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    • 1. 发明授权
    • Reflection type diffraction grating
    • 反射型衍射光栅
    • US06839173B2
    • 2005-01-04
    • US09953219
    • 2001-09-17
    • Katsuhide ShimmoShinji KawamotoTerufusa KunisadaKenichi Nakama
    • Katsuhide ShimmoShinji KawamotoTerufusa KunisadaKenichi Nakama
    • G02B5/18
    • G02B5/1861
    • A reflection type diffraction grating according to the present invention has a structure in which a metal film as a first layer with reflectance not lower than 30% with respect to the wavelength of incident light and a transparent dielectric film as a second layer are laminated successively on the surface of the reflection type diffraction grating. With respect to the wavelength of incident light, the metal film has a refractive index selected to be not higher than 1.5 and an extinction coefficient selected to be not smaller than 6.0. The transparent dielectric film has a refractive index selected to be in a range of from 1.30 to 1.46, both inclusively, with respect to the wavelength of incident light and has an optical film thickness selected to be in a range of from 0.20λ to 0.38λ, both inclusively, when λ is the wavelength of incident light.
    • 根据本发明的反射型衍射光栅具有如下结构:将相对于入射光的波长的反射率不低于30%的第一层的金属膜和作为第二层的透明电介质膜依次层叠在 反射型衍射光栅的表面。 对于入射光的波长,金属膜的折射率选择为不高于1.5,消光系数选择为不小于6.0。 透明电介质膜的折射率选择在1.30至1.46的范围内,包括相对于入射光的波长,并且具有选择在0.20λ至0.38λ范围内的光学膜厚度 ,当λ是入射光的波长时,都包括在内。
    • 6. 发明授权
    • Heat insulating and shielding glass panel
    • 隔热和屏蔽玻璃面板
    • US07282248B2
    • 2007-10-16
    • US11289231
    • 2005-11-28
    • Osamu AsanoTerufusa KunisadaTetsuo Minaai
    • Osamu AsanoTerufusa KunisadaTetsuo Minaai
    • E06B3/00B32B19/00E04C2/54
    • C03C17/3618B32B17/00C03C17/36C03C17/3626C03C17/3644C03C17/3652C03C17/366C03C27/10C03C2217/78E06B3/66304
    • A heat insulating and shielding glass panel that is capable of maintaining heat shielding performance even if heat treatment is carried out during manufacture. The heat insulating and shielding glass panel 1 is comprised of a pair of glass plates 11 and 12 that are hermetically joined together at their outer peripheral edges via a sealing frame 13 that fluidizes at low temperature, such that respective one surfaces of the glass plates 11, 12 face each other and a hollow layer 14 is formed between the glass plates; and pillars 15 that are substantially cylindrical spacers that are inserted into the hollow layer 14 as atmospheric pressure supporting members and determine the gap between the glass plates 11 and 12. A low-emission transparent multilayer 17 having an emittance of not more than 0.1 is coated by sputtering on each of surfaces 11a and 12a of the respective glass plates 11 and 12 facing the hollow layer 14 so as to realize high heat insulation performance. The low-emission transparent multilayer 17 is comprised of ZnO layers 33 and 35 as dielectric layers separated from each other in the direction of film thickness by an SiNx layer 34 as an amorphous layer, and an Ag—Pd layer 32 as a metal layer containing Ag and Pd.
    • 即使在制造过程中进行热处理也能够保持隔热性能的隔热屏蔽玻璃面板。 隔热屏蔽玻璃面板1由一对玻璃板11和12组成,玻璃板11和12通过密封框架13在其外周缘处气密地接合在一起,该密封框架13在低温下流化,使得玻璃板11的相应一个表面 12彼此面对,并且在玻璃板之间形成中空层14; 以及作为大气压支撑构件插入中空层14中的大致圆柱形间隔件的柱15,并且确定玻璃板11和12之间的间隙。发射率不大于0.1的低发射透明多层17被涂覆 通过溅射在面对中空层14的各个玻璃板11和12的每个表面11a和12a上,以实现高隔热性能。 低发射透明多层17由ZnO层33,35构成,作为电介质层,通过作为非晶层的SiNx层34在膜厚方向上彼此分离的电介质层和作为金属层的Ag-Pd层32 Ag和Pd。
    • 7. 发明授权
    • Optical articles and cathode-ray tube using the same
    • 光学制品和阴极射线管使用相同
    • US06313577B1
    • 2001-11-06
    • US09397116
    • 1999-09-16
    • Terufusa KunisadaEtsuo OginoChihiro SakaiKoji NakanishiYasunori Taninaka
    • Terufusa KunisadaEtsuo OginoChihiro SakaiKoji NakanishiYasunori Taninaka
    • H01J3100
    • H01J29/896G02B1/116G02B1/16H01J2229/8918
    • A face panel for a cathode-ray tube is coated with an antireflection film by forming, on the outer surface thereof in this order, a 44.9 nm-thick praseodymium titanate film as a first layer, a 4.9 nm-thick film of a nickel-iron alloy as a second layer, a 53.4 nm-thick praseodymium titanate film as a third layer, a 3.9 nm-thick film of a nickel-iron alloy as a fourth layer, a 20.6 nm-thick praseodymium titanate film as a fifth layer, and an 84.7 nm-thick magnesium fluoride film as a sixth layer. This coated face panel is free from the problem that conventional cathode-ray tube face panels coated on the outer surface with an antireflection film comprising superposed metal films and transparent dielectric films make the cathode-ray tubes exhibit double images although effective in diminishing the reflection of external light on the surface of the cathode-ray tubes and in enhancing display contrast. The cathode-ray tube using the face panel coated with the specific antireflection film does not exhibit double images, is prevented from suffering static buildup on its surface or from reflecting external light thereon, and can attain higher image contrast.
    • 阴极射线管的面板通过在其外表面上依次形成44.9nm厚的钛酸镨薄膜作为第一层,厚度为4.9nm的镍 - 铁合金作为第二层,作为第三层的53.4nm厚的钛酸镨膜,作为第四层的镍 - 铁合金的3.9nm厚的膜,作为第五层的20.6nm厚的镨钛酸盐膜, 和84.7nm厚的氟化镁膜作为第六层。 该涂覆的面板不存在涂覆在外表面上的常规阴极射线管面板与包含叠加的金属膜和透明电介质膜的抗反射膜的问题,使得阴极射线管呈现双重图像,尽管有效地减少了反射 在阴极射线管的表面上的外部光并且增强显示对比度。 使用涂覆有特定抗反射膜的面板的阴极射线管不呈现双重图像,防止其表面上产生静电积聚或反射其上的外部光,并且可以获得更高的图像对比度。
    • 9. 发明授权
    • Electromagnetic wave filter for plasma display panel
    • 等离子显示面板用电磁波滤波器
    • US06316110B1
    • 2001-11-13
    • US09265417
    • 1999-03-10
    • Toshiaki AnzakiEtsuo OginoTerufusa Kunisada
    • Toshiaki AnzakiEtsuo OginoTerufusa Kunisada
    • B32B1500
    • H05K9/0096H01J11/10H01J11/44H01J29/868H01J2211/446Y10T428/24942Y10T428/24975Y10T428/265Y10T428/28Y10T428/2804
    • An electromagnetic wave filter for a plasma display panel which is effective in preventing incorrect actions of a remote control of appliances, comprising a transparent substrate, a light transmitting electromagnetic wave shield film, and a resin protective film, wherein the electromagnetic wave shield film is a 7-layered laminate in which a dielectric layer and a metal layer containing silver as the principal ingredient are laminated alternately with the dielectric layer being the first to be provided on the transparent substrate, the dielectric layer has a refractive index of 1.6 to 2.8 at 550 nm, and the metal layer containing silver as the principal ingredient contains 0.1 atomic % or more and less than 0.5 atomic % of palladium based on silver and has a thickness of 5 to 25 nm, whereby the electromagnetic wave shield film has a sheet resistance of 3 &OHgr;/□ or lower and a near infrared transmission of 20% or lower at 850 nm.
    • 一种用于等离子体显示面板的电磁波滤波器,其有效地防止了包括透明基板,透光电磁波屏蔽膜和树脂保护膜的电器遥控器的不正确动作,其中电磁波屏蔽膜是 电介质层和含有银作为主要成分的金属层与首先被设置在透明基板上的电介质层交替叠层,其电介质层的折射率为1.6至2.8,550 nm,以银为主要成分的金属层含有0.1原子%以上且小于0.5原子%的基于银的钯,其厚度为5〜25nm,电磁波屏蔽膜的薄层电阻为 3欧米伽/平方或更低,在850nm处的近红外透射率为20%以下。
    • 10. 发明申请
    • Antireflection Film and Optical Device
    • 防反射膜和光学装置
    • US20120251803A1
    • 2012-10-04
    • US13434111
    • 2012-03-29
    • Minoru ShibuyaTerufusa KunisadaNaoki Yamashita
    • Minoru ShibuyaTerufusa KunisadaNaoki Yamashita
    • B32B3/26B32B7/02
    • G02B1/11Y10T428/24942
    • An object of the present invention is to provide an antireflection film and an optical device having excellent antireflection characteristics against a light beam having a wide wavelength range at a wide range of an incident angle, and also having practically sufficient durability. To achieve the above object, the present invention adopts an antireflection film having an optical two-layer structure composed of an intermediate layer provided on a base material and a low refractive index layer provided on a surface of the intermediate layer, wherein the low refractive index layer is a layer obtained by binding hollow silica by a binder, a refractive index n(1) thereof is between 1.15 and 1.24 inclusive, and a refractive index n(2) of the intermediate layer satisfies a relation in the expression (1) below assuming a refractive index of the base material n(sub). n(1)×√{square root over (n(sub))}×0.930≦n(2)≦n(1)×√{square root over (n(sub))}×0.985  (1)
    • 本发明的目的是提供一种抗反射膜和对具有宽波长范围的光束在入射角宽的范围内具有优异的防反射特性的光学装置,并且还具有实际上足够的耐久性。 为了实现上述目的,本发明采用具有由设置在基材上的中间层和设置在中间层的表面上的低折射率层构成的光学二层结构的抗反射膜,其中低折射率 层是通过粘合剂结合中空二氧化硅而获得的层,其折射率n(1)在1.15和1.24之间,并且中间层的折射率n(2)满足以下表达式(1)中的关系 假设基材n(sub)的折射率。 n(1)×√{平方根(n(sub))}×0.930≦̸ n(2)≦̸ n(1)×√{平方根(n(sub))}×0.985(1)