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1. 发明申请

WO2008134378A1 OPTICAL GAIN APPROACH FOR ENHANCEMENT OF OVERLAY AND ALIGNMENT SYSTEMS PERFORMANCE 审中-公开
标题翻译：增强覆盖和对准系统性能的光学增益方法
公开(公告)号：WO2008134378A1
公开(公告)日：2008-11-06
申请号：PCT/US2008/061318
申请日：2008-04-23
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , ADEL, Michael , SELIGSON, Joel
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , ADEL, Michael , SELIGSON, Joel
IPC分类号： G01N21/00
CPC分类号： G01B11/272 , G03F7/70633
摘要： A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. The resultant image may be analyzed to determine a shift in the grating target from a shift in the Moiré pattern. Optical alignment apparatus may include a first beam splitter, an image transformation element optically coupled to the first beam splitter, and a second beam splitter. The first beam splitter divides an image of a grating target into first and second portions. The second beam splitter combines the first portion and the second portion. The image transformation element optically modifies the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern.
摘要翻译：可以通过将目标图像划分成第一和第二部分并光学地修改第一和/或第二部分使得由其组合形成的最终图像由莫尔图案表征来获得光栅目标的合成图像。可以分析所得到的图像以确定光栅目标从莫尔图案的偏移中的偏移。光学对准装置可以包括第一分束器，光耦合到第一分束器的图像变换元件和第二分束器。第一分束器将光栅靶的图像分成第一和第二部分。第二分束器组合第一部分和第二部分。图像变换元件光学地修改第一和/或第二部分，使得由它们的组合形成的最终图像的特征在于莫尔图案。

2. 发明申请

WO2011028807A2 METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：计量系统和方法
公开(公告)号：WO2011028807A2
公开(公告)日：2011-03-10
申请号：PCT/US2010/047539
申请日：2010-09-01
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
IPC分类号： H01L21/66
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：
提供了各种计量系统和方法。

3. 发明申请

WO2011159725A2 DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
标题翻译：离散极化分析
公开(公告)号：WO2011159725A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040389
申请日：2011-06-14
申请人： KLA-TENCOR CORPORATION , HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
发明人： HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided.
摘要翻译：提供了离散极化散射法的系统和方法。

4. 发明申请

WO2013025333A1 OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS 审中-公开
标题翻译：通过相位分析的覆盖度量
公开(公告)号：WO2013025333A1
公开(公告)日：2013-02-21
申请号：PCT/US2012/048807
申请日：2012-07-30
申请人： KLA-TENCOR CORPORATION , MANASSEN, Amnon , KANDEL, Daniel , BARUCH, Moshe , LEVINSKI, Vladimir , SAPIENS, Noam , SELIGSON, Joel L. , HILL, Andy , BACHAR, Ohad , NEGRI, Daria , ZAHARAN, Ofer
发明人： MANASSEN, Amnon , KANDEL, Daniel , BARUCH, Moshe , LEVINSKI, Vladimir , SAPIENS, Noam , SELIGSON, Joel L. , HILL, Andy , BACHAR, Ohad , NEGRI, Daria , ZAHARAN, Ofer
IPC分类号： H01L21/66
CPC分类号： G03F7/70633
摘要： The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
摘要翻译：本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值。

5. 发明申请

WO2007143056A3 ORDER SELECTED OVERLAY METROLOGY 审中-公开
公开(公告)号：WO2007143056A3
公开(公告)日：2007-12-13
申请号：PCT/US2007/012875
申请日：2007-05-31
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , ADEL, Michael, E. , SELIGSON, Joel, L.
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , ADEL, Michael, E. , SELIGSON, Joel, L.
IPC分类号： G01N21/00 , G01B11/30
摘要： Disclosed are apparatus and methods for measuring a characteristic, such as overlay, of a semiconductor target. In general, order-selected imaging and/or illumination is performed while collecting an image from a target using a metrology system. In one implementation, tunable spatial modulation is provided only in the imaging path of the system. In other implementations, tunable spatial modulation is provided in both the illumination and imaging paths of the system. In a specific implementation, tunable spatial modulation is used to image side-by-side gratings with diffraction orders ±n. The side-by-side gratings may be in different layers or the same layer of a semiconductor wafer. The overlay between the structures is typically found by measuring the distance between centers symmetry of the gratings. In this embodiment, only orders ±n for a given choice of n (where n is an integer and not equal to zero) are selected, and the gratings are only imaged with these diffraction orders.

6. 发明申请

WO2011011511A1 ANGLE-RESOLVED ANTISYMMETRIC SCATTEROMETRY 审中-公开
标题翻译：角解决的反对称散射测量
公开(公告)号：WO2011011511A1
公开(公告)日：2011-01-27
申请号：PCT/US2010/042738
申请日：2010-07-21
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , SAPIENS, Noam
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , SAPIENS, Noam
IPC分类号： G01J4/00
CPC分类号： G01N21/95607 , G01B11/14 , G01B11/24 , G01B2210/56 , G03F7/70633
摘要： A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS 1 ) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS 2 ) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS 1 ) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS 2 ) associated with the second scatterometry cell.
摘要翻译：用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（ΔS1）; 获得与第二散射测量单元相关联的第二反对称差分信号（θS2），并计算与第一散射测量单元和第二反对称差分信号相关联的第一反对称差分（ΔS1）信号的叠加偏移（ βS2）与第二散射测量单元相关联。

7. 发明申请

WO2012109348A1 STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY 审中-公开
标题翻译：结构化照明在超大规模的对比度增强
公开(公告)号：WO2012109348A1
公开(公告)日：2012-08-16
申请号：PCT/US2012/024320
申请日：2012-02-08
申请人： KLA-TENCOR CORPORATION , SELIGSON, Joel, L. , SAPIENS, Noam , KANDEL, Daniel
发明人： SELIGSON, Joel, L. , SAPIENS, Noam , KANDEL, Daniel
IPC分类号： G03F9/00
CPC分类号： G01N21/47 , G01B11/02 , G01N21/00 , G03F7/70633
摘要： Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.
摘要翻译：计量工具中的对比度增强可以包括产生照射光束，将所产生的光束的一部分引导到空间光调制器（SLM）的表面上，引导入射到SLM的表面上的所产生的光束的至少一部分通过孔径的孔径停止并且连接到一个或多个样本的一个或多个目标结构上，并且通过使用SLM生成通过孔径透射的照明的选择的照明光瞳函数，以便建立一个或多个场图像的对比度所述一个或多个目标结构在所选择的对比度阈值之上，以及利用所选择的照明光瞳功能对所述一个或多个目标结构执行一个或多个度量测量。

8. 发明申请

WO2012018674A2 OPTICS SYMMETRIZATION FOR METROLOGY 审中-公开
标题翻译：计量学的光学对称
公开(公告)号：WO2012018674A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/045784
申请日：2011-07-28
申请人： KLA-TENCOR CORPORATION , MANASSEN, Ammon , KANDEL, Daniel , BARUCH, Moshe , SELIGSON, Joel , SVIZHER, Alexander , COHEN, Guy , ROTEM, Efraim , BACHAR, Ohad , NEGRI, Daria , SAPIENS, Noam
发明人： MANASSEN, Ammon , KANDEL, Daniel , BARUCH, Moshe , SELIGSON, Joel , SVIZHER, Alexander , COHEN, Guy , ROTEM, Efraim , BACHAR, Ohad , NEGRI, Daria , SAPIENS, Noam
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G01N21/55 , G03F7/70616
摘要： The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
摘要翻译：本发明包括照明源，至少一个照明对称化模块（ISM），其被配置为使从照明源发出的光的至少一部分对称化;第一分束器，其被配置为将第一部分由ISM沿着物体路径沿着参考路径沿着物体路径被ISM处理到一个或多个样本的表面以及由ISM处理的第二部分光;以及沿着主光轴布置的检测器，其中检测器被配置为收集从一个或多个样本的表面反射的一部分光。

9. 发明申请

WO2012138758A1 METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 审中-公开
标题翻译：提供改进过程控制质量标准的方法和系统
公开(公告)号：WO2012138758A1
公开(公告)日：2012-10-11
申请号：PCT/US2012/032169
申请日：2012-04-04
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , COHEN, Guy , KLEIN, Dana , LEVINSKI, Vladimir , SAPIENS, Noam , SHULMAN, Alex , KAMENETSKY, Vladimir , AMIT, Eran , VAKSHTEIN, Irina
发明人： KANDEL, Daniel , COHEN, Guy , KLEIN, Dana , LEVINSKI, Vladimir , SAPIENS, Noam , SHULMAN, Alex , KAMENETSKY, Vladimir , AMIT, Eran , VAKSHTEIN, Irina
IPC分类号： G01N37/00
CPC分类号： G03F7/70633 , G01N2223/6116
摘要： The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.
摘要翻译：本发明可以包括从分布在许多晶片的晶片的一个或多个场上的多个测量目标获取多个覆盖度量测量信号，为多个覆盖度量测量信号中的每一个确定多个重叠估计使用多个覆盖算法，生成多个覆盖估计分布，以及利用所生成的多个覆盖估计分布生成第一多个质量度量，其中每个质量度量对应于所生成的多个覆盖估计分布的一个覆盖估计分布每个质量度量是对应的生成的重叠估计分布的宽度的函数，每个质量度量还是来自相关度量目标的覆盖度量测量信号中存在的不对称的函数。

10. 发明申请

WO2012018673A2 MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 审中-公开
标题翻译：多层覆盖计量目标和免费覆盖计量测量系统
公开(公告)号：WO2012018673A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/045778
申请日：2011-07-28
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , COHEN, Guy
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , COHEN, Guy
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G03F7/70683
摘要： A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.
摘要翻译：公开了用于基于成像的度量衡中的多层覆盖目标。覆盖目标包括多个包括三个或更多个目标结构的目标结构，每个目标结构包括一组两个或更多个模式元素，其中目标结构被配置为在目标结构对齐时共享对称的共同中心，每个目标结构围绕所述公共对称中心不变为N度旋转，其中N等于或大于180度，其中所述两个或更多个图案元件中的每一个具有单独的对称中心，其中所述两个或更多个图案中的每一个每个目标结构的元素对于围绕单个对称中心的M度旋转是不变的，其中M等于或大于180度。

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