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    • 2. 发明授权
    • Bus system for coordinating internal and external direct memory access
controllers
    • 用于协调内部和外部直接存储器访问控制器的总线系统
    • US5347643A
    • 1994-09-13
    • US656676
    • 1991-02-19
    • Nobukazu KondoTakashi MaruyamaKeiichi IsamuHiroaki Aotsu
    • Nobukazu KondoTakashi MaruyamaKeiichi IsamuHiroaki Aotsu
    • G06F12/08G06F12/10G06F13/28G06F13/368
    • G06F13/28G06F12/1045G06F12/0879
    • A one-chip microprocessor including an instruction execution unit, a DMA controller, and a memory management unit. The instruction execution unit has a logical address for storing an address to be accessed. The DMA controller has a DMA register for storing an address given when direct memory access is performed. The memory execution unit further includes an address converting means for converting a logical address stored in the logical address register of the instruction execution unit into a physical address to be accessed, a hit determining means for determining whether or not the cache memory connected as an external unit is hit on the basis of the physical address, and a burst transfer circuit for performing burst transfer of the cache memory. The one-chip microprocessor is connected by a bus to a system having a cache memory, a memory controller and a main memory.
    • 包括指令执行单元,DMA控制器和存储器管理单元的单片微处理器。 指令执行单元具有用于存储要访问的地址的逻辑地址。 DMA控制器具有用于存储执行直接存储器访问时给定的地址的DMA寄存器。 存储器执行单元还包括地址转换装置,用于将存储在指令执行单元的逻辑地址寄存器中的逻辑地址转换为要访问的物理地址;命中确定装置,用于确定作为外部连接的高速缓冲存储器 基于物理地址命中单元,以及用于执行高速缓冲存储器的突发传送的突发传送电路。 单片微处理器通过总线连接到具有高速缓冲存储器,存储器控制器和主存储器的系统。
    • 5. 发明授权
    • Semiconductor manufacture method
    • 半导体制造方法
    • US08143075B2
    • 2012-03-27
    • US11300276
    • 2005-12-15
    • Takashi Maruyama
    • Takashi Maruyama
    • H01L21/00
    • H01L23/544B82Y10/00B82Y40/00G03F9/7003H01J37/3045H01J37/3174H01J2237/31793H01L2223/54453H01L2223/5448H01L2924/0002H01L2924/00
    • A semiconductor device manufacture method has the steps of: (a) forming a semiconductor device structure in a chip and alignment marks, respectively in a semiconductor wafer; (b) forming a workpiece layer above the semiconductor wafer; (c) exposing the alignment marks; (d) coating an electron beam resist film on the workpiece layer; (e) scanning the alignment marks with an electron beam to obtain plural position information on the alignment marks and obtaining differences between the plural position information; (f) removing abnormal values of position information in accordance with the difference between the plural position information; and (g) performing an electron beam exposure in accordance with plural position information of the alignment marks with the abnormal value being removed. An alignment mark detection precision can be improved in electron beam exposure.
    • 半导体器件制造方法具有以下步骤:(a)分别在半导体晶片中形成芯片中的半导体器件结构和对准标记; (b)在半导体晶片上形成工件层; (c)露出对准标记; (d)在工件层上涂覆电子束抗蚀剂膜; (e)用电子束扫描对准标记,以获得对准标记的多个位置信息,并获得多个位置信息之间的差异; (f)根据多个位置信息之间的差异去除位置信息的异常值; 和(g)根据所述对准标记的多个位置信息进行电子束曝光,异常值被去除。 可以改善电子束曝光中的对准标记检测精度。
    • 9. 发明申请
    • CAMERA AND IMAGE PROCESSOR
    • 相机和图像处理器
    • US20090128632A1
    • 2009-05-21
    • US12273060
    • 2008-11-18
    • Takeyuki GotoTakashi MaruyamaMakoto Kikuchi
    • Takeyuki GotoTakashi MaruyamaMakoto Kikuchi
    • H04N5/225
    • G01S3/7864G08B13/19686
    • A video signal produced through a shooting operation of a camera is sent to a motion detecting unit which detects a motion included in the video signal to set an area of the motion as a space motion area and inputs information of the area to a distance determination circuit which calculates distance between the motion area and the camera by use of a parallax signal produced from stereo cameras disposed in the camera to send information of the space motion area and the distance to a mask determination circuit. The mask determination circuit conducts a comparison between the space motion area information and the space mask area information and between the distance information of the motion area and that of the space mask area, and resultantly compares three-dimensional positions between the detected motion and the mask to determine a position relationship therebetween.
    • 通过照相机的拍摄操作产生的视频信号被发送到运动检测单元,该运动检测单元检测包括在视频信号中的运动,以将运动的区域设置为空间运动区域,并将该区域的信息输入到距离确定电路 其通过使用设置在摄像机中的立体摄像机产生的视差信号来计算运动区域和摄像机之间的距离,以发送空间运动区域的信息和到掩模确定电路的距离。 掩模确定电路进行空间运动区域信息和空间掩模区域信息之间以及运动区域的距离信息与空间掩模区域的距离信息之间的比较,并且结果将比较检测到的运动与掩模之间的三维位置 以确定它们之间的位置关系。