Endo , Keita Ishiduka
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/11 , G03F7/2041
摘要： To provide a material for protective film formation that can simultaneously prevent a change in quality of a resist film during liquid immersion exposure and a change in quality of a liquid for liquid immersion exposure used, and, at the same time, can form a resist pattern having a good shape without increasing the number of treatment steps. A material for protective film formation, comprising at least an alkali-soluble polymer comprising constitutional units represented by general formula (1): wherein R1 represents a hydrogen atom or a methyl group; R2 represents an alkylene chain having 1 to 5 carbon atoms; R3 represents a fluorinated alkylene chain having 1 to 10 carbon atoms in which a part or all of hydrogen atoms have been substituted by a fluorine atom; and m is a repeating unit.
摘要翻译：为了提供可以同时防止浸液曝光期间抗蚀剂膜的质量变化和用于液浸曝光的液体的质量变化的保护膜形成材料，并且同时可以形成抗蚀剂图案具有良好的形状而不增加治疗步骤的数量。一种用于保护膜形成的材料，至少包含含有由通式（1）表示的结构单元的碱溶性聚合物：其中R1表示氢原子或甲基; R2表示碳原子数为1〜5的亚烷基链; R3表示其中一部分或全部氢原子被氟原子取代的碳原子数1〜10的氟化亚烷基链; m是重复单元。

3. 发明授权

US08329838B2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions 失效
标题翻译：降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
公开(公告)号：US08329838B2
公开(公告)日：2012-12-11
申请号：US12884786
申请日：2010-09-17
申请人： Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
IPC分类号： G03F7/039 , G03F7/038 , C08F32/04
CPC分类号： G03F7/0395 , C08F232/08 , G03F7/0046 , G03F7/11 , G03F7/2041 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译：本发明的实施方案一般涉及可用于浸渍式光刻工艺的非自成像和可成象的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。

4. 发明授权

US08338076B2 Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
公开(公告)号：US08338076B2
公开(公告)日：2012-12-25
申请号：US12591639
申请日：2009-11-25
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Hideo Hada , Takehiro Seshimo , Kensuke Matsuzawa , Keita Ishiduka , Kotaro Endo
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Hideo Hada , Takehiro Seshimo , Kensuke Matsuzawa , Keita Ishiduka , Kotaro Endo
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039 , G03F7/26 , C07C381/12
CPC分类号： C07D327/04 , C07D307/33 , C07D307/93 , C07D307/94 , C07D309/30 , C07D409/12 , C07D493/18 , C07D497/18 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety comprising a group represented by general formula (I) (in the formula, R5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂（B1），其含有具有由通式（I）表示的基团的阳离子部分的化合物（式中，R5表示具有羰基，酯键或磺酰基的有机基团，Q表示二价连接基团）。

5. 发明授权

US07799883B2 Norbornene-type polymers, compositions thereof and lithographic process using such compositions 有权
标题翻译：降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
公开(公告)号：US07799883B2
公开(公告)日：2010-09-21
申请号：US11359880
申请日：2006-02-22
申请人： Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
IPC分类号： C08F32/08 , G03F7/11 , G03F7/038 , H01L23/48
CPC分类号： G03F7/0395 , C08F232/08 , G03F7/0046 , G03F7/11 , G03F7/2041 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译：本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。

6. 发明申请

US20100136478A1 Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
标题翻译：抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
公开(公告)号：US20100136478A1
公开(公告)日：2010-06-03
申请号：US12591639
申请日：2009-11-25
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Hideo Hada , Takehiro Seshimo , Kensuke Matsuzawa , Keita Ishiduka , Kotaro Endo
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Hideo Hada , Takehiro Seshimo , Kensuke Matsuzawa , Keita Ishiduka , Kotaro Endo
IPC分类号： G03F7/20 , G03F7/004 , C07D327/04 , C07D333/50
CPC分类号： C07D327/04 , C07D307/33 , C07D307/93 , C07D307/94 , C07D309/30 , C07D409/12 , C07D493/18 , C07D497/18 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂（B1），其含有具有由通式（I）表示的阳离子部分的化合物（式中，R5表示具有羰基，酯键或磺酰基的有机基团，Q表示二价连接基团）。

7. 发明申请

US20070190448A1 Positive-type resist composition for liquid immersion lithography and method for forming resist pattern 审中-公开
标题翻译：用于液浸光刻的正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US20070190448A1
公开(公告)日：2007-08-16
申请号：US10591718
申请日：2005-03-07
申请人： Keita Ishiduka , Kotaro Endo
发明人： Keita Ishiduka , Kotaro Endo
IPC分类号： G03C1/00
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/28 , G03F7/0397 , G03F7/2041
摘要： The present invention relates to a positive-type resist composition for liquid immersion lithography and a method of forming a resist pattern, in particular, a positive-type resist composition for liquid immersion lithography that exhibits superior liquid immersion resistance to water; and a method for forming a resist pattern by thereof. The positive-type resist composition for liquid immersion lithography according to the present invention includes a resin component (A) increasing alkali-solubility by acid action; and an acid generator generating acid by exposure; in which, the resin component (A) contains at least one acrylic ester constitutional unit (a1), and one (meth)acrylic ester constitutional unit (a2) having acid dissociable, dissolution inhibiting group, and the constitutional unit (a1) consists of a cyclic group bonded to the acrylic ester of the constitutional unit (a1), and a fluoro organic group bonded to the cyclic group.
摘要翻译：本发明涉及一种用于液浸光刻的正型抗蚀剂组合物和形成抗蚀剂图案的方法，特别涉及一种耐水浸性优良的用于液浸光刻的正型抗蚀剂组合物，以及通过其形成抗蚀剂图案的方法。根据本发明的液浸光刻用正型抗蚀剂组合物包括通过酸作用提高碱溶性的树脂组分（A）和通过暴露产生酸的酸发生剂; 其中，树脂成分（A）含有至少一种丙烯酸酯结构单元（a1）和具有酸解离性，溶解抑制基团的一个（甲基）丙烯酸酯结构单元（a2），结构单元（a1）由与结构单元（a1）的丙烯酸酯键合的环状基团和与该环状基团键合的氟有机基团。

8. 发明申请

US20090053646A1 MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST PATTERN THEREWITH 审中-公开
标题翻译：用于保护膜形成的材料及其形成电阻图案的方法
公开(公告)号：US20090053646A1
公开(公告)日：2009-02-26
申请号：US11912423
申请日：2006-04-13
申请人： Keita Ishiduka , Kotaro Endo
发明人： Keita Ishiduka , Kotaro Endo
IPC分类号： G03F7/11 , G03F7/20
CPC分类号： G03F7/11 , G03F7/2041
摘要： A material for protective film formation that is used to form an upper-layer protective film for a resist film and that contains at least a polymer component soluble in water or alkali and an alcohol containing a fluorine atom; and a method of forming a resist pattern with the use of the same. Consequently, not only can the degeneration of resist film during liquid immersion exposure by various liquids for liquid immersion exposure, for example, water and the degeneration of liquid immersion exposure liquids per se be simultaneously prevented in the liquid immersion exposure process, but also without inviting an increase of the number of processing steps, the resistance to post exposure delay of the resist film can be enhanced.
摘要翻译：用于形成抗蚀剂膜的上层保护膜并且至少包含可溶于水或碱的聚合物成分和含有氟原子的醇的保护膜形成用材料，以及使用其形成抗蚀剂图案的方法。因此，不仅可以在液浸曝光工序中同时防止液浸式曝光期间的抗浸膜的浸渍液浸渍曝光（例如水）和浸液曝光液本身的退化，而且不会引起可以提高加工步骤的数量，抗蚀剂膜的耐后曝光延迟。

9. 发明申请

US20060235174A1 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions 审中-公开
标题翻译：降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
公开(公告)号：US20060235174A1
公开(公告)日：2006-10-19
申请号：US11358903
申请日：2006-02-21
申请人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
IPC分类号： C08F4/80 , C08F36/00 , C08F10/00 , C08F132/08 , C08F236/00 , C08F136/00 , C08F232/08 , C08F32/08
CPC分类号： G03F7/11 , C08F232/08 , C08G61/06 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译：本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。

10. 发明授权

US08278025B2 Material for forming resist protection films and method for resist pattern formation with the same 有权
标题翻译：用于形成抗蚀剂保护膜的材料及其抗蚀剂图案形成方法
公开(公告)号：US08278025B2
公开(公告)日：2012-10-02
申请号：US11722797
申请日：2005-12-22
申请人： Keita Ishiduka , Kotaro Endo
发明人： Keita Ishiduka , Kotaro Endo
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/11 , C08F220/18 , C08F220/24 , G03F7/0046 , G03F7/2041
摘要： The formation of high-resolution resist patterns by liquid immersion lithography with various fluids is enabled by protecting a resist film from deterioration (such as bridging) during the immersion exposure in a fluid (such as water) and the fluid from deterioration and improving the stability of a resist film in the storage after exposure without increase in the number of treatment steps. A material for forming resist protection films which comprises an alkali-soluble polymer for forming a protective overcoat for a resist film, characterized in that the contact angle of the polymer to water is 90° or above. The polymer is preferably an acrylic polymer which comprises as the essential components constituent units derived from (meth) acrylic acid and constituent units derived from a specific acrylic ester.
摘要翻译：通过在各种流体中通过液浸光刻形成高分辨率抗蚀剂图案可以通过在液体（例如水）浸没暴露期间保护抗蚀剂膜免于劣化（例如桥接），并且使流体变质并提高稳定性的抗蚀剂膜在曝光后的储存中，而不增加处理步骤的数量。一种用于形成抗蚀剂保护膜的材料，其包含用于形成抗蚀剂膜的保护性外涂层的碱溶性聚合物，其特征在于，聚合物与水的接触角为90°或更高。聚合物优选为丙烯酸类聚合物，其包含作为主要组分的构成单元，其衍生自（甲基）丙烯酸和由特定丙烯酸酯衍生的构成单元。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式