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    • 6. 发明授权
    • Method of fabricating semiconductor device
    • 制造半导体器件的方法
    • US07846801B2
    • 2010-12-07
    • US11833050
    • 2007-08-02
    • Sung-jun KimSeong-kyu YunChang-ki HongBo-un YoonJong-won LeeHo-young Kim
    • Sung-jun KimSeong-kyu YunChang-ki HongBo-un YoonJong-won LeeHo-young Kim
    • H01L21/336
    • H01L29/66795H01L29/7851
    • Disclosed is a method of fabricating a semiconductor device including a multi-gate transistor. The method of fabricating a semiconductor device includes providing a semiconductor device having a number of active patterns which extend in a first direction, are separated by an isolation layer, and covered with a first insulating layer; forming a first groove by etching the isolation layer located between the active patterns adjacent to each other in the first direction; burying the first groove with a passivation layer; forming a second groove exposing at least a portion of both sides of the active patterns by etching the isolation layer located between the active patterns in a second direction intersecting the first direction; removing the passivation layer in the first groove; and forming a gate line filling at least a portion of the second groove and extending in the second direction.
    • 公开了一种制造包括多栅极晶体管的半导体器件的方法。 制造半导体器件的方法包括提供具有多个沿第一方向延伸的活性图案的半导体器件,被隔离层隔开并被第一绝缘层覆盖; 通过在第一方向上蚀刻位于彼此相邻的有源图案之间的隔离层来形成第一凹槽; 用钝化层掩埋第一槽; 通过在与所述第一方向相交的第二方向上蚀刻位于所述有源图案之间的所述隔离层来形成暴露所述有源图案的两侧的至少一部分的第二凹槽; 去除第一凹槽中的钝化层; 以及形成填充所述第二凹槽的至少一部分并沿所述第二方向延伸的栅极线。
    • 8. 发明授权
    • Wafer polishing slurry and chemical mechanical polishing (CMP) method using the same
    • 晶圆抛光浆和化学机械抛光(CMP)方法使用相同
    • US06514862B2
    • 2003-02-04
    • US09977239
    • 2001-10-16
    • Jae-dong LeeJong-won LeeBo-un YoonSang-rok Hah
    • Jae-dong LeeJong-won LeeBo-un YoonSang-rok Hah
    • H01L21302
    • C09G1/02H01L21/31053
    • A chemical mechanical polishing slurry includes an additive of a quaternary ammonium compound having a form of {N—(R1R2R3R4)}+X−, in which R1, R2, R3, and R4 are radicals, and X− is an anion derivative including halogen elements. Preferably, the quaternary ammonium compound is one of [(CH3)3NCH2CH2OH]Cl, [(CH3)3NCH2CH2OH]l, [(CH3)3NCH2CH2OH]Br, [(CH3)3NCH2CH2OH]CO3, and mixtures thereof. The slurry may further include a pH control agent formed of a base such as KOH, NH4OH, and (CH3)4NOH, and an acid such as HCl, H2SO4, H3PO4, and HNO3. Also, the pH control agent can include [(CH3)3NCH2CH2OH]OH. The slurry may further include a surfactant such as cetyldimethyl ammonium bromide, cetyldimethyl ammonium bromide, polyethylene oxide, polyethylene alcohol or polyethylene glycol.
    • 化学机械抛光浆料包括具有{N-(R1R2R3R4)} + X-形式的季铵化合物的添加剂,其中R 1,R 2,R 3和R 4是自由基,X是包含卤素的阴离子衍生物 元素。 优选地,季铵化合物是[(CH 3)3 NHCH 2 CH 2 OH] Cl,[(CH 3)3 NHCH 2 CH 2 OH] 1,[(CH 3)3 NHCH 2 CH 2 OH] Br,[(CH 3)3 NHCH 2 CH 2 OH] CO 3及其混合物之一。 该浆料还可以包括由碱如KOH,NH 4 OH和(CH 3)4 NOH形成的pH控制剂,以及酸如HCl,H 2 SO 4,H 3 PO 4和HNO 3。 此外,pH控制剂可以包括[(CH 3)3 NHCH 2 OH] OH。 浆料还可以包括表面活性剂如十六烷基二甲基溴化铵,鲸蜡基二甲基溴化铵,聚环氧乙烷,聚乙烯醇或聚乙二醇。
    • 10. 发明授权
    • Distributed opportunistic scheduling in IEEE 802.11 wireless location area networks (WLANs)
    • IEEE 802.11无线定位区域网络(WLAN)中的分布式机会调度
    • US07792138B2
    • 2010-09-07
    • US11520541
    • 2006-09-13
    • Seong-il HahmJong-won LeeChong-kwon Kim
    • Seong-il HahmJong-won LeeChong-kwon Kim
    • H04J3/02
    • H04W74/0825H04L1/0003
    • A WLAN distributed/opportunistic scheduling (WDOS) method for acquiring a multi-user diversity gain is disclosed. The WDOS method allows a transmitter (i.e., a transmission user) to observe channel conditions of receivers (i.e., reception users), and commands the transmitter to transmit packets to a specific receiver having a relative good channel condition. The WDOS method uses a modified RTS/CTS exchange method to perform the channel probing. If the transmitter broadcasts the BRTS frame, each receiver transmits a CTS frame after the lapse of its backoff period. According to the reception signal strength distribution, the backoff delay time minimizes the number of CTS collisions irrespective of the number of receivers, reduces an amount of channel probing overheads, and maximizes a multi-user diversity gain. The better the relative channel condition, the lower the backoff delay time.
    • 公开了一种用于获取多用户分集增益的WLAN分布/机会调度(WDOS)方法。 WDOS方法允许发射机(即传输用户)观察接收机(即,接收用户)的信道状况,并命令发射机向具有相对良好信道状态的特定接收机发送分组。 WDOS方法使用修改的RTS / CTS交换方法来执行信道探测。 如果发射机广播BRTS帧,则每个接收机在其退避周期过去之后发送CTS帧。 根据接收信号强度分布,回退延迟时间使CTS冲突的数量最小化,而与接收机的数量无关,减少了信道探测开销的数量,并使多用户分集增益最大化。 相对通道条件越好,退避延迟时间越短。