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1. 发明申请

US20060131268A1 Non-contact discrete removal of substrate surface contaminants/coatings, and method, apparatus, and system for implementing the same 审中-公开
标题翻译：非接触式离子去除基材表面污染物/涂层，以及用于实施其的方法，装置和系统
公开(公告)号：US20060131268A1
公开(公告)日：2006-06-22
申请号：US11020431
申请日：2004-12-21
申请人： Katrina Mikhaylichenko , Vladislav Yakovlev , Michael Ravkin , John Larios , Fritz Redeker
发明人： Katrina Mikhaylichenko , Vladislav Yakovlev , Michael Ravkin , John Larios , Fritz Redeker
IPC分类号： C23F1/00 , H01L21/306 , B44C1/22 , C03C15/00
CPC分类号： H01L21/31116 , B23K26/356 , B23K26/40 , B23K2103/172 , H01L21/0209
摘要： A substrate preparation method is provided. The method includes providing a substrate to be prepared. The substrate has a first layer and a second layer. The first layer is to be removed from over the second layer. An energy frequency that is to be absorbed by the second layer while penetrating through the first layer transparently is determined. Energy that has the determined energy frequency is applied onto the first layer so as to disrupt a bond between the first layer and the second layer at a location of application of the energy. A portion of the first layer defined at the location of application of energy is removed. A substrate preparation apparatus is also provided.
摘要翻译：提供了底物制备方法。该方法包括提供待制备的基底。衬底具有第一层和第二层。第一层将从第二层上移除。确定在透过第一层时被第二层吸收的能量频率。具有确定的能量频率的能量被施加到第一层上，以便在施加能量的位置处破坏第一层和第二层之间的结合。去除在施加能量的位置限定的第一层的一部分。还提供了基板制备装置。

2. 发明申请

US20070227656A1 Apparatus and method for confined area planarization 有权
标题翻译：限制区域平面化的装置和方法
公开(公告)号：US20070227656A1
公开(公告)日：2007-10-04
申请号：US11395881
申请日：2006-03-31
申请人： John Boyd , Fritz Redeker , Yezdi Dordi , Michael Ravkin , John Larios
发明人： John Boyd , Fritz Redeker , Yezdi Dordi , Michael Ravkin , John Larios
IPC分类号： H01L21/461 , H01L21/306
CPC分类号： H01L21/32115 , C25F7/00
摘要： A proximity head and associated method of use is provided for performing confined area planarization of a semiconductor wafer. The proximity head includes a chamber defined to maintain an electrolyte solution. A cathode is disposed within the chamber in exposure to the electrolyte solution. A cation exchange membrane is disposed over a lower opening of the chamber. A top surface of the cation exchange membrane is in direct exposure to the electrolyte solution to be maintained within the chamber. A fluid supply channel is defined to expel fluid at a location adjacent to a lower surface of the cation exchange membrane. A vacuum channel is defined to provide suction at a location adjacent to the lower surface of the cation exchange membrane, such that the fluid to be expelled from the fluid supply channel is made to flow over the lower surface of the cation exchange membrane.
摘要翻译：提供接近头和相关联的使用方法用于执行半导体晶片的限定区域平坦化。邻近头包括限定为维持电解质溶液的室。在室内暴露于电解质溶液中设置阴极。阳离子交换膜设置在室的下部开口的上方。阳离子交换膜的顶表面直接暴露于电解质溶液中以保持在室内。流体供应通道被定义为在邻近阳离子交换膜的下表面的位置排出流体。定义真空通道以在邻近阳离子交换膜的下表面的位置处提供吸力，使得要从流体供应通道排出的流体流过阳离子交换膜的下表面。

3. 发明授权

US08522799B2 Apparatus and system for cleaning a substrate 有权
标题翻译：用于清洁衬底的装置和系统
公开(公告)号：US08522799B2
公开(公告)日：2013-09-03
申请号：US11532493
申请日：2006-09-15
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker , Clint Thomas , John Parks
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , B08B3/003 , B08B3/02
摘要： An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.
摘要翻译：公开了一种用于清洁衬底的设备。该装置具有第一头单元和第二头单元。第一头单元定位成接近基底的表面，并且具有限定在构造成向基底的表面提供泡沫的第一排通道。第二头单元被定位成基本上与第一头单元相邻并且靠近衬底的表面。第二和第三行通道被限定在第二头单元内。第二排通道被配置成向衬底的表面提供流体。第三排通道被配置为向基板的表面施加真空。

4. 发明授权

US07862662B2 Method and material for cleaning a substrate 有权
标题翻译：清洗基材的方法和材料
公开(公告)号：US07862662B2
公开(公告)日：2011-01-04
申请号：US11532491
申请日：2006-09-15
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
IPC分类号： B08B3/00
CPC分类号： H01L21/02052 , B08B3/04 , B08B7/00 , C11D11/0047 , C11D17/0013 , C11D17/0017 , G03F1/82 , H01L21/02057 , H01L21/02096 , H01L21/67051
摘要： Methods for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causing the particle to be removed along with the tri-state body.
摘要翻译：公开了使用三态体进行清洁的方法。提供了沉积有颗粒的基板。产生具有固体部分，液体部分和气体部分的三态体。在三态体上施加力以发出固体部分和颗粒之间的相互作用。将三态体与来自衬底表面的颗粒一起去除。固体部分和颗粒之间的相互作用导致颗粒与三态体一起被去除。

5. 发明申请

US20070151583A1 Method and apparatus for particle removal 失效
标题翻译：颗粒去除的方法和装置
公开(公告)号：US20070151583A1
公开(公告)日：2007-07-05
申请号：US11543365
申请日：2006-10-04
申请人： Erik M. Freer , John M. deLarios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fritz C. Redeker
发明人： Erik M. Freer , John M. deLarios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fritz C. Redeker
IPC分类号： B08B3/00 , B08B3/12
CPC分类号： B08B3/024 , B08B3/003 , B08B3/08 , B08B6/00 , H01L21/67051
摘要： A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.
摘要翻译：一种用于清洁其上具有颗粒物质的表面的表面的方法和系统，其特征在于其表面上具有夹带在其中的具有耦合元件的液体的射流。赋予联接元件足够的拖曳力以相对于液体具有相同的移动并使颗粒物质相对于基底移动。

6. 发明授权

US07067016B1 Chemically assisted mechanical cleaning of MRAM structures 有权
标题翻译： MRAM结构的化学辅助机械清洗
公开(公告)号：US07067016B1
公开(公告)日：2006-06-27
申请号：US10404403
申请日：2003-03-31
申请人： Katrina Mikhaylichenko , Michael Ravkin
发明人： Katrina Mikhaylichenko , Michael Ravkin
IPC分类号： B08B7/00
CPC分类号： B08B1/04 , B08B3/08 , C11D7/06 , C11D11/0047 , H01L21/67046 , Y10S438/906
摘要： A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the substrate. A non-HF, copper compatible chemistry is introduced into the first brush box for cleaning the active and backside surfaces of the substrate. The substrate is then inserted into a second brush box which is also configured to provide double-sided mechanical cleaning of the active and backside surfaces of the substrate. A burst of chemistry is introduced into the second brush box followed by a DIW rinse. The substrate is then processed through an SRD apparatus for final rinse and dry.
摘要翻译：公开了一种使用MRAM结构和MJT结构和材料对衬底进行后蚀刻清洁的方法。该方法包括将基板插入被配置为用于基板的双面机械清洁的第一刷盒中。将非HF，铜兼容化学物质引入到第一刷盒中以清洁基底的活性和背面。然后将衬底插入第二刷盒中，第二刷盒还被配置为提供衬底的活性和背面的双面机械清洁。将化学爆炸物引入第二刷盒中，然后进行DIW冲洗。然后将基底通过SRD装置进行处理，以进行最终冲洗和干燥。

7. 发明授权

US08716210B2 Material for cleaning a substrate 有权
标题翻译：用于清洁基材的材料
公开(公告)号：US08716210B2
公开(公告)日：2014-05-06
申请号：US12948613
申请日：2010-11-17
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
IPC分类号： H01L21/02 , C11D11/00 , C11D17/00
CPC分类号： H01L21/02052 , B08B3/04 , B08B7/00 , C11D11/0047 , C11D17/0013 , C11D17/0017 , G03F1/82 , H01L21/02057 , H01L21/02096 , H01L21/67051
摘要： Material for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causes the particle to be removed along with the tri-state body.
摘要翻译：公开了使用三态体进行清洁的材料。提供了沉积有颗粒的基板。产生具有固体部分，液体部分和气体部分的三态体。在三态体上施加力以发出固体部分和颗粒之间的相互作用。将三态体与来自衬底表面的颗粒一起去除。固体部分和颗粒之间的相互作用导致颗粒与三态体一起被去除。

8. 发明授权

US08480810B2 Method and apparatus for particle removal 失效
标题翻译：颗粒去除的方法和装置
公开(公告)号：US08480810B2
公开(公告)日：2013-07-09
申请号：US11543365
申请日：2006-10-04
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fritz C. Redeker
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fritz C. Redeker
IPC分类号： B08B7/04
CPC分类号： B08B3/024 , B08B3/003 , B08B3/08 , B08B6/00 , H01L21/67051
摘要： A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.
摘要翻译：一种用于清洁其上具有颗粒物质的表面的表面的方法和系统，其特征在于其表面上具有夹带在其中的具有耦合元件的液体的射流。赋予耦合元件足够的阻力以相对于液体具有相同的移动并使颗粒物质相对于基底移动。

9. 发明授权

US08011116B2 Substrate proximity drying using in-situ local heating of substrate 失效
标题翻译：使用原位局部加热底物的基片接近干燥
公开(公告)号：US08011116B2
公开(公告)日：2011-09-06
申请号：US12860786
申请日：2010-08-20
申请人： Katrina Mikhaylichenko , Kenneth C. Dodge , Mikhail Korolik , Michael Ravkin , John M. de Larios , Fritz C. Redeker
发明人： Katrina Mikhaylichenko , Kenneth C. Dodge , Mikhail Korolik , Michael Ravkin , John M. de Larios , Fritz C. Redeker
IPC分类号： F26B3/34
CPC分类号： B08B3/04 , G03F7/30 , H01L21/67028 , H01L21/67034 , H01L21/67051 , Y10S134/902
摘要： A method is provided for removing a residual fluid remaining at a point of contact between a substrate support member and a back surface of a substrate being prepared by a proximity head. According to the method, the proximity head is applied onto the back surface of the substrate and the substrate support member being held by a carrier. The substrate support member is heated after the substrate support member passes the proximity head. The heating of the substrate support member is discontinued once the residual fluid has substantially evaporated.
摘要翻译：提供了一种用于去除残留在衬底支撑构件和由邻近头准备的衬底的背面之间的接触点处的残余流体的方法。根据该方法，将接近头部施加到基板的背面，并且基板支撑构件被载体保持。在衬底支撑构件通过邻近头之后，加热衬底支撑构件。一旦残留的流体基本上蒸发，衬底支撑构件的加热就会停止。

10. 发明申请

US20110065621A1 MATERIAL FOR CLEANING A SUBSTRATE 有权
标题翻译：清洁基材的材料
公开(公告)号：US20110065621A1
公开(公告)日：2011-03-17
申请号：US12948613
申请日：2010-11-17
申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
发明人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
IPC分类号： C11D17/00
CPC分类号： H01L21/02052 , B08B3/04 , B08B7/00 , C11D11/0047 , C11D17/0013 , C11D17/0017 , G03F1/82 , H01L21/02057 , H01L21/02096 , H01L21/67051
摘要： Material for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causes the particle to be removed along with the tri-state body.
摘要翻译：公开了使用三态体进行清洁的材料。提供了沉积有颗粒的基板。产生具有固体部分，液体部分和气体部分的三态体。在三态体上施加力以发出固体部分和颗粒之间的相互作用。将三态体与来自衬底表面的颗粒一起除去。固体部分和颗粒之间的相互作用导致颗粒与三态体一起被去除。

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