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1. 发明授权

US07538855B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07538855B2
公开(公告)日：2009-05-26
申请号：US10914633
申请日：2004-08-10
申请人： Kars Zeger Troost , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager
发明人： Kars Zeger Troost , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70791 , G03F7/70275
摘要： A system and method use a lithographic apparatus to direct a plurality of patterned beams onto a substrate supported on a substrate table. The patterned beams are projected onto target portions of the substrate and relative displacement between the substrate and the patterned beams causes the beams to be scanned across the substrate. A first projection device projects a first relatively large area patterned beam which extends across a substantial proportion of the substrate. At least one second relatively small area patterned beam is selectively positioned relative to the first projection device at least in a direction transverse to the predetermined direction. The second beam may be used to expose an elongate portion of the substrate which extends in the direction of relative displacement. At least one third patterned beam of relatively small area may be provided which is selectively displaceable relative to the substrate table during relative displacement between the substrate and the first beam. The third patterned beam may be used to expose an elongate portion of the substrate which extends transversely to the direction of relative displacement.
摘要翻译：系统和方法使用光刻设备将多个图案化的光束引导到支撑在衬底台上的衬底上。图案化的光束投影到基板的目标部分上，并且基板和图案化的光束之间的相对位移使得光束跨越基板被扫描。第一投影装置投射第一相对较大面积的图案化的束，其延伸穿过基本上相当大比例的衬底。至少一个第二相对小的区域图案化的光束至少在横向于预定方向的方向上相对于第一投影装置选择性地定位。可以使用第二梁来暴露沿相对位移方向延伸的衬底的细长部分。可以提供相对小面积的至少三分之一图案化的光束，其在衬底和第一光束之间的相对位移期间可相对于衬底台选择性地移位。第三图案化束可以用于暴露横向于相对位移方向延伸的衬底的细长部分。

2. 发明授权

US07477403B2 Optical position assessment apparatus and method 有权
标题翻译：光学位置评估装置及方法
公开(公告)号：US07477403B2
公开(公告)日：2009-01-13
申请号：US10854770
申请日：2004-05-27
申请人： Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager , Joannes Theodoor de Smit
发明人： Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen , Johan Christiaan Gerard Hoefnagels , Pieter Willem Herman de Jager , Joannes Theodoor de Smit
IPC分类号： G01B11/14 , G01B11/00 , G03B27/32 , G03F9/00 , G03C5/00
CPC分类号： G03F7/70275 , G03F9/7088
摘要： An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens. A processor is connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.
摘要翻译：光学位置评估装置和方法具有照射系统，其提供对准的辐射束，并且位置数据源自对准光束的反射。基板被支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分上。定位系统引起基板和投影系统之间的相对移动。透镜阵列被布置成使得阵列中的每个透镜将对准光束的相应部分聚焦到目标部分的相应部分上。一组检测器被布置成使得阵列中的每个检测器通过阵列中的相应透镜来检测从基板反射的光，并且通过相应的透镜提供代表从基板反射的光的强度的输出。处理器连接到检测器的输出，用于从检测器的输出导出表示透镜阵列相对于基板的位置的数据。

3. 发明申请

US20100014059A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20100014059A1
公开(公告)日：2010-01-21
申请号：US12469953
申请日：2009-05-21
申请人： Gustaaf Willem Van Der Feltz , Cheng-Qun Gui , Johan Christiaan Gerard Hoefnagels
发明人： Gustaaf Willem Van Der Feltz , Cheng-Qun Gui , Johan Christiaan Gerard Hoefnagels
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70875 , G03F7/705
摘要： A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
摘要翻译：一种光刻设备和方法，其中使用系统来发射图案化的光束。图案化的光束被投影到支撑在基板支撑件上的基板的表面的目标部分上。目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。测量衬底的温度，并计算衬底对测量温度的尺寸响应。调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。

4. 发明授权

US07511797B2 Lithography system, control system and device manufacturing method 有权
标题翻译：光刻系统，控制系统及器件制造方法
公开(公告)号：US07511797B2
公开(公告)日：2009-03-31
申请号：US12068288
申请日：2008-02-05
申请人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
发明人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
IPC分类号： G03B27/42
CPC分类号： G03F7/70616 , G03F7/70525
摘要： A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.
摘要翻译：基于光刻系统的一个或多个操作条件预测光刻系统的性能标准的光刻系统，并与该性能标准的测量值进行比较。光刻系统可以根据测量和预测的性能标准之间的差异来确定，如果有的话，光刻系统的子系统如预期的那样不能执行。

5. 发明申请

US20080143985A1 Lithography system, control system and device manufacturing method 有权
公开(公告)号：US20080143985A1
公开(公告)日：2008-06-19
申请号：US12068288
申请日：2008-02-05
申请人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
发明人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
IPC分类号： G03B27/42
CPC分类号： G03F7/70616 , G03F7/70525
摘要： A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.

6. 发明授权

US07352439B2 Lithography system, control system and device manufacturing method 有权
标题翻译：光刻系统，控制系统及器件制造方法
公开(公告)号：US07352439B2
公开(公告)日：2008-04-01
申请号：US11497534
申请日：2006-08-02
申请人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
发明人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
IPC分类号： G03B27/42
CPC分类号： G03F7/70616 , G03F7/70525
摘要： A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.
摘要翻译：基于光刻系统的一个或多个操作条件预测光刻系统的性能标准的光刻系统，并与该性能标准的测量值进行比较。光刻系统可以根据测量和预测的性能标准之间的差异来确定，如果有的话，光刻系统的子系统如预期的那样不能执行。

7. 发明申请

US20080036983A1 Lithography system, control system and device manufacturing method 有权
公开(公告)号：US20080036983A1
公开(公告)日：2008-02-14
申请号：US11497534
申请日：2006-08-02
申请人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
发明人： Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
IPC分类号： G03B27/42
CPC分类号： G03F7/70616 , G03F7/70525
摘要： A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.

8. 发明授权

US08502954B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08502954B2
公开(公告)日：2013-08-06
申请号：US12469953
申请日：2009-05-21
申请人： Gustaaf Willem Van Der Feltz , Cheng-Qun Gui , Johan Christiaan Gerard Hoefnagels
发明人： Gustaaf Willem Van Der Feltz , Cheng-Qun Gui , Johan Christiaan Gerard Hoefnagels
IPC分类号： G03B27/52 , G03B27/54 , G03B27/42
CPC分类号： G03F7/70875 , G03F7/705
摘要： A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
摘要翻译：一种光刻设备和方法，其中使用系统来发射图案化的光束。图案化的光束被投影到支撑在基板支撑件上的基板的表面的目标部分上。目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。测量衬底的温度，并计算衬底对测量温度的尺寸响应。调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。

9. 发明授权

US07561251B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07561251B2
公开(公告)日：2009-07-14
申请号：US10811070
申请日：2004-03-29
申请人： Gustaaf Willem Van Der Feltz , Cheng-Qun Gui , Johan Christiaan Gerard Hoefnagels
发明人： Gustaaf Willem Van Der Feltz , Cheng-Qun Gui , Johan Christiaan Gerard Hoefnagels
IPC分类号： G03B27/54 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/705
摘要： A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.
摘要翻译：一种光刻设备和方法，其中使用图案化系统以在其横截面中将投影光束赋予图案。光束由投影系统从照明系统引导到支撑在基板支撑件上的基板的表面的目标部分上。目标部分相对于衬底台具有适合于衬底表面上的期望曝光图案的预定空间特性。测量衬底的温度，并计算衬底对测量温度的尺寸响应。调整目标部分相对于衬底台的空间特性以补偿所计算的尺寸响应。

10. 发明授权

US07116398B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07116398B2
公开(公告)日：2006-10-03
申请号：US10972784
申请日：2004-10-26
申请人： Johan Christiaan Gerard Hoefnagels , Peter Spit
发明人： Johan Christiaan Gerard Hoefnagels , Peter Spit
IPC分类号： G03B27/68 , G03B27/42 , G03B27/32 , G02F1/1335 , G03C5/00
CPC分类号： G02F1/1333 , G02F1/1309 , G02F2001/133354 , G03F7/70425 , G03F7/70675 , G03F7/70791
摘要： A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
摘要翻译：制造耦合在一起的第一和第二基板的方法，例如平板显示器的有源和无源板。活动板根据标准图案形成并进行检查。然后通过根据形成在有源板上的实际图案修改被动板的图案数据来形成被动板，以确保形成在主动板和被动板上的图案紧密对应。

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