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1. 发明申请

US20110117822A1 DRESSING JIG FOR GLASS SUBSTRATE POLISHING PAD 审中-公开
标题翻译：玻璃衬垫抛光垫
公开(公告)号：US20110117822A1
公开(公告)日：2011-05-19
申请号：US12946290
申请日：2010-11-15
申请人： Kenichiro TERADA , Kazuo Mannami , Minoru Tamada
发明人： Kenichiro TERADA , Kazuo Mannami , Minoru Tamada
IPC分类号： B24B1/00 , B24B47/26
CPC分类号： B24B53/017 , B24B7/228
摘要： Dressing treatment of a polishing pad, adjusting a polishing surface of the polishing pad to given flatness and surface roughness without deteriorating productivity, a method for polishing a glass substrate, including polishing a main surface of a glass substrate using the polishing pad adjusted by the dressing treatment, and a method for manufacturing a glass substrate using the polishing method are provided. A dressing jig having arithmetic surface roughness on a surface performing dressing treatment of from 0.10 μm to 2.5 μm is used as the dressing jig for adjusting a polishing surface of the polishing pad to given flatness and surface roughness. A main surface of the glass substrate is polished with the polishing surface of the polishing pad having been subjected to a dressing treatment using the dressing jig.
摘要翻译：抛光垫的修整处理，将抛光垫的抛光表面调整到给定的平坦度和表面粗糙度而不降低生产率;玻璃基板的抛光方法，包括使用由敷料调节的抛光垫来研磨玻璃基板的主表面提供了使用该研磨方法制造玻璃基板的方法。使用在0.10μm〜2.5μm的修整处理的表面上具有算术表面粗糙度的修整夹具作为调整抛光垫的研磨面的修整夹具，使其具有平坦度和表面粗糙度。使用修整夹具对抛光垫的研磨面进行了修整处理，研磨玻璃基板的主表面。

2. 发明申请

US20120135153A1 GLASS SUBSTRATE FOR MAGNETIC DISK AND MANUFACTURING METHOD OF THE SAME 有权
标题翻译：用于磁盘的玻璃基板及其制造方法
公开(公告)号：US20120135153A1
公开(公告)日：2012-05-31
申请号：US13349495
申请日：2012-01-12
申请人： Kinobu OSAKABE , Hideki ISONO , Katsuyuki IWATA , Shinji EDA , Kenichiro TERADA
发明人： Kinobu OSAKABE , Hideki ISONO , Katsuyuki IWATA , Shinji EDA , Kenichiro TERADA
IPC分类号： B05D1/18
CPC分类号： G11B5/7315 , C03C21/002 , G11B5/8404
摘要： A glass substrate for a magnetic disk of the invention is a disk-shaped glass substrate for a magnetic disk where the substrate has a main surface and end face and is subjected to chemical reinforcement treatment, and is characterized in that the penetration length in the uppermost-portion stress layer on the main surface is 49.1 μm or less, and that assuming that an angle between the main surface and compressive stress in the stress profile by a Babinet compensator method is θ, a value y of {12·t·ln(tan θ)+(49.1/t)} is the penetration length in the uppermost-portion stress layer or less.
摘要翻译：本发明的磁盘用玻璃基板是用于磁盘的盘状玻璃基板，其中基板具有主表面和端面并进行化学强化处理，其特征在于，最上面的穿透长度主表面的应力层为49.1μm以下，假设通过Babinet补偿方法在应力分布中的主表面与压缩应力之间的角度为θ，则{12·t·ln （tan＆amp; t s）+（49.1 / t）}是最上部应力层的贯通长度以下。

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