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    • 5. 发明申请
    • OPTICAL FILM, LAMINATE AND TOUCH PANEL
    • 光学膜,层压板和触控面板
    • US20100053101A1
    • 2010-03-04
    • US12531992
    • 2009-02-24
    • Kazuhiro NozawaMasato Saito
    • Kazuhiro NozawaMasato Saito
    • G06F3/041B32B7/02
    • G02B1/14G02B1/105G02B1/111G02B1/16Y10T428/24942
    • An optical film that can make interference fringes inconspicuous with maintaining high surface hardness and transmission sharpness is provided.The optical film 1 has a transparent base material layer 12. An undercoat layer 14 is laminated on at least one surface of the transparent base material layer 12. A transparent hard coat layer 16 is laminated on the undercoat layer 14. An anti-reflection layer 18 is laminated on the transparent hard coat layer 16. The anti-reflection layer 18 is a layer having a low refractive index smaller than the refractive index of the transparent hard coat layer 16. The layers are designed so that refractive index n0 of the transparent base material layer 12, refractive index n1 of the undercoat layer 14, refractive index n2 of the transparent hard coat layer 16, and refractive index n3 of the anti-reflection layer 18 should satisfy the relationships of n3
    • 提供了一种能够使干涉条纹不显眼且保持高表面硬度和透光锐度的光学膜。 光学膜1具有透明基材层12.在透明基材层12的至少一个表面层叠底涂层14.将透明硬涂层16层合在底涂层14上。防反射层 18层叠在透明硬涂层16上。防反射层18是具有比透明硬涂层16的折射率小的折射率的低层。这些层被设计成使透明的硬涂层16的折射率n0 基材层12,底涂层14的折射率n1,透明硬涂层16的折射率n2和抗反射层18的折射率n3应满足n3
    • 8. 发明申请
    • PHOTOMASK MANUFACTURING METHOD USING CHARGED BEAM WRITING APPARATUS
    • 使用充电光束写入装置的光电制造方法
    • US20080213677A1
    • 2008-09-04
    • US12015032
    • 2008-01-16
    • Masato Saito
    • Masato Saito
    • G03F1/00G03F7/00
    • G03F1/78
    • A first relationship between the charge dose of a charged beam writing apparatus and the dimensional accuracy of a photomask pattern is obtained, and a charge dose is determined from given dimensional accuracy on the basis of the first relationship. On the basis of the determined charge dose, a resist by which a resist pattern having desired dimensions is formed with the charge dose is selected. A second relationship between the write condition of the charged beam writing apparatus and the write time necessary to write the selected resist with the charge dose is obtained for each write pattern. The write condition is determined for each write pattern on the basis of a condition given to the write time and the second relationship.
    • 获得充电光束写入装置的电荷剂量与光掩模图案的尺寸精度之间的第一关系,并且基于第一关系从给定的尺寸精度确定电荷剂量。 基于确定的电荷剂量,选择形成具有所需尺寸的抗蚀剂图案的抗蚀剂,其具有电荷剂量。 对于每个写入模式,获得充电光束写入装置的写入条件和写入所选择的抗蚀剂所需的写入时间之间的第二关系。 基于给予写入时间和第二关系的条件,为每个写入模式确定写入条件。