专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2013002988A2 ILLUMINATION CONTROL 审中-公开
标题翻译：照明控制
公开(公告)号：WO2013002988A2
公开(公告)日：2013-01-03
申请号：PCT/US2012/041273
申请日：2012-06-07
申请人： KLA-TENCOR CORPORATION , MANASSEN, Amnon , SELIGSON, Joel , SAPIENS, Noam
发明人： MANASSEN, Amnon , SELIGSON, Joel , SAPIENS, Noam
CPC分类号： G01J1/4257 , G02B21/0016 , G02B21/082 , G02B21/365 , G02B26/0833 , G03F7/70633
摘要： An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.
摘要翻译：光学系统可以包括目标，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统，以及分别位于瞳孔共轭平面和场共轭平面处的至少两个动态光学阵列器件照明光学。动态光学阵列装置被配置为控制从照明系统耦合到目标的照明的一个或多个特性。

2. 发明申请

WO2013025333A1 OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS 审中-公开
标题翻译：通过相位分析的覆盖度量
公开(公告)号：WO2013025333A1
公开(公告)日：2013-02-21
申请号：PCT/US2012/048807
申请日：2012-07-30
申请人： KLA-TENCOR CORPORATION , MANASSEN, Amnon , KANDEL, Daniel , BARUCH, Moshe , LEVINSKI, Vladimir , SAPIENS, Noam , SELIGSON, Joel L. , HILL, Andy , BACHAR, Ohad , NEGRI, Daria , ZAHARAN, Ofer
发明人： MANASSEN, Amnon , KANDEL, Daniel , BARUCH, Moshe , LEVINSKI, Vladimir , SAPIENS, Noam , SELIGSON, Joel L. , HILL, Andy , BACHAR, Ohad , NEGRI, Daria , ZAHARAN, Ofer
IPC分类号： H01L21/66
CPC分类号： G03F7/70633
摘要： The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
摘要翻译：本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值。

3. 发明申请

WO2011028807A2 METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：计量系统和方法
公开(公告)号：WO2011028807A2
公开(公告)日：2011-03-10
申请号：PCT/US2010/047539
申请日：2010-09-01
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
IPC分类号： H01L21/66
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：
提供了各种计量系统和方法。

4. 发明申请

WO2011159725A2 DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
标题翻译：离散极化分析
公开(公告)号：WO2011159725A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040389
申请日：2011-06-14
申请人： KLA-TENCOR CORPORATION , HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
发明人： HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided.
摘要翻译：提供了离散极化散射法的系统和方法。

5. 发明申请

WO2010080732A2 SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 审中-公开
标题翻译： SCATTERMETRY计量学目标设计优化
公开(公告)号：WO2010080732A2
公开(公告)日：2010-07-15
申请号：PCT/US2010/020046
申请日：2010-01-04
申请人： KLA-TENCOR CORPORATION , ADEL, Michael E. , MANASSEN, Amnon , KANDEL, Daniel
发明人： ADEL, Michael E. , MANASSEN, Amnon , KANDEL, Daniel
IPC分类号： H01L21/66
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.
摘要翻译：可以使用包括计量目标设计信息，底物信息，过程信息和计量系统信息的输入来优化计量目标设计。采用计量系统获取计量信号可以使用输入来建模，以产生计量目标的一个或多个光学特性。可以将计量学算法应用于特征以确定由计量系统制定的度量目标的预测精度和测量精度。可以修改与度量目标设计有关的部分信息，并且可以重复信号建模和计量学算法以优化一个或多个测量的精度和精度。可以在精度和精度优化后显示或存储度量目标设计。

6. 发明申请

WO2002061498A1 OPTICAL MODULATOR 审中-公开
标题翻译：光学调制器
公开(公告)号：WO2002061498A1
公开(公告)日：2002-08-08
申请号：PCT/IL2001/000143
申请日：2001-02-14
申请人： 3DV SYSTEMS, LTD. , MANASSEN, Amnon , BRAUN, Ori, J. , YAHAV, Giora
发明人： MANASSEN, Amnon , BRAUN, Ori, J. , YAHAV, Giora
IPC分类号： G02F1/017
CPC分类号： B82Y20/00 , G02F1/017
摘要： Provided is an optical modulator for modulating light comprising: a superlattice structure having a plurality of interleaved narrow and wide bandgap semiconductor layers, wherein wave functions of energy states of electrons and holes in different narrow bandgap layers are coupled; and a power supply that applies voltage to the superlattice structure between a first non-zero voltage and a second non-zero voltage to modulate the light.
摘要翻译：提供了一种用于调制光的光调制器，包括：具有多个交错的窄带宽宽带隙半导体层的超晶格结构，其中耦合不同窄带隙层中电子和空穴的能态的波函数; 以及在第一非零电压和第二非零电压之间向超晶格结构施加电压以调制光的电源。

7. 发明申请

WO2003001282A1 COMPOUND OPTICAL MODULATOR 审中-公开
标题翻译：复合光调制器
公开(公告)号：WO2003001282A1
公开(公告)日：2003-01-03
申请号：PCT/IL2001/000580
申请日：2001-06-26
申请人： 3DV SYSTEMS, LTD. , MANASSEN, Amnon , SANDER, Avner
发明人： MANASSEN, Amnon , SANDER, Avner
IPC分类号： G02F1/017
CPC分类号： B82Y20/00 , G02F1/017 , G02F2201/16 , G02F2203/055
摘要： There is therefore provided in accordance with an embodiment of the present invention a modulator for modulating light comprising: a quantum well structure (QWS), comprising narrow-bandgap semiconductor layers interleaved with wide-bandgap semiconductor layers which QWS has an operating band of wavelengths for which transmittance for light is controllable by an electric field generated in the QWS; a configuration of electrodes electrifiable to generate an electric field perpendicular to the semiconductor layers of the QWS in each of a plurality of localized non-overlapping voxels of the QWS independent of an electric field in any of the other voxels; a different optical filter coupled to each of at least two of the voxels, each different filter transmitting light in a different sub-band of the operating band of the QWS and being substantially opaque to light having a wavelength in the operating band that is outside of the sub-band; and a power supply controllable to apply voltage to the configuration of electrodes so as to generate the electric field.
摘要翻译：因此，根据本发明的实施例提供了一种用于调制光的调制器，包括：量子阱结构（QWS），包括与宽带隙半导体层交错的窄带隙半导体层， QWS有一个工作波长的波长，光的透射率可以通过QWS中产生的电场来控制; 在QWS的多个局域化非重叠体素中的每一个体系中，可电成形为产生垂直于QWS的半导体层的电场的电极的构造，而与任何其他体素中的电场无关; 耦合到所述体素中的至少两个的每一个的不同滤光器，每个不同滤光器透射在所述QWS的所述工作频带的不同子频带中的光，并且对于在所述工作频带中具有波长的光是基本不透明的，子带; 以及可控制的电源以将电压施加到电极的配置以产生电场。

8. 发明申请

WO2002079842A1 OPTICAL AND ELECTRONIC MICROCOMPONENT CONNECTIONS 审中-公开
标题翻译：光电与微电子连接
公开(公告)号：WO2002079842A1
公开(公告)日：2002-10-10
申请号：PCT/IL2001/000296
申请日：2001-03-29
申请人： 3DV SYSTEMS, LTD. , MANASSEN, Amnon , SANDER, Avner
发明人： MANASSEN, Amnon , SANDER, Avner
IPC分类号： G02B6/38
CPC分类号： G02B6/4236 , G02B6/32 , G02B6/423
摘要： A microcomponent comprising: a substrate; an optical sub-component formed on the substrate using microfabrication techniques, the optical sub-component having an optic axis; and at least one male and/or at least one female connective element formed on the substrate, said connective element aligned with respect to the optic axis and useable to connect the microcomponent with another microcomponent having respectively a matching at least one female and/or at least one male connective element.
摘要翻译：一种微组件，包括：基底; 使用微细加工技术在所述基板上形成的光学子部件，所述光学子部件具有光轴; 以及形成在所述基底上的至少一个阳和/或至少一个阴连接元件，所述连接元件相对于所述光轴对准并且可用于将所述微元件与另外的分别具有匹配的至少一个母体和/或至少一个公连接元件。

9. 发明申请

WO2020046408A1 OFF-AXIS ILLUMINATION OVERLAY MEASUREMENT USING TWO-DIFFRACTED ORDERS IMAGING 审中-公开
公开(公告)号：WO2020046408A1
公开(公告)日：2020-03-05
申请号：PCT/US2018/065579
申请日：2018-12-14
申请人： KLA-TENCOR CORPORATION
发明人： YONI, Shalibo , PASKOVER, Yuri , LEVINSKI, Vladimir , MANASSEN, Amnon , EISANBACH, Shlomo , LAREDO, Gilad , HILDESHEIM, Ariel
IPC分类号： G03F7/20 , G02B7/38 , G01N21/47 , G01N21/952
摘要： Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices. Methods comprise illuminating the target in a Littrow configuration to yield a first measurement signal comprising a -1st diffraction order and a 0th diffraction order and a second measurement signal comprising a +1st diffraction order and a 0th diffraction order, wherein the -1st diffraction order of the first measurement signal and the +1st diffraction order of the second measurement signal are diffracted at 180 to a direction of the illumination, performing a first measurement of the first measurement signal and a second measurement of the second measurement signal, and deriving metrology metric(s) therefrom. Optionally, a reflected 0th diffraction order may be split to yield components which interact with the -1st and +1st diffraction orders.

10. 发明申请

WO2018063471A2 OPTICAL NEAR-FIELD METROLOGY 审中-公开
标题翻译：光学近场测量
公开(公告)号：WO2018063471A2
公开(公告)日：2018-04-05
申请号：PCT/US2017/041404
申请日：2017-07-10
申请人： KLA-TENCOR CORPORATION
发明人： PASKOVER, Yuri , MANASSEN, Amnon , LEVINSKI, Vladimir
IPC分类号： G01B11/02 , G01B9/02
摘要： Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.
摘要翻译：提供了系统和方法，其利用光学微腔探测器以符合高体积计量要求的方式通过其间的近场相互作用来映射晶圆形貌。光学微腔探针通过参考辐射与微腔中的辐射和晶片特征（诸如装置特征和计量目标特征）的近场相互作用之间的干涉信号的移位来检测晶片上的特征。各种照明和检测配置提供快速和敏感的信号，用于增强光学测量测量的准确性和灵敏度。光学微腔探针可以在相对于晶片的受控高度和位置处被扫描，并提供关于装置和目标特征之间的空间关系的信息。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式