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1. 发明申请

WO2010120137A3 METHOD AND APPARATUS FOR PROVIDING METADATA FOR SENSORY EFFECT COMPUTER READABLE RECORDING MEDIUM ON WHICH METADATA FOR SENSORY EFFECT IS RECORDED, AND METHOD AND APPARATUS FOR SENSORY REPRODUCTION 审中-公开
标题翻译：用于提供用于感测效应的元数据的感测效应计算机可读记录介质的元数据的方法和装置以及用于感测再现的方法和装置
公开(公告)号：WO2010120137A3
公开(公告)日：2011-01-20
申请号：PCT/KR2010002362
申请日：2010-04-15
申请人： KOREA ELECTRONICS TELECOMM , KIM JIN-SEO , CHO MAENG-SUB , KOO BONKI , KIM SANG-KYUN , JOO YONG-SOO
发明人： KIM JIN-SEO , CHO MAENG-SUB , KOO BONKI , KIM SANG-KYUN , JOO YONG-SOO
IPC分类号： H04N5/44 , H04N7/08
CPC分类号： H04N9/64 , G11B27/034 , G11B27/105 , H04N7/08 , H04N21/235 , H04N21/435
摘要： The present invention relates to a method and an apparatus for providing metadata for sensory effect, a computer readable recording medium on which the metadata for the sensory effect is recorded, and a method and an apparatus for sensory reproduction. According to this technique, disclosed is a method for providing the metadata for a sensory effect which comprises the steps of: generating SEM (Sensory Effect Metadata) which includes sensory effect information on contents; and transmitting the SEM to a sensory reproduction apparatus engine unit which analyzes the SEM and generates control information on a sensory reproduction apparatus, wherein the sensory effect information includes color calibration effect information on the contents.
摘要翻译：本发明涉及一种用于提供感觉效果的元数据的方法和装置，其上记录有用于感觉效果的元数据的计算机可读记录介质，以及用于感觉再现的方法和装置。根据该技术，公开了一种用于提供用于感觉效果的元数据的方法，其包括以下步骤：生成包括关于内容的感觉效果信息的SEM（感觉效应元数据）以及将SEM发送到感测再现装置引擎单元，其分析SEM并在感觉再现设备上生成控制信息，其中感觉效果信息包括关于内容的颜色校准效果信息。

2. 发明申请

WO2010008139A3 MULTIMEDIA APPLICATION SYSTEM AND METHOD USING METADATA FOR SENSORY DEVICE 审中-公开
标题翻译：多媒体应用系统和使用元数据传感器件的方法
公开(公告)号：WO2010008139A3
公开(公告)日：2012-04-12
申请号：PCT/KR2009003010
申请日：2009-06-19
申请人： KOREA ELECTRONICS TELECOMM , CHO MAENG SUB , KIM JIN SEO , KOO BON KI , LEE JI HYUNG , CHU CHANG WOO , KIM HO WON , PARK IL KYU , CHOI YOON-SEOK , PARK JI YOUNG , LIM SEONG JAE , HWANG BON WOO , PARK JEUNG CHUL , KIM KAP KEE , KIM SANG-KYUN , JOO YONG-SOO
发明人： CHO MAENG SUB , KIM JIN SEO , KOO BON KI , LEE JI HYUNG , CHU CHANG WOO , KIM HO WON , PARK IL KYU , CHOI YOON-SEOK , PARK JI YOUNG , LIM SEONG JAE , HWANG BON WOO , PARK JEUNG CHUL , KIM KAP KEE , KIM SANG-KYUN , JOO YONG-SOO
IPC分类号： H04H60/73 , H04N5/765
CPC分类号： H04N5/765 , G06F3/016 , H04N5/85 , H04N9/8205 , H04N21/41 , H04N21/42201 , H04N21/485 , H04N21/812 , H04N21/8133 , H04N21/8166 , H04N21/8186
摘要： A multimedia application system uses metadata for sensory devices. The system includes: a sensory-device engine for generating a sensory device command (SDC) for controlling the sensory devices based on sensory effect information (SEI) generated to represent sensory effects by using the sensory devices depending on video contents, user preference information (UPI) of the sensory devices and device capability information (DCI) indicative of reproducing capability of the sensory devices; and a sensory-device controller for controlling sensory devices to perform sensory effect reproduction in response to the generated SDC.
摘要翻译：多媒体应用系统使用感觉设备的元数据。该系统包括：感觉装置引擎，用于生成感测装置命令（SDC），用于基于通过使用根据视频内容的感觉装置产生的感觉效果信息（SEI）来控制感觉装置命令，用户偏好信息（ UPI）感测装置和设备能力信息（DCI），其指示感觉装置的再现能力; 以及感测装置控制器，用于控制感觉装置响应于所产生的SDC来执行感觉效果再现。

3. 发明申请

WO2011081323A3 COMPOSITION FOR THE BOTTOM LAYER OF A PHOTORESIST, AND METHOD USING SAME TO MANUFACTURE SEMICONDUCTOR DEVICE 审中-公开
标题翻译：用于光电二极管底层的组合物及使用其制造半导体器件的方法
公开(公告)号：WO2011081323A3
公开(公告)日：2011-10-27
申请号：PCT/KR2010008859
申请日：2010-12-10
申请人： CHEIL IND INC , KIM MI-YOUNG , KIM SANG-KYUN , CHO HYEON-MO , WOO CHANG-SOO , KOH SANG-RAN , YUN HUI-CHAN , LEE WOO-JIN , KIM JONG-SEOB
发明人： KIM MI-YOUNG , KIM SANG-KYUN , CHO HYEON-MO , WOO CHANG-SOO , KOH SANG-RAN , YUN HUI-CHAN , LEE WOO-JIN , KIM JONG-SEOB
IPC分类号： G03F7/11
CPC分类号： G03F7/0752 , G03F7/09 , G03F7/11
摘要： According to one embodiment of the present invention, a composition for the bottom layer of a photoresist comprises: (A) a polysiloxane resin represented by chemical formula 1 below; and (B) a solvent. According to chemical formula 1: {(SiO1.5-Y-SiO1.5)x(SiO2)y(XSiO1.5)z}(OH)e(OR1)f, the bottom layer of a photoresist can have good storability and etch resistance, can have easily controllable physical surface properties, and can enable a photoresist pattern to be stably formed.
摘要翻译：根据本发明的一个实施方案，用于光致抗蚀剂底层的组合物包括：（A）由下述化学式1表示的聚硅氧烷树脂; 和（B）溶剂。根据化学式1：{（SiO 1.5-Y-SiO 1.5）x（SiO 2）y（XSiO 1.5）z}（OH）e（OR 1）f，光致抗蚀剂的底层可以具有良好的储存性，耐蚀刻性能可以容易地控制物理表面性质，并能够稳定地形成光刻胶图形。

4. 发明申请

WO2004101702A9 CERIA ABRASIVE FOR CMP 审中-公开
标题翻译： CERIA研磨CMP
公开(公告)号：WO2004101702A9
公开(公告)日：2005-12-15
申请号：PCT/KR2004001139
申请日：2004-05-14
申请人： K C TECH CO LTD , UNIV SOGANG IND UNIV COOP FOUN , PAIK UN-GYU , PARK JAE-GUN , KIM SANG-KYUN , KATOH TAKEO , PARK YONG-KOOK
发明人： PAIK UN-GYU , PARK JAE-GUN , KIM SANG-KYUN , KATOH TAKEO , PARK YONG-KOOK
IPC分类号： C09G1/02 , C09K3/14 , H01L21/3105
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/31053
摘要： The present invention relates to a CMP abrasive comprising a ceria slurry and a chemical additive having two or more functional groups by mixing and synthesizing a polymeric molecule and a monomer . Also, the present invention relates to a method for a manufacturing CMP abrasive by providing a ceria slurry, manufacturing a chemical additive having two or more functional groups by mixing and synthesizing of the polymeric moleculeand the monomer in a reactor, and mixing said slurry and said chemical additive. Therefore, when the abrasive according to the present invention is used as an STI CMP abrasive, it is possible to apply the abrasive to the patterning process required in the very large scale integration semiconductor process. Furthermore, the CMP abrasive of the present invention has a superior removal rate, superior polishing selectivity, superior within wafer non-uniformity (WIWNU), and minimized occurrence of micro scratches.
摘要翻译：本发明涉及通过混合和合成聚合物分子和单体，其包含二氧化铈浆料和具有两个或更多个官能团的化学添加剂的CMP磨料。另外，本发明涉及通过提供二氧化铈浆料制造CMP研磨剂的方法，通过在反应器中混合和合成聚合物分子和单体制备具有两个或多个官能团的化学添加剂，并将所述浆料和所述化学添加剂。因此，当将根据本发明的研磨剂用作STI CMP研磨剂时，可以将磨料施加到非常大规模的集成半导体工艺中所需的图案化工艺。此外，本发明的CMP磨料具有优异的去除速度，优异的抛光选择性，在晶片不均匀性（WIWNU）内优异，并且最小化微小划痕的发生。

5. 发明申请

WO2011078483A3 FINE GAP-FILL POLYMERS, FINE GAP-FILLING COMPOSITIONS COMPRISING SAME, AND METHOD FOR MAKING INTEGRATED CIRCUIT SEMICONDUCTOR DEVICES USING SAME 审中-公开
标题翻译：细间隙填充聚合物，包含该间隙填充聚合物的细间隙填充组合物以及使用相同方法制造集成电路半导体器件的方法
公开(公告)号：WO2011078483A3
公开(公告)日：2011-11-10
申请号：PCT/KR2010008193
申请日：2010-11-19
申请人： CHEIL IND INC , KOH SANG-RAN , KIM SANG-KYUN , CHO HYEON-MO , WOO CHANG-SOO , KIM MI-YOUNG , YUN HUI-CHAN , LEE WOO-JIN , KIM JONG-SEOB
发明人： KOH SANG-RAN , KIM SANG-KYUN , CHO HYEON-MO , WOO CHANG-SOO , KIM MI-YOUNG , YUN HUI-CHAN , LEE WOO-JIN , KIM JONG-SEOB
IPC分类号： C08G77/04 , C08L83/04 , H01L21/469 , H01L21/76
CPC分类号： C07F7/0852 , H01L21/76877
摘要： The present invention relates to fine gap-fill polymers and fine gap-filling compositions including same, and includes an organosilane polymer system which has the compound represented by Formula 1 as a substituent at its terminus. [Formula 1] HOOC-(CH2)l-R1 2Si-O-SiR1'2-(CH2)l-COOH, wherein R1, R1', and l of Formula 1 are defined and described in the description. Accordingly. the present invention provides a method for manufacturing integrated circuit semiconductor devices using the fine gap-filling compositions which have excellent gap-filling ability and good storage stability characteristics.
摘要翻译：本发明涉及细间隙填充聚合物和包含它的细间隙填充组合物，并且包括在其末端具有由式1表示的化合物作为取代基的有机硅烷聚合物体系。 [式1] HOOC-（CH 2）1 -R 2 2 Si-O-SiR 1'2 - （CH 2）1 -COOH其中式1中的R 1，R 1'和l在说明书中定义和描述。因此。本发明提供了一种使用具有优异间隙填充能力和良好储存稳定性特征的细间隙填充组合物制造集成电路半导体器件的方法。

6. 发明申请

WO2011081325A3 LIGHT-TRANSMITTING RESIN FOR AN ENCAPSULATING MATERIAL AND ELECTRONIC DEVICE COMPRISING SAME 审中-公开
标题翻译：用于封装材料的光发送树脂和包含其的电子器件
公开(公告)号：WO2011081325A3
公开(公告)日：2011-10-27
申请号：PCT/KR2010008927
申请日：2010-12-14
申请人： CHEIL IND INC , KOH SANG-RAN , KIM JONG-SEOB , KIM SANG-KYUN , SHIN JUNE-HO , JUNG DOO-YOUNG , CHA SUNG-HWAN , AHN HYUN-JUNG , CHOI YOUNG-EUN
发明人： KOH SANG-RAN , KIM JONG-SEOB , KIM SANG-KYUN , SHIN JUNE-HO , JUNG DOO-YOUNG , CHA SUNG-HWAN , AHN HYUN-JUNG , CHOI YOUNG-EUN
IPC分类号： C09K3/10 , C08G77/04 , C08L83/04
CPC分类号： C08G77/20 , C08G77/24 , C08G77/80
摘要： Provided is a light-transmitting resin composition for an encapsulating material, comprising polysiloxane obtained by copolymerizing a first silicon compound expressed by Chemical Formula 1 and a second silicon compound comprising the compound expressed by Chemical Formula 2. Also provided is an electronic device comprising an encapsulating material obtained by hardening the light-transmitting resin composition.
摘要翻译：提供一种用于封装材料的透光树脂组合物，其包含通过使由化学式1表示的第一硅化合物共聚而获得的聚硅氧烷和包含由化学式2表示的化合物的第二硅化合物。还提供了一种电子器件，其包含封装通过使透光性树脂组合物硬化而得到的材料。

7. 发明申请

WO2011081322A3 COMPOSITION FOR THE BOTTOM LAYER OF A RESIST, AND METHOD USING SAME TO MANUFACTURE A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE 审中-公开
标题翻译：用于电阻底层的组合物和使用其制造半导体集成电路器件的方法
公开(公告)号：WO2011081322A3
公开(公告)日：2011-11-03
申请号：PCT/KR2010008852
申请日：2010-12-10
申请人： CHEIL IND INC , KIM MI-YOUNG , LEE WOO-JIN , HAN KWEN-WOO , LEE HAN-SONG , KIM SANG-KYUN , KIM JONG-SEOB
发明人： KIM MI-YOUNG , LEE WOO-JIN , HAN KWEN-WOO , LEE HAN-SONG , KIM SANG-KYUN , KIM JONG-SEOB
IPC分类号： G03F7/11 , G03F7/075 , H01L21/027
CPC分类号： H01L21/0332 , C08G77/80 , C09D183/04 , G03F7/0752 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
摘要： Provided is a composition for the bottom layer of a resist, comprising: an organic-silane-based polycondensation compound as expressed in chemical formulae 1 to 3; and a solvent. The composition for the bottom layer of a resist easily controls the refractive index and light absorption, and can provide a bottom layer for a resist that has good antireflective characteristics, and a semiconductor integrated circuit device using same.
摘要翻译：本发明提供抗蚀剂底层用组合物，其含有：化学式1〜3表示的有机硅烷系缩聚化合物; 和溶剂。抗蚀剂底层的组合物容易控制折射率和光吸收，并且可以提供具有良好抗反射特性的抗蚀剂的底层，以及使用其的半导体集成电路器件。

8. 发明申请

WO2011081316A3 COMPOSITION FOR THE BOTTOM LAYER OF A RESIST, AND METHOD USING SAME TO MANUFACTURE A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE 审中-公开
标题翻译：用于抗蚀剂底层的组合物及使用该组合物制造半导体集成电路器件的方法
公开(公告)号：WO2011081316A3
公开(公告)日：2011-10-27
申请号：PCT/KR2010008765
申请日：2010-12-08
申请人： CHEIL IND INC , YUN HUI-CHAN , KIM SANG-KYUN , CHO HYEON-MO , KIM MI-YOUNG , KOH SANG-RAN , CHUNG YONG-JIN , KIM JONG-SEOB
发明人： YUN HUI-CHAN , KIM SANG-KYUN , CHO HYEON-MO , KIM MI-YOUNG , KOH SANG-RAN , CHUNG YONG-JIN , KIM JONG-SEOB
IPC分类号： G03F7/11 , G03F7/075
CPC分类号： G03F7/0752 , G03F7/094 , G03F7/11
摘要： Provided is a composition for the bottom layer of a resist, including an organic-silane-based polycondensation compound and a solvent. The organic-silane-based polycondensation compound is provided at a structural unit of 10 mol % to 40 mol % as expressed in chemical formula 1 in the specification. Therefore, the present invention relates to a composition for a bottom layer of a resist enabling excellent pattern transferability, using a bottom layer of a resist that has excellent storage stability and etch resistance, and to a method using same to manufacture a semiconductor integrated circuit device.
摘要翻译：本发明提供一种抗蚀剂底层用组合物，其含有有机硅烷系缩聚化合物和溶剂。本说明书中的化学式1所示的有机硅烷系缩聚化合物以10摩尔％〜40摩尔％的结构单元来提供。因此，本发明涉及使用具有优异的储存稳定性和耐蚀刻性的抗蚀剂的底层，能够实现优异的图案转印性的抗蚀剂底层用组合物，以及涉及使用其制造半导体集成电路装置的方法。

9. 发明申请

WO2011081321A3 COMPOSITION FOR THE BOTTOM LAYER OF A RESIST, AND METHOD USING SAME TO MANUFACTURE A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE 审中-公开
标题翻译：用于抗蚀剂底层的组合物及使用该组合物制造半导体集成电路器件的方法
公开(公告)号：WO2011081321A3
公开(公告)日：2011-11-03
申请号：PCT/KR2010008849
申请日：2010-12-10
申请人： CHEIL IND INC , KIM MI-YOUNG , KIM SANG-KYUN , CHO HYEON-MO , KOH SANG-RAN , YUN HUI-CHAN , CHUNG YONG-JIN , KIM JONG-SEOB
发明人： KIM MI-YOUNG , KIM SANG-KYUN , CHO HYEON-MO , KOH SANG-RAN , YUN HUI-CHAN , CHUNG YONG-JIN , KIM JONG-SEOB
IPC分类号： G03F7/11 , G03F7/075 , H01L21/027
CPC分类号： G03F7/0752 , C08G77/16 , C08G77/18 , C08L83/04 , C08L83/06 , G03F7/11 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/0332
摘要： Provided is a composition for the bottom layer of a resist, including an organic-silane-based polycondensation compound and a solvent, wherein the organic-silane-based polycondensation compound contains from 40 to 80 mol % of a structural unit as expressed in chemical formula 1. Therefore, the present invention relates to a composition for the bottom layer of a resist enabling excellent pattern transferability, using a bottom layer of a resist having excellent storage stability and etch resistance, and to a method using same to manufacture a semiconductor integrated circuit device.
摘要翻译：本发明提供一种抗蚀剂底层用组合物，其包含有机硅烷系缩聚化合物和溶剂，其中，有机硅烷系缩聚化合物含有40〜80摩尔％的化学式因此，本发明涉及使用具有优异的储存稳定性和耐蚀刻性的抗蚀剂的底层，能够实现优异的图案转印性的抗蚀剂底层用组合物，以及涉及使用其制造半导体集成电路的方法设备。

10. 发明公开

EP2301245A4 MULTIMEDIA APPLICATION SYSTEM AND METHOD USING METADATA FOR SENSORY DEVICE 审中-公开
标题翻译：多媒体应用系统，使用元数据的传感器设备的方法，
公开(公告)号：EP2301245A4
公开(公告)日：2013-07-10
申请号：EP09798042
申请日：2009-06-19
申请人： KOREA ELECTRONICS TELECOMM
发明人： CHO MAENG SUB , KIM JIN SEO , KOO BON KI , LEE JI HYUNG , CHU CHANG WOO , KIM HO WON , PARK IL KYU , CHOI YOON-SEOK , PARK JI YOUNG , LIM SEONG JAE , HWANG BON WOO , PARK JEUNG CHUL , KIM KAP KEE , KIM SANG-KYUN , JOO YONG-SOO
IPC分类号： H04H60/73 , H04N5/765
CPC分类号： H04N5/765 , G06F3/016 , H04N5/85 , H04N9/8205 , H04N21/41 , H04N21/42201 , H04N21/485 , H04N21/812 , H04N21/8133 , H04N21/8166 , H04N21/8186

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