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1. 发明授权

US4103542A Metrology instrument for measuring vertical profiles of integrated circuits 失效
标题翻译：用于测量集成电路垂直剖面的测量仪器
公开(公告)号：US4103542A
公开(公告)日：1978-08-01
申请号：US831870
申请日：1977-09-09
申请人： William R. Wheeler , George J. Kren , Karel Urbanek
发明人： William R. Wheeler , George J. Kren , Karel Urbanek
IPC分类号： G01B5/20 , G01B5/00 , G01B7/00 , G01B7/28 , G01B7/34 , G01B21/20 , G01B5/28
CPC分类号： G01B5/0002 , G01B7/10 , G01B7/28
摘要： A surface profile measuring instrument, which has a stylus supported on a counterbalanced scanner arm, in turn supported in a gimbal mounting having two axes, one of which is adjustable by a servo. A connected electronics package provides axis compensation for levelling through the servo, as well as zero adjustment of a display device and discrimination against small, unwanted slops. Stylus motion is translated into an analog signal by a linear position differential transformer. To achieve slope discrimination, the analog signal is differentiated and compared in a comparator to a reference for rejection of signals corresponding to small slopes. The signal is then integrated and displayed, with reference to a selected zero of a display device.
摘要翻译：具有支撑在平衡扫描器臂上的触针的表面轮廓测量仪器又支撑在具有两个轴的万向架安装件中，其中一个可由伺服机构调节。连接的电子封装提供了通过伺服调平的轴补偿，以及显示装置的零调整和对小的不需要的斜坡的区分。触针运动由线性位置差分变换器转换为模拟信号。为了实现斜率鉴别，模拟信号被微分，并在比较器中进行比较，用于对应于小斜率的信号的抑制。然后参照显示装置的选定的零点对信号进行积分和显示。

2. 发明授权

US4302721A Non-contacting resistivity instrument with structurally related conductance and distance measuring transducers 失效
标题翻译：具有结构相关电导和距离测量传感器的非接触电阻率仪器
公开(公告)号：US4302721A
公开(公告)日：1981-11-24
申请号：US39303
申请日：1979-05-15
申请人： Karel Urbanek , George J. Kren , William R. Wheeler
发明人： Karel Urbanek , George J. Kren , William R. Wheeler
IPC分类号： G01N27/02 , G01R31/26 , G01R31/265 , G01R31/28 , G01S15/32 , G01N27/72 , G01R33/12
CPC分类号： G01N27/023 , G01R31/2648 , G01R31/265 , G01R31/2831 , G01S15/32 , Y10S414/135
摘要： An instrument for computing resistivity based upon measurements of thickness and conductance. A conductance transducer is a solenoid in an annular ferrite cup connected to a tank circuit for an eddy current measurement of conductance. Within the center of the annular ferrite cup concentric acoustic wave sending and receiving channels are disposed for making an acoustic pressure wave measurement which is used for a thickness measurement using two gauge heads, spaced on opposite sides of an article to be measured. Each gauge head contains identical conductance and thickness transducers. The thickness measurement is divided by the conductance measurement to derive resistivity.
摘要翻译：基于厚度和电导测量计算电阻率的仪器。电导传感器是连接到用于电导涡流测量的电路的环形铁氧体杯中的螺线管。在环形铁氧体杯的中心内，设置同心声波发送和接收通道，用于进行声压测量，其用于使用两个测量头进行厚度测量，间隔在待测物品的相对两侧。每个测量头包含相同的电导和厚度换能器。厚度测量除以电导测量以导出电阻率。

3. 发明授权

US4175441A Gauge for measuring distance to planar surfaces and thicknesses of planar members 失效
标题翻译：用于测量平面表面距离和平面构件厚度的量具
公开(公告)号：US4175441A
公开(公告)日：1979-11-27
申请号：US903493
申请日：1978-05-08
申请人： Karel Urbanek , George J. Kren , William R. Wheeler
发明人： Karel Urbanek , George J. Kren , William R. Wheeler
IPC分类号： G01R27/02 , G01R31/26 , G01S15/32 , G01N29/00
CPC分类号： G01R31/2648 , G01S15/32
摘要： Apparatus for measuring distance between a gauge head orifice, and the front planar surface of an object by sensing acoustic pressure near the gauge head orifice. The acoustic pressure is initially generated by an audio oscillator activating a speaker which emits acoustic waves through a first orifice. Acoustic pressure is sensed through a second orifice, proximate to the first, and the pressure is converted to an electrical signal which is processed to yield a distance signal for a display. Two similar distance gauges spaced apart on opposite sides of a planar member at a known distance are used to compute the thickness of the planar member.
摘要翻译：用于通过感测测量头孔口附近的声压测量仪表头孔和物体的前平面之间的距离的装置。声压最初由音频振荡器产生，该音频振荡器激活通过第一孔口发出声波的扬声器。通过靠近第一孔的第二孔检测声压，并将压力转换成电信号，该信号被处理以产生显示器的距离信号。使用在已知距离处的平面构件的相对侧上间隔开的两个相似的距离计，以计算平面构件的厚度。

4. 发明授权

US4282483A Probe for determining p or n-type conductivity of semiconductor material 失效
标题翻译：用于确定半导体材料的p型或n型导电性的探针
公开(公告)号：US4282483A
公开(公告)日：1981-08-04
申请号：US69272
申请日：1979-08-24
申请人： George J. Kren , Karel Urbanek , William R. Wheeler
发明人： George J. Kren , Karel Urbanek , William R. Wheeler
IPC分类号： G01R31/26 , G01R31/265 , G01R31/28
CPC分类号： G01R31/2648 , G01R31/265 , G01R31/2831
摘要： A probe for determining the p or n-type of semiconductor material wherein a conductive wire is positioned for point contact with the semiconductor, forming a diode. The wire is energized by r.f. current passing through a capacitor so that the current is rectified at the diode, charging the capacitor. A voltage comparator is connected to the capacitor for determining the polarity of charge on the capacitor and hence the p or n-type of the semiconductor wafer. The semiconductor is supported on a non-diffusing dielectric over a conductive carrier such that r.f. current passes through the dielectric to the carrier, thereby completing the circuit.
摘要翻译：用于确定p型或n型半导体材料的探针，其中定位导线以与半导体点接触，形成二极管。线由r.f.通电。电流通过电容器，使得电流在二极管处整流，对电容器充电。将电压比较器连接到电容器，以确定电容器上的电荷的极性，因此确定p型或n型半导体晶片。半导体被支撑在导电载体上的非扩散电介质上，使得r.f. 电流通过电介质到载体，从而完成电路。

5. 发明授权

US4597708A Wafer handling apparatus 失效
标题翻译：晶圆处理装置
公开(公告)号：US4597708A
公开(公告)日：1986-07-01
申请号：US616979
申请日：1984-06-04
申请人： William R. Wheeler , Rusmin Kudinar , George J. Kren , David D. Clementson
发明人： William R. Wheeler , Rusmin Kudinar , George J. Kren , David D. Clementson
IPC分类号： H01L21/677 , B65G1/06
CPC分类号： H01L21/67766 , Y10T74/1892 , Y10T74/1896
摘要： A wafer handler featuring a carriage movable along a rail path, the carriage supporting an upright rotatable arm with a cantilevered wafer chuck. Elevators for raising and lowering trays containing wafer stacks are disposed on either side of the rail path. Each elevator has a curved track section which may be interposed along the rail path. The upright arm has a track follower, parallel to a boom supporting the wafer chuck and freely movable along the rail path, except when it encounters a curved track section. In this instance, the track follower will follow the curved track section, causing rotation of the arm, boom and wafer chuck, bringing the chuck into the wafer stack at an elevation determined by the elevator. In this manner, motion in the X, Y and Z planes may be provided for stacked wafers over extended distances.
摘要翻译：具有可沿轨道移动的支架的晶片处理器，该支架支撑具有悬臂晶片卡盘的直立可旋转臂。用于升高和降低包含晶片堆叠的托盘的升降机设置在轨道的任一侧。每个电梯具有弯曲的轨道部分，其可以沿着轨道路线插入。直立臂具有轨道跟随器，平行于支撑晶片卡盘的悬臂，并且可以沿着轨道路径自由移动，除非它遇到弯曲的轨道部分。在这种情况下，跟踪跟随器将跟随弯曲的轨道部分，引起臂，吊臂和晶片卡盘的旋转，使得卡盘以电梯确定的仰角进入晶片堆叠。以这种方式，X，Y和Z平面中的运动可以用于延长距离上的堆叠晶片。

6. 发明授权

US4280354A Acoustic method and apparatus for measuring surfaces of wafers and similar articles 失效
标题翻译：用于测量晶片和类似物品的表面的声学方法和装置
公开(公告)号：US4280354A
公开(公告)日：1981-07-28
申请号：US120932
申请日：1980-02-12
申请人： William R. Wheeler , George J. Kren
发明人： William R. Wheeler , George J. Kren
IPC分类号： G01B17/08 , G10K11/35 , G01N29/00
CPC分类号： G10K11/355 , G01B17/08
摘要： A measurement system wherein an acoustic distance measuring transducer is moved over a flat reference surface, measuring the distance from the transducer to a calibration surface and then to a test surface. The transducer is moved along a path within a ring while the top edge of the ring is used to support the calibration surface and then the test surface. The ring is mounted for rotation so that the transducer can scan a supported surface at a locus of points. Scans across the calibration surface and then the test surface are compared to measure deviations of the test surface from calibration surface.
摘要翻译：一种测量系统，其中声学距离测量传感器在平坦的参考表面上移动，测量从换能器到校准表面的距离，然后测量到测试表面。传感器沿着环内的路径移动，而环的顶部边缘用于支撑校准表面，然后测试表面。环安装为旋转，以便换能器可以在点的轨迹扫描受支撑的表面。扫描校准表面，然后将测试表面进行比较，以测量测试表面与校准表面的偏差。

7. 发明授权

US4376482A Wafer orientation system 失效
标题翻译：晶圆定向系统
公开(公告)号：US4376482A
公开(公告)日：1983-03-15
申请号：US265412
申请日：1981-05-19
申请人： William R. Wheeler , George J. Kren , David D. Clementson
发明人： William R. Wheeler , George J. Kren , David D. Clementson
IPC分类号： B65G47/244 , H01L21/68 , B65G47/24
CPC分类号： H01L21/68 , B65G47/244
摘要： A wafer orienting apparatus having inwardly biased rollers, spaced about the circumferential edge of a wafer in contact with the edge. Two of the rollers are spaced apart a distance less than the dimension of a primary flat registration edge and are mounted to follow the wafer edge upon rotation of the wafer. When a flat registration edge passes these closely spaced rollers they move inwardly, activating switches associated with a coincidence circuit. When both switches are simultaneously activated, the coincidence circuit produces a signal which stops wafer rotation, thereby orienting the wafer. The rollers are mounted so that they can be moved from the path of wafer travel after wafer orientation, permitting a queue of wafers to be oriented, one after the other.
摘要翻译：具有向内偏压的辊的晶片定向装置，其间隔开与所述边缘接触的晶片的周边边缘。两个辊间隔开一个小于主平面配准边缘的尺寸的距离，并且在晶片旋转时安装成跟随晶片边缘。当平面配准边缘通过这些紧密间隔的辊时，它们向内移动，启动与重合电路相关联的开关。当两个开关同时被激活时，符合电路产生停止晶片旋转的信号，从而使晶片定向。辊子被安装成使得它们可以在晶片取向之后从晶片移动的路径移动，从而允许晶片排队一个接一个地定向。

8. 发明授权

US08294887B1 Fast laser power control with improved reliability for surface inspection 有权
标题翻译：快速激光功率控制，提高了表面检测的可靠性
公开(公告)号：US08294887B1
公开(公告)日：2012-10-23
申请号：US12841319
申请日：2010-07-22
申请人： Stephen Biellak , Daniel Kavaldjiev , George J. Kren , Anatoly Romanovsky , Christian Wolters
发明人： Stephen Biellak , Daniel Kavaldjiev , George J. Kren , Anatoly Romanovsky , Christian Wolters
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/95607 , G01N2021/8822 , G01N2201/069
摘要： An inspection system may include, but is not limited to: an illumination subsystem for directing light to an inspection specimen comprising: a power attenuator subsystem configured for altering the power level of a light beam emitted by the illumination subsystem; and a power attenuation control subsystem configured to provide control signals to the power attenuator subsystem according to a detected level of light scattering by the inspection specimen upon illumination by the illumination subsystem. A method for scatterometry inspection may include, but is not limited to: directing light having a power level to an inspection specimen from a light source; detecting light scattered from the specimen; and modifying a power level of one or more intermediate light beams within the light source according to a level of light scattering by the specimen upon illumination by the light source.
摘要翻译：检查系统可以包括但不限于：用于将光引导到检查样本的照明子系统，包括：功率衰减器子系统，被配置为改变由照明子系统发射的光束的功率电平; 以及功率衰减控制子系统，被配置为根据所述照明子系统照明时检测样本的检测到的光散射水平向所述功率衰减子系统提供控制信号。用于散射检查的方法可以包括但不限于：将来自光源的具有功率水平的光引导到检查样本; 检测从样品散射的光; 以及根据光源照射时样品的光散射水平来修改光源内的一个或多个中间光束的功率电平。

9. 发明申请

US20130038866A1 AIR FLOW MANAGEMENT IN A SYSTEM WITH HIGH SPEED SPINNING CHUCK 审中-公开
标题翻译：在高速旋转切割系统中的空气流量管理
公开(公告)号：US20130038866A1
公开(公告)日：2013-02-14
申请号：US13565212
申请日：2012-08-02
申请人： George J. Kren , Paul Doyle , Alexander Belyaev
发明人： George J. Kren , Paul Doyle , Alexander Belyaev
IPC分类号： G01N21/00 , B23B31/30 , B23B31/02
CPC分类号： H01L21/68735 , Y10T279/11 , Y10T279/21 , Y10T279/34
摘要： The present invention is directed to a high speed, spinning chuck for use in a semiconductor wafer inspection system. The chuck of the present disclosure is configured with a turbulence-reducing lip. Spinning of the chuck produces radial airflows proximal to a surface of the wafer and proximal to the bottom of the chuck. The turbulence-reducing lip of the chuck of the present disclosure directs the radial airflows off of the top surface of the wafer and the bottom surface of the chuck in a manner that minimizes the size of the low pressure zone formed between these radial airflows. The minimization of the low pressure zone reduces air turbulence about the periphery of the chuck and substrate, thereby reducing the possibility of contaminants in the system being directed onto the surface of the substrate by such air turbulence.
摘要翻译：本发明涉及一种用于半导体晶片检查系统的高速纺丝卡盘。本公开的卡盘配置有减少湍流的唇部。卡盘的旋转产生靠近晶片表面并靠近卡盘底部的径向气流。本公开的卡盘的减少湍流的唇部以使得在这些径向气流之间形成的低压区域的尺寸最小化的方式引导径向气流离开晶片的顶表面和卡盘的底表面。低压区域的最小化减小了卡盘和基板周围的空气紊流，从而降低了系统中的污染物通过这种空气湍流被引导到基板的表面上的可能性。

10. 发明授权

US06781688B2 Process for identifying defects in a substrate having non-uniform surface properties 有权
标题翻译：用于识别具有不均匀表面性质的基底中的缺陷的方法
公开(公告)号：US06781688B2
公开(公告)日：2004-08-24
申请号：US10327484
申请日：2002-12-20
申请人： George J. Kren , Mehdi Vaez-Iravani , David W. Shortt
发明人： George J. Kren , Mehdi Vaez-Iravani , David W. Shortt
IPC分类号： G01N2100
CPC分类号： G01N21/9501
摘要： A surface inspection method of the invention includes scanning an inspection surface taking surface measurements. Determinations of various noise levels in the surface are made based on variations in the surface measurements. A dynamic threshold is then determined. The dynamic threshold adapts to the noise levels in the inspection surface to provide a varying threshold that can provide areas of high and low defect sensitivity on the same inspection surface. Defects are then identified by comparing surface measurements with the dynamic threshold. Additionally, the invention includes a surface inspection method that uses signal-to-noise ratios to identify defects. Such a method scans an inspection surface to obtain surface measurements. Noise levels associated with the inspection surface are then determined. Signal-to-noise ratios are determined for the surface measurements. The signal-to-noise ratios are compared with a signal-to-noise ratio threshold value. Defects are identified based on the comparisons of the signal-to-noise ratio of the surface measurements with the signal-to-noise ratio threshold value.
摘要翻译：本发明的表面检查方法包括扫描检查表面进行表面测量。基于表面测量的变化确定表面中各种噪声水平。然后确定动态阈值。动态阈值适应于检查表面中的噪声水平，以提供可在同一检查表面上提供高和低缺陷灵敏度区域的变化阈值。然后通过将表面测量与动态阈值进行比较来识别缺陷。此外，本发明包括使用信噪比来识别缺陷的表面检查方法。这种方法扫描检查表面以获得表面测量。然后确定与检查表面相关联的噪声水平。确定表面测量的信噪比。将信噪比与信噪比阈值进行比较。基于表面测量的信噪比与信噪比阈值的比较来识别缺陷。

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