专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6064484A Pattern inspection method and system 失效
标题翻译：图案检查方法和系统
公开(公告)号：US6064484A
公开(公告)日：2000-05-16
申请号：US814414
申请日：1997-03-11
申请人： Ken-ichi Kobayashi , Takayoshi Matsuyama , Showgo Matsui
发明人： Ken-ichi Kobayashi , Takayoshi Matsuyama , Showgo Matsui
IPC分类号： G01B11/00 , H01L21/66
CPC分类号： G01B11/00
摘要： A pattern inspection method includes the steps of: obtaining first image data by optically picking up an actually formed pattern such as a reticle; aligning a position of the first image data with second image data of a pattern at a different layer from that of the first image data; and performing a first pattern inspection using the first and second image data. Defect inspection can be executed in a short time with a practically sufficient precision.
摘要翻译：图案检查方法包括以下步骤：通过光学拾取实际形成的图案（例如掩模版）来获得第一图像数据; 将第一图像数据的位置与不同于第一图像数据的图案的图案的第二图像数据对准; 以及使用所述第一和第二图像数据执行第一图案检查。缺陷检查可以在短时间内以实际足够的精度执行。

2. 发明授权

US06327379B2 Pattern inspection method and apparatus 失效
标题翻译：图案检验方法及装置
公开(公告)号：US06327379B2
公开(公告)日：2001-12-04
申请号：US08908553
申请日：1997-08-08
申请人： Takayoshi Matsuyama , Ken-ichi Kobayashi
发明人： Takayoshi Matsuyama , Ken-ichi Kobayashi
IPC分类号： G06K900
CPC分类号： G06T7/001 , G06T2207/30148
摘要： An actual pattern image including an auxiliary pattern in a periphery of a pattern of an object to be inspected is recognized. The image of the auxiliary pattern is deleted from the recognized image and an auxiliary-pattern-image-deleted recognized image is produced. An inspection image to be used for inspection is produced from design data from which the auxiliary pattern is removed. The auxiliary-pattern-image-deleted recognized image is compared with the inspection image.
摘要翻译：识别包括待检查对象的图案的周边中的辅助图案的实际图案图像。从识别的图像中删除辅助图案的图像，并产生辅助图案图像删除的识别图像。用于检查的检查图像是从除去辅助图案的设计数据产生的。将辅助图像图像删除的识别图像与检查图像进行比较。

3. 发明授权

US5900941A High speed pattern inspection method and system 失效
标题翻译：高速模式检测方法和系统
公开(公告)号：US5900941A
公开(公告)日：1999-05-04
申请号：US864964
申请日：1997-05-29
申请人： Takayoshi Matsuyama , Ken-ichi Kobayashi , Katsuyoshi Nakashima , Yasunori Hada
发明人： Takayoshi Matsuyama , Ken-ichi Kobayashi , Katsuyoshi Nakashima , Yasunori Hada
IPC分类号： G01B11/30 , G01N21/956 , H01L21/66 , G01B11/00
CPC分类号： G01N21/95607
摘要： A pattern inspection method includes the steps of: copying design data representative of a design pattern in a storage unit; generating index data and storing the index data in the storage unit, the index data indicating data at what position of the design pattern is stored at which location of the storage unit; picking up an image of a real pattern on a stage and generating real pattern data; reading the design data by using the index data in accordance with a position on the real pattern; generating design pattern data in accordance with the read design data; and comparing the real pattern data with the design pattern data to detect any defect in the real pattern data. A pattern inspection method and system is provided which can perform die-to-database inspection at high speed.
摘要翻译：图案检查方法包括以下步骤：将表示设计图案的设计数据复制到存储单元中; 生成索引数据并将索引数据存储在存储单元中，指示数据指示设计图案的什么位置的数据存储在存储单元的哪个位置; 在舞台上拾取真实图案的图像并生成实际图案数据; 通过使用根据实际图案上的位置的索引数据来读取设计数据; 根据读取的设计数据生成设计图案数据; 并将实际图案数据与设计图案数据进行比较，以检测实际图案数据中的任何缺陷。提供了可以高速执行模 - 数据库检查的模式检查方法和系统。

4. 发明授权

US06603875B1 Pattern inspection method, pattern inspection apparatus, and recording medium which records pattern inspection program 失效
标题翻译：图案检查方法，图案检查装置和记录图案检查程序的记录介质
公开(公告)号：US06603875B1
公开(公告)日：2003-08-05
申请号：US09525019
申请日：2000-03-14
申请人： Takayoshi Matsuyama , Ituo Kobayashi
发明人： Takayoshi Matsuyama , Ituo Kobayashi
IPC分类号： G06K900
CPC分类号： G06T7/0006 , G03F1/84 , G03F7/70616 , G06T2207/30141
摘要： A pattern inspection method and apparatus for carrying out pattern inspection with a simple mechanical apparatus following a simple procedure are provided. A recording medium which records a pattern inspection program for carrying out the pattern inspection is also provided. The pattern inspection apparatus of the present invention includes: a first image data generator which generates first image data from a pattern image captured from a sample; a second image data generator which generates second image data by reducing the four sides of each pattern contained in the first image data; a pattern number detector which detects a first pattern number that is the number of patterns contained in the first image data, and also detects a second pattern number that is the number of patterns contained in the second image data; and a defect detector which detects a defect contained in the patterns of the sample in accordance with a result of the comparison between the first pattern number and the second pattern number.
摘要翻译：提供了一种用简单的机械装置进行图案检查的图案检查方法和装置。还提供记录用于进行图案检查的图案检查程序的记录介质。本发明的图案检查装置包括：第一图像数据生成器，其从从样本捕获的图案图像生成第一图像数据; 第二图像数据生成器，其通过减少包含在第一图像数据中的每个图案的四边来生成第二图像数据; 检测作为第一图像数据中包含的图案数量的第一图案编号的图案编号检测器，并且还检测作为第二图像数据中包含的图案数量的第二图案编号; 以及缺陷检测器，其根据第一图案编号和第二图案编号之间的比较的结果检测包含在样本的图案中的缺陷。

5. 发明授权

US4669123A Inspecting method and apparatus for photomask pattern 失效
标题翻译：光掩模图案的检查方法和装置
公开(公告)号：US4669123A
公开(公告)日：1987-05-26
申请号：US651086
申请日：1984-09-17
申请人： Kenichi Kobayashi , Takayoshi Matsuyama
发明人： Kenichi Kobayashi , Takayoshi Matsuyama
IPC分类号： G01B11/24 , G01B11/30 , G01N21/956 , G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/956 , G01N21/95607 , G06T2207/30148
摘要： A method and an apparatus for inspecting a photomask pattern utilizing a vector comparing method. A pair of optical images intended to be compared are taken from the photomask pattern and converted to digital data by optical systems and an amplitude distributor. The digital data have values of black (B), gray (G), or white (W) corresponding to high, middle, and low signal amplitudes. Separated data corresponding to a portion of each of the optical images are sequentially separated from the digital data by data separators. The separated data are shifted by several matrix elements of the separated data by data shifters to provide shifted data. The shifted data of each optical image and separated data are respectively synthesized by data synthesizers to provide two groups of synthesized data. Vectors are generated from the matrices of the groups of synthesized data by vector generators. The vectors are defined to indicate changes from B to W, from B to G, and from G to W, in one of eight latitudinal, longitudinal, and diagonal directions. The number of vectors having the same direction in vectors are respectively summed and compared by a vector comparator which outputs information of a defect on the photomask pattern if there is a difference between the groups for the summation of any vector direction.
摘要翻译：一种利用矢量比较方法检查光掩模图案的方法和装置。想要进行比较的一对光学图像从光掩模图案中获取，并通过光学系统和幅度分布器转换成数字数据。数字数据具有对应于高，中，低信号幅度的黑色（B），灰色（G）或白色（W）的值。对应于每个光学图像的一部分的分离数据通过数据分离器与数字数据顺序分离。分离的数据被数据移位器移位分离数据的几个矩阵元素以提供移位数据。每个光学图像和分离数据的移位数据分别由数据合成器合成，以提供两组合成数据。通过向量生成器从合成数据组的矩阵生成向量。向量被定义为指示从B到W，从B到G，从G到W的八个纬向，纵向和对角方向之一的变化。如果向量方向的相加方向之间存在差异，那么矢量中具有相同方向的向量的数量分别被相加和比较，该矢量比较器输出光掩模图案上的缺陷信息。

6. 发明授权

US4701859A Inspecting method and apparatus for a photomask pattern 失效
标题翻译：检查光掩模图案的方法和装置
公开(公告)号：US4701859A
公开(公告)日：1987-10-20
申请号：US659425
申请日：1984-10-10
申请人： Takayoshi Matsuyama , Kenichi Kobayashi
发明人： Takayoshi Matsuyama , Kenichi Kobayashi
IPC分类号： G03F1/38 , G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/308 , H01L21/66 , G06F15/60 , G01B11/00 , G06K9/68 , H04N7/18
CPC分类号： G03F1/42 , G03F1/44 , G03F1/84 , G03F7/70633 , H01L21/30
摘要： A method and the apparatus for inspecting the unit pattern arrangements on a photomask to determine relative shear between the unit patterns where each unit pattern has the same shape and size and is printed repeatedly at equal intervals on the photomask. Shear-detecting-patterns are provided on each unit pattern. Adjacent shear-detecting-patterns on adjacent unit patterns are designated as combined patterns. The combined patterns arranged in the same directions make a group. To detect an irregular shear, a standard pattern is designated from the combined patterns in a group and comparison is made between each combined pattern in the group and the standard pattern. An optical image of each combined pattern in a group is and converted into electric signals. The electrical signals for the standard pattern and for the other combined patters are stored a memory. The two sets of signals are read out and compared to provide a shear difference between the patterns. The difference is determined by counting the number of occupied or unoccupied memory locations in both the standard and the other images. The difference in count produces the shear difference. The shear difference is compared with a or tolerance level and it is determined whether the combined pattern arrangement in the group is correct based on the comparison.By repeating the comparison in other groups, it can be determined whether the unit pattern arrangement is correct.
摘要翻译：一种用于检查光掩模上的单元图案布置的方法和装置，以确定单元图案之间的相对剪切，其中每个单元图案具有相同的形状和尺寸，并且在光掩模上以相等的间隔重复印刷。在每个单元图案上提供剪切检测图案。相邻单元图案上的相邻剪切检测图案被指定为组合图案。以相同方向布置的组合图案组成一组。为了检测不规则剪切，从组中的组合图案中指定标准图案，并且在组中的每个组合图案与标准图案之间进行比较。组中的每个组合图案的光学图像被转换成电信号。标准图案和其他组合图案的电信号被存储在存储器中。读出两组信号并进行比较，以提供图案之间的剪切差。差异是通过对标准图像和其他图像中的被占用或未占用的存储器位置的数量进行计数来确定的。计数差异产生剪切差异。将剪切差与一个或公差等级进行比较，并且基于该比较来确定组中的组合图案布置是否正确。通过重复其他组中的比较，可以确定单位图案布置是否正确。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式