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1. 发明授权

US08319193B2 Charged particle beam apparatus, and method of controlling the same 有权
标题翻译：带电粒子束装置及其控制方法
公开(公告)号：US08319193B2
公开(公告)日：2012-11-27
申请号：US12999075
申请日：2009-06-10
申请人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
发明人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
IPC分类号： H01J27/26
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1×10−2sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译：提供一种带电粒子束装置，其能够发射具有高亮度和窄能量宽度的稳定电子束。带电粒子束装置包括场发射电子源，用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在10×10 8 Pa以下的真空排气单元。该装置构成为使用发射的电子束中心辐射角为1×10-2sr以下的电子束，并使用其电流，其二阶微分为负或相对于时间为零，并以每小时10％或更少的速率减少。带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。重复加热场致发射电子源以使电子束的电流保持在规定值以上。

2. 发明授权

US08772735B2 Charged particle beam apparatus, and method of controlling the same 有权
标题翻译：带电粒子束装置及其控制方法
公开(公告)号：US08772735B2
公开(公告)日：2014-07-08
申请号：US13666119
申请日：2012-11-01
申请人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
发明人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
IPC分类号： H01J1/304
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： A charged particle beam apparatus includes a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10−8 Pa or less. The apparatus uses electron beams emitted to have an electron-beam-center radiation angle of 1×10−2 sr or less, and uses the electric current thereof, the second order differentiation of which is negative or zero with respect to time, and which reduces at a rate of 10% or less per hour. A heating unit is provided for the field emission electron source, and a detection unit is provided for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译：带电粒子束装置包括场致发射电子源，用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在1×10 -8 Pa以下的真空排气单元。该装置使用发射的电子束具有1×10 -2 sr以下的电子束中心辐射角，并使用其电流，其二阶微分相对于时间为负或为零，其中以每小时10％或更少的速度减少。为场发射电子源提供加热单元，为电子束的电流提供检测单元。重复加热场致发射电子源以使电子束的电流保持在规定值以上。

3. 发明申请

US20110089336A1 CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME 有权
标题翻译：充电颗粒光束装置及其控制方法
公开(公告)号：US20110089336A1
公开(公告)日：2011-04-21
申请号：US12999075
申请日：2009-06-10
申请人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
发明人： Keigo Kasuya , Takashi Ohshima , Souichi Katagiri , Shigeru Kokubo , Hideo Todokoro
IPC分类号： H01J27/26 , H01J27/00
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vaccume exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1 10−2 str or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译：提供一种带电粒子束装置，其能够发射具有高亮度和窄能量宽度的稳定电子束。带电粒子束装置包括场致发射电子源，用于向场致发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在10×10 8 Pa以下的疫苗排气单元。该装置构成为使用发射的电子束中心辐射角为1×10 -2 str以下的电子束，并使用其电流，其二阶微分为负或相对于时间为零，并以每小时10％或更少的速率减少。带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。重复加热场致发射电子源以使电子束的电流保持在规定值以上。

4. 发明授权

US08835844B2 Sample electrification measurement method and charged particle beam apparatus 有权
标题翻译：样品充电测量方法和带电粒子束装置
公开(公告)号：US08835844B2
公开(公告)日：2014-09-16
申请号：US12710679
申请日：2010-02-23
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G01N23/04 , G01N23/225 , H01J37/28 , H01J37/244 , H01J37/21 , H01J37/26
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译：本发明的目的是提供一种理想的减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动由于在指定位置处的静电电荷的波动而发生。

5. 发明授权

US08604430B2 Method and an apparatus of an inspection system using an electron beam 有权
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US08604430B2
公开(公告)日：2013-12-10
申请号：US13366874
申请日：2012-02-06
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector scans the beam over a sample, an objective lens converges the electron beam on the sample, a detector located between the sample and the objective lens detects charged particles emitted from the sample, a power supply applies a retarding voltage to the sample for decelerating the electron beam to the sample, an electrode is disposed between the objective lens and the sample, and a voltage is generated between the sample and the electrode by said electrode, the voltage being determined depending on the sample. The apparatus solves problems encountered in conventional inspection systems.
摘要翻译：所公开的检查装置产生电子束，加速电极加速电子束，会聚透镜会聚电子束，电子束偏转器扫描样品上的光束，物镜会将电子束会聚在样品上，检测器位于在样品和物镜之间检测从样品发射的带电粒子，电源向样品施加延迟电压以将电子束减速到样品，电极设置在物镜和样品之间，电压为通过所述电极在样品和电极之间产生，电压根据样品确定。该装置解决了常规检测系统遇到的问题。

6. 发明授权

US07977632B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07977632B2
公开(公告)日：2011-07-12
申请号：US12253476
申请日：2008-10-17
申请人： Hideo Todokoro , Makoto Ezumi , Yasutsugu Usami
发明人： Hideo Todokoro , Makoto Ezumi , Yasutsugu Usami
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/0045 , H01J2237/0048 , H01J2237/04735 , H01J2237/04756 , H01J2237/281 , H01J2237/31701
摘要： To make it possible to observe the bottom of a contact hole and internal wires, in observation of the contact hole 102, by scanning it at a predetermined acceleration voltage, the positive charge 106 is formed on the surface of the insulator 101, and the secondary electrons 104 are attracted in the hole by this electric field, and the hole is continuously scanned at an acceleration voltage different from the acceleration voltage, and the sample is observed. When the wires embedded in the insulator are to be observed, by observing the insulator at a predetermined acceleration voltage, an electron beam is allowed to enter the sample, and the sample is continuously scanned at an acceleration voltage different from the acceleration voltage, and hence the existence of wires is reflected as a change in the charge of the surface, and it is observed. In either case, the acceleration voltage before observation is different from the one during observation, and the sample surface is temporarily radiated at an acceleration voltage positively generating a positive or negative charge, and thereafter, the acceleration voltage is returned to a one suited to observation, and the sample is observed.
摘要翻译：为了可以观察接触孔和内部电线的底部，在观察接触孔102时，通过以预定的加速电压扫描，正电荷106形成在绝缘体101的表面上，次级电子104通过该电场被吸引在孔中，并且以与加速电压不同的加速电压连续地扫描孔，并且观察样品。当要观察嵌入在绝缘体中的电线时，通过以预定的加速电压观察绝缘体，允许电子束进入样品，并且以不同于加速电压的加速电压连续扫描样品，因此电线的存在被反映为表面电荷的变化，并且被观察。在任一种情况下，观察前的加速电压与观察期间的加速电压不同，并且以正向或正负电荷的正电荷的加速电压暂时照射样品表面，然后将加速电压恢复为适合于观察的加速电压，并观察样品。

7. 发明授权

US07838827B2 Monochromator and scanning electron microscope using the same 有权
标题翻译：单色器和扫描电子显微镜使用相同
公开(公告)号：US07838827B2
公开(公告)日：2010-11-23
申请号：US11987018
申请日：2007-11-26
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/05
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要翻译：本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场在与包含狭缝的表面形成对称镜的位置处。该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

8. 发明授权

US07800059B2 Method of forming a sample image and charged particle beam apparatus 有权
标题翻译：形成样品图像和带电粒子束装置的方法
公开(公告)号：US07800059B2
公开(公告)日：2010-09-21
申请号：US12073359
申请日：2008-03-04
申请人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
发明人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
IPC分类号： G01N23/22 , H01J37/26 , H01J37/28 , G21K7/00
CPC分类号： G01N23/22 , H01J37/222 , H01J37/28
摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.
摘要翻译：本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置。为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

9. 发明授权

US07700918B2 Sample electrification measurement method and charged particle beam apparatus 有权
标题翻译：样品充电测量方法和带电粒子束装置
公开(公告)号：US07700918B2
公开(公告)日：2010-04-20
申请号：US12076355
申请日：2008-03-17
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G01N23/00 , H01J37/28 , G01R19/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译：本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动由于在指定位置处的静电电荷的波动而发生。

10. 发明申请

US20080265161A1 Electron Microscope And Electron Beam Inspection System 审中-公开
标题翻译：电子显微镜和电子束检测系统
公开(公告)号：US20080265161A1
公开(公告)日：2008-10-30
申请号：US12144060
申请日：2008-06-23
申请人： Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
发明人： Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
IPC分类号： G21K7/00
CPC分类号： H01J37/29 , H01J37/147 , H01J2237/1508 , H01J2237/2538 , H01J2237/28
摘要： An electron microscope includes an electron source, a stage for mounting a specimen, an illuminating lens system that illuminates an electron beam onto the specimen, an imaging lens system that forms a specimen image using a reflecting electron beam of the illuminating electron beam, a beam separator that separates the illuminating electron beam and the reflecting electron beam, a control unit that controls current to be supplied to the beam separator; and a switching unit which enables switching between a first mode and a second mode. The control unit changes a value of the current to be supplied to the beam separator when switching from the first mode to the second mode.
摘要翻译：电子显微镜包括电子源，用于安装样本的台，将样品照射电子束的照明透镜系统，使用照射电子束的反射电子束形成标本图像的成像透镜系统，光束分离器，其分离照明电子束和反射电子束;控制单元，其控制供给到光束分离器的电流; 以及能够在第一模式和第二模式之间切换的切换单元。当从第一模式切换到第二模式时，控制单元改变要提供给分束器的电流的值。

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