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1. 发明授权

US07851121B2 Photosensitive polyimide composition and polyimide precursor composition 失效
标题翻译：光敏聚酰亚胺组合物和聚酰亚胺前体组合物
公开(公告)号：US07851121B2
公开(公告)日：2010-12-14
申请号：US12278349
申请日：2006-02-10
申请人： Kazuhiro Yamanaka , Michael Romeo , Clifford Henderson , Kazuhiko Maeda
发明人： Kazuhiro Yamanaka , Michael Romeo , Clifford Henderson , Kazuhiko Maeda
IPC分类号： G03F7/004 , G03F7/023
CPC分类号： G03F7/0233 , G03F7/0046 , G03F7/0387 , G03F7/039 , G03F7/0392 , G03F7/0758 , Y10S430/107
摘要： There is provided a photosensitive composition including a polyimide or polyimide precursor. The polyimide and polyimide precursor of the present invention includes a group of a first acid-cleavable group, a first base-cleavable group or a first thermally-cleavable group, and another group of a hydrophilic group, or a protected hydrophilic group by a second acid-cleavable group, a second base-cleavable group, or a crosslinkable group.
摘要翻译：提供了包含聚酰亚胺或聚酰亚胺前体的光敏组合物。本发明的聚酰亚胺和聚酰亚胺前体包括一组第一可酸切割基团，第一可裂解基团或第一可热切割基团，另一组亲水基团或被保护的亲水基团酸可裂解基团，第二碱基可裂解基团或可交联基团。

2. 发明申请

US20100009290A1 Photosensitive Polybenzoxazines and Methods of Making the Same 审中-公开
标题翻译：光敏聚苯并恶嗪及其制备方法
公开(公告)号：US20100009290A1
公开(公告)日：2010-01-14
申请号：US12517511
申请日：2006-12-03
申请人： Kazuhiro Yamanaka , Clifford Henderson , Michael Romeo , Kazuhiko Maeda
发明人： Kazuhiro Yamanaka , Clifford Henderson , Michael Romeo , Kazuhiko Maeda
IPC分类号： G03F7/00 , C08G69/00 , C08F2/46 , C08G59/00 , C08F26/00
CPC分类号： C07C233/75 , C07C235/64 , C08L77/00 , C08L79/04 , G03F7/0046 , G03F7/037 , G03F7/0382 , G03F7/0387 , G03F7/0392
摘要： Photosensitive polybenzoxazine compositions include a photosensitive additive such as an o-diazoquinone and a polymer comprising a repeating unit represented by the following formula (I) wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R4 comprises a hydrophilic group, a hydrophilic group protected by an acid-cleavable group, a hydrophilic group protected by a base-cleavable group, a cross-linkable group, or combinations thereof, and i represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a photosensitive additive and a solvent, patterning the precursor polymer, and heating the precursor polymer at a thermal processing temperature in a range of from about 180° C. to about 300° C. to convert the precursor polymer into the final polymer.
摘要翻译：光敏聚苯并恶嗪组合物包括光敏添加剂如邻二醌醌和包含由下式（I）表示的重复单元的聚合物，其中R 1包括脂族基，脂环基，芳族基，杂环基或其组合 R2包括脂族基团，脂环基团，芳族基团，杂环基团或其组合，R4包括亲水基团，被酸可裂解基团保护的亲水基团，被碱基可裂解基团保护的亲水基团，可交联基团，或其组合，i表示1以上的整数。光敏组合物可以通过将前体聚合物与感光添加剂和溶剂组合而形成，图案化前体聚合物，并在约180℃至约300℃的热加工温度下加热前体聚合物。以将前体聚合物转化成最终聚合物。

3. 发明申请

US20090176172A1 PHOTOSENSITIVE POLYIMIDE COMPOSITION AND POLYIMIDE PRECURSOR COMPOSITION 失效
标题翻译：光敏聚酰亚胺组合物和聚酰亚胺前体组合物
公开(公告)号：US20090176172A1
公开(公告)日：2009-07-09
申请号：US12278349
申请日：2006-02-10
申请人： Kazuhiro Yamanaka , Michael Romeo , Clifford Henderson , Kazuhiko Maeda
发明人： Kazuhiro Yamanaka , Michael Romeo , Clifford Henderson , Kazuhiko Maeda
IPC分类号： G03F7/039
CPC分类号： G03F7/0233 , G03F7/0046 , G03F7/0387 , G03F7/039 , G03F7/0392 , G03F7/0758 , Y10S430/107
摘要： There is provided a photosensitive composition including a polyimide or polyimide precursor. The polyimide and polyimide precursor of the present invention includes a group of a first acid-cleavable group, a first base-cleavable group or a first thermally-cleavable group, and another group of a hydrophilic group, or a protected hydrophilic group by a second acid-cleavable group, a second base-cleavable group, or a crosslinkable group.
摘要翻译：提供了包含聚酰亚胺或聚酰亚胺前体的光敏组合物。本发明的聚酰亚胺和聚酰亚胺前体包括一组第一可酸切割基团，第一可裂解基团或第一可热切割基团，另一组亲水基团或被保护的亲水基团酸可裂解基团，第二碱基可裂解基团或可交联基团。

4. 发明申请

US20100216070A1 Photosensitive Polyimides and Methods of Making the Same 审中-公开
标题翻译：光敏聚酰亚胺及其制备方法
公开(公告)号：US20100216070A1
公开(公告)日：2010-08-26
申请号：US12517501
申请日：2006-12-04
申请人： Kazuhiro Yamanaka , Clifford Henderson , Michael Romeo , Kazuhiko Maeda
发明人： Kazuhiro Yamanaka , Clifford Henderson , Michael Romeo , Kazuhiko Maeda
IPC分类号： G03F7/004 , C08G73/10
CPC分类号： C07C233/75 , C08G73/06 , C08G73/1039 , C08L79/08 , G03F7/0046 , G03F7/0233 , G03F7/0382 , G03F7/0387 , G03F7/0392
摘要： Photosensitive polyimide compositions include a photosensitive additive and a polymer comprising a repeating unit represented by the following formula (I): wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R3 represents hydrogen or an organic group comprising a hydrophilic group, an acid-cleavable group, a base-cleavable group, a cross-linkable group, or combinations thereof, and h represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a processing solvent, followed by a relatively low-temperature cyclization process in which the precursor polymer is converted to the final polymer. The resulting polyimide may be separated from the solution and purified. It may then be combined with a casting solvent and a photosensitive additive.
摘要翻译：感光性聚酰亚胺组合物包括光敏添加剂和包含由下式（I）表示的重复单元的聚合物：其中R1包括脂族基团，脂环族基团，芳族基团，杂环基团或其组合，R 2包括脂肪族基团，脂环族基团，芳族基团，杂环基团或其组合，R 3表示氢或包含亲水基团，酸可裂解基团，碱基可裂解基团，可交联基团或组合的有机基团 h表示1以上的整数。光敏组合物可以通过将前体聚合物与加工溶剂组合，然后将前体聚合物转化为最终聚合物的相对低温环化过程来形成。所得聚酰亚胺可以与溶液分离并纯化。然后可将其与铸造溶剂和光敏添加剂组合。

5. 发明申请

US20080221298A1 Fluorinated Diamine and Polymer Made from the Same 有权
标题翻译：氟化二胺和由其制成的聚合物
公开(公告)号：US20080221298A1
公开(公告)日：2008-09-11
申请号：US11667823
申请日：2005-12-26
申请人： Kazuhiro Yamanaka , Kazuhiko Maeda
发明人： Kazuhiro Yamanaka , Kazuhiko Maeda
IPC分类号： C07C229/54 , C08G69/02
CPC分类号： C08G69/32 , C07C229/60 , C08G69/26 , C08G73/1039
摘要： A fluorine-containing diamine represented by the formula (1), [Chemical Formula 29] is provided. Furthermore, a fluorine-containing polymer is provided by using this fluorine-containing amine as a monomer. The fluorine-containing polymer can exhibit superior characteristics such as low dielectric property and high transparency, while maintaining high fluorine content and retaining adhesive property.
摘要翻译：提供由式（1）表示的含氟二胺，[化学式29]。此外，通过使用该含氟胺作为单体，提供含氟聚合物。含氟聚合物可以表现出优异的特性，例如低介电性能和高透明度，同时保持高氟含量和保持粘合性能。

6. 发明授权

US07125643B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07125643B2
公开(公告)日：2006-10-24
申请号：US10969097
申请日：2004-10-21
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/004 , G03F7/30 , G08F18/20
CPC分类号： G03F7/0397 , C08F216/1408 , C08F220/24 , G03F7/0046 , G03F7/085 , Y10S430/108 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
摘要翻译：包含式（1）的重复单元和式（2a）至（2d）的重复单元的聚合物，其中R 1是F或氟烷基，R 2是单键或亚烷基或氟亚烷基，R 3和R 4是H，F，烷基或氟代烷基，R 3和R 3中的至少一个， SUP> 4 含有F，R 5是H或酸不稳定基团，R 6是酸不稳定基团，粘合剂基团，烷基或氟烷基，和 “a”为1或2用作基础树脂以配制抗蚀剂组合物，该抗蚀剂组合物具有波长高达200nm的辐射的高透明度，底物粘合性，显影剂亲和性和耐干蚀刻性等优点。

7. 发明申请

US20050106499A1 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20050106499A1
公开(公告)日：2005-05-19
申请号：US10969097
申请日：2004-10-21
申请人： Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shirrji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shirrji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： C08G61/02 , C08F216/14 , C08F220/24 , G03C1/10 , G03C1/492 , G03F7/004 , G03F7/039 , G03F7/085
CPC分类号： G03F7/0397 , C08F216/1408 , C08F220/24 , G03F7/0046 , G03F7/085 , Y10S430/108 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
摘要翻译：包含式（1）的重复单元和式（2a）至（2d）的重复单元的聚合物，其中R 1是F或氟烷基，R 2是单键或亚烷基或氟亚烷基，R 3和R 4是H，F，烷基或氟代烷基，R 3和R 3中的至少一个， SUP> 4 含有F，R 5是H或酸不稳定基团，R 6是酸不稳定基团，粘合剂基团，烷基或氟烷基，和 “a”为1或2用作基础树脂以配制抗蚀剂组合物，该抗蚀剂组合物具有波长高达200nm的辐射的高透明度，底物粘合性，显影剂亲和性和耐干蚀刻性等优点。

8. 发明授权

US07001707B2 Resist compositions and patterning process 有权
标题翻译：抗蚀剂组合物和图案化工艺
公开(公告)号：US07001707B2
公开(公告)日：2006-02-21
申请号：US10925014
申请日：2004-08-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/004 , C08F114/18
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要： A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
摘要翻译：包含具有醇基作为可溶性基团的环状聚合物和具有羧酸或六氟醇基团的聚合物的共聚物的抗蚀剂组合物，其氢原子被酸不稳定基团替代为基础树脂形成抗蚀剂膜，其透明度提高，碱溶解对比度和等离子体耐蚀刻性。

9. 发明授权

US07241553B2 Polymer, resist composition, and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07241553B2
公开(公告)日：2007-07-10
申请号：US11051721
申请日：2005-01-27
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/039 , G03F7/30 , C08F18/20 , C08F118/00 , C08F120/22
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A chemically amplified resist composition using an alternating copolymer of α-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.
摘要翻译：使用α-三氟丙烯酸与降冰片烯作为基础聚合物的交替共聚物的化学放大抗蚀剂组合物适用于ArF激光平版印刷微图案，并提高了透明度，等离子体耐蚀刻性和线边缘粗糙度。

10. 发明申请

US20060264592A1 Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection file material using such copolymers 有权
标题翻译：含氟烯丙基醚化合物，它们的共聚物，抗蚀剂组合物和使用这种共聚物的抗反射锉材料
公开(公告)号：US20060264592A1
公开(公告)日：2006-11-23
申请号：US11492056
申请日：2006-07-25
申请人： Satoru Kobayashi , Katsunori Kawamura , Kazuhiro Yamanaka , Haruhiko Komoriya , Kazuhiko Maeda
发明人： Satoru Kobayashi , Katsunori Kawamura , Kazuhiro Yamanaka , Haruhiko Komoriya , Kazuhiko Maeda
IPC分类号： C08F18/20
CPC分类号： G03F7/0397 , C07C43/1781 , C07C43/192 , C07C2601/14 , C07C2603/68 , C08F16/24 , G03F7/0046 , G03F7/091 , Y10S430/108
摘要： The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further relates to a fluorine-containing copolymer containing a first unit derived from the fluorine-containing allyl ether represented by the formula 1; and a second unit derived from a vinyl monomer.
摘要翻译：本发明涉及由式1表示的含氟烯丙基醚化合物，其中R表示含有至少一个氟原子和脂环结构的有机基团。本发明还涉及含有由式1表示的含氟烯丙基醚衍生的第一单元的含氟共聚物; 和衍生自乙烯基单体的第二单元。

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