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1. 发明申请

US20120007276A1 IMPRINT TEMPLATE, METHOD FOR MANUFACTURING IMPRINT TEMPLATE, AND PATTERN FORMATION METHOD 审中-公开
标题翻译：印刷模板，制造印模的方法和图案形成方法
公开(公告)号：US20120007276A1
公开(公告)日：2012-01-12
申请号：US13168570
申请日：2011-06-24
申请人： Katsutoshi KOBAYASHI , Yoshihisa Kawamura , Shinichi Ito
发明人： Katsutoshi KOBAYASHI , Yoshihisa Kawamura , Shinichi Ito
IPC分类号： B29C33/42 , B29C59/02
CPC分类号： B29C33/424 , B29C33/305 , B29C33/3878 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： According to one embodiment, an imprint template includes a base substrate and a resin-based pattern transfer portion. The pattern transfer portion is formed on a major surface of the base substrate and includes a protrusion-depression pattern. A shape of the protrusion-depression pattern is transferred to a transfer target. The protrusion-depression portion is provided at the major surface of the base substrate. A major surface side of the pattern transfer portion is provided so as to fit into a depression of the protrusion-depression portion. In another embodiment, a pattern formation method is disclosed. The method can include providing the transfer target on the substrate, and using the imprint template to bring the pattern into contact with the transfer target. In addition, the method can include curing the transfer target and then releasing the imprint template from the transfer target to transfer the shape of the pattern to the transfer target.
摘要翻译：根据一个实施例，压印模板包括基底基板和基于树脂的图案转印部分。图案转印部分形成在基底基材的主表面上并且包括突起 - 凹陷图案。突起凹陷图案的形状被转印到转印对象物上。突起凹陷部设置在基底基板的主表面。图案转印部的主表面侧设置成嵌合到突起凹陷部的凹部中。在另一个实施例中，公开了图案形成方法。该方法可以包括在基板上提供转印目标，并且使用压印模板使图案与转印对象接触。此外，该方法可以包括固化转印目标，然后从转印目标释放印模模板，以将图案的形状转印到转印目标。

2. 发明申请

US20110244131A1 METHOD AND APPARATUS FOR TEMPLATE SURFACE TREATMENT, AND PATTERN FORMING METHOD 审中-公开
标题翻译：用于模板表面处理的方法和装置，以及图案形成方法
公开(公告)号：US20110244131A1
公开(公告)日：2011-10-06
申请号：US13043911
申请日：2011-03-09
申请人： Yoshihisa KAWAMURA , Katsutoshi Kobayashi , Shinichi Ito , Hidekazu Hayashi , Hiroshi Tomita
发明人： Yoshihisa KAWAMURA , Katsutoshi Kobayashi , Shinichi Ito , Hidekazu Hayashi , Hiroshi Tomita
IPC分类号： B05D5/02 , B05D3/10
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to an embodiment, a template surface treatment method includes hydroxylating the surface of a template having an uneven pattern surface or absorbing water onto the surface to distribute OH radicals on the surface, and coupling a coupling agent onto the template surface on which the OH radicals are distributed. These processes are performed in an environment in which amines are controlled to be in a predetermined concentration or less.
摘要翻译：根据一个实施方案，模板表面处理方法包括将具有不均匀图案表面的模板的表面或吸附水的表面羟基化在表面上以在表面上分布OH自由基，并将偶联剂偶联到模板表面上，OH基团分发。这些方法是在将胺控制在规定浓度以下的环境下进行的。

3. 发明授权

US08419995B2 Imprint method 有权
标题翻译：印记法
公开(公告)号：US08419995B2
公开(公告)日：2013-04-16
申请号：US12563461
申请日：2009-09-21
申请人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
发明人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
IPC分类号： B28B11/08 , B29C35/08
CPC分类号： B29C37/0003 , B29C35/0888 , B29C37/006 , B29C59/022 , B29C2035/0822 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated.
摘要翻译：压印方法包括将光固化树脂施加在待加工的基板上，所述基板包括施加有光固化树脂的第一和第二区域，使印模与光固化树脂接触，通过照射光固化树脂来固化光固化树脂光固化树脂，其光通过压印模具，通过对施加在基板的区域上的光固化树脂进行预定处理产生气体，该区域至少包括第一区域，其中从光可固化施加在第一区域上的树脂大于由第二区域的光固化树脂产生的气体的量，并且在产生气体之后通过从光固化树脂分离压印模具来形成图案。

4. 发明申请

US20110059406A1 PATTERN FORMING METHOD 有权
标题翻译：图案形成方法
公开(公告)号：US20110059406A1
公开(公告)日：2011-03-10
申请号：US12878828
申请日：2010-09-09
申请人： Yoshihisa KAWAMURA , Eishi Shiobara , Shinichi Ito
发明人： Yoshihisa KAWAMURA , Eishi Shiobara , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/0002
摘要： According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.
摘要翻译：根据一个实施例，公开了一种图案形成方法。该方法可以包括选择性地向模板中的图案提供固化剂，使提供固化剂的模板与基底接触，用光照射固化剂，其中模板和基底彼此接触以硬化固化剂，脱模所述模板从所述基板在所述基板上形成固化剂图案，并且基于所述固化剂图案来蚀刻所述基板。

5. 发明授权

US08753803B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08753803B2
公开(公告)日：2014-06-17
申请号：US12878828
申请日：2010-09-09
申请人： Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito
发明人： Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/0002
摘要： According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.
摘要翻译：根据一个实施例，公开了一种图案形成方法。该方法可以包括选择性地向模板中的图案提供固化剂，使提供固化剂的模板与基底接触，用光照射固化剂，其中模板和基底彼此接触以硬化固化剂，脱模所述模板从所述基板在所述基板上形成固化剂图案，并且基于所述固化剂图案来蚀刻所述基板。

6. 发明申请

US20120248065A1 METHOD FOR FORMING A PATTERN 审中-公开
标题翻译：形成图案的方法
公开(公告)号：US20120248065A1
公开(公告)日：2012-10-04
申请号：US13424837
申请日：2012-03-20
申请人： Yoshihisa KAWAMURA , Shinichi Ito
发明人： Yoshihisa KAWAMURA , Shinichi Ito
IPC分类号： B05D5/00 , B05D3/06 , B05D3/10 , B05D3/12
CPC分类号： H01L21/31144 , B05D1/42 , B05D3/067 , B05D5/02 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/3105
摘要： According to one embodiment, a pattern forming methoo is disclosed. A film is formed on a substrate to be processed. A gaps is formed in a surface of the film. A photo-curable imprinting agent is supplied on the film surface in which the gaps are formed. The agent is contacted with a template including a concave pattern. The contacting is configured to fill the concave pattern with the agent. Light is applied to the agent while the agent is contacted with the template, wherein the agent is cured by the light. The template is separated from the substrate, wherein a pattern of the cured agent is formed on the substrate.
摘要翻译：根据一个实施例，公开了形成图案的图案。在被处理基板上形成膜。在膜的表面形成间隙。在其上形成间隙的膜表面上提供可光固化的压印剂。该试剂与包括凹形图案的模板接触。接触被配置成用该药剂填充凹形图案。当试剂与模板接触时，将光施加到试剂上，其中试剂通过光固化。将模板与基材分离，其中在基材上形成固化剂的图案。

7. 发明申请

US20110159209A1 PATTERN FORMING METHOD 审中-公开
标题翻译：图案形成方法
公开(公告)号：US20110159209A1
公开(公告)日：2011-06-30
申请号：US12977443
申请日：2010-12-23
申请人： Yoshihisa KAWAMURA , Shinichi Ito
发明人： Yoshihisa KAWAMURA , Shinichi Ito
IPC分类号： B05D3/00 , B05D3/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： To forming a pattern on a substrate using a template simply and at low cost by forming a high-molecular copolymer having a first segment and a second segment on a substrate, contacting a template having a groove with the copolymer, filling the copolymer into the groove of the template, causing a phase separation of the copolymer to form a first phase having the first segment and a second phase having the second segment, releasing the template from the copolymer, and removing the first phase or the second phase of the copolymer.
摘要翻译：为了通过在基板上形成具有第一段和第二段的高分子共聚物，简单且低成本地使用模板在基板上形成图案，使具有凹槽的模板与共聚物接触，将共聚物填充到凹槽中的模板，导致共聚物的相分离形成具有第一段的第一相和具有第二段的第二相，从共聚物中释放模板，以及除去共聚物的第一相或第二相。

8. 发明申请

US20100078860A1 IMPRINT METHOD 有权
标题翻译： IMPRINT方法
公开(公告)号：US20100078860A1
公开(公告)日：2010-04-01
申请号：US12563461
申请日：2009-09-21
申请人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
发明人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
IPC分类号： B29C35/08
CPC分类号： B29C37/0003 , B29C35/0888 , B29C37/006 , B29C59/022 , B29C2035/0822 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated.
摘要翻译：压印方法包括将光固化树脂施加在待加工的基板上，所述基板包括施加有光固化树脂的第一和第二区域，使印模与光固化树脂接触，通过照射光固化树脂来固化光固化树脂光固化树脂，其光通过压印模具，通过对施加在基板的区域上的光固化树脂进行预定处理产生气体，该区域至少包括第一区域，其中从光可固化施加在第一区域上的树脂大于由第二区域的光固化树脂产生的气体的量，并且在产生气体之后通过从光固化树脂分离压印模具来形成图案。

9. 发明授权

US09644875B2 Air-conditioning system and humidity control device 有权
公开(公告)号：US09644875B2
公开(公告)日：2017-05-09
申请号：US13882614
申请日：2010-12-22
申请人： Shinichi Ito , Masaki Toyoshima , Fumitake Unezaki
发明人： Shinichi Ito , Masaki Toyoshima , Fumitake Unezaki
IPC分类号： F25B49/02 , F24F3/14 , F25B13/00
CPC分类号： F25B49/02 , F24F3/1411 , F24F3/1429 , F24F11/0008 , F25B13/00 , F25B2313/006 , F25B2313/02741 , F25B2313/0314 , F25B2313/0315 , F25B2700/02 , F25B2700/1931 , F25B2700/1933
摘要： An air-conditioning system includes at least one outdoor unit including a compressor, a four-way valve, and an outdoor heat exchanger, at least one indoor unit including an indoor unit expansion valve and an indoor unit heat exchanger, and at least one humidity control device including a humidity control device expansion valve, a humidity control device heat exchanger, and first and second water adsorption/desorption devices. The compressor, the four-way valve, the outdoor heat exchanger, the indoor unit expansion valve, the indoor unit heat exchanger, the humidity control device expansion valve, and the humidity control device heat exchanger are connected to each other with pipes so as to constitute a refrigerant circuit.

10. 发明授权

US09297546B2 Humidity control apparatus and air-conditioning system 有权
标题翻译：湿度控制装置和空调系统
公开(公告)号：US09297546B2
公开(公告)日：2016-03-29
申请号：US14234765
申请日：2011-07-27
申请人： Shinichi Ito , Masaki Toyoshima , Fumitake Unezaki
发明人： Shinichi Ito , Masaki Toyoshima , Fumitake Unezaki
IPC分类号： F25D17/06 , F24F11/00 , F24F3/14 , B01D53/26 , B01D53/04
CPC分类号： F24F11/0008 , B01D53/0454 , B01D53/265 , F24F3/1411 , F24F3/1429 , F24F11/30 , F24F2110/20
摘要： A humidity control apparatus and an air-conditioning system are capable of controlling the latent heat processing amount and the sensible heat processing amount in accordance with an indoor heat load without decreasing the operation efficiency. Every time an air route is switched to an air route A or an air route B, the route maintenance time for the switched air route is set on the basis of the heat load within a dehumidification target space, and switching of switching devices is controlled such that the set route maintenance time is ensured.
摘要翻译：湿度控制装置和空调系统能够根据室内热负荷来控制潜热处理量和显热处理量，而不降低操作效率。每当空中路线切换到航路A或航路B时，根据除湿目标空间内的热负荷来设定切换航路的路线维护时间，切换装置的切换被控制为确保路由维护时间。

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