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1. 发明授权

US07405158B2 Methods for depositing tungsten layers employing atomic layer deposition techniques 有权
标题翻译：使用原子层沉积技术沉积钨层的方法
公开(公告)号：US07405158B2
公开(公告)日：2008-07-29
申请号：US11038592
申请日：2005-01-19
申请人： Ken Kaung Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Averginos V. Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael X. Yang , Hua Chung , Jeong Soo Byun
发明人： Ken Kaung Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Averginos V. Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael X. Yang , Hua Chung , Jeong Soo Byun
IPC分类号： H01L21/44
CPC分类号： H01L21/28562 , C23C16/0281 , C23C16/08 , C23C16/14 , C23C16/45525 , H01L21/28556 , H01L21/76843 , H01L21/76855 , H01L21/76856 , H01L21/7687 , H01L21/76876 , H01L21/76877 , H01L2221/1089
摘要： In one embodiment of the invention, a method for forming a tungsten-containing layer on a substrate is provided which includes positioning a substrate containing a barrier layer disposed thereon in a process chamber, exposing the substrate to a first soak process for a first time period and depositing a nucleation layer on the barrier layer by flowing a tungsten-containing precursor and a reductant into the process chamber. The method further includes exposing the nucleation layer to a second soak process for a second time period and depositing a bulk layer on the nucleation layer. In one example, the barrier layer contains titanium nitride, the first and second soak processes independently comprise at least one reducing gas selected from the group consisting of hydrogen, silane, disilane, dichlorosilane, borane, diborane, derivatives thereof and combinations thereof and the nucleation layer may be deposited by an atomic layer deposition process or a pulsed chemical vapor deposition process while the bulk layer may be deposited by a chemical vapor deposition process or a physical vapor deposition process.
摘要翻译：在本发明的一个实施例中，提供了一种在衬底上形成含钨层的方法，其包括将包含设置在其上的阻挡层的衬底定位在处理室中，将衬底暴露于第一次浸泡过程第一时间段以及通过使含钨前体和还原剂流入所述处理室，在所述阻挡层上沉积成核层。该方法还包括将成核层暴露于第二次浸泡过程第二时间段，并将沉积层沉积在成核层上。在一个实例中，阻挡层包含氮化钛，第一和第二浸泡工艺独立地包含选自氢，硅烷，乙硅烷，二氯硅烷，硼烷，乙硼烷，其衍生物及其组合中的至少一种还原气体和成核层可以通过原子层沉积工艺或脉冲化学气相沉积工艺沉积，同时可以通过化学气相沉积工艺或物理气相沉积工艺沉积主体层。

2. 发明授权

US07745333B2 Methods for depositing tungsten layers employing atomic layer deposition techniques 有权
标题翻译：使用原子层沉积技术沉积钨层的方法
公开(公告)号：US07745333B2
公开(公告)日：2010-06-29
申请号：US12179002
申请日：2008-07-24
申请人： Ken Kaung Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Avgerinos V. Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael X. Yang , Hua Chung , Jeong Soo Byun
发明人： Ken Kaung Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Avgerinos V. Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael X. Yang , Hua Chung , Jeong Soo Byun
IPC分类号： H01L21/44
CPC分类号： H01L21/28562 , C23C16/0281 , C23C16/08 , C23C16/14 , C23C16/45525 , H01L21/28556 , H01L21/76843 , H01L21/76855 , H01L21/76856 , H01L21/7687 , H01L21/76876 , H01L21/76877 , H01L2221/1089
摘要： In one embodiment of the invention, a method for forming a tungsten-containing layer on a substrate is provided which includes positioning a substrate containing a barrier layer disposed thereon in a process chamber, exposing the substrate to a first soak process for a first time period and depositing a nucleation layer on the barrier layer by flowing a tungsten-containing precursor and a reductant into the process chamber. The method further includes exposing the nucleation layer to a second soak process for a second time period and depositing a bulk layer on the nucleation layer. In one example, the barrier layer contains titanium nitride, the first and second soak processes independently comprise at least one reducing gas selected from the group consisting of hydrogen, silane, disilane, dichlorosilane, borane, diborane, derivatives thereof and combinations thereof and the nucleation layer may be deposited by an atomic layer deposition process or a pulsed chemical vapor deposition process while the bulk layer may be deposited by a chemical vapor deposition process or a physical vapor deposition process.
摘要翻译：在本发明的一个实施例中，提供了一种在衬底上形成含钨层的方法，其包括将包含设置在其上的阻挡层的衬底定位在处理室中，将衬底暴露于第一次浸泡过程第一时间段以及通过使含钨前体和还原剂流入所述处理室，在所述阻挡层上沉积成核层。该方法还包括将成核层暴露于第二次浸泡过程第二时间段，并将沉积层沉积在成核层上。在一个实例中，阻挡层包含氮化钛，第一和第二浸泡工艺独立地包含选自氢，硅烷，乙硅烷，二氯硅烷，硼烷，乙硼烷，其衍生物及其组合中的至少一种还原气体和成核层可以通过原子层沉积工艺或脉冲化学气相沉积工艺沉积，同时可以通过化学气相沉积工艺或物理气相沉积工艺沉积主体层。

3. 发明申请

US20080280438A1 METHODS FOR DEPOSITING TUNGSTEN LAYERS EMPLOYING ATOMIC LAYER DEPOSITION TECHNIQUES 有权
标题翻译：沉积原子层沉积技术的沉积层的方法
公开(公告)号：US20080280438A1
公开(公告)日：2008-11-13
申请号：US12179002
申请日：2008-07-24
申请人： Ken Kaung Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Aygerinos V. Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael X. Yang , Hua Chung , Jeong Soo Byun
发明人： Ken Kaung Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Aygerinos V. Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael X. Yang , Hua Chung , Jeong Soo Byun
IPC分类号： H01L21/44
CPC分类号： H01L21/28562 , C23C16/0281 , C23C16/08 , C23C16/14 , C23C16/45525 , H01L21/28556 , H01L21/76843 , H01L21/76855 , H01L21/76856 , H01L21/7687 , H01L21/76876 , H01L21/76877 , H01L2221/1089
摘要： In one embodiment of the invention, a method for forming a tungsten-containing layer on a substrate is provided which includes positioning a substrate containing a barrier layer disposed thereon in a process chamber, exposing the substrate to a first soak process for a first time period and depositing a nucleation layer on the barrier layer by flowing a tungsten-containing precursor and a reductant into the process chamber. The method further includes exposing the nucleation layer to a second soak process for a second time period and depositing a bulk layer on the nucleation layer. In one example, the barrier layer contains titanium nitride, the first and second soak processes independently comprise at least one reducing gas selected from the group consisting of hydrogen, silane, disilane, dichlorosilane, borane, diborane, derivatives thereof and combinations thereof and the nucleation layer may be deposited by an atomic layer deposition process or a pulsed chemical vapor deposition process while the bulk layer may be deposited by a chemical vapor deposition process or a physical vapor deposition process.
摘要翻译：在本发明的一个实施例中，提供了一种在衬底上形成含钨层的方法，其包括将包含设置在其上的阻挡层的衬底定位在处理室中，将衬底暴露于第一次浸泡过程第一时间段以及通过使含钨前体和还原剂流入所述处理室，在所述阻挡层上沉积成核层。该方法还包括将成核层暴露于第二次浸泡过程第二时间段，并将沉积层沉积在成核层上。在一个实例中，阻挡层包含氮化钛，第一和第二浸泡工艺独立地包含选自氢，硅烷，乙硅烷，二氯硅烷，硼烷，乙硼烷，其衍生物及其组合中的至少一种还原气体和成核层可以通过原子层沉积工艺或脉冲化学气相沉积工艺沉积，同时可以通过化学气相沉积工艺或物理气相沉积工艺沉积主体层。

4. 发明申请

US20060009034A1 Methods for depositing tungsten layers employing atomic layer deposition techniques 有权
标题翻译：使用原子层沉积技术沉积钨层的方法
公开(公告)号：US20060009034A1
公开(公告)日：2006-01-12
申请号：US11038592
申请日：2005-01-19
申请人： Ken Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Aygerinos Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael Yang , Hua Chung , Jeong Byun
发明人： Ken Lai , Ravi Rajagopalan , Amit Khandelwal , Madhu Moorthy , Srinivas Gandikota , Joseph Castro , Aygerinos Gelatos , Cheryl Knepfler , Ping Jian , Hongbin Fang , Chao-Ming Huang , Ming Xi , Michael Yang , Hua Chung , Jeong Byun
IPC分类号： H01L21/44
CPC分类号： H01L21/28562 , C23C16/0281 , C23C16/08 , C23C16/14 , C23C16/45525 , H01L21/28556 , H01L21/76843 , H01L21/76855 , H01L21/76856 , H01L21/7687 , H01L21/76876 , H01L21/76877 , H01L2221/1089
摘要： In one embodiment of the invention, a method for forming a tungsten-containing layer on a substrate is provided which includes positioning a substrate containing a barrier layer disposed thereon in a process chamber, exposing the substrate to a first soak process for a first time period and depositing a nucleation layer on the barrier layer by flowing a tungsten-containing precursor and a reductant into the process chamber. The method further includes exposing the nucleation layer to a second soak process for a second time period and depositing a bulk layer on the nucleation layer. In one example, the barrier layer contains titanium nitride, the first and second soak processes independently comprise at least one reducing gas selected from the group consisting of hydrogen, silane, disilane, dichlorosilane, borane, diborane, derivatives thereof and combinations thereof and the nucleation layer may be deposited by an atomic layer deposition process or a pulsed chemical vapor deposition process while the bulk layer may be deposited by a chemical vapor deposition process or a physical vapor deposition process.
摘要翻译：在本发明的一个实施例中，提供了一种在衬底上形成含钨层的方法，其包括将包含设置在其上的阻挡层的衬底定位在处理室中，将衬底暴露于第一次浸泡过程第一时间段以及通过使含钨前体和还原剂流入所述处理室，在所述阻挡层上沉积成核层。该方法还包括将成核层暴露于第二次浸泡过程第二时间段，并将沉积层沉积在成核层上。在一个实例中，阻挡层包含氮化钛，第一和第二浸泡工艺独立地包含选自氢，硅烷，乙硅烷，二氯硅烷，硼烷，乙硼烷，其衍生物及其组合中的至少一种还原气体和成核层可以通过原子层沉积工艺或脉冲化学气相沉积工艺沉积，同时可以通过化学气相沉积工艺或物理气相沉积工艺沉积主体层。

5. 发明授权

US5074415A Method and apparatus for manufacturing heat shrinkable enclosures 失效
标题翻译：用于制造热收缩外壳的方法和装置
公开(公告)号：US5074415A
公开(公告)日：1991-12-24
申请号：US664498
申请日：1991-03-05
申请人： Harold Kaplan , Joseph Castro
发明人： Harold Kaplan , Joseph Castro
IPC分类号： B65D75/00 , B65D77/00
CPC分类号： B29C65/08 , B29C66/1122 , B29C66/43 , B29C66/4312 , B29C66/71 , B29C66/73715 , B29C66/73921 , B29C66/8161 , B65D75/002 , B65D77/003 , B29C2793/009 , B29C66/8322 , B29K2027/06 , B29K2995/0049 , B29L2031/7128
摘要： Disclosed herein is a new and improved method of continuously forming a heat shrinkable packaging medium from PVC tubing comprising the steps of supporting a roll of flat folded heat shrinkable seamless tubing material for controlled unwinding; directing a web of tubing drawn from said roll toward a sealing station; directing said unseamed tube to an ultrasonic welding station; applying ultrasonic welding energy exteriorly and transversely of said tube for less than the full width thereof while pinching the walls thereof between an ultrasonic horn means bearing against lower exterior surfaces of said tubing and a sealing bar means bearing against the upper surfaces of said tubing to weld said walls into a permanent joint and to form an air relief port; advancing the welded tube from said welding station to a severing station; severing said tubing downstream of said joint to separate an individual bag having an open end and closed end.The result heating shrinkable tubular element comprises a shrinkable PVC bag having juxtaposed top and bottom walls, the sides of which are the parallel fold lines of tubing; the ultrasonically established weld permanently joining said top and bottom walls along a first edge; and an open end at a second edge opposite said first edge; the air relief port permitting trapped air to escape from the element when it is heat shrunk over an irregularly shaped object.
摘要翻译：本文公开了一种从PVC管连续形成热收缩包装介质的新的和改进的方法，其包括以下步骤：支撑一卷平面折叠的可热收缩无缝管材料，用于受控展开; 将从所述卷筒拉出的管材的腹板指向密封站; 将所述未使用的管引导到超声波焊接站; 在所述管的外部和横向上施加超过其全部宽度的超声波焊接能量，同时将其壁挤压在支撑所述管道的下外表面的超声波喇叭装置和紧靠所述管道的上表面的密封杆装置之间，以焊接所述墙体形成永久性接头并形成一个空气排放口; 将焊接管从所述焊接站推进到切割站; 在所述接头的下游切断所述管道以分离具有开口端和封闭端的单个袋。结果加热收缩管状元件包括具有并置的顶壁和底壁的可收缩PVC袋，其侧面是管的平行折叠线; 所述超声建立的焊接沿着第一边缘永久地连接所述顶壁和底壁; 以及在与所述第一边缘相对的第二边缘处的开口端; 空气释放口允许被捕获的空气在热收缩在不规则形状的物体上时从元件逸出。

6. 发明授权

US5893460A Shrinkable tubing with integral tear strip 失效
标题翻译：具有整体撕裂条的可收缩管
公开(公告)号：US5893460A
公开(公告)日：1999-04-13
申请号：US326059
申请日：1994-10-19
申请人： Joseph Castro , Seymour Naps
发明人： Joseph Castro , Seymour Naps
IPC分类号： B65D75/00 , B65D75/58 , B65D65/00
CPC分类号： B65D75/58 , B65D75/002 , Y10T156/1056
摘要： A packaging sleeve of heat-shrinkable thermoplastic comprising a flattened tube having a first wall and second wall connected along parallel first and second lines of connection; lines of weakness formed in said first and second walls proximate to one of said lines of connection; said lines of weakness and the line of connection defining tear strip zones therebetween; a reinforcing-levering band in said zones formed by welding superimposed portions of said first and second walls; said reinforcing levering band being disposed parallel to said lines of weakness and in combination with said zones and lines of weakness establishing a tear strip for opening the sleeve.
摘要翻译：一种热收缩热塑性塑料包装套筒，包括一个扁平管，该扁平管具有沿平行的第一和第二连接线连接的第一壁和第二壁; 所述第一和第二壁中靠近所述连接线之一形成的弱线; 所述线的弱点和连接线限定了它们之间的撕裂带区域; 通过焊接所述第一和第二壁的重叠部分形成的所述区域中的加强杠杆带; 所述加强杠杆带平行于所述弱化线布置，并且与所述区域和弱线组合，建立用于打开套筒的撕条。

7. 发明授权

US5074218A Grenade with dual fuses for simulating small arms fire 失效
标题翻译：双重保险丝用于模拟小武器的手榴弹
公开(公告)号：US5074218A
公开(公告)日：1991-12-24
申请号：US395968
申请日：1989-08-18
申请人： Joseph Castro
发明人： Joseph Castro
IPC分类号： F42B4/22 , F42B8/26
CPC分类号： F42B8/26 , F42B4/22
摘要： A grenade with dual fuses for simulating small arms fire comprises: a hollow cylindrical housing including a first threaded end and a second open end; a main filler charge being located within the housing proper; means for covering the end of the main filler charge which is adjacent the housing open end; means being compressively connected to the housing open end for securing the main filler charge within the housing; a main igniting fuse being fitted onto the housing threaded end; a cup shaped member being located inside the housing in between the main igniting fuse and the main filter charge; a propelling charge being located in between the cup shaped member, the housing threaded end, and the main igniting fuse; a first straight fuse being responsive to the main igniting fuse and being located in between the main igniting fuse and the main filler charge; a second L-shaped fuse being responsive to the main igniting fuse and being located in between the main igniting fuse, the propelling charge, and the cup shaped member, the first fuse igniting the main filler charge after the second fuse ignites the propelling charge such that the already ignited propelling charge ejects the main filler charge along with the already ignited first fuse from the housing via the housing open end only before the first fuse has ignited the main filler charge. A feature of the invention is that the propelling charge is an annular cylinder.
摘要翻译：具有用于模拟小武器火的双重保险丝的手榴弹包括：包括第一螺纹端和第二开口端的中空圆柱形壳体; 主填料装料位于壳体内; 用于覆盖邻近壳体开口端的主填料装料端部的装置; 意味着压缩地连接到壳体开口端，用于将主填充物填充物固定在壳体内; 主要点火保险丝装配在外壳螺纹端上; 杯形构件位于主要点火保险丝和主过滤器充电之间的壳体内部; 推进装料位于杯形构件，壳体螺纹端和主要点火保险丝之间; 第一直线保险丝响应于主点火保险丝并且位于主要点火保险丝和主填充物充电之间; 第二个L形保险丝响应于主要点火保险丝并且位于主要点火保险丝，推进电荷和杯形构件之间，第一保险丝在第二个保险丝点燃推进电荷之后点燃主充电器电荷，已经点燃的推进装料只有在第一个保险丝点燃了主填料装料之前，才通过外壳开口端将已经点燃的第一个保险丝与已经点燃的第一个保险丝一起排出。本发明的特征在于推进装药是环形筒。

8. 发明授权

US6045641A Method of manufacturing shrinkable tubing with integral tear strip 失效
标题翻译：具有整体撕裂条的可收缩管的制造方法
公开(公告)号：US6045641A
公开(公告)日：2000-04-04
申请号：US187599
申请日：1998-11-06
申请人： Joseph Castro , Seymour Naps
发明人： Joseph Castro , Seymour Naps
IPC分类号： B65D75/00 , B65D75/58 , B32B31/16
CPC分类号： B65D75/58 , B65D75/002 , Y10T156/1056
摘要： A method of continuously forming a packaging sleeve of heat-shrinkable thermoplastic with an integral tear strip, the sleeve comprising a flattened tube having a first wall and second wall connected along parallel first and second lines of connection; lines of weakness formed in the first and second walls proximate to one of the lines of connection; the lines of weakness and the line of connection defining tear strip zones therebetween; a reinforcing-levering band in the tear strip zones formed by welding superimposed portions of the first and second walls; the reinforcing levering band being disposed parallel to the lines of weakness and in combination with the zones and lines of weakness establishing a tear strip for opening the sleeve.
摘要翻译：一种连续地形成具有整体撕裂带的热收缩热塑性塑料的包装套筒的方法，所述套筒包括扁平管，所述扁平管具有沿平行的第一和第二连接线连接的第一壁和第二壁; 在靠近连接线之一的第一和第二壁中形成的弱线; 弱线和连接线限定其间的撕裂带区域; 通过焊接第一和第二壁的叠加部分而形成的撕裂带区域中的加强杠杆带; 所述加强杠杆带平行于弱线设置并且与弱区和弱线组合，建立用于打开套筒的撕裂带。

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