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1. 发明申请

WO2014100023A1 TWO DIMENSIONAL OPTICAL DETECTOR WITH MULTIPLE SHIFT REGISTERS 审中-公开
标题翻译：具有多个移位寄存器的二维光学检测器
公开(公告)号：WO2014100023A1
公开(公告)日：2014-06-26
申请号：PCT/US2013/075836
申请日：2013-12-17
申请人： KLA-TENCOR CORPORATION
发明人： FLOCK, Klaus
IPC分类号： H01L21/66
CPC分类号： G01N21/9501
摘要： Methods and systems for enhancing the throughput of a metrology system generating measurement signals based on at least two different optical properties of the illumination light are presented. A detector having a two dimensional photosensitive area is subdivided into multiple photosensitive stripes by multiple, independent linear arrays of shift register elements located within the photosensitive area. Charge transfer from pixels within each stripe is directed to a distinct linear array of shift register elements. Each photosensitive stripe is able to resolve an optical property dispersed across the length of each stripe with relatively high resolution. In addition, the detector is able to resolve another optical property dispersed across several photosensitive stripes in a direction orthogonal to each linear array of shift registers at a relatively low resolution.
摘要翻译：提出了用于增强基于照明光的至少两种不同光学特性产生测量信号的度量系统的吞吐量的方法和系统。具有二维感光区域的检测器被位于感光区域内的移位寄存器元件的多个独立的线性阵列细分为多个光敏条纹。每个条带内的像素的电荷转移被引导到移位寄存器元件的不同线性阵列。每个光敏条纹能够以相对较高的分辨率来分辨分散在每个条带的长度上的光学特性。此外，检测器能够以相对低的分辨率解析在与移位寄存器的每个线性阵列正交的方向上分散在若干光敏条纹上的另一光学性质。

2. 发明申请

WO2015027200A1 BROADBAND AND WIDE FIELD ANGLE COMPENSATOR 审中-公开
标题翻译：宽带和宽场角度补偿器
公开(公告)号：WO2015027200A1
公开(公告)日：2015-02-26
申请号：PCT/US2014/052373
申请日：2014-08-22
申请人： KLA-TENCOR CORPORATION
发明人： ROTTER, Lawrence , FLOCK, Klaus , ARAIN, Muzammil , WANG, David Y.
IPC分类号： H01L21/66
CPC分类号： G01N21/23 , G01N21/211 , G01N21/9501 , G01N2021/213 , G01N2201/068 , G02B5/3083 , G02B5/3091 , G02F1/13363
摘要： A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.
摘要翻译：提供了一种可旋转补偿器，其被配置为在宽范围的波长（包括紫外线）上传输非准直光，并且在整个孔径上具有高程度的延迟均匀性。在一个实施例中，可旋转补偿器包括光学接触的四个单独板的堆叠。堆叠中间的两个薄板由双折射材料制成并且被布置成形成复合物，零级双板。剩余的两个板相对较厚并且由光学各向同性材料制成。这些板设置在化合物的任一端，为零级双板。低阶平板将通过光圈的延迟的灵敏度最小化为非准直光。选择材料以确保紫外线的透射。光学各向同性的端板最小化在薄板的光学界面处引起的相干效应。

3. 发明授权

EP3047520B1 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
公开(公告)号：EP3047520B1
公开(公告)日：2019-11-06
申请号：EP14843577.9
申请日：2014-09-15
申请人： Kla-Tencor Corporation
发明人： WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
IPC分类号： H01L21/66 , G01N21/88 , G01N21/95 , G01B11/00 , G01N21/21 , G01B11/06

4. 发明申请

WO2015039031A1 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：多个角度的半导体计量系统和方法
公开(公告)号：WO2015039031A1
公开(公告)日：2015-03-19
申请号：PCT/US2014/055666
申请日：2014-09-15
申请人： KLA-TENCOR CORPORATION
发明人： WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
IPC分类号： H01L21/66
CPC分类号： G01N21/211 , G01B11/0641 , G01N21/8806 , G01N21/9501 , H01L22/12
摘要： An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
摘要翻译：一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合（AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v）控制器，用于基于输出信号或图像来表征样本的特征。

5. 发明申请

WO2013138297A1 CALIBRATION OF AN OPTICAL METROLOGY SYSTEM FOR CRITICAL DIMENSION APPLICATION MATCHING 审中-公开
标题翻译：用于关键尺寸应用匹配的光学计量系统的校准
公开(公告)号：WO2013138297A1
公开(公告)日：2013-09-19
申请号：PCT/US2013/030427
申请日：2013-03-12
申请人： KLA-TENCOR CORPORATION
发明人： FLOCK, Klaus , ROTTER, Lawrence , ARAIN, Muzammil
IPC分类号： G01B11/02
CPC分类号： G05B23/00 , G03F7/70625
摘要： Methods and systems for matching critical dimension measurement applications at high precision across multiple optical metrology systems are presented. In one aspect, machine parameter values of a metrology system are calibrated based on critical dimension measurement data. In one further aspect, calibration of the machine parameter values is based on critical dimension measurement data collected by a target measurement system from a specimen with assigned critical dimension parameter values obtained from a reference measurement source. In another further aspect, the calibration of the machine parameter values of a target measurement system is based on measurement data without knowledge of critical dimension parameter values. In some examples, the measurement data includes critical dimension measurement data and thin film measurement data. Calibration of machine parameter values based on critical dimension data enhances application and tool-to-tool matching among systems for measurement of critical dimensions, film thickness, film composition, and overlay.
摘要翻译：介绍了在多个光学测量系统中以高精度匹配关键尺寸测量应用的方法和系统。在一个方面，测量系统的机器参数值基于关键尺寸测量数据进行校准。在另一方面，机器参数值的校准基于由目标测量系统从具有从参考测量源获得的分配的临界尺寸参数值的样本收集的临界尺寸测量数据。在另一方面，目标测量系统的机器参数值的校准基于测量数据，而不知道关键尺寸参数值。在一些示例中，测量数据包括临界尺寸测量数据和薄膜测量数据。基于关键尺寸数据校准机器参数值可增强用于测量关键尺寸，膜厚度，膜成分和覆盖层的系统之间的应用和工具对刀具匹配。

6. 发明申请

WO2013066899A1 LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM 审中-公开
标题翻译：光学系统系统中的光源跟踪
公开(公告)号：WO2013066899A1
公开(公告)日：2013-05-10
申请号：PCT/US2012/062624
申请日：2012-10-30
申请人： KLA-TENCOR CORPORATION
发明人： ZHUANG, Guorong Vera , KRISHNAN, Shankar , DE VEER, Johannes D. , FLOCK, Klaus , WANG, David Y. , ROTTER, Lawrence D.
IPC分类号： G01N21/01 , G01N21/88
CPC分类号： G01J3/0264 , G01B2210/56 , G01J3/0208 , G01J3/0278 , G01J3/06 , G01J3/10 , G01N21/4785
摘要： The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.
摘要翻译：本发明可以包括将诊断样本加载到样本台上，将来自设置在多轴平台上的照明源的光聚焦到诊断样本上，利用检测器收集从诊断样品的表面反射的一部分光，其中照明源和检测器通过光学系统光学直接耦合，获取指示来自诊断样本的照明源位置漂移的一组诊断参数，通过比较所获取的诊断参数集合来确定照明源位置漂移的大小到在先前测量的对准条件下从诊断样本获得的初始参数集合，确定照明源位置漂移的方向; 以及提供照明源位置调整参数，其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

7. 发明公开

EP3624174A2 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
公开(公告)号：EP3624174A2
公开(公告)日：2020-03-18
申请号：EP19207085.2
申请日：2014-09-15
申请人： Kla-Tencor Corporation
发明人： WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
IPC分类号： H01L21/66 , G01N21/88 , G01N21/95 , G01B11/00 , G01N21/21 , G01B11/06
摘要： An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

8. 发明公开

EP3971950A1 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 审中-实审
公开(公告)号：EP3971950A1
公开(公告)日：2022-03-23
申请号：EP21199265.6
申请日：2014-09-15
申请人： Kla-Tencor Corporation
发明人： WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
IPC分类号： H01L21/66 , G01N21/88 , G01N21/95 , G01B11/00 , G01N21/21 , G01B11/06
摘要： An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

9. 发明公开

EP3624174A3 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
公开(公告)号：EP3624174A3
公开(公告)日：2020-06-03
申请号：EP19207085.2
申请日：2014-09-15
申请人： Kla-Tencor Corporation
发明人： WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
IPC分类号： H01L21/66 , G01N21/88 , G01N21/95 , G01B11/00 , G01N21/21 , G01B11/06
摘要： An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

10. 发明公开

EP3047520A1 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
标题翻译：麻疯病基因食品
公开(公告)号：EP3047520A1
公开(公告)日：2016-07-27
申请号：EP14843577.9
申请日：2014-09-15
申请人： Kla-Tencor Corporation
发明人： WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
IPC分类号： H01L21/66
摘要： An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
摘要翻译：一种装置包括（i）用于提供在从深紫外线波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合（AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和来自基于输出光束产生输出信号或图像的检测器的偏振态引导来自样品的输出光束，以及（v）控制器，用于基于输出信号或图像来表征样本的特征。

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