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    • 5. 发明授权
    • Low defect density silicon having a vacancy-dominated core substantially free of oxidation induced stacking faults
    • 具有基本上不含氧化诱导的堆垛层错的空位主导的核的低缺陷密度的硅
    • US07217320B2
    • 2007-05-15
    • US11005987
    • 2004-12-07
    • Chang Bum KimSteven L. KimbelJeffrey L. LibbertMohsen Banan
    • Chang Bum KimSteven L. KimbelJeffrey L. LibbertMohsen Banan
    • C03B15/20
    • C30B15/203C30B15/20C30B15/206C30B29/06Y10T428/21
    • The present invention relates to a process for preparing a single crystal silicon ingot, as well as to the ingot or wafer resulting therefrom. The process comprises controlling (i) a growth velocity, v, (ii) an average axial temperature gradient, G0, and (iii) a cooling rate of the crystal from solidification to about 750° C., in order to cause the formation of a segment having a first axially symmetric region extending radially inward from the lateral surface of the ingot wherein silicon self-interstitials are the predominant intrinsic point defect, and a second axially symmetric region extending radially inward from the first and toward the central axis of the ingot. The process is characterized in that v, G0 and the cooling rate are controlled to prevent the formation of agglomerated intrinsic point defects in the first region, while the cooling rate is further controlled to limit the formation of oxidation induced stacking faults in a wafer derived from this segment, upon subjecting the wafer to an oxidation treatment otherwise suitable for the formation of such faults.
    • 本发明涉及一种制备单晶硅锭的方法,以及由此产生的锭或晶片。 该方法包括控制(i)生长速度v,(ii)平均轴向温度梯度G 0 O 3,和(iii)晶体从凝固到约750℃的冷却速率。 ,以便形成具有第一轴向对称区域的区段,该第一轴向对称区域从该晶锭的侧表面径向向内延伸,其中硅自间隙是主要的固有点缺陷,以及第二轴向对称区域,其从第一 并朝向锭的中心轴线。 该方法的特征在于控制v,G 0和冷却速率以防止在第一区域中形成凝聚的固有点缺陷,同时进一步控制冷却速率以限制氧化物的形成 在对晶片进行氧化处理(其他适用于形成这样的故障的氧化处理)之后,在来自该段的晶片中引起堆垛层错。
    • 6. 发明授权
    • Electron beam generating apparatus
    • 电子束发生装置
    • US08736169B2
    • 2014-05-27
    • US13122109
    • 2010-08-10
    • Yong Woon ParkSung Ju ParkIn Soo KoChang Bum KimJu Ho HongSung Ik Moon
    • Yong Woon ParkSung Ju ParkIn Soo KoChang Bum KimJu Ho HongSung Ik Moon
    • H01J29/80
    • H01J3/02
    • An apparatus for generating an electron beam is disclosed to reduce emittance of an electron beam. The apparatus includes: a housing including a rear portion where an electron beam is generated, a front portion having an electron beam discharge hole for discharging the electron beam to the exterior, and a side portion connecting the rear portion and the front portion, the side portion having a first hole and an opposite side portion, facing the first hole, having a second hole in order to reduce asymmetry of an electric field caused by the first hole; and a waveguide installed on the side portion to supply an electromagnetic wave to the interior of the housing through the first hole, wherein the electron beam is generated by laser incident to the interior of the housing and accelerated by the electromagnetic wave supplied to the interior of the housing.
    • 公开了一种用于产生电子束的装置,以减少电子束的发射。 该装置包括:壳体,其包括产生电子束的后部,具有用于将电子束排出到外部的电子束排出孔的前部和连接后部和前部的侧部, 具有第一孔和与第一孔相对的相对侧部的部分具有第二孔,以减少由第一孔引起的电场的不对称性; 以及安装在所述侧部上的波导,以通过所述第一孔向所述壳体的内部提供电磁波,其中所述电子束通过入射到所述壳体的内部的激光产生并且被提供给所述壳体内部的电磁波加速 住房。
    • 7. 发明授权
    • Low defect density silicon having a vacancy-dominated core substantially free of oxidation induced stacking faults
    • 具有基本上不含氧化诱导的堆垛层错的空位主导的核的低缺陷密度的硅
    • US06846539B2
    • 2005-01-25
    • US10054629
    • 2002-01-22
    • Chang Bum KimSteven L. KimbelJeffrey L. LibbertMohsen Banan
    • Chang Bum KimSteven L. KimbelJeffrey L. LibbertMohsen Banan
    • C30B29/06C30B15/00C30B15/20C30B33/02H01L29/06
    • C30B15/203C30B15/20C30B15/206C30B29/06Y10T428/21
    • The present invention relates to a process for preparing a single crystal silicon ingot, as well as to the ingot or wafer resulting therefrom. The process comprises controlling (i) a growth velocity, v, (ii) an average axial temperature gradient, G0, and (iii) a cooling rate of the crystal from solidification to about 750° C., in order to cause the formation of a segment having a first axially symmetric region extending radially inward from the lateral surface of the ingot wherein silicon self-interstitials are the predominant intrinsic point defect, and a second axially symmetric region extending radially inward from the first and toward the central axis of the ingot. The process is characterized in that v, G0 and the cooling rate are controlled to prevent the formation of agglomerated intrinsic point defects in the first region, while the cooling rate is further controlled to limit the formation of oxidation induced stacking faults in a wafer derived from this segment, upon subjecting the wafer to an oxidation treatment otherwise suitable for the formation of such faults.
    • 本发明涉及一种制备单晶硅锭的方法,以及由此产生的锭或晶片。 该方法包括控制(i)生长速度v,(ii)平均轴向温度梯度G0和(iii)晶体从凝固到约750℃的冷却速率,以便形成 具有从铸锭的侧表面径向向内延伸的第一轴向对称区域的区段,其中硅自填隙是主要的固有点缺陷,以及从铸锭的第一和朝向中心轴线径向向内延伸的第二轴向对称区域 。 该方法的特征在于,控制v,G0和冷却速率以防止在第一区域中形成凝聚的本征点缺陷,同时进一步控制冷却速率以限制衍生自晶片的晶片中氧化诱导的堆垛层错的形成 该片段在使晶片进行其他适于形成这种故障的氧化处理时。
    • 9. 发明申请
    • ELECTRON BEAM GENERATING APPARATUS
    • 电子束发生装置
    • US20120133281A1
    • 2012-05-31
    • US13122109
    • 2010-08-10
    • Yong Woon ParkSung Ju ParkIn Soo KoChang Bum KimJu Ho HongSung Ik Moon
    • Yong Woon ParkSung Ju ParkIn Soo KoChang Bum KimJu Ho HongSung Ik Moon
    • H01J29/80
    • H01J3/02
    • An apparatus for generating an electron beam is disclosed to reduce emittance of an electron beam. The apparatus includes: a housing including a rear portion where an electron beam is generated, a front portion having an electron beam discharge hole for discharging the electron beam to the exterior, and a side portion connecting the rear portion and the front portion, the side portion having a first hole and an opposite side portion, facing the first hole, having a second hole in order to reduce asymmetry of an electric field caused by the first hole; and a waveguide installed on the side portion to supply an electromagnetic wave to the interior of the housing through the first hole, wherein the electron beam is generated by laser incident to the interior of the housing and accelerated by the electromagnetic wave supplied to the interior of the housing.
    • 公开了一种用于产生电子束的装置,以减少电子束的发射。 该装置包括:壳体,其包括产生电子束的后部,具有用于将电子束排出到外部的电子束排出孔的前部和连接后部和前部的侧部, 具有第一孔和与第一孔相对的相对侧部的部分具有第二孔,以减少由第一孔引起的电场的不对称性; 以及安装在所述侧部上的波导,以通过所述第一孔向所述壳体的内部提供电磁波,其中所述电子束通过入射到所述壳体的内部的激光产生并且被提供给所述壳体内部的电磁波加速 住房。