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1. 发明授权

US5982379A Interactive color system editor and method of specifying potable color system framework representation 失效
标题翻译：交互式颜色系统编辑器和指定饮用色系统框架表示的方法
公开(公告)号：US5982379A
公开(公告)日：1999-11-09
申请号：US869074
申请日：1997-06-04
申请人： Koichi Suzuki , Yusuke Ohta , Noboru Murayama
发明人： Koichi Suzuki , Yusuke Ohta , Noboru Murayama
IPC分类号： G06T11/00 , G06F15/00
CPC分类号： G06T11/001
摘要： A system for and a method visualizes a color system for specifying a portable color system representation. The portable color system representation does not require a large table or a large amount of calculation. The same system and the method allows the user to interactively edit each of color components of a given color system so as to generate a portable color system framework representation between unrelated devices whose input and output ranges are different.
摘要翻译：系统和方法可视化用于指定便携式彩色系统表示的颜色系统。便携式彩色系统表示不需要大的表或大量的计算。相同的系统和方法允许用户交互地编辑给定颜色系统的每个颜色分量，以便在其输入和输出范围不同的不相关设备之间生成便携式彩色系统框架表示。

2. 发明授权

US6130763A Method of and system for correcting output values based upon conditional polynomials 失效
标题翻译：基于条件多项式校正输出值的方法和系统
公开(公告)号：US6130763A
公开(公告)日：2000-10-10
申请号：US18667
申请日：1998-02-04
申请人： Yusuke Ohta , Noboru Murayama
发明人： Yusuke Ohta , Noboru Murayama
IPC分类号： H04N1/407 , G06F17/10 , G06T1/00 , H04N1/60 , G03F3/08 , G06K9/00
CPC分类号： H04N1/6027
摘要： A method and a system for correcting output color component values for a color image output used in devices such as a printer and a digital copier based upon independently selected input and output values and an interpolated curve line based upon a predetermined conditional polynomial equation.
摘要翻译：一种用于基于独立选择的输入和输出值以及基于预定条件多项式方程的内插曲线来校正在诸如打印机和数字复印机的设备中使用的彩色图像输出的输出颜色分量值的方法和系统。

3. 发明授权

US09540285B2 Graphite film and process for producing graphite film 有权
标题翻译：石墨膜和石墨膜生产工艺
公开(公告)号：US09540285B2
公开(公告)日：2017-01-10
申请号：US13818400
申请日：2011-08-19
申请人： Yusuke Ohta , Takashi Inada , Makoto Mishiro , Yasushi Nishikawa
发明人： Yusuke Ohta , Takashi Inada , Makoto Mishiro , Yasushi Nishikawa
IPC分类号： C01B31/04 , C04B35/634 , C08L77/06 , C04B35/52 , C04B35/524 , C04B35/622
CPC分类号： C01B31/04 , C04B35/522 , C04B35/524 , C04B35/62218 , C04B35/63444 , C08G69/26 , C08G69/28 , C08L77/06
摘要： A graphite film which is low in graphite dust generation can be produced by properly selecting acid dianhydride and diamine which constitute a polyimide film, which polyimide film is a raw material of the graphite film. Specifically, the graphite film which is low in graphite dust generation can be obtained if (1) the acid dianhydride is PMDA and the diamine has a molar ratio of ODA/PDA in a range of 100:0 to 80:20, or (2) the acid dianhydride has a molar ratio of PMDA/BPDA in a range of 80:20 to 50:50, and the diamine has a molar ratio of ODA/PDA in a range of 30:70 to 90:10.
摘要翻译：可以通过适当选择构成聚酰亚胺膜的酸二酐和二胺作为石墨膜的原料，来制造石墨粉生成量低的石墨膜。具体而言，如果（1）酸二酐是PMDA，二胺的ODA / PDA的摩尔比在100:0〜80:20的范围内，则可以得到石墨粉尘产生低的石墨膜，或（2 ）酸二酐具有80:20至50:50范围内的PMDA / BPDA的摩尔比，二胺的ODA / PDA的摩尔比在30:70至90:10的范围内。

4. 发明授权

US09533888B2 Graphite film 有权
标题翻译：石墨胶片
公开(公告)号：US09533888B2
公开(公告)日：2017-01-03
申请号：US14240221
申请日：2012-08-17
申请人： Yusuke Ohta , Takashi Inada , Makoto Kutsumizu , Yasushi Nishikawa , Satoshi Katayama
发明人： Yusuke Ohta , Takashi Inada , Makoto Kutsumizu , Yasushi Nishikawa , Satoshi Katayama
IPC分类号： C01B31/04 , H01L23/373 , C04B35/52 , C04B35/524 , C04B35/622
CPC分类号： C01B31/04 , C01B32/20 , C04B35/522 , C04B35/524 , C04B35/62218 , C04B2235/6562 , H01L23/373 , H01L2924/0002 , Y10T428/24628 , Y10T428/24653 , H01L2924/00
摘要： It is possible to obtain a graphite film with its shape controlled, by performing a sag controlling step of controlling temperatures of a polymer film at both widthwise ends and a temperature of the polymer film in a widthwise middle portion within a temperature range from a starting temperature of thermal decomposition of the polymer film to a sag controlling temperature of the polymer film.
摘要翻译：通过在起始温度的温度范围内进行控制宽度方向的两个宽度方向的聚合物膜的温度和宽度方向中间部分的聚合物膜的温度的下垂控制工序，聚合物膜的热分解为聚合物膜的下垂控制温度。

5. 发明申请

US20140328745A1 METHOD FOR PRODUCING CARBONACEOUS FILM AND METHOD FOR PRODUCING GRAPHITE FILM 有权
标题翻译：生产碳膜的方法和生产石墨膜的方法
公开(公告)号：US20140328745A1
公开(公告)日：2014-11-06
申请号：US14343639
申请日：2012-07-25
申请人： Makoto Mishiro , Yusuke Ohta , Takashi Inada , Yasushi Nishikawa
发明人： Makoto Mishiro , Yusuke Ohta , Takashi Inada , Yasushi Nishikawa
IPC分类号： C01B31/04 , C01B31/02
CPC分类号： C01B31/04 , C01B32/20
摘要： Disclosed herein is a method for producing a roll-shaped carbonaceous film by polymer pyrolysis while suppressing the occurrence of fusion bonding in the roll-shaped carbonaceous film. The carbonaceous film production method includes the step of heat-treating a polymer film wound into a roll, wherein, at a temperature equal to or higher than the pyrolysis onset temperature of the polymer film but equal to or lower than a temperature at which the weight of the polymer film is reduced by 40% as compared to that before heat treatment, the roll-shaped polymer film has (2-1) a gap between layers of the polymer film so that a value determined for the whole roll-shaped polymer film by dividing the thickness of the gap between adjacent layers of the polymer film (Ts) by the thickness of the polymer film (Tf) (Ts/Tf) satisfies a relationship of 0.33≦Ts/Tf≦1.50 and/or (2-2) a space inside a 50% cross-sectional circle of the roll-shaped polymer film so that the area of the space inside the 50% cross-sectional circle is 25% or more of the cross-sectional area of the 50% cross-sectional circle.
摘要翻译：本文公开了一种通过聚合物热解制备辊状碳质膜的方法，同时抑制辊状碳质膜中的熔融粘合的发生。含碳膜的制造方法包括对卷绕成卷的聚合物膜进行热处理的步骤，其中，在等于或高于聚合物膜的热解开始温度的温度下，但等于或低于重量的聚合物膜与热处理相比降低了40％，所以辊状聚合物膜具有（2-1）聚合物膜的层间的间隙，使得对于整个辊状聚合物膜确定的值通过将聚合物膜（Ts）的相邻层之间的间隙的厚度除以聚合物膜的厚度（Tf）（Ts / Tf）之间的间隔的厚度满足0.33≤n1E; Ts / Tf＆lt; lE; 1.50和/或（2- 2）辊状聚合物膜的50％横截面圆内的空间，使得50％横截面圆内的空间面积为50％横截面的横截面积的25％以上截面圆。

6. 发明申请

US20130164210A1 GRAPHITE FILM AND PROCESS FOR PRODUCING GRAPHITE FILM 有权
标题翻译：石墨膜和生产石墨膜的方法
公开(公告)号：US20130164210A1
公开(公告)日：2013-06-27
申请号：US13818400
申请日：2011-08-19
申请人： Yusuke Ohta , Takashi Inada , Makoto Mishiro , Yasushi Nishikawa
发明人： Yusuke Ohta , Takashi Inada , Makoto Mishiro , Yasushi Nishikawa
IPC分类号： C01B31/04
CPC分类号： C01B31/04 , C04B35/522 , C04B35/524 , C04B35/62218 , C04B35/63444 , C08G69/26 , C08G69/28 , C08L77/06
摘要： A graphite film which is low in graphite dust generation can be produced by properly selecting acid dianhydride and diamine which constitute a polyimide film, which polyimide film is a raw material of the graphite film. Specifically, the graphite film which is low in graphite dust generation can be obtained if (1) the acid dianhydride is PMDA and the diamine has a molar ratio of ODA/PDA in a range of 100:0 to 80:20, or (2) the acid dianhydride has a molar ratio of PMDA/BPDA in a range of 80:20 to 50:50, and the diamine has a molar ratio of ODA/PDA in a range of 30:70 to 90:10.
摘要翻译：可以通过适当选择构成聚酰亚胺膜的酸二酐和二胺作为石墨膜的原料，来制造石墨粉生成量低的石墨膜。具体而言，如果（1）酸二酐是PMDA，二胺的ODA / PDA的摩尔比在100:0〜80:20的范围内，则可以得到石墨粉尘产生低的石墨膜，或（2 ）酸二酐具有80:20至50:50范围内的PMDA / BPDA的摩尔比，二胺的ODA / PDA的摩尔比在30:70至90:10的范围内。

7. 发明申请

US20130119571A1 METHOD FOR IMPROVING THE FLATNESS OF GRAPHITE FILM, GRAPHITE FILM, AND METHOD FOR PRODUCING SAME 有权
公开(公告)号：US20130119571A1
公开(公告)日：2013-05-16
申请号：US13700580
申请日：2011-05-12
申请人： Yusuke Ohta , Takashi Inada , Makoto Mishiro , Takashi Inada , Yasushi Nishikawa
发明人： Yusuke Ohta , Takashi Inada , Makoto Mishiro , Takashi Inada , Yasushi Nishikawa
IPC分类号： C01B31/04
CPC分类号： C01B31/04 , C01B32/20
摘要： When a raw material graphite film bad in flatness is laminated onto another material, creases and other defects may be caused. In particular, when a graphite film having a large area is laminated, defects such as creases may be often caused. In order to solve such defects, a flatness correction treatment step is performed wherein a raw material graphite film is subjected to heat treatment up to 2000° C. or higher while a pressure is applied thereto. This flatness correction treatment gives a graphite film good in flatness. Furthermore, when the flatness of the raw material graphite film is corrected by use of a thermal expansion of a core, a graphite film small in sagging can be obtained.

8. 发明申请

US20110165379A1 Graphite Film and Graphite Composite Film 有权
标题翻译：石墨膜和石墨复合膜
公开(公告)号：US20110165379A1
公开(公告)日：2011-07-07
申请号：US13044043
申请日：2011-03-09
申请人： Yusuke Ohta , Shuhei Wakahara , Yasushi Nishikawa
发明人： Yusuke Ohta , Shuhei Wakahara , Yasushi Nishikawa
IPC分类号： B32B3/00
CPC分类号： C09K5/14 , B32B5/18 , B32B7/12 , B32B9/007 , B32B9/045 , B32B27/065 , B32B27/281 , B32B2307/302 , B32B2307/306 , B32B2307/54 , B32B2307/714 , B32B2457/00 , C01B32/20 , H01L23/373 , H01L23/3737 , H01L2924/0002 , H05K7/20481 , Y10T428/24446 , Y10T428/2918 , Y10T428/30 , H01L2924/00
摘要： An object of the present invention is to provide a graphite film, and a graphite composite film both having an excellent thermal diffusivity which can sufficiently manage heat dissipation of electronic instruments, precision instruments and the like, along with an excellent flex resistance which can withstand application to bent portions.Means for Resolution of the present invention is a graphite film exhibiting the number of reciprocal foldings being 10,000 times or more as measured using a rectangular strip test piece having a width of 15 mm until the test piece breaks in a MIT folding endurance test under conditions of: a curvature radius R of the bending clamp being 2 mm; a left-and-right bending angle being 135°; a bending rate being 90 times/min; and a load being 0.98 N.
摘要翻译：本发明的目的是提供一种具有优异的热扩散性的石墨膜和石墨复合膜，其能够充分地管理电子仪器，精密仪器等的散热，以及能够经受应用的优异的抗弯曲性弯曲部分。本发明的解决方法是使用宽度为15mm的矩形条状试验片测定的往复折叠数为10,000倍以上的石墨膜，直到试验片在MIT耐折性试验中断裂为止，弯曲夹具的曲率半径R为2mm; 左右弯曲角度为135°; 弯曲率为90次/分钟; 负载为0.98N。

9. 发明申请

US20090271839A1 Document Security System 审中-公开
标题翻译：文件安全系统
公开(公告)号：US20090271839A1
公开(公告)日：2009-10-29
申请号：US11922109
申请日：2007-05-02
申请人： Yoichi Kanai , Yusuke Ohta , Atsuhisa Saitoh
发明人： Yoichi Kanai , Yusuke Ohta , Atsuhisa Saitoh
IPC分类号： G06K15/00 , G06F17/21
CPC分类号： H04N1/0087 , G06F21/6209 , G06F2221/2141 , G06F2221/2149 , H04N1/0084 , H04N1/00867 , H04N1/4406 , H04N1/4426 , H04N1/4433 , H04N1/444 , H04N1/4486
摘要： A document security system is disclosed. In the document security system, when a user is permitted to use a device and to use a document, a process for the document requested by a user is executed by the device. Further, after executing the process, a follow-up obligation is executed corresponding to the type of the document obtained from image data of the document.
摘要翻译：公开了一种文件安全系统。在文档安全系统中，当允许用户使用设备并使用文档时，由设备执行用户请求的文档的处理。此外，在执行该处理之后，对应于从文档的图像数据获得的文档的类型执行跟踪义务。

10. 发明申请

US20050085009A1 Method of manufacturing a semiconductor device 失效
标题翻译：制造半导体器件的方法
公开(公告)号：US20050085009A1
公开(公告)日：2005-04-21
申请号：US10953955
申请日：2004-09-30
申请人： Yoshihiko Yamaguchi , Atsushi Fujishima , Yusuke Ohta
发明人： Yoshihiko Yamaguchi , Atsushi Fujishima , Yusuke Ohta
IPC分类号： H01L23/52 , B08B7/00 , H01L21/00 , H01L21/30 , H01L21/3205 , H01L21/44 , H01L21/48 , H01L21/50 , H01L21/56 , H01L21/60 , H01L21/66 , H01L23/12 , H01L23/31 , H01L23/495
CPC分类号： H01L24/97 , H01L21/4803 , H01L23/3114 , H01L23/3128 , H01L24/45 , H01L24/48 , H01L24/73 , H01L2224/32225 , H01L2224/45144 , H01L2224/48227 , H01L2224/73265 , H01L2224/97 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/12041 , H01L2924/12042 , H01L2924/14 , H01L2924/15311 , H01L2924/181 , H01L2924/19043 , H01L2924/30105 , H01L2924/3011 , H01L2224/85 , H01L2224/83 , H01L2224/92247 , H01L2924/00 , H01L2924/00012 , H01L2224/05599
摘要： A method of manufacturing a semiconductor device involves the steps of: forming a plurality of product formation areas each having a circuit and a plurality of first electrode pads over a main surface of a semiconductor wafer; arranging a plurality of second electrode pads with larger pitches than the first electrode pads in each of the product formation areas; segmenting the semiconductor wafer to separate the plural product formation areas and provide a plurality of semiconductor devices each having the circuit, the plural first electrode pads and the plural second electrode pads on a first surface; and cleaning foreign matter off the first surface of the semiconductor device after the step of segmenting the semiconductor devices.
摘要翻译：制造半导体器件的方法包括以下步骤：在半导体晶片的主表面上形成多个产品形成区域，每个产品形成区域具有电路和多个第一电极焊盘; 在每个产品形成区域中布置具有比第一电极焊盘更大间距的多个第二电极焊盘; 分割半导体晶片以分离多个产品形成区域，并且在第一表面上提供多个半导体器件，每个半导体器件具有电路，多个第一电极焊盘和多个第二电极焊盘; 以及在分割半导体器件的步骤之后，从半导体器件的第一表面除去异物。

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