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1. 发明授权

US5733688A Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber 失效
标题翻译：平版印刷掩模结构及其制造方法，包括W和钼合金吸收体
公开(公告)号：US5733688A
公开(公告)日：1998-03-31
申请号：US570686
申请日：1995-12-11
申请人： Hideo Kato , Masao Sugata , Keiko Chiba , Hiroshi Maehara
发明人： Hideo Kato , Masao Sugata , Keiko Chiba , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F9/00
CPC分类号： G03F1/22
摘要： A mask suitably usable in X-ray lithography has a membrane and a radiation absorbing material pattern formed on the membrane, wherein the radiation absorbing material pattern contains an alloy including tungsten (W) and molybdenum (Mo), the proportion of the molybdenum content to the alloy being in a range of 0.1-50 wt %, the alloy having crystal precedence orientation of {110}. In one preferred form, the absorbing material pattern is provided on an amolphous metal layer formed on the mask membrane.
摘要翻译：适用于X射线光刻的掩模具有在膜上形成的膜和辐射吸收材料图案，其中辐射吸收材料图案包含包含钨（W）和钼（Mo）的合金，钼含量与该合金的范围为0.1-50wt％，晶体优先取向为{110}的合金。在一个优选形式中，吸收材料图案设置在形成在掩模膜上的淀粉金属层上。

2. 发明授权

US5882826A Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask 失效
标题翻译：膜和掩模以及使用该掩模的曝光装置，以及使用该掩模的装置制造方法
公开(公告)号：US5882826A
公开(公告)日：1999-03-16
申请号：US680796
申请日：1996-07-16
申请人： Hideo Kato , Keiko Chiba , Hiroshi Maehara
发明人： Hideo Kato , Keiko Chiba , Hiroshi Maehara
IPC分类号： B32B9/00 , C23C14/06 , C23C16/30 , G03F1/22 , G03F1/76 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F1/22
摘要： X-ray or vacuum-ultraviolet-ray transmissive mask membrane is constituted by a laminated film. The laminated film is obtained by continuously forming a SiCN film on one of or each of sides of a SiC film. Thereby, a membrane, which is superior in physical or mechanical strength and in surface conditions and optical transmittance, is provided. Moreover, there is provided a mask using the membrane.
摘要翻译： X射线或真空紫外线透射掩模膜由层叠膜构成。层叠膜通过在SiC膜的一侧或每侧上连续形成SiCN膜而获得。因此，提供了物理或机械强度以及表面条件和光透射性优异的膜。此外，提供了使用膜的掩模。

3. 发明授权

US06337161B2 Mask structure exposure method 有权
标题翻译：面膜结构曝光方法
公开(公告)号：US06337161B2
公开(公告)日：2002-01-08
申请号：US09161372
申请日：1998-09-28
申请人： Keiko Chiba , Hideo Kato , Hiroshi Maehara
发明人： Keiko Chiba , Hideo Kato , Hiroshi Maehara
IPC分类号： G03F900
CPC分类号： G03F1/22 , G03F1/62
摘要： A mask structure to be used for X-ray exposure or the like in manufacturing semiconductor devices prevents contaminants from adhering and accumulating on the surface of a mask, thereby extending the life of the mask. In this mask structure, titanium oxide films are formed on front and back pellicles that protect a mask, composed of a support film and an X-ray absorber, from dust or the like. Titanium oxide decomposes contaminants by functioning as a photocatalyst, and prevents the adhesion and accumulation of contaminants by an antistatic function based on photoconductivity. When a titanium oxide film is formed on the surface of the mask itself, it is preferable that the film be formed outside the exposure area or the like.
摘要翻译：在制造半导体器件中用于X射线曝光等的掩模结构防止污染物粘附并积聚在掩模的表面上，从而延长掩模的使用寿命。在该掩模结构中，在保护由支撑膜和X射线吸收体构成的掩模的灰尘等上的前面和后面防护薄膜上形成氧化钛膜。氧化钛通过作为光催化剂起作用来分解污染物，并且通过基于光电导性的抗静电功能来防止污染物的粘附和积累。当在掩模本身的表面上形成氧化钛膜时，优选将膜形成在曝光区域等之外。

4. 发明授权

US4735877A Lithographic mask structure and lithographic process 失效
标题翻译：平版印刷掩模结构和光刻工艺
公开(公告)号：US4735877A
公开(公告)日：1988-04-05
申请号：US915376
申请日：1986-10-06
申请人： Hideo Kato , Yoshie Izawa , Keiko Chiba
发明人： Hideo Kato , Yoshie Izawa , Keiko Chiba
IPC分类号： G03F1/22 , G03F7/20 , G03F7/10
CPC分类号： G03F1/22 , G03F7/7035 , G03F7/70375
摘要： There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise.
摘要翻译：公开了一种光刻掩模结构，其包括掩模材料支撑膜和用于在外围支撑掩模材料支撑膜的环形支撑基板，所述掩模材料支撑膜含有荧光物质。还公开了一种光刻工艺，用于将感光材料暴露于通过图案化地设置有掩模材料的掩模材料支撑膜的辐射束照射。

5. 发明授权

US06317274B1 Optical element 有权
标题翻译：光学元件
公开(公告)号：US06317274B1
公开(公告)日：2001-11-13
申请号：US09533691
申请日：2000-03-23
申请人： Hideo Kato , Hiroshi Maehara
发明人： Hideo Kato , Hiroshi Maehara
IPC分类号： G02B308
CPC分类号： G03F7/70058 , G02B5/1866 , G02B5/1876 , G03F7/70216
摘要： An optical element includes a first substrate having a diffractive surface or a surface structure with a surface level difference, a second substrate for covering the diffractive surface or the surface structure to provide a shield therefor, and a groove provided at the diffractive surface or the surface structure, and extending from a central portion to a peripheral portion thereof, for discharging or replacing a gas at the diffractive surface or the surface structure therethrough.
摘要翻译：光学元件包括具有衍射面或具有表面水平差的表面结构的第一衬底，用于覆盖衍射表面或表面结构以提供其屏蔽的第二衬底，以及设置在衍射表面或表面处的凹槽结构，并且从中心部分延伸到其周边部分，用于排出或替换通过其中的衍射表面或表面结构处的气体。

6. 发明授权

US06795166B2 Illuminator, exposure apparatus, and method for fabricating device using the same 失效
标题翻译：照明器，曝光装置及使用其的装置的制造方法
公开(公告)号：US06795166B2
公开(公告)日：2004-09-21
申请号：US09159775
申请日：1998-09-24
申请人： Hideo Kato , Hiroshi Maehara
发明人： Hideo Kato , Hiroshi Maehara
IPC分类号： G03B2754
CPC分类号： G03F7/70958 , G03F7/70158 , G03F7/70316 , G03F7/70741 , G03F7/70916
摘要： In a projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting the pattern onto a wafer with a projection optical system, a titanium oxide (TiO2) film is provided on the surface of at least one optical unit in the projection aligner. Thus, contamination of the projection aligner can be reduced.
摘要翻译：在用于通过照明系统从光源照射掩模上的图案并将图案投射到晶片上的投影对准器中，在投影光学系统的表面上设置氧化钛（TiO 2）膜投影对准器中的至少一个光学单元。因此，可以减少投影对准器的污染。

7. 发明授权

US06652781B2 Method for manufacture of optical element 失效
标题翻译：光学元件制造方法
公开(公告)号：US06652781B2
公开(公告)日：2003-11-25
申请号：US09754311
申请日：2001-01-05
申请人： Hideo Kato , Hiroshi Maehara , Makoto Ogusu
发明人： Hideo Kato , Hiroshi Maehara , Makoto Ogusu
IPC分类号： B29D1100
CPC分类号： B29D11/00769 , B29D11/00009 , G02B3/00 , G02B5/1852 , G03F7/70058 , G03F7/70241
摘要： In a method for manufacture of an optical element, a thin film is formed on a surface, such as a grating surface, an aspherical surface or a spherical surface, formed on a mold. Then, a substrate is bonded to the thin film. Subsequently, the thin film and the substrate are separated from the mold.
摘要翻译：在制造光学元件的方法中，在形成在模具上的表面，例如光栅表面，非球面或球面上形成薄膜。然后，将基板粘合到薄膜上。随后，将薄膜和基底与模具分离。

8. 发明授权

US06476968B1 Optical element 失效
标题翻译：光学元件
公开(公告)号：US06476968B1
公开(公告)日：2002-11-05
申请号：US09672316
申请日：2000-09-29
申请人： Hideo Kato , Hiroshi Maehara
发明人： Hideo Kato , Hiroshi Maehara
IPC分类号： G02B2744
CPC分类号： G02B5/1876 , G02B1/02
摘要： Disclosed is an optical element including a substrate made of a monocrystal of a fluoride compound, and a fine structure formed on the substrate and made of a non-monocrystal of metal fluoride. Also disclosed are an optical system having such optical element, and an exposure apparatus having such optical system incorporated therein.
摘要翻译：公开了一种光学元件，包括由氟化物的单晶制成的基板和形成在基板上并由金属氟化物的非单晶构成的微细结构。还公开了具有这种光学元件的光学系统，以及其中并入有这种光学系统的曝光装置。

9. 发明授权

US08649360B2 Wireless base station and signal processing method 有权
标题翻译：无线基站和信号处理方法
公开(公告)号：US08649360B2
公开(公告)日：2014-02-11
申请号：US13094422
申请日：2011-04-26
申请人： Shinichiro Kobayashi , Hideo Kato , Yoshihisa Nakayama
发明人： Shinichiro Kobayashi , Hideo Kato , Yoshihisa Nakayama
IPC分类号： H04W4/00
CPC分类号： H04J13/0003 , H04J13/16 , H04J13/18 , H04L5/0007 , H04L5/001 , H04L5/0014 , H04L5/0021 , H04L27/2601 , H04L27/2626 , H04L27/2633 , H04W72/00 , H04W88/08
摘要： A total of n signal processing circuits respectively constituted by independent circuit blocks process signals at the Data Link and Physical Layers. The signal processing circuits are associated with respective n groups of M/n subcarriers each, to process signals at the Data Link and Physical Layers. For example, the signal processing circuit independently processes signals of the subcarrier group at the Data Link and Physical Layers, the signal processing circuit independently processes signals of the subcarrier group at the Data Link and Physical Layers, and so on. The signal processing circuit independently processes signals of the subcarrier group at the Data Link and Physical Layers.
摘要翻译：分别由独立电路块构成的n个信号处理电路在数据链路和物理层处理信号。信号处理电路分别与各n个M / n个子载波相关联，以处理数据链路和物理层上的信号。例如，信号处理电路独立地处理数据链路和物理层上的子载波组的信号，信号处理电路独立地处理数据链路和物理层等子载波组的信号，等等。信号处理电路独立地处理数据链路和物理层上的子载波组的信号。

10. 发明授权

US08221923B2 Stop method for fuel cell system and fuel cell system 有权
标题翻译：燃料电池系统和燃料电池系统的停止方法
公开(公告)号：US08221923B2
公开(公告)日：2012-07-17
申请号：US11481679
申请日：2006-07-06
申请人： Shigeru Inai , Hiromichi Yoshida , Hideo Kato , Katsumi Hayashi , Ryo Jinba , Nobuyuki Matsumoto , Takahiro Takai , Masao Utsunomiya
发明人： Shigeru Inai , Hiromichi Yoshida , Hideo Kato , Katsumi Hayashi , Ryo Jinba , Nobuyuki Matsumoto , Takahiro Takai , Masao Utsunomiya
IPC分类号： H01M8/04
CPC分类号： H01M8/04231 , B60L11/1881 , B60L11/1885 , B60L11/1888 , B60L11/1892 , B60L11/1896 , H01M8/04097 , H01M2250/20 , Y02T90/32 , Y02T90/34
摘要： A stop method for a fuel cell system including a fuel cell unit in which hydrogen is supplied to an anode, and air is supplied to a cathode so as to generate electrical power via an electrochemical reaction. The stop method includes the steps of stopping supply of hydrogen to the anode, electrically connecting the anode and the cathode via an electrical load, and supplying air to the anode.
摘要翻译：一种用于燃料电池系统的停止方法，该燃料电池系统包括将氢气供应到阳极的燃料电池单元，并且向阴极供应空气以通过电化学反应产生电力。停止方法包括以下步骤：停止向阳极供应氢，通过电负载电连接阳极和阴极，并向阳极供应空气。

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