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    • 1. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING ELEMENT
    • 半导体发光元件
    • US20090059986A1
    • 2009-03-05
    • US12039303
    • 2008-02-28
    • Koichi TACHIBANAShinji SAITOShinya NUNOUEHaruhiko YOSHIDA
    • Koichi TACHIBANAShinji SAITOShinya NUNOUEHaruhiko YOSHIDA
    • H01S5/30
    • H01S5/34333B82Y20/00H01S5/22H01S5/2214H01S5/2218H01S2301/18
    • A semiconductor light emitting element includes a first clad layer of a first conductivity type provided on a substrate; an active layer provided on the first clad layer; a second clad layer of a second conductivity type provided on the active layer, an upper portion of the second clad layer implements a ridge extending in a predetermined direction; a pair of first current block layers provided on the second clad layer sandwiching the ridge along the extending direction; and a pair of second current block layers provided between the first current block layers on the second clad layer and at sidewalls of the ridge to be contacted with the first current block layers, sandwiching selectively a region including an edge of the ridge, the second current block layers having a refractive index larger than the first current block layers at an emission peak wavelength of the active layer.
    • 半导体发光元件包括设置在基板上的第一导电类型的第一覆盖层; 设置在所述第一包层上的有源层; 设置在所述有源层上的第二导电类型的第二覆盖层,所述第二覆层的上部实现沿预定方向延伸的脊; 一对第一电流阻挡层,设置在沿所述延伸方向夹着所述脊的所述第二覆层上; 以及一对第二电流阻挡层,设置在所述第二覆盖层上的所述第一电流阻挡层之间并且在所述脊的侧壁处与所述第一电流阻挡层接触,选择性地夹持包括所述脊的边缘的区域,所述第二电流 在有源层的发射峰值波长处具有大于第一电流阻挡层的折射率的阻挡层。
    • 2. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING ELEMENT
    • 半导体发光元件
    • US20080179623A1
    • 2008-07-31
    • US11850404
    • 2007-09-05
    • Koichi TACHIBANAHajime NagoShinji SaitoShinya NunoueGenichi Hatakoshi
    • Koichi TACHIBANAHajime NagoShinji SaitoShinya NunoueGenichi Hatakoshi
    • H01L29/24
    • H01L33/32H01L33/02H01L33/16
    • A semiconductor light emitting element includes: an {0001} n-type semiconductor substrate formed of a III-V semiconductor, which is in a range of 0° to 45° in inclination angle into a direction, and which is in a range of 0° to 10° in inclination angle into a direction; an n-type layer formed of a III-V semiconductor on the n-type semiconductor substrate; an n-type guide layer formed of a III-V semiconductor above the n-type layer; an active layer formed of a III-V semiconductor above the n-type guide layer; a p-type first guide layer formed of a III-V semiconductor above the active layer; a p-type contact layer formed of a III-V semiconductor above the p-type first guide layer; and an concavo-convex layer formed of a III-V semiconductor between the p-type first guide layer and the p-type contact layer. The concavo-convex layer has concave portions and convex portions which are alternately and regularly arranged at a top face thereof, and has lower p-type impurity concentration than that of the p-type contact layer.
    • 半导体发光元件包括:由III-V族半导体形成的{0001} n型半导体衬底,其倾斜角度在0°至45°的范围内,并且其为 在倾斜角度为0°至10°的范围内成为<11-20>方向; 在n型半导体衬底上由III-V半导体形成的n型层; 由n型层上方的III-V族半导体形成的n型引导层; 由n型引导层上方的III-V族半导体形成的有源层; 由有源层上方的III-V族半导体形成的p型第一引导层; p型接触层,其由p型第一引导层上方的III-V族半导体形成; 以及在p型第一引导层和p型接触层之间由III-V族半导体形成的凹凸层。 该凹凸层具有在顶面交替规则地配置的凹部和凸部,并且p型杂质浓度比p型接触层低。
    • 4. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • 半导体发光器件
    • US20130087805A1
    • 2013-04-11
    • US13404531
    • 2012-02-24
    • Shigeya KIMURAKoichi TACHIBANAShinya NUNOUE
    • Shigeya KIMURAKoichi TACHIBANAShinya NUNOUE
    • H01L29/20
    • H01L33/06H01L33/32
    • According to one embodiment, a semiconductor light emitting device includes an n-type semiconductor layer, a p-type semiconductor layer and a light emitting layer. The emitting layer is provided between the n-type layer and the p-type layer, and includes a plurality of barrier layers and a plurality of well layers, being alternately stacked. The p-side barrier layer being closest to the p-type layer among the plurality of barrier layer includes a first layer and a second layer, containing group III elements. An In composition ratio in the group III elements of the second layer is higher than an In composition ratio in the group III elements of the first layer. An average In composition ratio of the p-side layer is higher than an average In composition ratio of an n-side barrier layer that is closest to the n-type layer among the plurality of barrier layers.
    • 根据一个实施例,半导体发光器件包括n型半导体层,p型半导体层和发光层。 发光层设置在n型层和p型层之间,并且包括交替层叠的多个势垒层和多个阱层。 在多个阻挡层中最靠近p型层的p侧阻挡层包括含有III族元素的第一层和第二层。 第二层的III族元素中的In组成比高于第一层的III族元素中的In组成比。 p侧层的平均In组成比高于多个势垒层中最靠近n型层的n侧阻挡层的平均In组成比。
    • 8. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • 半导体发光器件
    • US20120138889A1
    • 2012-06-07
    • US13198105
    • 2011-08-04
    • Koichi TACHIBANAHajime NagoToshiki HikosakaShigeya KimuraShinya Nunoue
    • Koichi TACHIBANAHajime NagoToshiki HikosakaShigeya KimuraShinya Nunoue
    • H01L33/04
    • H01L33/325H01L33/02H01L33/06H01L33/32H01L33/40H01S5/32341
    • According to one embodiment, a semiconductor light emitting device includes an n-type semiconductor layer, a p-type semiconductor layer, a light emitting part, and a p-side electrode. The light emitting part is provided between the n-type and the p-type semiconductor layers, and includes a plurality of barrier layers and a plurality of well layers. The p-side electrode contacts the p-type semiconductor layer. The p-type semiconductor layer includes first, second, third, and fourth p-type layers. The first p-type layer contacts the p-side electrode. The second p-type layer contacts the light emitting part. The third p-type layer is provided between the first p-type layer and the second p-type layer. The fourth p-type layer is provided between the second p-type layer and the third p-type layer. The second p-type layer contains Al and contains a p-type impurity in a lower concentration lower than that in the first concentration.
    • 根据一个实施例,半导体发光器件包括n型半导体层,p型半导体层,发光部分和p侧电极。 发光部分设置在n型和p型半导体层之间,并且包括多个势垒层和多个阱层。 p侧电极与p型半导体层接触。 p型半导体层包括第一,第二,第三和第四p型层。 第一p型层与p侧电极接触。 第二p型层与发光部接触。 第三p型层设置在第一p型层和第二p型层之间。 第四p型层设置在第二p型层和第三p型层之间。 第二p型层含有Al并含有比第一浓度低的浓度的p型杂质。
    • 9. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • 半导体发光器件
    • US20110198561A1
    • 2011-08-18
    • US12874510
    • 2010-09-02
    • Koichi TACHIBANAHajime NagoToshiki HikosakaShigeya KimuraShinya Nunoue
    • Koichi TACHIBANAHajime NagoToshiki HikosakaShigeya KimuraShinya Nunoue
    • H01L33/32
    • H01L33/145B82Y20/00H01L33/06H01L33/32H01S5/34333
    • According to one embodiment, a semiconductor light emitting device includes an n-type semiconductor layer, a p-type semiconductor layer, a light emitting portion, a first layer, a second layer, and an intermediate layer. The semiconductor layers include nitride semiconductor. The light emitting portion is provided between the n-type semiconductor layer and the p-type semiconductor layer and includes a quantum well layer. The first layer is provided between the light emitting portion and the p-type semiconductor layer and includes AlX1Ga1-x1N having first Al composition ratio x1. The second layer is provided between the first layer and the p-type semiconductor layer and includes Alx2Ga1-x2N having second Al composition ratio x2 higher than the first Al composition ratio x1. The intermediate layer is provided between the first layer and the light emitting portion and has a thickness not smaller than 3 nanometers and not larger than 8 nanometers and includes Inz1Ga1-z1N (0≦z1
    • 根据一个实施例,半导体发光器件包括n型半导体层,p型半导体层,发光部分,第一层,第二层和中间层。 半导体层包括氮化物半导体。 发光部分设置在n型半导体层和p型半导体层之间,并且包括量子阱层。 第一层设置在发光部和p型半导体层之间,并且包括具有第一Al组成比x1的AlX1Ga1-x1N。 第二层设置在第一层和p型半导体层之间,并且包括具有比第一Al组成比x1高的第二Al组成比x2的Al x2 Ga1-x2N。 中间层设置在第一层和发光部之间,并且具有不小于3纳米且不大于8纳米的厚度,并且包括Inz1Ga1-z1N(0&nlE; z1 <1)。
    • 10. 发明申请
    • NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE
    • 氮化物半导体发光器件
    • US20110037049A1
    • 2011-02-17
    • US12717653
    • 2010-03-04
    • Koichi TACHIBANAHajime NagoToshiki HikosakaShinya Nunoue
    • Koichi TACHIBANAHajime NagoToshiki HikosakaShinya Nunoue
    • H01L33/04H01L33/30
    • H01L33/32H01L33/06
    • Disclosed is a nitride semiconductor light-emitting device including a substrate, a pair of p-type and n-type clad layers formed on the substrate, and an active layer having a single quantum well structure or a multiple quantum well structure, which is sandwiched between the p-type clad layer and the n-type clad layer, and includes a quantum well layer and a pair of barrier layers each having a larger bandgap than that of the quantum well layer, the quantum well layer being sandwiched between the pair of barrier layers. Each of the pair of barrier layers has a multi-layer structure including, starting from the quantum well layer side, a first subbarrier layer having a composition of Iny1Ga1-y1N, a second subbarrier layer having a composition of Iny2Ga1-y2N and a third subbarrier layer having a composition of Iny3Ga1-y3N, in which y1, y2 and y3 satisfy the relationship of 0≦y1,y3
    • 公开了一种氮化物半导体发光器件,其包括衬底,形成在衬底上的一对p型和n型覆盖层以及具有单量子阱结构或多量子阱结构的有源层,其夹在 在p型覆盖层和n型覆盖层之间,包括量子阱层和一对阻挡层,每个阻挡层的带隙比量子阱层的带隙大,量子阱层夹在一对 阻挡层。 所述一对势垒层中的每一个具有多层结构,包括从量子阱层侧开始具有In y Ga 1-y N N的组成的第一子屏蔽层,具有In y Ga 1-y N N的组成的第二子隔离层和第三子阱 y1,y2和y3满足0&nlE; y1,y3