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1. 发明授权

US07140947B2 Barrel polishing method and barrel polishing apparatus 有权
标题翻译：桶式抛光方法和滚筒抛光装置
公开(公告)号：US07140947B2
公开(公告)日：2006-11-28
申请号：US11135601
申请日：2005-05-23
申请人： Kazutoshi Nishimura , Takao Ishida , Yoshihiro Masuda
发明人： Kazutoshi Nishimura , Takao Ishida , Yoshihiro Masuda
IPC分类号： B24B1/00 , B24B49/00
CPC分类号： B24B31/108
摘要： Barrel polishing is effected while causing a mass (M) consisting of work and media (polishing material) to rotation-flow by rotating a rotary disk installed in the bottom of a polishing tank by a drive motor. A load on the drive motor for the rotary disk is preset as by a load current value, and the flow of the mass (M) in the polishing tank is controlled, thereby effecting polishing while maintaining the load on the drive motor within the preset range.
摘要翻译：通过驱动马达旋转安装在抛光槽底部的旋转盘，同时通过工作和介质（抛光材料）组成的质量（M）进行滚筒抛光。用于旋转盘的驱动电动机上的负载是通过负载电流值预设的，并且控制抛光槽中的质量（M）的流动，从而在将驱动电动机上的负载保持在预设范围内的同时进行抛光。

2. 发明申请

US20060116053A1 Barrel polishing method and barrel polishing apparatus 有权
公开(公告)号：US20060116053A1
公开(公告)日：2006-06-01
申请号：US11135601
申请日：2005-05-23
申请人： Kazutoshi Nishimura , Takao Ishida , Yoshihiro Masuda
发明人： Kazutoshi Nishimura , Takao Ishida , Yoshihiro Masuda
IPC分类号： B24B1/00 , B24B31/00
CPC分类号： B24B31/108
摘要： Barrel polishing is effected while causing a mass (M) consisting of work and media (polishing material) to rotation-flow by rotating a rotary disk installed in the bottom of a polishing tank by a drive motor. A load on the drive motor for the rotary disk is preset as by a load current value, and the flow of the mass (M) in the polishing tank is controlled, thereby effecting polishing while maintaining the load on the drive motor within the preset range.

3. 发明授权

US5476415A Dry barrel finishing machine 失效
标题翻译：干桶整理机
公开(公告)号：US5476415A
公开(公告)日：1995-12-19
申请号：US141267
申请日：1993-10-22
申请人： Kazutoshi Nishimura , Yoshinori Kohketsu , Takao Ishida
发明人： Kazutoshi Nishimura , Yoshinori Kohketsu , Takao Ishida
IPC分类号： B24B31/108 , B24B31/12 , B24B31/00
CPC分类号： B24B31/12 , B24B31/108
摘要： An improved dry barrel finishing machine is described, in which a mass consisting of media and workpieces is flowed in the barrel of the machine for abrasive finishing of the workpieces and in which air suction is used to remove dust resulting from the finishing operation and to cool the barrel and the mass. The mass is flowed by rotation of the barrel by a motor or through the vibration of the barrel by a driving mechanism. Air inlets and outlets are provided in the barrel. An air suction device draws air through the barrel and around the workpieces and media during the finishing operation. The drawn out air picks up dust and media particles resulting from the abrasive finishing operation and cools the media and the barrel.
摘要翻译：描述了一种改进的干燥桶整理机，其中由介质和工件组成的组合物在机器的机筒中流动，用于工件的研磨抛光，并且其中使用空气抽吸来去除由精加工操作引起的灰尘并且冷却桶和质量。质量通过电动机的筒的旋转或通过驱动机构的筒的振动而流动。枪管内设有进气口和出气口。吸气装置在整理操作期间通过筒体和周围的工件和介质吸入空气。抽出的空气拾取磨料整理操作产生的灰尘和介质颗粒，并冷却介质和桶。

4. 发明授权

US5733172A Dry barrel finishing machine having a device to wet media 失效
标题翻译：干桶整理机具有用于湿介质的装置
公开(公告)号：US5733172A
公开(公告)日：1998-03-31
申请号：US651333
申请日：1996-05-22
申请人： Kazutoshi Nishimura , Masatomo Watanabe , Takao Ishida , Satoshi Niwa , Mikitoshi Hiraga
发明人： Kazutoshi Nishimura , Masatomo Watanabe , Takao Ishida , Satoshi Niwa , Mikitoshi Hiraga
IPC分类号： B24B31/00 , B24B55/02
CPC分类号： B24B31/00 , B24B55/02
摘要： A dry barrel finishing machine is disclosed. The machine includes a device to drip or spray water to wet the surface of media. The faucet of the device is located adjacent or in the barrel or barrels of the finishing machine so that it can spray water on media in the barrel or barrels. The media is cooled by the sprayed water. Since the sprayed water wets and softens the surface of the media, attrition dust on the surface of the media is easily removed during attrition. Also, since the wetted surface of the media tends to peel, it is self-sharpened. Thus the media always keeps its abrasive ability.
摘要翻译：公开了干桶整理机。该机器包括用于滴水或喷洒水以润湿介质表面的装置。设备的龙头位于整理机的桶或桶的相邻或相对的位置，使得其可以将水喷射到桶或桶中的介质上。介质由喷射水冷却。由于喷涂的水润湿并使介质的表面变软，因此在磨损过程中容易除去介质表面上的磨屑。此外，由于介质的润湿表面倾向于剥离，因此其自锐化。因此，媒体始终保持其磨蚀能力。

5. 发明授权

US06921718B2 Semiconductor device and method of manufacturing the same 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US06921718B2
公开(公告)日：2005-07-26
申请号：US10408258
申请日：2003-04-08
申请人： Naoto Andoh , Takao Ishida , Kenji Hosogi
发明人： Naoto Andoh , Takao Ishida , Kenji Hosogi
IPC分类号： H01L23/52 , H01L21/3205 , H01L21/768 , H01L21/311
CPC分类号： H01L21/76898
摘要： A semiconductor device includes a semiconductor substrate and an electrode disposed on a major surface of the semiconductor substrate. A via hole is formed on a center of the electrode so as to open from a surface of the electrode to a place under the surface of the semiconductor substrate. A via-hole foundation electrode for inhibiting diffusion from a metal layer is formed inside the via hole and on the surface of the electrode, a via-hole electrode is formed on the surface of the via-hole foundation electrode. A back via hole is formed on the back of the semiconductor substrate opposite to the major surface thereof, and opened from the back of the semiconductor substrate to the via-hole electrode. A back via-hole electrode is formed on the back of the semiconductor substrate including the inside of the back via hole.
摘要翻译：半导体器件包括半导体衬底和设置在半导体衬底的主表面上的电极。在电极的中心形成通孔，从电极的表面向半导体衬底的表面下方的位置开口。在通孔内形成有用于抑制从金属层扩散的通孔基础电极，在电极表面上，在通孔基础电极的表面上形成通孔电极。在半导体衬底的与其主表面相对的背面上形成背部通孔，并且从半导体衬底的背面开口到通孔电极。背部通孔电极形成在包括背部通孔内侧的半导体衬底的背面上。

6. 发明授权

US06391770B1 Method of manufacturing semiconductor device 有权
公开(公告)号：US06391770B1
公开(公告)日：2002-05-21
申请号：US09876044
申请日：2001-06-08
申请人： Katsuya Kosaki , Masahiro Tamaki , Takao Ishida
发明人： Katsuya Kosaki , Masahiro Tamaki , Takao Ishida
IPC分类号： H01L2144
摘要： In a semiconductor device, an opening having a high aspect ratio from a back surface of a GaAs substrate and is formed by anisotropic dry etching. After an Au film is deposited on the entire back surface of the GaAs substrate, including inside of the opening, a Ni alloy is non-electrolytically plated. The Ni film can also be deposited on the inner wall and bottom of the opening. An IC substrate or FET may have the Ni film only at an area corresponding to the via hole. The back surface of the IC substrate or FET and the front surface of a package substrate are bonded to each other by AuSn solder poorly wetting the Ni film.

7. 发明授权

US06268619B1 Semiconductor device with high aspect ratio via hole including solder repelling coating 失效
标题翻译：具有高纵横比通孔的半导体器件，包括焊料排斥涂层
公开(公告)号：US06268619B1
公开(公告)日：2001-07-31
申请号：US09038090
申请日：1998-03-11
申请人： Katsuya Kosaki , Masahiro Tamaki , Takao Ishida
发明人： Katsuya Kosaki , Masahiro Tamaki , Takao Ishida
IPC分类号： H01L2980
CPC分类号： H01L21/76898 , H01L21/76838 , H01L23/481 , H01L2924/0002 , H01L2924/10158 , H01L2924/10329 , H01L2924/00
摘要： In a semiconductor device, an opening having a high aspect ratio extends from a back surface of a GaAs substrate and is formed by anisotropic dry etching. After an Au film is deposited on the entire back surface of the GaAs substrate, including inside of the opening, a Ni alloy is non-electrolytically plated. The Ni film can also be deposited on the inner wall and the bottom of the opening. An IC substrate or FET may have the Ni film only at an area corresponding to the via hole. The back surface of the IC substrate or FET and the front surface of a package substrate are bonded to each other by AuSn solder poorly wetting the Ni film.
摘要翻译：在半导体器件中，具有高纵横比的开口从GaAs衬底的背面延伸并且通过各向异性干蚀刻形成。在Au膜沉积在GaAs衬底的整个背面（包括开口内部）之后，Ni合金是非电解电镀的。 Ni膜也可以沉积在开口的内壁和底部。 IC基板或FET可以仅在对应于通孔的区域具有Ni膜。 IC基板或FET的背面和封装基板的前表面通过AuSn焊料彼此接合，使Ni膜不良润湿。

8. 发明授权

US5739558A High electron mobility transistor including asymmetrical carrier supply layers sandwiching a channel layer 失效
标题翻译：高电子迁移率晶体管包括夹着沟道层的非对称载流子供应层
公开(公告)号：US5739558A
公开(公告)日：1998-04-14
申请号：US786210
申请日：1997-01-21
申请人： Takao Ishida , Naohito Yoshida
发明人： Takao Ishida , Naohito Yoshida
IPC分类号： H01L29/78 , H01L21/338 , H01L29/778 , H01L29/812 , H01L31/0328 , H01L31/0336
CPC分类号： H01L29/7785
摘要： A field effect transistor includes a semi-insulating semiconductor substrate; a buffer layer disposed on the substrate and having a high resistance; a first semiconductor layer disposed on the buffer layer and having a relatively high concentration of a dopant impurity; a second semiconductor layer disposed on the first semiconductor layer and having a relatively low concentration of a dopant impurity; a third semiconductor layer disposed on the second semiconductor layer and having a relatively high concentration of a dopant impurity; a fourth semiconductor layer disposed on the third semiconductor layer; and a gate electrode, a source electrode, and a drain electrode disposed on the fourth semiconductor layer wherein the electron affinity of the second semiconductor layer is larger than that of the first and third semiconductor layers, and the difference between the electron affinities of the first and second semiconductor layers proximate their junction is larger than the difference between the electron affinities of the second and third semiconductor layers proximate their junction. The linearity of an output signal with respect to an input signal is improved so that the field effect transistor has improved distortion characteristics and reduced noise on adjacent lines in frequency multiplexed communication.
摘要翻译：场效应晶体管包括半绝缘半导体衬底; 缓冲层，其设置在所述基板上并具有高电阻; 设置在所述缓冲层上并且具有相对高浓度的掺杂剂杂质的第一半导体层; 第二半导体层，其设置在所述第一半导体层上并且具有相对低的掺杂剂杂质浓度; 第三半导体层，设置在所述第二半导体层上并且具有相对高的掺杂剂杂质浓度; 设置在所述第三半导体层上的第四半导体层; 以及设置在第四半导体层上的栅电极，源电极和漏极，其中第二半导体层的电子亲和力大于第一和第三半导体层的电子亲和力，并且第一和第二半导体层的电子亲和力之间的差异并且靠近其结的第二半导体层大于靠近其结的第二和第三半导体层的电子亲和力之间的差异。改善了输出信号相对于输入信号的线性，使得场效应晶体管具有改善的频率复用通信中相邻线路上的失真特性和降低的噪声。

9. 发明授权

US4607908A Optical deflector 失效
标题翻译：光学偏转器
公开(公告)号：US4607908A
公开(公告)日：1986-08-26
申请号：US735984
申请日：1985-05-20
申请人： Takao Ishida , Yoshitsugu Nakatomi
发明人： Takao Ishida , Yoshitsugu Nakatomi
IPC分类号： F16C32/04 , G02B26/10 , G02B26/12
CPC分类号： F16C39/063 , F16C17/026 , G02B26/121 , F16C2370/22
摘要： In an optical deflector of a polygonal mirror type, a rotating shaft is supported by a pair of journal bearings of a herringbone dynamic pressure type and a magnetic thrust bearing. The magnetic thrust bearing comprises first and second annular magnets. The first annular magnet is coaxially fixed to the shaft and has a first magnetic pole arrangement on its outer surface. The second annular magnet is fixed to a housing, and has its inner surface opposed to the outer surface of the first magnet and magnetized with a pole arrangement different from the pole arrangement of the first magnet, so that the first and second magnet attract one another to suspend the shaft. Ferromagnetic plates are fixed on both upper and lower surfaces of the first and second magnets.
摘要翻译：在多面镜型的光学偏转器中，旋转轴由人字动态压力型和磁性推力轴承的一对轴颈轴承支撑。磁力推力轴承包括第一和第二环形磁体。第一环形磁体同轴地固定到轴上，并且在其外表面上具有第一磁极布置。第二环形磁体被固定到壳体，并且其内表面与第一磁体的外表面相对并且用与第一磁体的磁极布置不同的磁极装置进行磁化，使得第一和第二磁体彼此吸引悬挂轴。铁磁板固定在第一和第二磁体的上表面和下表面上。

10. 发明授权

US5776251A Duplex type coating apparatus and coating system 失效
标题翻译：双相式涂装设备及涂装系统
公开(公告)号：US5776251A
公开(公告)日：1998-07-07
申请号：US720599
申请日：1996-09-30
申请人： Nobuaki Irie , Takao Ishida , Akiyoshi Hashimoto , Yasutomi Yoshimura
发明人： Nobuaki Irie , Takao Ishida , Akiyoshi Hashimoto , Yasutomi Yoshimura
IPC分类号： B05B9/04 , B05C5/02 , B05C9/04 , B05C11/00 , B05C3/02
CPC分类号： B05C5/027 , B05B9/04 , B05C5/0254
摘要： In a duplex type coating apparatus, a left-right pair of dies and are disposed on opposite sides of a carrying path of a web, the dies and are each made up of an upper member and a lower member, a tip part of the lower member projects further toward the carrying path than a tip part of the upper member, and coating liquid discharge passages are inclined in the direction of the carrying path of the web. As a result, because the same amount of coating liquid is discharged from each of the dies and coated onto each side of the web, it is possible to carry out coating at the same coating thickness and in the same position on both sides of the web.
摘要翻译：在双面涂布装置中，左右一对模具设置在幅材的承载路径的相对侧上，该模具各自由上部构件和下部构件构成，下部构件的顶端部分构件比上部构件的顶端进一步向运送路径突出，并且涂布液体排出通道沿着幅材的传送路径的方向倾斜。结果，由于将相同量的涂布液从每个模具中排出并涂布在幅材的每一侧上，所以可以以相同的涂层厚度和在纸幅两侧的相同位置进行涂布。

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