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    • 1. 发明授权
    • Semiconductor light emitting element
    • 半导体发光元件
    • US07763907B2
    • 2010-07-27
    • US11850404
    • 2007-09-05
    • Koichi TachibanaHajime NagoShinji SaitoShinya NunoueGenichi Hatakoshi
    • Koichi TachibanaHajime NagoShinji SaitoShinya NunoueGenichi Hatakoshi
    • H01L33/22H01L33/14H01L33/38
    • H01L33/32H01L33/02H01L33/16
    • A semiconductor light emitting element includes: an {0001} n-type semiconductor substrate formed of a III-V semiconductor, which is in a range of 0° to 45° in inclination angle into a direction, and which is in a range of 0° to 10° in inclination angle into a direction; an n-type layer formed of a III-V semiconductor on the n-type semiconductor substrate; an n-type guide layer formed of a III-V semiconductor above the n-type layer; an active layer formed of a III-V semiconductor above the n-type guide layer; a p-type first guide layer formed of a III-V semiconductor above the active layer; a p-type contact layer formed of a III-V semiconductor above the p-type first guide layer; and an concavo-convex layer formed of a III-V semiconductor between the p-type first guide layer and the p-type contact layer. The concavo-convex layer has concave portions and convex portions which are alternately and regularly arranged at a top face thereof, and has lower p-type impurity concentration than that of the p-type contact layer.
    • 半导体发光元件包括:由III-V族半导体形成的{0001} n型半导体衬底,其倾斜角度在0°至45°的范围内,并且其为 在倾斜角度为0°至10°的范围内成为<11-20>方向; 在n型半导体衬底上由III-V半导体形成的n型层; 由n型层上方的III-V族半导体形成的n型引导层; 由n型引导层上方的III-V族半导体形成的有源层; 由有源层上方的III-V族半导体形成的p型第一引导层; p型接触层,其由p型第一引导层上方的III-V族半导体形成; 以及在p型第一引导层和p型接触层之间由III-V族半导体形成的凹凸层。 该凹凸层具有在顶面交替规则地配置的凹部和凸部,并且p型杂质浓度比p型接触层低。
    • 2. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING ELEMENT
    • 半导体发光元件
    • US20080179623A1
    • 2008-07-31
    • US11850404
    • 2007-09-05
    • Koichi TACHIBANAHajime NagoShinji SaitoShinya NunoueGenichi Hatakoshi
    • Koichi TACHIBANAHajime NagoShinji SaitoShinya NunoueGenichi Hatakoshi
    • H01L29/24
    • H01L33/32H01L33/02H01L33/16
    • A semiconductor light emitting element includes: an {0001} n-type semiconductor substrate formed of a III-V semiconductor, which is in a range of 0° to 45° in inclination angle into a direction, and which is in a range of 0° to 10° in inclination angle into a direction; an n-type layer formed of a III-V semiconductor on the n-type semiconductor substrate; an n-type guide layer formed of a III-V semiconductor above the n-type layer; an active layer formed of a III-V semiconductor above the n-type guide layer; a p-type first guide layer formed of a III-V semiconductor above the active layer; a p-type contact layer formed of a III-V semiconductor above the p-type first guide layer; and an concavo-convex layer formed of a III-V semiconductor between the p-type first guide layer and the p-type contact layer. The concavo-convex layer has concave portions and convex portions which are alternately and regularly arranged at a top face thereof, and has lower p-type impurity concentration than that of the p-type contact layer.
    • 半导体发光元件包括:由III-V族半导体形成的{0001} n型半导体衬底,其倾斜角度在0°至45°的范围内,并且其为 在倾斜角度为0°至10°的范围内成为<11-20>方向; 在n型半导体衬底上由III-V半导体形成的n型层; 由n型层上方的III-V族半导体形成的n型引导层; 由n型引导层上方的III-V族半导体形成的有源层; 由有源层上方的III-V族半导体形成的p型第一引导层; p型接触层,其由p型第一引导层上方的III-V族半导体形成; 以及在p型第一引导层和p型接触层之间由III-V族半导体形成的凹凸层。 该凹凸层具有在顶面交替规则地配置的凹部和凸部,并且p型杂质浓度比p型接触层低。
    • 5. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US08525195B2
    • 2013-09-03
    • US12873662
    • 2010-09-01
    • Hajime NagoKoichi TachibanaToshiki HikosakaShigeya KimuraShinya Nunoue
    • Hajime NagoKoichi TachibanaToshiki HikosakaShigeya KimuraShinya Nunoue
    • H01L33/02
    • H01L33/12B82Y20/00H01L33/04H01L33/32H01S5/34333
    • According to one embodiment, a semiconductor light emitting device includes n-type and p-type semiconductor layers, a light emitting portion, a multilayered structural body, and an n-side intermediate layer. The light emitting portion is provided between the semiconductor layers. The light emitting portion includes barrier layers containing GaN, and a well layer provided between the barrier layers. The well layer contains Inx1Ga1-x1N. The body is provided between the n-type semiconductor layer and the light emitting portion. The body includes: first layers containing GaN, and a second layer provided between the first layers. The second layer contains Inx2Ga1-x2N. Second In composition ratio x2 is not less than 0.6 times of first In composition ratio x1 and is lower than the first In composition x1. The intermediate layer is provided between the body and the light emitting portion and includes a third layer containing Aly1Ga1-y1N (0
    • 根据一个实施例,半导体发光器件包括n型和p型半导体层,发光部分,多层结构体和n侧中间层。 发光部分设置在半导体层之间。 发光部分包括含有GaN的阻挡层,以及设置在阻挡层之间的阱层。 阱层包含Inx1Ga1-x1N。 本体设置在n型半导体层和发光部之间。 主体包括:包含GaN的第一层,以及设置在第一层之间的第二层。 第二层包含Inx2Ga1-x2N。 第二组成比x2不小于第一In组成比x1的0.6倍,并且低于第一In组成x1。 中间层设置在主体和发光部分之间,并且包括含有Aly1Ga1-y1N(0