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    • 1. 发明申请
    • Method and Apparatus for Reviewing Defect
    • 检查缺陷的方法和装置
    • US20090002695A1
    • 2009-01-01
    • US12141955
    • 2008-06-19
    • Keiya SAITOYasuhiro YoshitakeShunichi MatsumotoHidetoshi Nishiyama
    • Keiya SAITOYasuhiro YoshitakeShunichi MatsumotoHidetoshi Nishiyama
    • G01N21/88G01N23/00
    • G01N21/8806G01N21/9501G01N2021/8822G01N2021/8861G02B21/0032G02B21/0072
    • The present invention provides an apparatus and a method for reviewing a defect with high throughput by detecting the defect to be reviewed with high sensitivity, comprising: an optical microscope; a correction means; and a scanning electron microscope which reviews the defect existed on the sample; wherein the optical microscope has: an optical height detection system which optically detects a vertical position of an upper surface of the sample placed on the stage; an illumination optical system which illuminates the defect with light; an image detection optical system which converges and detects reflected light or scattered light generated from the defect illuminated by the illumination optical system to obtain an image signal; and a focus adjusting means which adjusts a focus position of the optical microscope based on the vertical position of the upper surface of the sample, which is detected by the optical height detection system.
    • 本发明提供一种通过以高灵敏度检测待检查的缺陷来检查具有高通量的缺陷的装置和方法,包括:光学显微镜; 修正手段; 和扫描电子显微镜检查样品上存在的缺陷; 其中所述光学显微镜具有:光学高度检测系统,其光学地检测放置在所述台上的样品的上表面的垂直位置; 用光照亮缺陷的照明光学系统; 会聚和检测由照明光学系统照射的缺陷产生的反射光或散射光以获得图像信号的图像检测光学系统; 以及焦点调节装置,其基于由光学高度检测系统检测到的样品的上表面的垂直位置来调节光学显微镜的焦点位置。
    • 2. 发明授权
    • Method and apparatus for reviewing defect
    • 检查缺陷的方法和装置
    • US08045146B2
    • 2011-10-25
    • US12141955
    • 2008-06-19
    • Keiya SaitoYasuhiro YoshitakeShunichi MatsumotoHidetoshi Nishiyama
    • Keiya SaitoYasuhiro YoshitakeShunichi MatsumotoHidetoshi Nishiyama
    • G01N21/00G01J4/00
    • G01N21/8806G01N21/9501G01N2021/8822G01N2021/8861G02B21/0032G02B21/0072
    • The present invention provides an apparatus and a method for reviewing a defect with high throughput by detecting the defect to be reviewed with high sensitivity, comprising: an optical microscope; a correction means; and a scanning electron microscope which reviews the existing defect on the sample; wherein the optical microscope has: an optical height detection system which optically detects a vertical position of an upper surface of the sample placed on the stage; an illumination optical system which illuminates the defect with light; an image detection optical system which converges and detects reflected light or scattered light generated from the defect illuminated by the illumination optical system to obtain an image signal; and a focus adjusting means which adjusts a focus position of the optical microscope based on the vertical position of the upper surface of the sample, which is detected by the optical height detection system.
    • 本发明提供一种通过以高灵敏度检测待检查的缺陷来检查具有高通量的缺陷的装置和方法,包括:光学显微镜; 修正手段; 和扫描电子显微镜,用于回顾样品上现有的缺陷; 其中所述光学显微镜具有:光学高度检测系统,其光学地检测放置在所述台上的样品的上表面的垂直位置; 用光照亮缺陷的照明光学系统; 会聚和检测由照明光学系统照射的缺陷产生的反射光或散射光以获得图像信号的图像检测光学系统; 以及焦点调节装置,其基于由光学高度检测系统检测到的样本的上表面的垂直位置来调整光学显微镜的对焦位置。