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    • 7. 发明申请
    • Method of forming projecting film
    • 形成投影膜的方法
    • US20050019528A1
    • 2005-01-27
    • US10868261
    • 2004-06-14
    • Tetsuya YoshitakeToshifumi Tsujino
    • Tetsuya YoshitakeToshifumi Tsujino
    • C03C17/25C03C17/34C03C17/36G02B5/02G02B5/08G02B5/09G02F1/1335G02F1/13357B32B1/00D06N7/04
    • G02B1/10C03C17/25C03C17/3417C03C17/36C03C2217/212C03C2217/213C03C2217/734C03C2218/113G02B5/0221G02B5/0268G02B5/0284Y10T428/24355
    • By establishing a projecting part control method that enables the same application liquid to be used for a plurality of different scattering property requirements, there is provided a method of forming a projecting film according to which an increase in the number of times of preparing an application liquid and the frequency of replacing the application liquid can be suppressed, and hence the uptime ratio of coating equipment can be prevented from dropping, and thus the manufacturing cost can be reduced. The method of forming a projecting film comprises a formation step of applying a sol-form application liquid comprising at least one film component and at least two solvents onto a glass substrate 20 to form an applied layer 41, a phase separation step of drying the applied layer 41 to selectively remove at least one of the solvents that acted effectively to homogenize the applied layer 41, thus carrying out phase separation between at least one of the solvents that acts effectively to cause phase separation and at least one of the film components, or between a plurality of the film components, by utilizing a difference in surface tension between at least one of the solvents that acts effectively to cause phase separation and at least one of the film components, or between a plurality of the film components, and a gelation step of removing the solvents to gelate the film components. The drying temperature in the drying of the applied layer 41 is controlled within a range of 200 to 500° C., and the drying time is controlled within a range of 1 minute to 24 hours.
    • 通过建立使得相同的涂布液能够用于多种不同散射特性要求的突出部分控制方法,提供了一种形成突起膜的方法,根据该方法,制备涂布液的次数增加 能够抑制更换涂布液的频率,能够防止涂布装置的正常运转时间的下降,能够降低制造成本。 形成突出膜的方法包括:将包含至少一种膜成分和至少两种溶剂的溶胶型涂布液施加到玻璃基板20上以形成涂布层41的形成步骤, 层41以选择性地除去至少一种有效地作用以使施加的层41均匀化的溶剂,从而在有效地引起相分离的至少一种溶剂之间进行相分离,并且至少一种膜组分,或 在多个膜组分之间,通过利用有效地引起相分离的至少一种溶剂与至少一种膜组分之间或多个膜组分之间的表面张力差和凝胶化 去除溶剂以使膜组分胶凝的步骤。 施加层41的干燥中的干燥温度控制在200〜500℃的范围内,干燥时间控制在1分钟〜24小时的范围内。
    • 10. 发明授权
    • Low-reflectance glass article and process for preparing the same
    • 低反射玻璃制品及其制备方法
    • US06379803B1
    • 2002-04-30
    • US09230901
    • 1999-02-03
    • Koichiro NakamuraToshifumi TsujinoKoji Yokoi
    • Koichiro NakamuraToshifumi TsujinoKoji Yokoi
    • C03C1734
    • C03C17/3417G02B1/115Y10T428/24942Y10T428/24975
    • The present invention is a low reflection glass article which is prepared by laminating a first layer which has a middle refractive index (n1) from 1.60 to 1.95 and has a film thickness of (60 to 130 nm)/n1, a second layer which has a high refractive index (n2) which is in a range from 1.91 to 2.60 and higher than the refractive index of said first layer by at least 0.20 and has a film thickness of (140 to 230 nm)/n2, and a third layer which has a low refractive index (n3) which is in a range from 1.35 to 1.59 and lower than the refractive index of said first layer by at least 0.20 and has a film thickness of (110 to 150 nm)/n3 in this order on a transparent glass substrate having a refractive index from 1.47 to 1.53, wherein said second layer contains titanium oxide and other metal oxides in an amount of 70 mol % or more in total, said third layer contains a silicon oxide in an amount from 50 to 100 mol % and said metal oxides in an amount from 0 to 10 mol % in total, and said first layer contains a silicon oxide in an amount from 15 to 80 mol % and said metal oxides in an amount from 20 to 70 mol % in total. According to the present invention, there can be provided a low reflection glass article coated with an optical multi-layer film which can reduce the reflectivity in wide visible light range.
    • 本发明是一种低反射玻璃制品,其通过层压具有1.60至1.95的中折射率(n1)从而具有(60-130nm)/ n1的膜厚度的第一层,其具有 高折射率(n2)在1.91至2.60的范围内并且高于所述第一层的折射率至少为0.20并具有(140至230nm)/ n2的膜厚度,以及第三层, 具有低折射率(n3),其在1.35至1.59的范围内,并且低于所述第一层的折射率至少0.20,并且具有(110至150nm)/ n3的膜厚度 折射率为1.47〜1.53的透明玻璃基板,其中所述第二层含有氧化钛和总共为70摩尔%以上的其它金属氧化物,所述第三层含有50〜100摩尔的氧化硅 %,所述金属氧化物的总量为0〜10摩尔%,前述1 ayer含有15至80摩尔%的氧化硅和所述金属氧化物的总量为20至70摩尔%。根据本发明,可以提供一种涂覆有光学多层的低反射玻璃制品 可以在宽的可见光范围内降低反射率。