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1. 发明申请

US20060157807A1 Three dimensional high aspect ratio micromachining 有权
公开(公告)号：US20060157807A1
公开(公告)日：2006-07-20
申请号：US11375860
申请日：2006-03-15
申请人： Kanakasabapathi Subramanian , Xiaojun Huang , Noel MacDonald
发明人： Kanakasabapathi Subramanian , Xiaojun Huang , Noel MacDonald
IPC分类号： H01L29/84
CPC分类号： B81C1/00626 , B81B2201/033 , H01L21/3086
摘要： Multi-level structures are formed in a semiconductor substrate by first forming a pattern of lines or structures of different widths. Width information on the pattern is decoded by processing steps into level information to form a MEMS structure. The pattern is etched to form structures having a first floor. The structures are oxidized until structures of thinner width are substantially fully oxidized. A portion of the oxide is then etched to expose the first floor. The first floor is then etched to form a second floor. The oxide is then optionally removed, leaving a multi-level structure. In one embodiment, high aspect ratio comb actuators are formed using the multi-level structure process.

2. 发明申请

US20060249841A1 Small scale wires with microelectromechanical devices 有权
公开(公告)号：US20060249841A1
公开(公告)日：2006-11-09
申请号：US11340135
申请日：2006-01-26
申请人： Kanakasabapathi Subramanian , Noel MacDonald
发明人： Kanakasabapathi Subramanian , Noel MacDonald
IPC分类号： H01L23/48
CPC分类号： B81C1/00142 , B81B2203/0361 , B81C1/00071 , B81C1/00111 , B81C2201/0112 , Y10S977/70 , Y10S977/762
摘要： A process cycles between etching and passivating chemistries to create rough sidewalls that are converted into small structures. In one embodiment, a mask is used to define lines in a single crystal silicon wafer. The process creates ripples on sidewalls of the lines corresponding to the cycles. The lines are oxidized in one embodiment to form a silicon wire corresponding to each ripple. The oxide is removed in a further embodiment to form structures ranging from micro sharp tips to photonic arrays of wires. Fluidic channels are formed by oxidizing adjacent rippled sidewalls. The same mask is also used to form other structures for MEMS devices.

3. 发明授权

US06825967B1 Shaped electrodes for micro-electro-mechanical-system (MEMS) devices to improve actuator performance and methods for fabricating the same 有权
标题翻译：用于微机电系统（MEMS）装置的成形电极以改善致动器性能及其制造方法
公开(公告)号：US06825967B1
公开(公告)日：2004-11-30
申请号：US09676459
申请日：2000-09-29
申请人： John Chong , Seung Bok Lee , Noel MacDonald , Robert Lewis , Peter Hunt
发明人： John Chong , Seung Bok Lee , Noel MacDonald , Robert Lewis , Peter Hunt
IPC分类号： G02B2600
CPC分类号： B81C1/00619 , B81C1/00357 , B81C2201/019 , G02B26/0841 , Y10S359/90
摘要： Shaped electrodes for micro-electro-mechanical-system (MEMS) devices to improve actuator performance and methods for fabricating the same are disclosed. The shaped electrodes utilize its three-dimensional geometry to shape an electric field for electrostatic actuation for MEMS devices. For example, the height, width, length, sidewall slope, and layout of the shaped electrodes can be used to provide an optimum electric field in moving a MEMS mirror device. The shaped electrodes can provide electrostatic actuation at a low operating voltage and provide an optimum electric field for maximum tilt or angular range of motion for a MEMS mirror device. The shaped electrodes can be fabricated simply by using a pillar wafer and an electrode wafer. The pillar wafer can be used to form pillars as electrodes, or, alternatively, as barriers. A single substrate can also be used to form pillars and electrodes.
摘要翻译：公开了用于微机电系统（MEMS）装置的用于改善致动器性能的成形电极及其制造方法。成形电极利用其三维几何形状来形成用于MEMS器件的静电致动的电场。例如，可以使用成形电极的高度，宽度，长度，侧壁倾斜度和布局来提供移动MEMS反射镜装置中的最佳电场。成形电极可以在低工作电压下提供静电驱动，并为MEMS反射镜装置的最大倾斜或角度范围提供最佳电场。可以通过使用柱晶片和电极晶片简单地制造成形电极。支柱晶片可以用于形成柱子作为电极，或者替代地，作为屏障。单个基底也可用于形成柱和电极。

4. 发明申请

US20070117246A1 METAL MEMS DEVICES AND METHODS OF MAKING SAME 有权
标题翻译：金属MEMS器件及其制造方法
公开(公告)号：US20070117246A1
公开(公告)日：2007-05-24
申请号：US11625758
申请日：2007-01-22
申请人： Noel MacDonald , Marco Aimi
发明人： Noel MacDonald , Marco Aimi
IPC分类号： H01L21/00
CPC分类号： C23F4/00 , B81C1/00492 , B81C2201/0132
摘要： Metal MEMS structures are fabricated from metal substrates, preferably titanium, utilizing micromachining processes with a new deep etching procedure to provide released microelectromechanical devices. The deep etch procedure includes metal anisotropic reactive ion etching utilizing repetitive alternating steps of etching and side wall protection. Variations in the timing of the etching and protecting steps produces walls of different roughness and taper. The metal wafers can be macomachined before forming the MEMS structures, and the resulting wafers can be stacked and bonded in packages.
摘要翻译：金属MEMS结构由金属基底（优选钛）制成，利用微加工工艺和新的深刻蚀工艺来提供释放的微机电装置。深蚀刻程序包括利用重复的蚀刻和侧壁保护的交替步骤的金属各向异性反应离子蚀刻。蚀刻和保护步骤的时间变化产生不同粗糙度和锥度的壁。在形成MEMS结构之前，金属晶片可以被加工，并且所得到的晶片可以堆叠并结合成封装。

5. 发明授权

US06563106B1 Micro-electro-mechanical-system (MEMS) mirror device and methods for fabricating the same 有权
标题翻译：微机电系统（MEMS）镜装置及其制造方法
公开(公告)号：US06563106B1
公开(公告)日：2003-05-13
申请号：US09929900
申请日：2001-08-14
申请人： John Edward Bowers , Roger Jonathan Helkey , Charles Corbalis , Robert Kehl Sink , Seung Bok Lee , Noel MacDonald
发明人： John Edward Bowers , Roger Jonathan Helkey , Charles Corbalis , Robert Kehl Sink , Seung Bok Lee , Noel MacDonald
IPC分类号： H01J314
CPC分类号： B81B3/004 , B81B2201/042 , G02B26/0841
摘要： A micro-electro-mechanical-system (MEMS) mirror device and methods for fabricating the same allow for a large range of angular motion for a center mirror component. The large range of angular motion for a center mirror component is dictated simply by a thickness of a substrate used or a thickness of a thick film used in making a support structure to support the center mirror component. The MEMS mirror device and methods for fabricating the same allow a large number mirror devices to be fabricated on a substrate. The MEMS mirror device includes a substrate. Electrodes are formed supported by the substrate. A support structure is formed adjacent to the electrodes. A hinge pattern and a mirror pattern having a center mirror component are formed such that the support structure supports the hinge pattern and mirror pattern. The support structure also supports the hinge pattern and mirror pattern such that a bottom surface of the center mirror component in a stationary non-rotating position is capable of exceeding a height of 50 &mgr;m above the electrodes.
摘要翻译：微机电系统（MEMS）镜装置及其制造方法允许中心镜部件的大范围的角运动。用于中心镜部件的大范围的角运动简单地由所使用的基板的厚度或用于制造支撑结构以支撑中心镜部件的厚膜的厚度决定。 MEMS镜装置及其制造方法允许在衬底上制造大量镜装置。 MEMS反射镜装置包括基板。电极由衬底支撑形成。在电极附近形成支撑结构。形成具有中心镜部件的铰链图案和反射镜图案，使得支撑结构支撑铰链图案和反射镜图案。支撑结构还支撑铰链图案和镜面图案，使得在静止非旋转位置的中心镜部件的底面能够超过电极上方50um的高度。

6. 发明申请

US20070039170A1 Three-dimensional metal microfabrication process and devices produced thereby 有权
标题翻译：三维金属微细加工工艺及其制造的装置
公开(公告)号：US20070039170A1
公开(公告)日：2007-02-22
申请号：US11445067
申请日：2006-06-01
申请人： Masaru Rao , Marco Aimi , Noel MacDonald
发明人： Masaru Rao , Marco Aimi , Noel MacDonald
IPC分类号： B44C1/22 , H01B13/00 , C23F1/00 , H01R43/00
CPC分类号： C23F4/00 , B81B2201/042 , B81B2203/033 , B81C1/00126 , B81C2201/0132 , Y10T29/49117
摘要： The present invention relates, in general, to a method for three-dimensional (3D) microfabrication of complex, high aspect ratio structures with arbitrary surface height profiles in metallic materials, and to devices fabricated in accordance with this process. The method builds upon anisotropic deep etching methods for metallic materials previously developed by the inventors by enabling simplified realization of complex, non-prismatic structural geometries composed of multiple height levels and sloping and/or non-planar surface profiles. The utility of this approach is demonstrated in the fabrication of a sloping electrode structure intended for application in bulk micromachined titanium micromirror devices, however such a method could find use in the fabrication of any number of other microactuator, microsensor, microtransducer, or microstructure devices as well.
摘要翻译：本发明一般涉及用于金属材料中具有任意表面高度分布的复合高纵横比结构的三维（3D）微细加工方法，以及根据该方法制造的器件。该方法基于由本发明人先前开发的金属材料的各向异性深蚀刻方法，其通过使得能够简化实现由多个高度级别和倾斜和/或非平面表面轮廓组成的复杂的非棱柱结构几何形状。在制造用于体积微加工的钛微镜器件中的倾斜电极结构的过程中证明了这种方法的实用性，然而这种方法可用于制造任何数量的其它微型致动器，微传感器，微传感器或微结构器件，如好。

7. 发明申请

US20060268398A1 MEMS tunable vertical-cavity semiconductor optical amplifier 有权
标题翻译： MEMS可调垂直腔半导体光放大器
公开(公告)号：US20060268398A1
公开(公告)日：2006-11-30
申请号：US11442100
申请日：2006-05-26
申请人： Garrett Cole , E. Bjorlin , Qi Chen , Noel MacDonald , John Bowers
发明人： Garrett Cole , E. Bjorlin , Qi Chen , Noel MacDonald , John Bowers
IPC分类号： H01S3/00
CPC分类号： H01S5/50 , H01S5/041 , H01S5/0607 , H01S5/1025 , H01S5/18305 , H01S5/18308 , H01S5/18358 , H01S5/18366
摘要： A MEMS-tunable semiconductor optical amplifier (SOA). A device in accordance with the present invention comprises a substrate, a first mirror, coupled to the substrate, a second mirror, an active region, coupled between the first and second mirror, and a microelectromechanical actuator, coupled to the second mirror, wherein a voltage is applied to the microelectromechanical actuator to tune the SOA.
摘要翻译： MEMS可调谐半导体光放大器（SOA）。根据本发明的装置包括耦合到第一反射镜和耦合在第一和第二反射镜之间的基板，耦合到基板的第一反射镜，第二反射镜，有源区和耦合到第二反射镜的微机电致动器，其中，电压被施加到微机电致动器以调谐SOA。

8. 发明授权

US06788842B1 Method and apparatus for internal monitoring and control of reflectors in an optical switch 有权
标题翻译：用于光学开关中的反射器的内部监控和控制的方法和装置
公开(公告)号：US06788842B1
公开(公告)日：2004-09-07
申请号：US10091921
申请日：2002-03-05
申请人： Robert Kehl Sink , John Edward Bowers , Roger Jonathan Helkey , Robert Anderson , Noel MacDonald
发明人： Robert Kehl Sink , John Edward Bowers , Roger Jonathan Helkey , Robert Anderson , Noel MacDonald
IPC分类号： G02B635
CPC分类号： G02B6/359 , G02B6/3512 , G02B6/3556
摘要： The disclosed embodiments include method and apparatus for detecting the alignment of movable reflectors in an optical switch. A diagnostic device embodiment includes a two-dimensional photoimager positioned to receive light from movable mirrors in the switch. Each movable mirror reflects light to different two-dimensional positions on the photoimager based on the position of each movable mirror, thereby creating a two-dimensional image of the reflector array. A controller receives information from the photoimager and adjusts the positions of the movable mirrors according to light received at the photoimager. A related diagnostic device includes an illumination source for directing monitor light beams onto the movable mirrors where the monitor beams are reflected onto the photoimager. This configuration provides two-dimensional information concerning the current position of the movable mirrors which is used to monitor and adjust the positions of the movable mirrors of the switch.
摘要翻译：所公开的实施例包括用于检测光学开关中的可移动反射器的对准的方法和装置。诊断装置实施例包括被定位成从开关中的可移动反射镜接收光的二维光电成像仪。基于每个可移动镜的位置，每个可移动镜将光反射到光成像仪上的不同二维位置，由此产生反射器阵列的二维图像。控制器从光电成像仪接收信息，并根据在光电成像仪处接收到的光来调节可移动反射镜的位置。相关的诊断装置包括用于将监视光束引导到可移动反射镜上的照明源，其中监视器光束被反射到光电成像仪上。该配置提供了关于可移动反射镜的当前位置的二维信息，其用于监视和调整开关的可移动反射镜的位置。

9. 发明授权

US06628041B2 Micro-electro-mechanical-system (MEMS) mirror device having large angle out of plane motion using shaped combed finger actuators and method for fabricating the same 有权
标题翻译：使用成形精梳手指致动器的具有大角度平面外运动的微机电系统（MEMS）镜装置及其制造方法
公开(公告)号：US06628041B2
公开(公告)日：2003-09-30
申请号：US09572979
申请日：2000-05-16
申请人： Seung Bok Lee , Noel MacDonald
发明人： Seung Bok Lee , Noel MacDonald
IPC分类号： H02N100
CPC分类号： B81B3/0086 , B81B3/004 , B81B2201/033 , B81B2201/042 , B81B2203/058 , G02B26/0841
摘要： A micro-electro-mechanical-system (MEMS) mirror device includes a mirror component that is capable of moving upon electrostatic actuation. The MEMS mirror device also includes and one or more electrostatic actuators providing electrostatic actuation. The electrostatic actuators having plates disposed approximately perpendicular to the mirror component. The plates are disposed to define a gap between the plates that decreases along a direction perpendicular to a surface of the mirror component.
摘要翻译：微电子机械系统（MEMS）镜装置包括能够在静电致动时移动的反射镜部件。 MEMS反射镜装置还包括提供静电致动的一个或多个静电致动器。静电致动器具有大致垂直于镜子部件设置的板。板被设置成限定沿着垂直于镜部件的表面的方向减小的板之间的间隙。

10. 发明授权

US06449098B1 High uniformity lens arrays having lens correction and methods for fabricating the same 有权
标题翻译：具有透镜校正的高均匀度透镜阵列及其制造方法
公开(公告)号：US06449098B1
公开(公告)日：2002-09-10
申请号：US09572922
申请日：2000-05-16
申请人： Roger Jonathan Helkey , Noel MacDonald
发明人： Roger Jonathan Helkey , Noel MacDonald
IPC分类号： G02B2710
CPC分类号： G02B3/0062 , G02B3/0012 , G02B27/0025
摘要： Uniformity errors for a lens array are corrected using corrective measures. The lens array includes a substrate. A plurality of primary lenses are formed from the substrate. A corrective measure is formed for each primary lens having a uniformity error such that the corrective measure corrects the uniformity error. Furthermore, a plurality of primary lenses are formed from a first side of a substrate. A uniformity of the plurality of primary lenses are measured. A corrective measure is formed for each primary lens having a uniformity error based on the measured uniformity such that the corrective measure corrects the uniformity error.
摘要翻译：使用纠正措施校正镜头阵列的均匀性误差。透镜阵列包括基板。从基板形成多个主透镜。对于具有均匀性误差的每个主要透镜形成校正措施，使得校正措施校正均匀性误差。此外，从基板的第一侧形成多个主透镜。测量多个主要透镜的均匀性。对于具有基于测量的均匀性的均匀性误差的每个主要透镜形成校正措施，使得校正措施校正均匀性误差。

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