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1. 发明授权

US5863699A Photo-sensitive composition 失效
标题翻译：光敏组合物
公开(公告)号：US5863699A
公开(公告)日：1999-01-26
申请号：US728388
申请日：1996-10-09
申请人： Koji Asakawa , Toru Ushirogochi , Naomi Shida , Makoto Nakase
发明人： Koji Asakawa , Toru Ushirogochi , Naomi Shida , Makoto Nakase
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/115 , Y10S430/123 , Y10S430/128
摘要： A photosensitive composition for forming a pattern through a light-exposure with either one of ArF excimer laser and F.sub.2 excimer laser, which comprises a compound having either an acid-decomposable or acid-crosslinkable group, and a compound represented by the following general formula (1): ##STR1## wherein Ar.sup.1 and Ar.sup.2 are individually an aromatic ring or condensed aromatic ring, R.sup.1 and R.sup.2 are individually halogen atoms or monovalent organic group, X is a group selected from the group consisting of CF.sub.3 SO.sub.3, CH.sub.3 SO.sub.3, CF.sub.3 COOH, ClO.sub.4, SbF.sub.6 and AsF.sub.6, Z is a group selected from the group consisting of Cl, Br, I, S--R and Se--R (R is an alkyl group having 1 to 10 carbon atoms or perfluoroalkyl group having 1 to 10 carbon atoms), and m and n are 0 or a positive integer.
摘要翻译：用ArF受激准分子激光器和F2准分子激光器中的任一种通过曝光形成图案的光敏组合物，其包含具有酸分解性或酸交联性基团的化合物和由以下通式表示的化合物 1）：其中Ar1和Ar2分别为芳环或稠合芳环，R1和R2分别为卤素原子或一价有机基团，X为选自CF 3 SO 3，CH 3 SO 3，CF 3 COOH的基团，ClO 4，SbF 6和AsF 6，Z为选自Cl，Br，I，SR和Se-R（R为碳原子数1〜10的烷基或碳原子数1〜10的全氟烷基），m和n为0或正整数。

2. 发明授权

US06228552B1 Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material 失效
标题翻译：感光材料，形成抗蚀剂图案的方法和使用光敏材料制造电子部件
公开(公告)号：US06228552B1
公开(公告)日：2001-05-08
申请号：US08927411
申请日：1997-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Makoto Nakase
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Makoto Nakase
IPC分类号： G03F7021
CPC分类号： G03F7/0212 , G03F7/0045 , G03F7/0233 , G03F7/095 , G03F7/2024
摘要： A photosensitive material, which comprises, an alkali-soluble resin moiety having an alicyclic skeleton, a polycyclic condensation skeleton, or both alicyclic and polycyclic condensation skeletons, and a diazo compound moiety. The diazo compound moiety may be contained in a side chain of the alkali-soluble resin moiety or included in the photosensitive material in separate from the alkali-soluble resin moiety.
摘要翻译：一种感光材料，其包含具有脂环骨架的碱可溶性树脂部分，多环缩合骨架或脂环族和多环缩合骨架以及重氮化合物部分。重氮化合物部分可以包含在碱溶性树脂部分的侧链中，或者包含在与碱溶性树脂部分分开的感光材料中。

3. 发明授权

US06410748B1 Alicycli c group-containing monomer 失效
标题翻译：含脂环族基团的单体
公开(公告)号：US06410748B1
公开(公告)日：2002-06-25
申请号：US09847387
申请日：2001-05-03
申请人： Naomi Shida , Toru Ushirogouchi , Koji Asakawa , Takeshi Okino , Shuji Hayase , Yoshihiko Nakano , Makoto Nakase
发明人： Naomi Shida , Toru Ushirogouchi , Koji Asakawa , Takeshi Okino , Shuji Hayase , Yoshihiko Nakano , Makoto Nakase
IPC分类号： C07D20948
CPC分类号： G03F7/0397 , C08F246/00 , G03F7/0045 , G03F7/039 , G03F7/0758 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3 (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.
摘要翻译：由以下通式（m-1）表示的单体：其中R是具有脂环骨架的基团，R 2可以相同或不同，分别为氢原子，卤素原子或一价有机基团，X 1为二价有机基团含有杂原子，j为0〜3的整数，R1为选自下列基团的基团，具有Si（R1-1）的一价有机基团，X2和X3中的任一个为含有杂原子的二价有机基团，k m为0〜3的整数，R4为二价烷基，R6可以相同或不同，分别为氢原子，卤素原子或一价有机基团。

4. 再颁专利

USRE38256E1 Photosensitive composition 有权
标题翻译：感光组合物
公开(公告)号：USRE38256E1
公开(公告)日：2003-09-23
申请号：US09448977
申请日：1999-11-24
申请人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
发明人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
IPC分类号： G03F7021
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0215 , G03F7/038 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

5. 发明授权

US5932391A Resist for alkali development 失效
标题翻译：抵抗碱发展
公开(公告)号：US5932391A
公开(公告)日：1999-08-03
申请号：US697009
申请日：1996-08-16
申请人： Toru Ushirogouchi , Koji Asakawa , Naoko Kihara , Makoto Nakase , Naomi Shida , Takeshi Okino
发明人： Toru Ushirogouchi , Koji Asakawa , Naoko Kihara , Makoto Nakase , Naomi Shida , Takeshi Okino
IPC分类号： G03F7/004 , G03F7/039 , G03F7/021
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A resist for alkali development, which comprises an alicyclic compound attached with an acidic substituent group exhibiting pKa of 7 to 11 in an aqueous solution of 25.degree. C. This alicyclic compound is preferably a copolymer comprising as a comonomer component a vinyl compound and exhibiting a light absorbency of 3 or less per 1 .mu.m to the light of 193 nm in wavelength.
摘要翻译：一种碱显影用抗蚀剂，其包含在25℃的水溶液中具有表现出pKa为7〜11的酸性取代基的脂环族化合物。该脂环族化合物优选为包含乙烯基化合物作为共聚单体成分的共聚物，对于波长为193nm的光，每1μm的光吸收率为3以下。

6. 发明授权

US5691101A Photosensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5691101A
公开(公告)日：1997-11-25
申请号：US644395
申请日：1996-05-09
申请人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
发明人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
IPC分类号： G03F7/004 , G03F7/021 , G03F7/038 , G03F7/039 , G03F7/023
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0215 , G03F7/038 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.
摘要翻译：公开了一种安全的浆料感光性组合物，其成像能力如分辨率和灵敏度优异且不含有害化合物，以及能够在不使用任何有机溶剂的情况下溶解在水中的安全的水溶性光敏组合物，同时保持足够的灵敏度作为抗蚀剂不含有害物质。浆料光敏组合物含有当用光或电离辐射照射时产生酸的化合物，至少一种具有酸交联性或酸分解性的树脂和粉末。可以通过在基板上形成这种感光性组合物的层来制造各种装置，根据期望的图案将该层曝光，并加热该层。水溶性光敏组合物含有当用光或电离辐射照射时产生酸的化合物和缩醛树脂。将该水溶性感光性组合物涂布在基材上，并根据期望的图案用光或电离辐射照射。所得到的底物通过加热化学放大并用水显影。这使得可以安全地形成图案而不使用任何呼吸机。

7. 发明授权

US06291129B1 Monomer, high molecular compound and photosensitive composition 失效
标题翻译：单体，高分子化合物和感光组合物
公开(公告)号：US06291129B1
公开(公告)日：2001-09-18
申请号：US09143533
申请日：1998-08-28
申请人： Naomi Shida , Toru Ushirogouchi , Koji Asakawa , Takeshi Okino , Shuji Hayase , Yoshihiko Nakano , Makoto Nakase
发明人： Naomi Shida , Toru Ushirogouchi , Koji Asakawa , Takeshi Okino , Shuji Hayase , Yoshihiko Nakano , Makoto Nakase
IPC分类号： G03C173
CPC分类号： G03F7/0397 , C08F246/00 , G03F7/0045 , G03F7/039 , G03F7/0758 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3 (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.
摘要翻译：由以下通式（m-1）表示的单体：其中R是具有脂环骨架的基团，R 2可以相同或不同，分别为氢原子，卤素原子或一价有机基团，X 1为二价有机基团含有杂原子，j为0〜3的整数，R1为选自下列基团的基团，具有Si（R1-1）的一价有机基团，X2和X3中的任一个为含有杂原子的二价有机基团，k m为0〜3的整数，R4为二价烷基，R6可以相同或不同，分别为氢原子，卤素原子或一价有机基团。

8. 发明授权

US06280897B1 Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts 失效
标题翻译：光敏组合物，使用其形成图案的方法，以及电子部件的制造方法
公开(公告)号：US06280897B1
公开(公告)日：2001-08-28
申请号：US08997623
申请日：1997-12-23
申请人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
发明人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
IPC分类号： G03F7004
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.
摘要翻译：一种感光性组合物，其含有具有下述通式（1A）表示的重复链段的聚合物和能够通过照射光化辐射而产生酸的化合物。其中，R 11为氢原子，脂肪族烃基，烷氧基基团，卤素原子或氰基，R 12是脂族烃基或环状烯烃，R 13是（a）具有2〜12个碳原子的直链烯烃，环状烯烃或杂环基中的任一种和（ b）由 - （CH 2）m - （m为3〜9的整数）表示的烃基，R 14为亲水性基团。

9. 发明授权

US5853952A Color developing organic material, color developing resin composition and colored thin film pattern 失效
标题翻译：显色有机材料，彩色显影树脂组合物和着色薄膜图案
公开(公告)号：US5853952A
公开(公告)日：1998-12-29
申请号：US705265
申请日：1996-08-29
申请人： Toru Ushirogouchi , Makoto Nakase , Akira Yoshizumi , Naoko Kihara , Takuya Naito , Naomi Shida , Koji Asakawa
发明人： Toru Ushirogouchi , Makoto Nakase , Akira Yoshizumi , Naoko Kihara , Takuya Naito , Naomi Shida , Koji Asakawa
IPC分类号： C08G12/06 , C08G73/00 , G02B5/22 , G03F7/00 , G03F7/004 , G03F7/105 , G03C1/73
CPC分类号： C08G12/06 , G03F7/0007 , G03F7/0045 , G03F7/105 , G02B5/22 , Y10S430/163
摘要： There is disclosed a color developing resin composition comprising a base polymer, a dialdehyde represented by the general formula OHC--R.sup.1' --CHO, a diamine represented by the general formula H.sub.2 N--R.sup.2' --NH.sub.2 (at least one of R.sup.1' and R.sup.2' is an aromatic group), a compound which produces an acid by light irradiating and a resin which is crosslinked with the acid.
摘要翻译：公开了一种显色树脂组合物，其包含基础聚合物，由通式OHC-R1'-CHO表示的二醛，由通式H2N-R2'-NH2表示的二胺（R1'和R2'中的至少一个）是芳族基团），通过光照射产生酸的化合物和与酸交联的树脂。

10. 发明授权

US6071670A Transparent resin, photosensitive composition, and method of forming a pattern 失效
标题翻译：透明树脂，感光性组合物和形成图案的方法
公开(公告)号：US6071670A
公开(公告)日：2000-06-06
申请号：US948425
申请日：1997-10-10
申请人： Toru Ushirogouchi , Takeshi Okino , Naomi Shida , Makoto Nakase , Yoshiaki Kawamonzen , Rumiko Hayase , Koji Asakawa
发明人： Toru Ushirogouchi , Takeshi Okino , Naomi Shida , Makoto Nakase , Yoshiaki Kawamonzen , Rumiko Hayase , Koji Asakawa
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/107 , Y10S430/109
摘要： A photosensitive composition comprising, an oligomer having a backbone chain comprising an alicyclic skeleton and/or a conjugated polycondensed aromatic skeleton, the backbone chain being acid-decomposable or hydrolyzable, and a photo-acid-generating agent.
摘要翻译：一种光敏组合物，其包含具有包含脂环骨架和/或共轭缩聚芳族骨架的主链的低聚物，所述主链是酸可分解的或可水解的，以及光酸产生剂。

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