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1. 发明申请

WO2014074868A1 METHOD AND SYSTEM FOR PROVIDING A TARGET DESIGN DISPLAYING HIGH SENSITIVITY TO SCANNER FOCUS CHANGE 审中-公开
标题翻译：提供目标设计的方法和系统，显示对扫描仪聚焦变化的高灵敏度
公开(公告)号：WO2014074868A1
公开(公告)日：2014-05-15
申请号：PCT/US2013/069224
申请日：2013-11-08
申请人： KLA-TENCOR CORPORATION
发明人： LEVINSKI, Vladimir , FELER, Yoel , KANDEL, Daniel
IPC分类号： H01L21/027
CPC分类号： G03F1/38 , G01B11/14 , G03F1/70 , G03F7/70641 , G03F7/70683
摘要： A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the unresolvable segmentation pitch along the first direction is smaller than the illumination of the lithography printing tool, wherein the plurality of cell structures have a pitch along a second direction perpendicular to the first direction, wherein the unresolvable segmentation pitch is suitable for generating a printed pattern for shifting the best focus position of the lithography tool by a selected amount to achieve a selected level of focus sensitivity.
摘要翻译：分割的掩模包括一组单元结构，其中每个单元结构包括沿着第一方向具有不可解析的分割间距的一组特征，其中沿着第一方向的不可解析的分割间距小于光刻印刷工具的照明，其中所述多个单元结构具有沿着垂直于所述第一方向的第二方向的间距，其中所述不可分辨的分割间距适于产生用于将所述光刻工具的最佳聚焦位置移动所选量的印刷图案，以实现所选择的等级聚焦灵敏度。

2. 发明申请

WO2014004555A1 NEAR FIELD METROLOGY 审中-公开
标题翻译：近场计量学
公开(公告)号：WO2014004555A1
公开(公告)日：2014-01-03
申请号：PCT/US2013/047682
申请日：2013-06-25
申请人： KLA-TENCOR CORPORATION
发明人： SAPIENS, Noam , SELIGSON, Joel , LEVINSKI, Vladimir , KANDEL, Daniel , FELER, Yoel , BRINGOLTZ, Barak , MANASSEN, Amnon , BENISTY, Eliav
IPC分类号： H01L21/66
CPC分类号： G01N21/4788 , G01N2201/06113 , G02B27/56 , G02B27/58
摘要： Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed, the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
摘要翻译：本文提供的计量系统和方法包括位于系统的物镜和目标之间的光学元件。光学元件布置成增强目标反射的辐射消散模式。公开了各种配置，光学元件可以包括固体浸没透镜，莫尔元件和固体浸没光学元件的组合，不同设计的介电金属 - 电介质堆叠以及用于放大照明辐射的渐逝模式的谐振元件。计量系统和方法可配置为各种计量类型，包括成像和散射方法。

3. 发明公开

EP3948937A1 METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS IN A SEMICONDUCTOR DEVICE, AND MISREGISTRATION TARGETS USEFUL THEREIN 审中-实审
公开(公告)号：EP3948937A1
公开(公告)日：2022-02-09
申请号：EP19921663.1
申请日：2019-05-06
申请人： Kla-Tencor Corporation
发明人： VOLKOVICH, Roie , MILO, Renan , YERUSHALMI, Liran , ZABERCHIK, Moran , FELER, Yoel , IZRAELI, David
IPC分类号： H01L21/66 , H01L21/67

4. 发明申请

WO2020091733A1 ESTIMATION OF ASYMMETRIC ABERRATIONS 审中-公开
公开(公告)号：WO2020091733A1
公开(公告)日：2020-05-07
申请号：PCT/US2018/058068
申请日：2018-10-30
申请人： KLA-TENCOR CORPORATION
发明人： FELER, Yoel , LEVINSKI, Vladimir
IPC分类号： G03F7/20 , H01L21/66
摘要： Metrology targets, target design methods and metrology measurement methods are provided, which estimate the effects of asymmetric aberrations, independently or in conjunction with metrology overlay estimations. Targets comprise one or more pairs of segmented periodic structures having a same coarse pitch, a same 1:1 line to space ratio and segmented into fine elements at a same fine pitch, wherein the segmented periodic structures differ from each other in that one thereof lacks at least one of its corresponding fine elements and/or in that one thereof comprises two groups of the fine elements which are separated from each other by a multiple of the fine pitch. The missing element(s) and/or central gap enable deriving the estimation of aberration effects from measurements of the corresponding segmented periodic structures. The fine pitches may be selected to correspond to the device fine pitches in the corresponding layer.

5. 发明申请

WO2017024158A1 FOCUS METROLOGY AND TARGETS WHICH UTILIZE TRANSFORMATIONS BASED ON AERIAL IMAGES OF THE TARGETS 审中-公开
标题翻译：基于目标的空中图像利用变换的重点计量和目标
公开(公告)号：WO2017024158A1
公开(公告)日：2017-02-09
申请号：PCT/US2016/045594
申请日：2016-08-04
申请人： KLA-TENCOR CORPORATION
发明人： GUTMAN, Nadav , FELER, Yoel , LEVINSKI, Vladimir , KAMINSKY, Oded
IPC分类号： H01L21/66 , H01L21/027
CPC分类号： G03F7/70641
摘要： Focus metrology methods and modules are provided, which use aerial-images-based transformations to share measurement information derived from multiple targets and/or to design additional targets to specified compliant targets, which enable simple adjustment of focus targets to changing production conditions. Methods comprise positioning two or more focus targets in each wafer field, conducting focus measurements of the targets, transforming the focus measurements into a single set of results for each field, using a transformation between the targets that is based on the aerial images thereof, and deriving focus results from the single sets of results; and possibly designing the focus targets from specified targets using aerial image parameters of the specified targets.
摘要翻译：提供了重点测量方法和模块，其使用基于空中图像的变换来共享从多个目标导出的测量信息和/或针对指定的兼容目标设计附加目标，这使得能够简单地调整焦点目标以改变生产条件。方法包括在每个晶片领域中定位两个或更多个聚焦目标，使用基于其基于其空间图像的目标之间的变换，进行目标的聚焦测量，将焦点测量值转换为每个场的单个结果集合，以及从单一结果中得出重点结果; 并且可能使用指定目标的空中图像参数来设计来自指定目标的焦点目标。

6. 发明申请

WO2015153497A1 FOCUS MEASUREMENTS USING SCATTEROMETRY METROLOGY 审中-公开
标题翻译：使用散射测量方法的重点测量
公开(公告)号：WO2015153497A1
公开(公告)日：2015-10-08
申请号：PCT/US2015/023405
申请日：2015-03-30
申请人： KLA-TENCOR CORPORATION
发明人： EL KODADI, Mohammed , AMIR, Nuriel , VOLKOVICH, Roie , LEVINSKI, Vladimir , FELER, Yoel , KANDEL, Daniel , GUTMAN, Nadav , PANDEV, Stilian , SANKO, Dzmitry
IPC分类号： G02B15/14 , H04N7/18
CPC分类号： G06F17/5081 , G01N21/4785 , G03F7/70641 , G03F7/70683 , G06F17/5072
摘要： Target designs and methods are provided, which relate to periodic structures having elements recurring with a first pitch in a first direction. The elements are periodic with a second pitch along a second direction that is perpendicular to the first direction and are characterized in the second direction by alternating, focus-sensitive and focus-insensitive patterns with the second pitch. In the produced targets, the first pitch may be about the device pitch and the second pitch may be several times larger. The first, focus-insensitive pattern may be produced to yield a first critical dimension and the second, focus-sensitive pattern may be produced to yield a second critical dimension that may be equal to the first critical dimension only when specified focus requirements are satisfied, or provide scatterometry measurements of zeroth as well as first diffraction orders, based on the longer pitch along the perpendicular direction.
摘要翻译：提供了目标设计和方法，其涉及具有在第一方向上以第一间距重复的元件的周期性结构。这些元件沿着与第一方向垂直的第二方向具有第二间距周期性，并且通过具有第二间距的交替的，聚焦敏感的和不对焦的图案在第二方向上表征。在所产生的目标中，第一节距可以是关于装置间距，而第二节距可以是数倍。可以产生第一个不对焦模式以产生第一临界尺寸，并且可以产生第二焦点敏感图案以产生仅当满足指定的焦点要求时可以等于第一临界尺寸的第二临界尺寸，或者基于沿着垂直方向的较长的间距来提供零和第一衍射级的散射测量。

7. 发明申请

WO2020197571A1 METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS IN A SEMICONDUCTOR DEVICE, AND MISREGISTRATION TARGETS USEFUL THEREIN 审中-公开
公开(公告)号：WO2020197571A1
公开(公告)日：2020-10-01
申请号：PCT/US2019/030776
申请日：2019-05-06
申请人： KLA-TENCOR CORPORATION
发明人： VOLKOVICH, Roie , MILO, Renan , YERUSHALMI, Liran , ZABERCHIK, Moran , FELER, Yoel , IZRAELI, David
IPC分类号： H01L21/66 , H01L21/67
摘要： A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of a semiconductor device wafer at a first instance and providing a first misregistration indication, measuring misregistration between layers of a semiconductor device wafer at a second instance and providing a second misregistration indication, providing a misregistration measurement difference output in response to a difference between the first misregistration indication and the second misregistration indication, prodding a baseline difference output and ameliorating the difference between the misregistration measurement difference output and the baseline difference output.

8. 发明申请

WO2014074893A1 METROLOGY TARGET CHARACTERIZATION 审中-公开
标题翻译：计量目标特征
公开(公告)号：WO2014074893A1
公开(公告)日：2014-05-15
申请号：PCT/US2013/069263
申请日：2013-11-08
申请人： KLA-TENCOR CORPORATION
发明人： TARSHISH-SHAPIR, Inna , FELER, Yoel , MARCHELLI, Anat , DINU, Berta , LEVINSKI, Vladimir , EFRATY, Boris , AMIR, Nuriel , GHINOVKER, Mark , MANASSEN, Amnon , ROBINZON, Sigalit
IPC分类号： G06F19/00
CPC分类号： G01N21/95607 , G01N21/47 , G01N21/9501 , G01N2021/95615 , G03F7/70633
摘要： Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.
摘要翻译：提供了方法和系统，其使用选定的度量来识别指定的计量目标异常，并在几何上对所识别的目标异常进行分类，以将它们链接到相应的误差源。可以通过从晶片上的相应目标导出来自指定感兴趣区域（ROI）的目标信号（例如来自目标信号的内核）来执行识别，使用各自的功能从目标信号计算度量，并分析用于表征目标的度量。

9. 发明申请

WO2014062972A1 SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY 审中-公开
标题翻译： SCATTERMETRY OVERLAY METROLOGY中的对称目标设计
公开(公告)号：WO2014062972A1
公开(公告)日：2014-04-24
申请号：PCT/US2013/065527
申请日：2013-10-17
申请人： KLA-TENCOR CORPORATION
发明人： BRINGOLTZ, Barak , KANDEL, Daniel , FELER, Yoel , SAPIENS, Noam , IRINA, Paykin , SVIZHER, Alexander , ALONI, Meir , BEN DOV, Guy , SHALMONI, Hadar , LEVINSKI, Vladimir
IPC分类号： G01N21/47 , G01B9/02 , H01L21/66
CPC分类号： G01N21/01 , G01B11/272 , G01N21/4788 , G01N21/9501 , G01N21/956 , G01N2201/068 , G02B27/4255 , G02B27/4272 , G03F7/70633 , G03F7/70683
摘要： Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
摘要翻译：提供了计量方法，系统和目标，实现了并行范例。使用具有周期性结构的相邻小区来提取覆盖误差，例如通过引入可控相移或图像偏移，这使得能够进行覆盖的算法计算。周期性结构被设计为展现旋转对称性以支持计算并减少误差。

10. 发明申请

WO2018226215A1 RETICLE OPTIMIZATION ALGORITHMS AND OPTIMAL TARGET DESIGN 审中-公开
公开(公告)号：WO2018226215A1
公开(公告)日：2018-12-13
申请号：PCT/US2017/036219
申请日：2017-06-06
申请人： KLA-TENCOR CORPORATION
发明人： FELER, Yoel , LEVINSKI, Vladimir
IPC分类号： G06F17/50
摘要： Metrology target designs on the reticle and on the wafer, and target design and processing methods are provided. Target designs comprise coarse pitched periodic structures having fine pitched sub-elements, which vary in sub-element CD and/or height, an orthogonal periodic structure, perpendicular to the measurement direction, with an orthogonal unresolved pitch among periodically recurring bars, which provide a calibration parameter for achieving well-printed targets. Orthogonal periodic structures may be designed on the reticle and be unresolved, or be applied in cut patterns on the process layer, with relatively low sensitivity to the cut layer overlay. Designed targets may be used for overlay metrology as well as for measuring process parameters such as scanner aberrations and pitch walk.

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