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1. 发明申请

WO2016133765A1 OPTICAL METROLOGY WITH REDUCED FOCUS ERROR SENSITIVITY 审中-公开
标题翻译：具有减少聚焦误差灵敏度的光学计量学
公开(公告)号：WO2016133765A1
公开(公告)日：2016-08-25
申请号：PCT/US2016/017399
申请日：2016-02-10
申请人： KLA-TENCOR CORPORATION
发明人： KRISHNAN, Shankar , ZHUANG, Guorong Vera , WANG, David Y. , LIU, Xuefeng
IPC分类号： H01L21/66
CPC分类号： G01N21/255 , G01J3/0205 , G01J3/0208 , G01J3/18 , G01J3/2803 , G01J3/42 , G01J2003/425 , G01N21/211 , G01N21/55 , G01N21/9501 , G01N2021/213 , G01N2201/06113 , G01N2201/068
摘要： Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to focus errors are presented herein. Significant reductions in sensitivity to focus position error are achieved by imaging the measurement spot onto the detector such that the direction aligned with the plane of incidence on the wafer surface is oriented perpendicular to the direction of wavelength dispersion on the detector surface. This reduction in focus error sensitivity enables reduced focus accuracy and repeatability requirements, faster focus times, and reduced sensitivity to wavelength errors without compromising measurement accuracy. In a further aspect, the dimension of illumination field projected on the wafer plane in the direction perpendicular to the plane of incidence is adjusted to optimize the resulting measurement accuracy and speed based on the nature of target under measurement.
摘要翻译：本文介绍了对聚焦误差灵敏度降低的宽带光谱测量方法和系统。通过将测量点成像到检测器上来实现对聚焦位置误差的敏感性的显着降低，使得与晶片表面上的入射平面对准的方向定向为垂直于检测器表面上的波长色散的方向。聚焦误差灵敏度的降低可以降低焦点精度和重复性要求，更快的聚焦时间，降低对波长误差的灵敏度，而不会影响测量精度。在另一方面，调整在垂直于入射平面的方向上投射在晶片平面上的照明场的尺寸，以根据测量目标的性质优化所得到的测量精度和速度。

2. 发明申请

WO2015039031A1 MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：多个角度的半导体计量系统和方法
公开(公告)号：WO2015039031A1
公开(公告)日：2015-03-19
申请号：PCT/US2014/055666
申请日：2014-09-15
申请人： KLA-TENCOR CORPORATION
发明人： WANG, David Y. , FLOCK, Klaus , ROTTER, Lawrence D. , KRISHNAN, Shankar , DE VEER, Johannes D. , FILIP, Catalin , BRADY, Gregory , ARAIN, Muzammil , SHCHEGROV, Andrei
IPC分类号： H01L21/66
CPC分类号： G01N21/211 , G01B11/0641 , G01N21/8806 , G01N21/9501 , H01L22/12
摘要： An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
摘要翻译：一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合（AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v）控制器，用于基于输出信号或图像来表征样本的特征。

3. 发明申请

WO2013066899A1 LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM 审中-公开
标题翻译：光学系统系统中的光源跟踪
公开(公告)号：WO2013066899A1
公开(公告)日：2013-05-10
申请号：PCT/US2012/062624
申请日：2012-10-30
申请人： KLA-TENCOR CORPORATION
发明人： ZHUANG, Guorong Vera , KRISHNAN, Shankar , DE VEER, Johannes D. , FLOCK, Klaus , WANG, David Y. , ROTTER, Lawrence D.
IPC分类号： G01N21/01 , G01N21/88
CPC分类号： G01J3/0264 , G01B2210/56 , G01J3/0208 , G01J3/0278 , G01J3/06 , G01J3/10 , G01N21/4785
摘要： The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.
摘要翻译：本发明可以包括将诊断样本加载到样本台上，将来自设置在多轴平台上的照明源的光聚焦到诊断样本上，利用检测器收集从诊断样品的表面反射的一部分光，其中照明源和检测器通过光学系统光学直接耦合，获取指示来自诊断样本的照明源位置漂移的一组诊断参数，通过比较所获取的诊断参数集合来确定照明源位置漂移的大小到在先前测量的对准条件下从诊断样本获得的初始参数集合，确定照明源位置漂移的方向; 以及提供照明源位置调整参数，其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

4. 发明申请

WO2018064227A1 INFRARED SPECTROSCOPIC REFLECTOMETER FOR MEASUREMENT OF HIGH ASPECT RATIO STRUCTURES 审中-公开
标题翻译：用于测量高高比结构的红外光谱反射仪
公开(公告)号：WO2018064227A1
公开(公告)日：2018-04-05
申请号：PCT/US2017/053825
申请日：2017-09-27
申请人： KLA-TENCOR CORPORATION
发明人： KRISHNAN, Shankar , WANG, David Y.
IPC分类号： G01B9/02 , G01B11/02
摘要： Methods and systems for performing spectroscopic reflectometry measurements of semiconductor structures at infrared wavelengths are presented herein. In some embodiments measurement wavelengths spanning a range from 750 nanometers to 2,600 nanometers, or greater, are employed. In one aspect, reflectometry measurements are performed at oblique angles to reduce the influence of backside reflections on measurement results. In another aspect, a broad range of infrared wavelengths are detected by a detector that includes multiple photosensitive areas having different sensitivity characteristics. Collected light is linearly dispersed across the surface of the detector according to wavelength. Each different photosensitive area is arranged on the detector to sense a different range of incident wavelengths. In this manner, a broad range of wavelengths are detected with high signal to noise ratio by a single detector.
摘要翻译：本文给出了用于执行红外波长下的半导体结构的光谱反射测量的方法和系统。在一些实施例中，采用跨越750纳米至2600纳米或更大范围的测量波长。在一个方面，反射测量测量以斜角执行以减少背面反射对测量结果的影响。另一方面，由包括具有不同灵敏度特性的多个光敏区域的检测器检测宽范围的红外波长。收集到的光根据波长线性分散在检测器表面上。每个不同的光敏区域被布置在检测器上以感测不同范围的入射波长。以这种方式，通过单个检测器以高信噪比检测宽范围的波长。

5. 发明申请

WO2011159725A2 DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
标题翻译：离散极化分析
公开(公告)号：WO2011159725A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040389
申请日：2011-06-14
申请人： KLA-TENCOR CORPORATION , HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
发明人： HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided.
摘要翻译：提供了离散极化散射法的系统和方法。

6. 发明申请

WO2017214314A1 SIMULTANEOUS MULTI-ANGLE SPECTROSCOPY 审中-公开
标题翻译：同时进行多角度光谱分析
公开(公告)号：WO2017214314A1
公开(公告)日：2017-12-14
申请号：PCT/US2017/036417
申请日：2017-06-07
申请人： KLA-TENCOR CORPORATION
发明人： KRISHNAN, Shankar , BUETTNER, Alexander , PURRUCKER, Kerstin , WANG, David Y.
IPC分类号： H01L21/66 , H01L21/67
摘要： Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures over a broad range of angles of incidence (AOI), azimuth angles, or both, are presented herein. Spectra including two or more sub-ranges of angles of incidence, azimuth angles, or both, are simultaneously measured over different sensor areas at high throughput. Collected light is linearly dispersed across different photosensitive areas of one or more detectors according to wavelength for each subrange of AOIs, azimuth angles, or both. Each different photosensitive area is arranged on the one or more detectors to perform a separate spectroscopic measureement for each different range of AOIs, azimuth angles, or both. In this manner, a broad range of AOIs, azimuth angles, or both, are detected with high signal to noise ratio, simultaneously. This approach enables high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.
摘要翻译：本文给出了用于在宽范围的入射角（AOI），方位角或两者上执行半导体结构的同时光谱测量的方法和系统。包括入射角，方位角或两者的两个或更多个子范围的光谱在高吞吐量下在不同传感器区域上同时测量。根据AOI的每个子范围，方位角或两者的波长，收集的光线线性分散在一个或多个检测器的不同光敏区域上。每个不同的光敏区域被布置在一个或多个检测器上以针对AOI的每个不同范围，方位角或两者执行单独的光谱测量。以这种方式，同时检测具有高信噪比的宽范围的AOI，方位角或两者。这种方法可实现高吞吐量，高吞吐量，高精度和高准确度的高宽比结构测量。

7. 发明申请

WO2017123467A1 SYSTEMS AND METHODS FOR EXTENDED INFRARED SPECTROSCOPIC ELLIPSOMETRY 审中-公开
标题翻译：扩展的红外光谱椭圆测量系统和方法
公开(公告)号：WO2017123467A1
公开(公告)日：2017-07-20
申请号：PCT/US2017/012502
申请日：2017-01-06
申请人： KLA-TENCOR CORPORATION
发明人： KRISHNAN, Shankar , WANG, David Y.
IPC分类号： H01L21/66 , G03F7/20
CPC分类号： G01N21/3563 , G01J3/0224 , G01J3/18 , G01J3/2803 , G01J3/36 , G01J3/427 , G01J2003/4275 , G01N21/211 , G01N21/31 , G01N21/9501 , G01N2021/213 , G01N2021/3568
摘要： Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures at ultraviolet, visible, and infrared wavelengths are presented herein. In another aspect, wavelength errors are reduced by orienting the direction of wavelength dispersion on the detector surface perpendicular to the projection of the plane of incidence onto the detector surface. In another aspect, a broad range of infrared wavelengths are detected by a detector that includes multiple photosensitive areas having different sensitivity characteristics. Collected light is linearly dispersed across the surface of the detector according to wavelength. Each different photosensitive area is arranged on the detector to sense a different range of incident wavelengths. In this manner, a broad range of infrared wavelengths are detected with high signal to noise ratio by a single detector. These features enable high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.
摘要翻译：本文给出了用于在紫外，可见和红外波长下执行半导体结构的同时光谱测量的方法和系统。另一方面，通过将检测器表面上的波长色散的方向垂直于入射平面的投影定向到检测器表面上来减小波长误差。另一方面，由包括具有不同灵敏度特性的多个光敏区域的检测器检测宽范围的红外波长。收集到的光根据波长线性分散在检测器表面上。每个不同的光敏区域被布置在检测器上以感测不同范围的入射波长。以这种方式，通过单个检测器以高信噪比检测宽范围的红外波长。这些功能可实现高吞吐量，高吞吐量，高精度和高精度的高宽比结构测量。

8. 发明申请

WO2015027200A1 BROADBAND AND WIDE FIELD ANGLE COMPENSATOR 审中-公开
标题翻译：宽带和宽场角度补偿器
公开(公告)号：WO2015027200A1
公开(公告)日：2015-02-26
申请号：PCT/US2014/052373
申请日：2014-08-22
申请人： KLA-TENCOR CORPORATION
发明人： ROTTER, Lawrence , FLOCK, Klaus , ARAIN, Muzammil , WANG, David Y.
IPC分类号： H01L21/66
CPC分类号： G01N21/23 , G01N21/211 , G01N21/9501 , G01N2021/213 , G01N2201/068 , G02B5/3083 , G02B5/3091 , G02F1/13363
摘要： A rotatable compensator configured to transmit non-collimated light over a broad range of wavelengths, including ultraviolet, with a high degree of retardation uniformity across the aperture is presented. In one embodiment, a rotatable compensator includes a stack of four individual plates in optical contact. The two thin plates in the middle of the stack are made from a birefringent material and are arranged to form a compound, zeroth order bi-plate. The remaining two plates are relatively thick and are made from an optically isotropic material. These plates are disposed on either end of the compound, zeroth order bi-plate. The low order plates minimize the sensitivity of retardation across the aperture to non-collimated light. Materials are selected to ensure transmission of ultraviolet light. The optically isotropic end plates minimize coherence effects induced at the optical interfaces of the thin plates.
摘要翻译：提供了一种可旋转补偿器，其被配置为在宽范围的波长（包括紫外线）上传输非准直光，并且在整个孔径上具有高程度的延迟均匀性。在一个实施例中，可旋转补偿器包括光学接触的四个单独板的堆叠。堆叠中间的两个薄板由双折射材料制成并且被布置成形成复合物，零级双板。剩余的两个板相对较厚并且由光学各向同性材料制成。这些板设置在化合物的任一端，为零级双板。低阶平板将通过光圈的延迟的灵敏度最小化为非准直光。选择材料以确保紫外线的透射。光学各向同性的端板最小化在薄板的光学界面处引起的相干效应。

9. 发明申请

WO2011008478A3 SYSTEM AND METHOD FOR PERFORMING PHOTOTHERMAL MEASUREMENTS AND RELAXATION COMPENSATION 审中-公开
公开(公告)号：WO2011008478A3
公开(公告)日：2011-01-20
申请号：PCT/US2010/040063
申请日：2010-06-25
申请人： KLA-TENCOR CORPORATION , ROTTER, Lawrence D. , WANG, David Y. , SHAUGHNESSY, Derrick , SENKO, Mark
发明人： ROTTER, Lawrence D. , WANG, David Y. , SHAUGHNESSY, Derrick , SENKO, Mark
IPC分类号： G01N25/72 , G01N21/63 , H01L21/66
摘要： A device and methods for performing a photothermal measurement and relaxation compensation of a sample are disclosed. The device may include a probe beam source, a pump beam source, a sample, and a detector array. A method may include adjusting an intensity modulated pump beam power, adjusting a probe beam power to increase a response measurement location temperature and increase a modulated optical reflectance signal, directing the intensity modulated pump beam and the probe beam along a measurement path to a response measurement location on a sample for periodically exciting a region on the sample, detecting a reflected portion of the probe beam, and calculating an implantation dose.

10. 发明申请

WO2018152382A1 METHODS AND SYSTEMS FOR MEASUREMENT OF THICK FILMS AND HIGH ASPECT RATIO STRUCTURES 审中-公开
公开(公告)号：WO2018152382A1
公开(公告)日：2018-08-23
申请号：PCT/US2018/018457
申请日：2018-02-16
申请人： KLA-TENCOR CORPORATION
发明人： SAPIENS, Noam , KRISHNAN, Shankar , WANG, David Y. , BUETTNER, Alexander , PURRUCKER, Kerstin , PETERLINZ, Kevin A.
IPC分类号： H01L21/66 , H01L21/67
摘要： Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein. A spectroscopic measurement system includes a combined illumination source including a first illumination source that generates ultraviolet, visible, and near infrared wavelengths (wavelengths less than two micrometers) and a second illumination source that generates mid infrared and long infrared wavelengths (wavelengths of two micrometers and greater). Furthermore, the spectroscopic measurement system includes one or more measurement channels spanning the range of illumination wavelengths employed to perform measurements of semiconductor structures. In some embodiments, the one or more measurement channels simultaneously measure the sample throughout the wavelength range. In some other embodiments, the one or more measurement channels sequentially measure the sample throughout the wavelength range.

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