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1. 发明申请

WO2012018674A2 OPTICS SYMMETRIZATION FOR METROLOGY 审中-公开
标题翻译：计量学的光学对称
公开(公告)号：WO2012018674A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/045784
申请日：2011-07-28
申请人： KLA-TENCOR CORPORATION , MANASSEN, Ammon , KANDEL, Daniel , BARUCH, Moshe , SELIGSON, Joel , SVIZHER, Alexander , COHEN, Guy , ROTEM, Efraim , BACHAR, Ohad , NEGRI, Daria , SAPIENS, Noam
发明人： MANASSEN, Ammon , KANDEL, Daniel , BARUCH, Moshe , SELIGSON, Joel , SVIZHER, Alexander , COHEN, Guy , ROTEM, Efraim , BACHAR, Ohad , NEGRI, Daria , SAPIENS, Noam
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G01N21/55 , G03F7/70616
摘要： The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
摘要翻译：本发明包括照明源，至少一个照明对称化模块（ISM），其被配置为使从照明源发出的光的至少一部分对称化;第一分束器，其被配置为将第一部分由ISM沿着物体路径沿着参考路径沿着物体路径被ISM处理到一个或多个样本的表面以及由ISM处理的第二部分光;以及沿着主光轴布置的检测器，其中检测器被配置为收集从一个或多个样本的表面反射的一部分光。

2. 发明申请

WO2011159725A2 DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
标题翻译：离散极化分析
公开(公告)号：WO2011159725A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040389
申请日：2011-06-14
申请人： KLA-TENCOR CORPORATION , HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
发明人： HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided.
摘要翻译：提供了离散极化散射法的系统和方法。

3. 发明申请

WO2011028807A2 METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：计量系统和方法
公开(公告)号：WO2011028807A2
公开(公告)日：2011-03-10
申请号：PCT/US2010/047539
申请日：2010-09-01
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
IPC分类号： H01L21/66
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：
提供了各种计量系统和方法。

4. 发明申请

WO2019045780A1 QUICK ADJUSTMENT OF METROLOGY MEASUREMENT PARAMETERS ACCORDING TO PROCESS VARIATION 审中-公开
公开(公告)号：WO2019045780A1
公开(公告)日：2019-03-07
申请号：PCT/US2018/026157
申请日：2018-04-05
申请人： KLA-TENCOR CORPORATION
发明人： PELED, Einat , AMIT, Eran , SVIZHER, Alexander , LAMHOT, Yuval , SELLA, Noga , CHENG, Wei-Te Aaron
IPC分类号： H01L21/66
摘要： Methods applicable in metrology modules and tools are provided, which enable adjusting metrology measurement parameters with respect to process variation, without re-initiating metrology recipe setup. Methods comprise, during an initial metrology recipe setup, recording a metrology process window and deriving baseline information therefrom, and during operation, quantifying the process variation with respect to the baseline information, and adjusting the metrology measurement parameters within the metrology process window with respect to the quantified process variation. The quick adjustment of metrology parameters avoids metrology-related process delays and releases prior art bottlenecks related thereto. Models of effects of various process variation factors on the metrology measurements may be used to enhance the derivation of required metrology tuning and enable their application with minimal delays to the production process.

5. 发明申请

WO2018081147A1 FAULT DISCRIMINATION AND CALIBRATION OF SCATTEROMETRY OVERLAY TARGETS 审中-公开
标题翻译：错位测量覆盖目标的故障辨别与校准
公开(公告)号：WO2018081147A1
公开(公告)日：2018-05-03
申请号：PCT/US2017/058118
申请日：2017-10-24
申请人： KLA-TENCOR CORPORATION
发明人： GRUNZWEIG, Tzahi , PIO, Jordan , SVIZHER, Alexander
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70633 , G03F7/70683
摘要： Scatterometry overlay targets and measurement methods are provided, which are configured to detect and eliminate process-related errors and illumination-related errors from overlay measurements of the targets. Targets comprise at least three cells associated with a measurement direction, wherein at least two of the cells comprise periodic structures at different target layers, having a same pitch and opposite offsets between the two cells, and at least an additional cell comprises a periodic structure with the same pitch at only one of the target layers. The additional cell(s) are used to detect irregularities in the respective periodic structure(s), enable estimation of process quality, provide reference images, enhance metrology simulations and provide mitigation of errors in critical process steps. Measurement methods incorporate scatterometry measurements ion the additional cell(s) for these purposes.
摘要翻译：提供了散射测量叠加目标和测量方法，它们被配置为检测并消除来自目标的重叠测量的与过程有关的误差和与照明相关的误差。目标包括与测量方向相关联的至少三个单元，其中至少两个单元包括不同目标层处的周期性结构，两个单元之间具有相同的间距和相反的偏移，并且至少另外的单元包括具有只有一个目标层的音高相同。附加单元用于检测相应周期性结构中的不规则性，实现过程质量评估，提供参考图像，增强计量模拟并减少关键工艺步骤中的错误。为了这些目的，测量方法结合了散射测量法来测量额外的细胞。

6. 发明申请

WO2014130829A1 SYSTEMS FOR PROVIDING ILLUMINATION IN OPTICAL METROLOGY 审中-公开
标题翻译：用于在光学计量学中提供照明的系统
公开(公告)号：WO2014130829A1
公开(公告)日：2014-08-28
申请号：PCT/US2014/017723
申请日：2014-02-21
申请人： KLA-TENCOR CORPORATION
发明人： BRADY, Gregory , SHCHEGROV, Andrei V. , ROTTER, Lawrence D. , SHAUGHNESSY, Derrick , SHCEMELININ, Anatoly , BEZEL, Ilya , ARAIN, Muzammil , VASILIEV, Anatoly , ALLEN, James , SHULEPOV, Oleg , HILL, Andrew , BACHAR, Ohad , MARKOWITZ, Moshe , ISH-SHALOM, Yaron , SELA, Ilan , MANASSEN, Amnon , SVIZHER, Alexander , KHOKHLOV, Maxim , ABRAMOV, Avi , TSIBULEVSKY, Oleg , KANDEL, Daniel , GHINOVKER, Mark
IPC分类号： H01L21/66
CPC分类号： G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
摘要： The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
摘要翻译：本公开涉及用于向用于光学测量的测量头提供照明的系统。在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。

7. 发明申请

WO2019139685A1 METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES 审中-公开
公开(公告)号：WO2019139685A1
公开(公告)日：2019-07-18
申请号：PCT/US2018/062931
申请日：2018-11-29
申请人： KLA-TENCOR CORPORATION
发明人： YOEL, Feler , GHINOVKER, Mark , SVIZHER, Alexander , LEVINSKI, Vladimir , TARSHISH-SHAPIR, Inna
IPC分类号： G03F7/20
摘要： Metrology targets, design methods and measurement methods thereof are provided with periodic structure(s) which are oblique with respect to orthogonal production axes X and Y of the lithography tool - enabling more accurate overlay measurements of devices having diagonal (oblique, tilted) elements such as DRAM devices. One or more oblique periodic structure(s) may be used to provide one- or two-dimensional signals, with respect to one or more layers, possibly providing overlay measurements for multiple steps applied to one layer. The oblique periodic structure(s) may be used to modify current metrology target designs (e.g., imaging targets and/or scatterometry targets) or to design new targets, and measurement algorithms may be adjusted respectively to derive signals from the oblique periodic structure(s) and/or to provide pre-processed images thereof. The disclosed targets are process compatible and reflect more accurately the device overlays with respect to various process steps.

8. 发明申请

WO2015200315A1 ROTATED BOUNDARIES OF STOPS AND TARGETS 审中-公开
标题翻译：倾斜的边界和目标边界
公开(公告)号：WO2015200315A1
公开(公告)日：2015-12-30
申请号：PCT/US2015/037167
申请日：2015-06-23
申请人： KLA-TENCOR CORPORATION
发明人： GRUNZWEIG, Tzahi , SVIZHER, Alexander
IPC分类号： H01L21/66
CPC分类号： G01N21/4785 , G01N21/4788 , G01N21/956 , G03F7/70633 , G03F7/70683 , G06F17/5068
摘要： Scatterometry metrology systems, targets and methods are provided, which reduce or remove edge diffractions from target diffraction signals. Boundaries of field stops and/or of targets may be designed to be slanted with respect to the measurement directions, to cause edge diffraction to propagate obliquely and thus reduce or remove its effects on the measured target diffraction signals.
摘要翻译：提供散射测量计量系统，目标和方法，其减少或消除来自目标衍射信号的边缘衍射。场停止点和/或目标的边界可以被设计为相对于测量方向倾斜，以使边缘衍射倾斜地传播，从而减少或消除其对测量的目标衍射信号的影响。

9. 发明申请

WO2014062972A1 SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY 审中-公开
标题翻译： SCATTERMETRY OVERLAY METROLOGY中的对称目标设计
公开(公告)号：WO2014062972A1
公开(公告)日：2014-04-24
申请号：PCT/US2013/065527
申请日：2013-10-17
申请人： KLA-TENCOR CORPORATION
发明人： BRINGOLTZ, Barak , KANDEL, Daniel , FELER, Yoel , SAPIENS, Noam , IRINA, Paykin , SVIZHER, Alexander , ALONI, Meir , BEN DOV, Guy , SHALMONI, Hadar , LEVINSKI, Vladimir
IPC分类号： G01N21/47 , G01B9/02 , H01L21/66
CPC分类号： G01N21/01 , G01B11/272 , G01N21/4788 , G01N21/9501 , G01N21/956 , G01N2201/068 , G02B27/4255 , G02B27/4272 , G03F7/70633 , G03F7/70683
摘要： Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
摘要翻译：提供了计量方法，系统和目标，实现了并行范例。使用具有周期性结构的相邻小区来提取覆盖误差，例如通过引入可控相移或图像偏移，这使得能够进行覆盖的算法计算。周期性结构被设计为展现旋转对称性以支持计算并减少误差。

10. 发明授权

EP2959503B1 SYSTEMS FOR PROVIDING ILLUMINATION IN OPTICAL METROLOGY 有权
公开(公告)号：EP2959503B1
公开(公告)日：2018-05-30
申请号：EP14753960.5
申请日：2014-02-21
申请人： Kla-Tencor Corporation
发明人： BRADY, Gregory , SHCHEGROV, Andrei V. , ROTTER, Lawrence D. , SHAUGHNESSY, Derrick , SHCEMELININ, Anatoly , BEZEL, Ilya , ARAIN, Muzammil , VASILIEV, Anatoly , ALLEN, James , SHULEPOV, Oleg , HILL, Andrew , BACHAR, Ohad , MARKOWITZ, Moshe , ISH-SHALOM, Yaron , SELA, Ilan , MANASSEN, Amnon , SVIZHER, Alexander , KHOKHLOV, Maxim , ABRAMOV, Avi , TSIBULEVSKY, Oleg , KANDEL, Daniel , GHINOVKER, Mark
IPC分类号： G01J3/10 , G01J3/12 , H01J65/04 , G01J3/02 , G02B6/35 , F21V13/00 , F21V13/08 , F21V13/12 , G02B6/293
CPC分类号： G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
摘要： The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

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