会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING THE SAME
    • 用于磁盘的玻璃基板及其制造方法
    • US20100136372A1
    • 2010-06-03
    • US12628484
    • 2009-12-01
    • Mizuho ISHIDANorihito ShidaKatsuhiro MatsumotoKazuo Mannami
    • Mizuho ISHIDANorihito ShidaKatsuhiro MatsumotoKazuo Mannami
    • G11B5/706B24B1/00
    • G11B5/8404B24B37/24B24D3/32
    • The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 μm and has a thickness of 400 μm or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 μm or less and has a thickness of 50 to 250 μm, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 μm or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
    • 本发明涉及一种用于制造磁盘用玻璃基板的方法,所述方法包括以下步骤:向所述圆形玻璃板的主表面进行抛光,同时向所述抛光材料供给包含抛光材料的抛光浆料 通过使用具有:形成研磨面的第一树脂发泡层的研磨垫,进行敷料处理,包括孔径在20μm以上,厚度为400μm以下的孔的树脂发泡体 ; 以及第二树脂泡沫层,其设置在用于固定所述抛光垫的台板和所述第一树脂发泡层之间,包括具有孔径为20μm以下且具有50〜250μm的厚度的孔的树脂发泡体,以及 其中第一树脂发泡层和第二树脂发泡层的总厚度为550μm以下,通过根据JIS K6253的M法测定的研磨垫的国际橡胶硬度为40IRHD以上。
    • 4. 发明授权
    • Glass substrate for magnetic disk and method for producing the same
    • 磁盘用玻璃基板及其制造方法
    • US08092280B2
    • 2012-01-10
    • US12628484
    • 2009-12-01
    • Mizuho IshidaNorihito ShidaKatsuhiro MatsumotoKazuo Mannami
    • Mizuho IshidaNorihito ShidaKatsuhiro MatsumotoKazuo Mannami
    • B24B7/19C03B17/00G11B5/65
    • G11B5/8404B24B37/24B24D3/32
    • The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 μm and has a thickness of 400 μm or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 μm or less and has a thickness of 50 to 250 μm, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 μm or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
    • 本发明涉及一种用于制造磁盘用玻璃基板的方法,所述方法包括以下步骤:向所述圆形玻璃板的主表面进行抛光,同时向所述抛光材料供给包含抛光材料的抛光浆料 通过使用具有:形成研磨面的第一树脂发泡层的研磨垫,进行敷料处理,包括孔径在20μm以上,厚度为400μm以下的孔的树脂发泡体 ; 以及第二树脂泡沫层,其设置在用于固定所述抛光垫的台板和所述第一树脂发泡层之间,包括具有孔径为20μm以下且具有50〜250μm的厚度的孔的树脂发泡体,以及 其中第一树脂发泡层和第二树脂发泡层的总厚度为550μm以下,通过根据JIS K6253的M法测定的研磨垫的国际橡胶硬度为40IRHD以上。
    • 6. 发明申请
    • DRESSING JIG FOR GLASS SUBSTRATE POLISHING PAD
    • 玻璃衬垫抛光垫
    • US20110117822A1
    • 2011-05-19
    • US12946290
    • 2010-11-15
    • Kenichiro TERADAKazuo MannamiMinoru Tamada
    • Kenichiro TERADAKazuo MannamiMinoru Tamada
    • B24B1/00B24B47/26
    • B24B53/017B24B7/228
    • Dressing treatment of a polishing pad, adjusting a polishing surface of the polishing pad to given flatness and surface roughness without deteriorating productivity, a method for polishing a glass substrate, including polishing a main surface of a glass substrate using the polishing pad adjusted by the dressing treatment, and a method for manufacturing a glass substrate using the polishing method are provided. A dressing jig having arithmetic surface roughness on a surface performing dressing treatment of from 0.10 μm to 2.5 μm is used as the dressing jig for adjusting a polishing surface of the polishing pad to given flatness and surface roughness. A main surface of the glass substrate is polished with the polishing surface of the polishing pad having been subjected to a dressing treatment using the dressing jig.
    • 抛光垫的修整处理,将抛光垫的抛光表面调整到给定的平坦度和表面粗糙度而不降低生产率;玻璃基板的抛光方法,包括使用由敷料调节的抛光垫来研磨玻璃基板的主表面 提供了使用该研磨方法制造玻璃基板的方法。 使用在0.10μm〜2.5μm的修整处理的表面上具有算术表面粗糙度的修整夹具作为调整抛光垫的研磨面的修整夹具,使其具有平坦度和表面粗糙度。 使用修整夹具对抛光垫的研磨面进行了修整处理,研磨玻璃基板的主表面。