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    • 7. 发明授权
    • Method of erasing in non-volatile memory device
    • 在非易失性存储器件中擦除的方法
    • US07957199B2
    • 2011-06-07
    • US12833098
    • 2010-07-09
    • Doo-Gon KimKi-Tae ParkYeong-Taek Lee
    • Doo-Gon KimKi-Tae ParkYeong-Taek Lee
    • G11C16/06
    • G11C16/14
    • An erasing method in a nonvolatile memory device is disclosed. The method includes post-programming dummy memory cells; verifying whether threshold voltages of the dummy memory cells are greater than or equal to a first voltage; post-programming normal memory cells; and verifying whether threshold voltages of the normal memory cells are greater than or equal to a second voltage. The first voltage is different from the second voltage, and the post-programming of the dummy memory cells comprises: applying a program voltage to a plurality of dummy word lines coupled to the dummy memory cells to post-program the dummy memory cells; and applying a pass voltage to a plurality of normal word lines coupled to the normal memory cells so that the normal memory cells are not post-programmed.
    • 公开了一种非易失性存储器件中的擦除方法。 该方法包括后编程虚拟存储器单元; 验证所述伪存储单元的阈值电压是否大于或等于第一电压; 后编程正常记忆单元; 以及验证所述正常存储单元的阈值电压是否大于或等于第二电压。 第一电压与第二电压不同,并且虚拟存储单元的后编程包括:将程序电压施加到耦合到虚拟存储器单元的多个虚拟字线,以对虚拟存储器单元进行后编程; 以及对耦合到所述正常存储器单元的多个正常字线施加通过电压,使得所述正常存储器单元未被编程。
    • 9. 发明授权
    • Flash memory device applying erase voltage
    • 闪存器件施加擦除电压
    • US07649775B2
    • 2010-01-19
    • US11970634
    • 2008-01-08
    • Doo-Gon KimKi-Tae Park
    • Doo-Gon KimKi-Tae Park
    • G11C16/00
    • G11C16/3418
    • A flash memory device includes; a plurality of layers, each one including memory cells arranged in a matrix of rows and columns, a layer decoder configured to select one of the plurality of layers to thereby define a selected layer and an unselected layer, a voltage generator configured to generate an erase voltage at a level higher than ground voltage, and an internal voltage, and a row select circuit configured to apply the erase voltage to the selected layer, and apply at least one of the erase voltage and the internal voltage to the unselected layer during an erase operation.
    • 闪存装置包括: 多个层,每个层包括排列成行和列的矩阵的存储单元;层解码器,被配置为选择所述多个层中的一个,从而限定所选择的层和未选择层;电压发生器,被配置为产生擦除 电压高于接地电压,内部电压以及行选择电路,配置为向所选层施加擦除电压,并且在擦除期间将擦除电压和内部电压中的至少一个施加到未选择层 操作。