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    • 3. 发明申请
    • THIN FILM TRANSISTOR
    • 薄膜晶体管
    • WO2004019400A1
    • 2004-03-04
    • PCT/IB2003/003477
    • 2003-08-06
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.GREEN, Peter, W.
    • GREEN, Peter, W.
    • H01L21/336
    • H01L29/66765H01L29/41733H01L29/42384H01L29/78618H01L29/78642H01L29/78696
    • A method of fabricating a TFT comprises: etching a base layer structure (9) on a substrate (1) so as to form a gate (4) with inclined side edges (4a, 4b) that extend towards an apex region (12) with a tip (13) of a radius of a few nanometers, depositing an amorphous silicon channel layer (6) over the inclined side edges and the apex region, depositing a metal layer (8) over the channel layer so as to cover the apex region and the side edges, applying a layer of masking material (14) over the conductive material and selectively etching it so that the metal layer (8) in the apex region protrudes through and upstands from the masking material, and selectively etching the metal (8) that protrudes through the masking material (14) in the apex region such as to provide separate, self aligned source and drain regions (8a, 8b) overlying the inclined edges with a short channel (L) between them.
    • 一种制造TFT的方法包括:蚀刻衬底(1)上的基底层结构(9),以便形成具有向顶点区域(12)延伸的倾斜侧边缘(4a,4b)的栅极(4) 半径为几纳米的尖端(13),在所述倾斜侧边缘和所述顶点区域上沉积非晶硅沟道层(6),在所述沟道层上沉积金属层(8)以覆盖所述顶点区域 和侧边缘,在导电材料上施加一层掩模材料(14)并选择性地蚀刻它,使得顶点区域中的金属层(8)从掩模材料突出并仰卧起来,并且选择性地蚀刻金属(8 ),其突出穿过顶点区域中的掩模材料(14),以便在它们之间具有在其上具有短通道(L)的分开的自对准的源极和漏极区域(8a,8b)。
    • 4. 发明申请
    • DISPLAY SUBSTRATE WITH AN INTEGRATED ACOUSTIC TRANSDUCER
    • 具有集成式声学传感器的显示基板
    • WO2002077702A1
    • 2002-10-03
    • PCT/IB2002/000642
    • 2002-03-04
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.
    • MURDEN, VegaGREEN, Peter, W.
    • G02F1/1333
    • H04R19/005G02F1/1333G02F1/133308H04R17/02H04R19/016H04R31/00
    • A display substrate (1) comprising a plate, for example a glass plate (2), on which display elements, e.g. pixels (4-8) comprising pixel electrodes (72) and thin-film-transistors (69), and an acoustic transducer (10), e.g. a microphone, speaker or buzzer, formed from thin film layers over a cavity (28), are formed. The cavity (28) may be provided by powderblasting through the depth of the glass plate (2). The display substrate (1) with integrated acoustic transducer (10) may be incorporated in a display device, e.g. a liquid crystal display device (11). Also described is a discrete acoustic transducer, comprising a plate of an insulating material (102), a cavity (120) in the plate (102), a plurality of layers that have been deposited on the plate, and a moveable member (122) formed from the deposited layers and positioned over the cavity (120).
    • 显示基板(1),其包括板,例如玻璃板(2),显示元件 包括像素电极(72)和薄膜晶体管(69)的像素(4-8)和声变换器(10) 形成由空腔(28)上的薄膜层形成的麦克风,扬声器或蜂鸣器。 空腔(28)可以通过玻璃板(2)的深度的粉末喷射来提供。 具有集成的声换能器(10)的显示基板(1)可以结合在显示装置中。 液晶显示装置(11)。 还描述了一种离散的声换能器,包括绝缘材料(102)的板,板(102)中的空腔(120),已经沉积在板上的多个层和可移动构件(122) 由沉积的层形成并定位在空腔(120)上方。
    • 5. 发明公开
    • THYRISTORS AND THEIR MANUFACTURE
    • 可控硅及其制造方法
    • EP1129490A1
    • 2001-09-05
    • EP00953146.8
    • 2000-08-02
    • Koninklijke Philips Electronics N.V.
    • GREEN, Peter, W.
    • H01L29/74H01L29/06
    • H01L29/0619H01L29/74H01L29/747
    • The forward and reverse blocking voltage capability of a thyristor in accordance with the invention is substantially independent of the active thyristor area (Aa), thereby facilitating its design and its manufacture. This is achieved by means of a concentric arrangement of a deep inner lower-doped perimeter zone (42) of the forward base region (2) with a deep outer perimeter zone (43) of the same conductivity type, doping profile and depth (A4xj=Axj). The outer perimeter zone (43) brings the reverse blocking p-n junction (34) to the front surface (11) at a lateral distance (D3) around the forward blocking p-n junction (32). The outer perimeter zone (43) extends in depth to a lower perimeter zone (44) of the underlying region (4) that forms the reverse blocking junction with the high-resistivity base region (3) of opposite conductivity type. All these perimeter zones (42-44) together provide the thyristor with a deep peripheral termination which surrounds the active thyristor area (Aa). By making the inner and outer perimeter zones (42, 43) much deeper than the surrounded forward base region (2), the forward and reverse blocking voltage capability of the thyristor is determined substantially independently of the doping of the forward base region (2) and layout geometry of the N-P-N-P or N-P-N-P-N region structure in the active thyristor area (Aa). This doping and layout geometry can be chosen to give different magnitudes of transistor gain and different thyristor switching characteristics, all within the same peripheral termination. Current conduction in the lower-doped perimeter zone (42) is less than in the highly-doped, highly-conductive base perimeter of prior-art planar thyristors and may even be pinched off from the active area (Aa), so easing the layout design of emitter-base shorts (1a) in the active area (Aa).