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    • 4. 发明授权
    • Data processing system and control method
    • 数据处理系统及控制方法
    • US06948049B2
    • 2005-09-20
    • US10175446
    • 2002-06-20
    • Takeshi Satou
    • Takeshi Satou
    • G06F9/30G06F9/38G06F15/00
    • G06F9/3814G06F9/3802G06F9/3836G06F9/3877
    • A data processing system is provided that comprises a special-purpose processing unit (VU), a general-purpose processing unit that is suited to general-purpose data processing unit (PU) and a fetch unit for supplying a special-purpose instruction to the VU and supplying a general-purpose instruction to the PU, wherein the PU is equipped with a first mode for operating based on a first instruction from the fetch unit and a second mode for operating based on a second instruction from the VU. The resources of the PU are made available for use by the VU so that the resources of the PU can be used by the VU with effectively no overheads being required by the transfer of data between the VU and the PU. As a result, a processor with even greater flexibility and faster processing can be provided.
    • 提供了一种数据处理系统,其包括专用处理单元(VU),适用于通用数据处理单元(PU)的通用处理单元和用于向通用数据处理单元(PU)提供专用指令的提取单元 VU并且向PU提供通用指令,其中PU配备有基于来自提取单元的第一指令进行操作的第一模式和基于来自VU的第二指令进行操作的第二模式。 PU的资源可供VU使用,使得可以由VU使用PU的资源,在VU和PU之间的数据传输中没有必要的开销。 因此,可以提供具有更大灵活性和更快处理的处理器。
    • 8. 发明授权
    • Manufacturing method of thin film transistor substrate
    • 薄膜晶体管衬底的制造方法
    • US07323716B2
    • 2008-01-29
    • US11032026
    • 2005-01-11
    • Takeshi SatouToshihiko ItogaTakeo Shiba
    • Takeshi SatouToshihiko ItogaTakeo Shiba
    • H01L29/76H01L31/036H01L31/112H01L29/90H01L27/01
    • H01L27/1237H01L27/1255H01L29/42384H01L29/78621H01L29/78627H01L29/78645
    • This invention provides a manufacturing method for fabricating on the same substrate both high voltage thin film transistors suitable for driving liquid crystal and low voltage drive high performance thin film transistors. In addition, this invention provides a thin film transistor substrate where the area occupied by a storage capacitor in each pixel is reduced to raise the aperture ratio of the display unit.One aspect of this invention provides a manufacturing method characterized in that the impurity regions of both high voltage thin film transistors and high performance thin film transistors which differ in the thickness of gate insulation are formed by implanting a dopant through the same two-layered film. Another aspect of this invention reduces the area occupied by the drive circuit in the display unit by utilizing an extension of one layer of the insulation film included in each thin film transistor.
    • 本发明提供一种制造方法,用于在同一衬底上制造适于驱动液晶的高电压薄膜晶体管和低电压驱动高性能薄膜晶体管。 此外,本发明提供一种薄膜晶体管基板,其中减少了每个像素中的存储电容器占据的面积以提高显示单元的开口率。 本发明的一个方面提供一种制造方法,其特征在于,通过将相同的双层膜注入掺杂剂,形成栅极绝缘层厚度不同的高电压薄膜晶体管和高性能薄膜晶体管的杂质区域。 本发明的另一方面通过利用包括在每个薄膜晶体管中的一层绝缘膜的延伸来减小显示单元中的驱动电路占据的面积。